JPS61208649A - Method for electron ray phase change type recording and reproducing and its apparatus - Google Patents
Method for electron ray phase change type recording and reproducing and its apparatusInfo
- Publication number
- JPS61208649A JPS61208649A JP4944485A JP4944485A JPS61208649A JP S61208649 A JPS61208649 A JP S61208649A JP 4944485 A JP4944485 A JP 4944485A JP 4944485 A JP4944485 A JP 4944485A JP S61208649 A JPS61208649 A JP S61208649A
- Authority
- JP
- Japan
- Prior art keywords
- phase change
- recording
- phase
- electron beam
- recording film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は、相変化型記憶再生方法およびその装”置に係
り、特、に、1−d当り101ビツトを越える高密度不
揮発性記憶に好適な、相変化型記録、消去および再生方
法ならびにその装置に関する。なお、本発明においては
、非晶質状態を保つて原子配列が変化するものや多層膜
などの複合膜内で相互拡散が起るものも広義の相変化に
含まれるものとする。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a phase change type memory reproducing method and apparatus thereof, and is particularly suitable for high-density nonvolatile memory exceeding 101 bits per 1-d. The present invention relates to phase change recording, erasing and reproducing methods and devices thereof.In the present invention, interdiffusion occurs in composite films such as those that maintain an amorphous state and the atomic arrangement changes, and multilayer films. Phase changes are also included in the broad sense of phase change.
従来の相変化型記憶装置は、米国特許
第3530441号公報に記載されているように、光レ
ーザビームを用い、光による加熱で、記憶媒体中の原子
移動を生ゼしぬ1局所的な相変化状態を情報記憶に利用
するものであった。しかし、この場合、光の波長限界か
ら、収束しうる光ビームスポットの最小値は直径1p程
度であり、光を用いた記録密度の限界は!01ビット/
dである。しかしながら、近年、記憶装置においては大
量の情報の格納のために、さらに高密度の記憶装置が必
要とされている。As described in U.S. Pat. No. 3,530,441, a conventional phase change storage device uses an optical laser beam to heat a local phase change in a storage medium without causing any atomic movement. The state of change was used to store information. However, in this case, due to the wavelength limit of light, the minimum value of the light beam spot that can be converged is about 1 p in diameter, which is the limit of recording density using light! 01 bit/
It is d. However, in recent years, storage devices with even higher density are required to store large amounts of information.
一方、電子線を用いた相変化型記録に関しては前記米国
特許に電子線を用いる場合もあることが記載されている
ものの、具体的実施例については何らの記載がない、ま
た、電子線を用いた再生方法についても記載がなく、記
録、m去、再生すべてに電子線を用いる相変化型記憶方
法およびその装置については配慮されていなかった。On the other hand, regarding phase change recording using electron beams, although the above-mentioned US patent states that electron beams may be used in some cases, there is no mention of any specific examples, and there is no mention of specific examples. There is also no mention of a reproduction method, and no consideration was given to phase-change storage methods and devices that use electron beams for recording, erasure, and reproduction.
本発明の目的は、電子線を用いることにより。 The object of the present invention is to use an electron beam.
相変化型記録膜上において、情報の書き込み(記録)、
消去、読み出しく再生)を行なう、記憶密度が101ビ
ツト/dを越える新たな記憶、消去。Writing (recording) information on the phase change recording film,
New storage and erasure with a storage density exceeding 101 bits/d.
再生方法およびその装置を提供することにある。An object of the present invention is to provide a regeneration method and apparatus.
本発明においては、電子線の直径をO,S、以下。 In the present invention, the diameter of the electron beam is O.S.
より好ましくは、0.1−程度とし、相変化型記録薄膜
上に局所的に該電子線をパルス的にあるいは強弱変化さ
せて照射することにより、該薄膜の加熱、冷却を行なっ
て、非晶質相■←→非晶質相■、非晶質相←→結晶質相
、結晶質相■←→結晶質相■などの相変化を生ゼしぬ、
情報の記録もしくは消去を行なうものであるが、記憶の
再生は、それぞれの相間で2次電子放出能が異なること
を利用し、放出2次電子量の大小によって、相の判別、
すなわち情報の弁別を行なうようにしたものである。More preferably, the electron beam is about 0.1 -, and the thin film is heated and cooled by locally irradiating the electron beam onto the phase change type recording thin film in a pulsed manner or with varying intensity. Does not produce phase changes such as solid phase■←→amorphous phase■, amorphous phase←→crystalline phase, crystalline phase■←→crystalline phase■, etc.
It is used to record or erase information, but reproducing memory takes advantage of the fact that the secondary electron emission ability differs between each phase, and distinguishes the phase depending on the amount of emitted secondary electrons.
In other words, information is discriminated.
以下1本発明を実施例により詳細に説明する。 The present invention will be explained in detail below using examples.
第1図は本発明による相変化型記録再生装置の概略説明
図である。FIG. 1 is a schematic explanatory diagram of a phase change type recording/reproducing apparatus according to the present invention.
