JPS61206149A - Ion implanting apparatus - Google Patents
Ion implanting apparatusInfo
- Publication number
- JPS61206149A JPS61206149A JP60044866A JP4486685A JPS61206149A JP S61206149 A JPS61206149 A JP S61206149A JP 60044866 A JP60044866 A JP 60044866A JP 4486685 A JP4486685 A JP 4486685A JP S61206149 A JPS61206149 A JP S61206149A
- Authority
- JP
- Japan
- Prior art keywords
- information
- ion implantation
- error
- error information
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002513 implantation Methods 0.000 claims abstract description 11
- 238000005468 ion implantation Methods 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 7
- 238000011084 recovery Methods 0.000 claims description 6
- 150000002500 ions Chemical class 0.000 claims 4
- 230000006386 memory function Effects 0.000 claims 1
- 238000000926 separation method Methods 0.000 claims 1
- 238000012544 monitoring process Methods 0.000 abstract description 4
- 238000003860 storage Methods 0.000 description 4
- 238000004026 adhesive bonding Methods 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明はイオン打込装置に係り、特に打込装置の自動化
に伴なうエラー情報の提供および処理済み試料の情報を
提供するに好適な情報収集に関する。[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to an ion implantation device, and in particular to information suitable for providing error information associated with automation of the implantation device and information on processed samples. Regarding collection.
従来のイオン打込装置におけるエラーの警報および表示
は、エラーの発生時にエラーコードを表示し、警報を発
し、イオン打込装置の打込処理を停止させる方式である
が、イオン打込装置の自動化に伴ない、エラーを検出時
に再設定を行なう等のりトライにより自動復帰処理をし
た時に、打込処理中のエラー情報がなく、処理済試料に
対するエラー情報および来歴が残されていないという欠
点がある。Conventional error alarms and displays in ion implantation equipment display an error code when an error occurs, issue an alarm, and stop the implantation process of the ion implantation equipment, but automation of ion implantation equipment Due to this, there is a drawback that when automatic recovery processing is performed by gluing trial, such as resetting when an error is detected, there is no error information during the implantation process, and error information and history for processed samples are not left. .
本発明の目的は、イオン打込装置におけるエラー情報を
一時記憶させ、その情4を必要なとき、或いは、打込処
理終了時に出力させることにより、イオン打込装置の状
態把握および、打込処理済試料の情報、来歴等を提供す
ることにある。An object of the present invention is to temporarily store error information in the ion implantation device and output the information when necessary or at the end of the implantation process, thereby understanding the state of the ion implantation device and improving the implantation process. The purpose of this website is to provide information on processed samples, their provenance, etc.
本発明は、イオン打込&直の制一部に計時機能を備え、
この機能を有効に活用し、打込装置に工”ラー発生時、
日時とエラーコードを一旦記憶するとともに、エラー状
態を自動復帰させ、この情報を任意に出力し、打込処理
済み試料の情報および経歴を得ること、また、イオン打
込装置の状態を把握することを可能にしたものである。The present invention includes a timing function in the ion implantation and direct control part,
By effectively utilizing this function, when an error occurs in the driving device,
Temporarily memorize the date and time and error code, automatically recover from the error state, output this information arbitrarily, obtain information and history of the implanted sample, and grasp the status of the ion implantation device. This is what made it possible.
イオン打込装置f1ri、制御装置2により制御され、
この制御装置2には、計算機3、記憶装置4、計時装置
5、外部出力装置6が接続されており、この制御装置1
t2がイオンビームの引出条件、およびイオン打込装置
の状態監視を行なっている。The ion implantation device f1ri is controlled by the control device 2,
A computer 3, a storage device 4, a clock device 5, and an external output device 6 are connected to this control device 2.
t2 monitors the ion beam extraction conditions and the state of the ion implantation device.
イオン打込装置1、および制御装置2が打込処理中、ま
たは状嘘監視中にエラーが発生すると、そのエラー情報
が計算機3に送られる。計算機3は、そのエラー情報に
よるエラーコードと、計時装置f5からの年、月、日、
時、分の情報を記憶装置4に格納する。同時に計算機3
は、エラー情報より、自動復帰に必要な池の情報を収集
し、自動復帰の可能、不可能を判断し処理を行なう。If an error occurs in the ion implantation device 1 and the control device 2 during implantation processing or during status monitoring, the error information is sent to the computer 3. Calculator 3 receives the error code based on the error information and the year, month, day, and time from clock f5.
Hour and minute information is stored in the storage device 4. calculator 3 at the same time
collects the information necessary for automatic recovery from the error information, determines whether automatic recovery is possible, and performs processing.
