JPS61195985A - Lusterless high-velocity silver plating liquid - Google Patents

Lusterless high-velocity silver plating liquid

Info

Publication number
JPS61195985A
JPS61195985A JP3616785A JP3616785A JPS61195985A JP S61195985 A JPS61195985 A JP S61195985A JP 3616785 A JP3616785 A JP 3616785A JP 3616785 A JP3616785 A JP 3616785A JP S61195985 A JPS61195985 A JP S61195985A
Authority
JP
Japan
Prior art keywords
silver
silver plating
matte
salt
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3616785A
Other languages
Japanese (ja)
Inventor
Tomio Kudo
富雄 工藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NE Chemcat Corp
Original Assignee
Nippon Engelhard Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Engelhard Ltd filed Critical Nippon Engelhard Ltd
Priority to JP3616785A priority Critical patent/JPS61195985A/en
Publication of JPS61195985A publication Critical patent/JPS61195985A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain the lusterless silver plating in 50-90A/dm<2> high current density by containing one and more kinds of a formalin condensate of aromatic sulfonic acid and its salt, aromatic carboxylic acid and its salt, fatty polycarboxylic acid and its salt. CONSTITUTION:An organic additive consisting of the following substance is contained in a lusterless silver plating soln. which is one and more kinds of a formalin condensate of aromatic sulfonic acid and its salt, aromatic carboxylic acid and its salt, fatty polycarboxylic acid and its salt. The weight to be added of the organic additive for the silver plating soln. is regulated to 5mg-5g/l.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、銀めっき液、より詳しく云うと無光沢銀皮膜
をN着する無光沢高速銀めっき液に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a silver plating solution, and more specifically, to a matte high-speed silver plating solution for N-depositing a matte silver film.

(従来技術) 銀めっき技術は、リードフレームやコネクター等の電子
部品あるいは電気部品の銀めっきに広く利用されている
が、これら部品に銀めっき加工を施す場合、経済的見地
から高速度めっきを行うことが有利であり、主流をなし
ている。
(Prior art) Silver plating technology is widely used for silver plating electronic and electrical parts such as lead frames and connectors, but when silver plating these parts, high-speed plating is recommended from an economical standpoint. This is advantageous and has become mainstream.

^速度銀めっきは、電流密度を大きくし、液温を轟クシ
、金属イオン濃度を高くし、めっき液の流速を大きくす
る以外に、銀めっき液にセレン等の金属塩を添加するこ
とによって得られることが知られており、これら金属塩
を添加することにより析出銀皮膜は光沢を有するに至る
^ Speed silver plating can be achieved by increasing the current density, increasing the liquid temperature, increasing the metal ion concentration, and increasing the flow rate of the plating solution, as well as adding metal salts such as selenium to the silver plating solution. By adding these metal salts, the deposited silver film becomes glossy.

(発明が解決しようとする問題点) しかしながら、要求される銀めっきの特性によっては、
セレン等の金属塩を添加することができない場合がある
。また、析出銀皮膜のボンディング性、半田付は性の物
理的特性の点からは無光沢(マット状)析出銀が望まし
いが、従来の銀めっき液では、このような無光沢銀めっ
きは低電流密度(約30A/dd以下)でしか得ること
ができず、^速性に欠けるという欠点があった。
(Problems to be solved by the invention) However, depending on the characteristics of the silver plating required,
It may not be possible to add metal salts such as selenium. In addition, from the viewpoint of physical properties such as bondability and solderability of the precipitated silver film, matte precipitated silver is desirable, but with conventional silver plating solutions, such matte silver plating is difficult to achieve with low current. It can only be obtained at a density (approximately 30 A/dd or less) and has the drawback of lacking speed.

(問題点を解決するための手段) 本発明は、従来技術の上記欠点に鑑み、高電流密度で銀
の無光沢(マット状)析出が可能な無光沢高速銀めっき
液を開発すべく研究検討の結果、銀めっき液に有機添加
剤を添加することにより高電流密度で無光沢析出銀が得
られることを知得し、本発明を完成したものである。
(Means for Solving the Problems) In view of the above-mentioned shortcomings of the prior art, the present invention has been made to conduct research and study in order to develop a matte high-speed silver plating solution capable of depositing matte silver at high current density. As a result, the inventors learned that matte precipitated silver could be obtained at high current density by adding an organic additive to the silver plating solution, and completed the present invention.

従って、本発明の目的は、高電流密度で無光沢析出銀皮
膜を得ることができる無光沢高速銀めっき液を提供する
ことにある。
Therefore, an object of the present invention is to provide a matte high-speed silver plating solution that can produce a matte precipitated silver film at a high current density.

本発明の無光沢高速銀めっき液は、芳香族スルホン酸及
びその塩のホルマリン縮合物、芳香族カルボン酸及びそ
の塩、並びに、脂肪族ポリカルボン酸及びその塩よりな
る群から選ばれる少なくとも一つの物質からなる有機添
加剤を含有することを特徴とする構成に係るものである
The matte high-speed silver plating solution of the present invention contains at least one member selected from the group consisting of formalin condensates of aromatic sulfonic acids and salts thereof, aromatic carboxylic acids and salts thereof, and aliphatic polycarboxylic acids and salts thereof. This relates to a structure characterized by containing an organic additive consisting of a substance.