ガラス、アルミニウムなどからなるディスク基板1の上
に、相変化型記録膜2を厚さ200人〜5−にスパッタ
法、蒸着法、あるいは他の一般的な薄膜作製法により被
着したものを記録媒体とする。Recording is performed by depositing a phase change recording film 2 on a disk substrate 1 made of glass, aluminum, etc. to a thickness of 200 to 50 mm by sputtering, vapor deposition, or other general thin film fabrication methods. Use as a medium.
記録膜の上部または下部に保護膜を形成してもよい、た
だし、上部保護膜は電子線透過性を有するものとする。A protective film may be formed above or below the recording film, provided that the upper protective film is transparent to electron beams.
上記相変化型記録膜材料としては、非晶質相■−非晶質
相■変化型のAs−8s−8−Go系、非晶貧相−結晶
相変化型の5n−To−8a系、結晶相I−結晶相■変
化型のAg−Zn系などの例が有る。The above-mentioned phase change type recording film materials include As-8s-8-Go system of amorphous phase ■-amorphous phase ■ change type, 5n-To-8a system of amorphous poor phase-crystalline phase change type, crystalline Examples include a phase I-crystalline phase (I) change type Ag-Zn system.
以上のようにして得られたディスク基板1を記録膜2側
を上にして回転軸8に取り付け、1000〜3600r
p■の速度で回転させる。The disk substrate 1 obtained as described above was mounted on the rotating shaft 8 with the recording film 2 side facing up, and
Rotate at a speed of p■.
一方、このディスク基板1の上方に基板1の動径方向に
平行に設けたスライド軸7に固定された電子銃3により
、基板1上の記録膜2上に直径0.24に収束した電子
線5を0.1〜100+++Wのエネルギー範囲でパル
ス的あるいは強弱変化させて照射し、膜面を局所的に加
熱、冷却して相変化を生ぜしめ、情報の記録、消去を行
なう、記録の進行に伴って電子@3をスライド軸7に沿
ってスタイ下させてもよいが、電子銃3を固定し1回転
軸8を記録の進行に伴って該軸に直角な方向に移動させ
る方がより好ましい。On the other hand, an electron gun 3 fixed to a slide shaft 7 provided above the disk substrate 1 parallel to the radial direction of the substrate 1 converges an electron beam with a diameter of 0.24 onto the recording film 2 on the substrate 1. 5 is irradiated in the energy range of 0.1 to 100+++ W in a pulsed manner or with intensity changes, and the film surface is locally heated and cooled to cause a phase change, recording and erasing information. Accordingly, the electron @ 3 may be moved down along the slide axis 7, but it is more preferable to fix the electron gun 3 and move the one-rotation axis 8 in a direction perpendicular to the axis as recording progresses. .
この記録情報の再生は、ディスク基板1の面上の電子銃
3の下面の周囲に配置した2次電子検出器4により基板
上からの2次電子量を検知して行なう、なお、以上の装
置において、電子銃、2次電子検出器、スライド軸、デ
ィスク基板は通常真空容器中に配設される。This recorded information is reproduced by detecting the amount of secondary electrons from the substrate with a secondary electron detector 4 placed around the bottom surface of the electron gun 3 on the surface of the disk substrate 1. In this case, the electron gun, secondary electron detector, slide shaft, and disk substrate are usually arranged in a vacuum container.
CuBaTa膜では、非晶貧相からの2次電子量は1次
電子量の5%であるのに対し、結晶相からの2次電子量
は2%と相対的に小さい。In the CuBaTa film, the amount of secondary electrons from the amorphous phase is 5% of the amount of primary electrons, whereas the amount of secondary electrons from the crystalline phase is relatively small at 2%.
第2図(1)は基板1上のCuBeTa非晶質記録膜2
上に直径2pmの結晶相スポット9が0.54おきに直
線的に記録されている情報スポット列を第1図の装置を
用い、情報スポット列上を1次電子線ビーム5で直線的
に2 m / secの速度で掃引し、放出された2次
電子線6を2次電子検出器4により検知した0図で、点
線で囲んだ領域は情報記録のなかった部分を示す、この
ようにして測定した結晶相スポット9と非晶質相領域か
らの2次電子の相対量は、第2図(2)に示すようにな
った。このことから、記録膜上に記録した情報列を再生
できることが確認できた。FIG. 2 (1) shows the CuBeTa amorphous recording film 2 on the substrate 1.
Using the apparatus shown in FIG. 1, an information spot array on which crystalline phase spots 9 with a diameter of 2 pm are recorded linearly at intervals of 0.54 is linearly illuminated with a primary electron beam 5 over the information spot array. In the figure, the emitted secondary electron beam 6 was detected by the secondary electron detector 4 after sweeping at a speed of m/sec, and the area surrounded by the dotted line indicates the area where no information was recorded. The measured relative amounts of secondary electrons from the crystal phase spot 9 and the amorphous phase region were as shown in FIG. 2 (2). From this, it was confirmed that the information string recorded on the recording film could be reproduced.