自動復帰の可能な時は、エラーコードおよび、日、時情
報を記憶装置4に格納し之まま、打込処理または、状態
監視を行ない、打込処理終了時あるいは任意に外部出力
装f6にょシ、記憶装fi4に格納されている情報を出
力する。When automatic recovery is possible, the error code and date and time information are stored in the storage device 4, input processing or status monitoring is performed, and when the input processing is completed or optionally the external output device f6 is output. , outputs the information stored in the storage device fi4.
自動復帰の不可能な時は、警報を発するとともにエラー
コードを出力し、操作者の処理待ちとする。出力フォー
マツドアはその一列である。If automatic recovery is not possible, a warning is issued and an error code is output, and the system waits for the operator to take action. The output format door is one row of them.
第2図に、上記の流れ図を示す。FIG. 2 shows the above flowchart.
本発明の一実施例によれば、打込処理済み試料に対する
イオン打込装置のエラー情報、および来歴を把握するこ
とができ、イオン打込装置の状態診断、および試料の生
産管理の信頼性向上等の効果がある。According to an embodiment of the present invention, it is possible to grasp the error information and history of the ion implantation device for a sample that has been implanted, thereby improving the reliability of ion implantation device condition diagnosis and sample production management. There are other effects.
本発明によれば、エラー発生時のエラーコードと日時の
情報が得られるので、試料の信頼性向上と、装置の信頼
性向上に効果がるる。According to the present invention, since information on the error code and date and time at the time of error occurrence can be obtained, it is effective in improving the reliability of the sample and the reliability of the apparatus.
第1図は本発明の動作原理を説明する路線図、第2図は
本発明の一作原理分示す流れ図である。FIG. 1 is a route diagram illustrating the operating principle of the present invention, and FIG. 2 is a flowchart illustrating one working principle of the present invention.
Claims (1)
オンを選択できる質量分離用電磁石と、質量分離された
イオンを偏向する偏向用電磁石および複数の試料を装着
して回転する円盤を内蔵する複数の打込室より構成され
るイオン打込装置において、制御部に計算機、記憶機能
、計時機能を備え、イオン打込装置のエラー情報により
イオン打込装置の自動復帰を行なうとともに日時情報と
エラー情報を記憶、任意に出力することにより、イオン
打込装置の状態診断およびプロセス上の不良診断を行な
うことを特徴とするイオン打込装置。 2、特許請求の範囲第1項において、試料の打込処理終
了ごとに、打込時間内に発生したエラー情報と日時情報
を出力し、打込処理済み試料の経歴情報とし、打込工程
時の不良原因解析情報とすることを特徴とするイオン打
込装置。 3、特許請求の範囲第1項において、イオン打込装置の
エラー情報により自動復帰の不可能時、エラー情報と日
時情報を記憶することなく、表示および警報を発するこ
とを特徴とするイオン打込装置。[Claims] 1. An ion source that can ionize and accelerate a sample, a mass separation electromagnet that can select any ion, a deflection electromagnet that deflects the mass-separated ions, and a plurality of samples are attached and rotated. In an ion implantation device consisting of multiple implantation chambers with built-in discs, the control unit is equipped with a computer, memory function, and timekeeping function, and the ion implantation device is automatically reset based on error information of the ion implantation device. An ion implantation apparatus characterized in that the state of the ion implantation apparatus and process failures are diagnosed by storing and arbitrarily outputting date and time information and error information. 2. In claim 1, each time the sample placement process is completed, error information and date and time information that occurred during the sample placement time are outputted, and are used as history information of the sample that has been placed, and during the placement process. An ion implantation device characterized in that the analysis information on the cause of failure of the ion implanter is provided. 3. Ion implantation according to claim 1, characterized in that when automatic recovery is impossible due to error information of the ion implantation device, a display and an alarm are issued without storing error information and date/time information. Device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60044866A JPS61206149A (en) | 1985-03-08 | 1985-03-08 | Ion implanting apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60044866A JPS61206149A (en) | 1985-03-08 | 1985-03-08 | Ion implanting apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61206149A true JPS61206149A (en) | 1986-09-12 |
Family
ID=12703415
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60044866A Pending JPS61206149A (en) | 1985-03-08 | 1985-03-08 | Ion implanting apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61206149A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0196646U (en) * | 1987-12-21 | 1989-06-27 |
-
1985
- 1985-03-08 JP JP60044866A patent/JPS61206149A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0196646U (en) * | 1987-12-21 | 1989-06-27 |
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