以上説明したところから1本発明によれば、収束電子線
により、相変化型の記録、消去、再生が実現でき、記録
密度が101ビツト/aiを越える高密度記録、再生方
法およびその装置を提供することができる。From the above explanation, 1. According to the present invention, there is provided a high-density recording and reproducing method and an apparatus thereof, which can realize phase-change type recording, erasing, and reproducing using a convergent electron beam, and has a recording density exceeding 101 bits/ai. can do.
第1図は、本発明による相変化型記憶装置の配置図、第
2図は記録スポットの再生例の説明図である。
図において。
1・・・ディスク基板 2・・・相変化型記録膜3
・・・電子銃 4・・・2次電子検出器5・
・・1次電子線 6・・・2次電子線7・・・ス
ライド軸 8・・・回転軸9・・・結晶相スポッ
トFIG. 1 is a layout diagram of a phase change storage device according to the present invention, and FIG. 2 is an explanatory diagram of an example of reproduction of recording spots. In fig. 1... Disc substrate 2... Phase change type recording film 3
...Electron gun 4...Secondary electron detector 5.
...Primary electron beam 6...Secondary electron beam 7...Slide axis 8...Rotation axis 9...Crystal phase spot
Claims (1)
ルギーをもち、かつ所定の多値ないしはアナログ情報に
対応する収束1次電子線を照射し、該記録膜を局所的に
加熱した後冷却し、該記録膜中に局所的に相変化を生ぜ
しめることにより、前記記録膜中に前記情報の記録を行
なうか、もしくは記録された該情報の消去を行ない、さ
らには、前記情報を記録した記録膜面に前記相変化を生
ぜしめない程度のエネルギーをもった収束1次電子線を
照射し、該記録膜面から前記相変化に対応して放出され
る2次電子量の変化を検出することにより前記多値ない
し、アナログ記録の再生を行なうことを特徴とする電子
線・相変化型記録再生方法。 2、特許請求の範囲第1項記載の電子線・相変化型記録
再生方法において、前記記録膜に生ずる相変化が、非晶
質相 I −非晶質相II、非晶質相−結晶相または結晶相
I −結晶相II間の相変化であることを特徴とする電子
線・相変化型記録再生方法。 3、ディスク基板上に形成した相変化型記録膜表面に収
束1次電子線を照射する電子銃と、前記収束1次電子線
の照射により前記記録膜表面から放出される2次電子量
を検出しうるように配置された2次電子検出器と、ディ
スク基板を回転させる手段と、前記電子銃と2次電子検
出器とを前記ディスク基板に対して該基板の動径方向に
平行に相対的に移動せしめる手段とを具備していること
を特徴とする電子線・相変化型記録再生装置。[Claims] 1. A convergent primary electron beam having a predetermined energy and corresponding to predetermined multivalued or analog information is irradiated onto the surface of a phase change recording film formed on a substrate, and the recording film is Recording the information in the recording film or erasing the recorded information by locally heating and then cooling to cause a local phase change in the recording film, and irradiates the surface of the recording film on which the information is recorded with a focused primary electron beam having an energy that does not cause the phase change, and generates secondary electrons emitted from the surface of the recording film in response to the phase change. An electron beam/phase change type recording and reproducing method, characterized in that the multivalued or analog recording is reproduced by detecting a change in the amount of electrons. 2. In the electron beam/phase change recording and reproducing method according to claim 1, the phase change occurring in the recording film is amorphous phase I - amorphous phase II, amorphous phase - crystalline phase. or crystalline phase
An electron beam/phase change recording and reproducing method characterized by a phase change between I and crystal phase II. 3. An electron gun that irradiates a focused primary electron beam onto the surface of a phase-change recording film formed on a disk substrate, and detects the amount of secondary electrons emitted from the recording film surface by irradiation with the focused primary electron beam. a secondary electron detector arranged to rotate the disk substrate; a means for rotating the disk substrate; and a means for rotating the electron gun and the secondary electron detector relative to the disk substrate parallel to the radial direction of the substrate. What is claimed is: 1. An electron beam/phase change type recording/reproducing device, characterized in that the electron beam/phase change type recording/reproducing device is provided with means for moving the electron beam to
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4944485A JPS61208649A (en) | 1985-03-14 | 1985-03-14 | Method for electron ray phase change type recording and reproducing and its apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4944485A JPS61208649A (en) | 1985-03-14 | 1985-03-14 | Method for electron ray phase change type recording and reproducing and its apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61208649A true JPS61208649A (en) | 1986-09-17 |
Family
ID=12831294
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4944485A Pending JPS61208649A (en) | 1985-03-14 | 1985-03-14 | Method for electron ray phase change type recording and reproducing and its apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61208649A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63119042A (en) * | 1986-11-06 | 1988-05-23 | Canon Inc | Information recording and reproducing method and information recording and reproducing device |
JP2008027579A (en) * | 1999-12-28 | 2008-02-07 | Toshiba Corp | Electron beam recorder |
-
1985
- 1985-03-14 JP JP4944485A patent/JPS61208649A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63119042A (en) * | 1986-11-06 | 1988-05-23 | Canon Inc | Information recording and reproducing method and information recording and reproducing device |
JP2008027579A (en) * | 1999-12-28 | 2008-02-07 | Toshiba Corp | Electron beam recorder |
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