本発明の無光沢高速銀めっき液は、上記のように、有機
添加剤として、芳香族スルホン酸及びその塩の各ホルマ
リン縮合物、芳香族カルボン酸及びその塩、並びに、脂
肪族ポリカルボン酸及びその塩よりなる群から選ばれる
少なくとも一つの物質を含むものである。
As described above, the matte high-speed silver plating solution of the present invention contains, as organic additives, formalin condensates of aromatic sulfonic acids and their salts, aromatic carboxylic acids and their salts, and aliphatic polycarboxylic acids and It contains at least one substance selected from the group consisting of salts thereof.

芳香族スルホン酸又はその塩の各ホルマリン縮合物とし
ては、ナフタリンスルホン酸ホルマリン縮合物が挙げら
れ、このナフタリンスルホン酸ホルマリン縮合物は、縮
合度や構造を異にする異性体の混合物として得られ、ま
たナフタリン環は炭化水素基を有していてもよく、アル
キル化ナフタリンスルホン酸ホルマリン縮合物も含まれ
る。これらの縮合物は、多くの場合ナトリウム塩として
商業的に入手できるが、酸の形態のものや他の可溶性塩
又はこれらの混合物も使用することができる。
Examples of formalin condensates of aromatic sulfonic acids or salts thereof include naphthalene sulfonic acid formalin condensates, and these naphthalene sulfonic acid formalin condensates are obtained as a mixture of isomers having different degrees of condensation and structures, The naphthalene ring may also have a hydrocarbon group, including alkylated naphthalene sulfonic acid formalin condensates. These condensates are often commercially available as sodium salts, but acid forms and other soluble salts or mixtures thereof can also be used.

芳香族カルボン酸又はその塩としては、芳香族単環炭化
水素、芳香族多環炭化水素又はそれらの誘導体等のカル
ボン酸又はその塩があり、例えば安息香酸、ナフトエ酸
、バモ酸等及び各その塩が挙げられる。
Examples of aromatic carboxylic acids or salts thereof include carboxylic acids such as aromatic monocyclic hydrocarbons, aromatic polycyclic hydrocarbons, and derivatives thereof, and salts thereof, such as benzoic acid, naphthoic acid, bamoic acid, etc. Salt is an example.

脂肪族ポリカルボン酸又はその塩は、炭素数5〜20か
らなり、カルボキシル基数や構造を異にする異性体の混
合物として得られる。この炭素数5〜20からなる脂肪
族ポリカルボン酸又はその塩は多くの場合、ナトリウム
塩として商業的に入手できるが酸の形態のものや他の可
溶性塩又はこれらの混合物としても使用することができ
る。
The aliphatic polycarboxylic acid or its salt has 5 to 20 carbon atoms and is obtained as a mixture of isomers having different numbers of carboxyl groups and structures. These aliphatic polycarboxylic acids having 5 to 20 carbon atoms or their salts are often commercially available as sodium salts, but they can also be used in acid form, other soluble salts, or mixtures thereof. can.

また、本発明の無光沢高速銀めっき液の他の成分は、当
業者に自明なものが使用できる。例えば、シアン化銀カ
リウム、シアン化銀ナトリウム等の銀化合物と、クエン
酸塩、リン酸塩、ビロリン酸塩、硫酸塩、硝酸塩、スル
ファミン酸塩等の伝導塩成分を主成分とし、その他緩衝
剤及びキレート試薬、pH講整剤等を含有させることが
できる低シアン浴が挙げられる。また、シアン化銀とシ
アン化カリウム等のシアン化物を主成分とするアルカリ
シアン浴も使用できる。
Further, other components of the matte high-speed silver plating solution of the present invention may be those obvious to those skilled in the art. For example, the main components are silver compounds such as potassium silver cyanide and sodium silver cyanide, and conductive salts such as citrate, phosphate, birophosphate, sulfate, nitrate, and sulfamate, and other buffering agents. and a low cyanide bath that can contain a chelating reagent, a pH adjusting agent, and the like. Furthermore, an alkaline cyanide bath containing cyanides such as silver cyanide and potassium cyanide as main components can also be used.

上記した有機添加剤のめっき液に対する添加量は、広範
囲に亘って変えることができるが、得られる析出銀皮膜
の特性及び銀めっき液の経済性がら、有機添加剤の量は
、5η/β乃至59/βであるのが好ましい。即ち、添
加量が5Rg/iよりも少なくなるにつれて、無光沢の
銀皮膜は次第に得られなくなり、一方、59/12を越
えるにつれて、析出銀皮膜が変色する傾向が生ずるとと
もに、経済的にも不利となる。
The amount of the above-mentioned organic additive added to the plating solution can be varied over a wide range, but depending on the characteristics of the deposited silver film obtained and the economical efficiency of the silver plating solution, the amount of the organic additive should be between 5η/β and 5η/β. Preferably, it is 59/β. That is, as the amount added becomes less than 5Rg/i, it becomes increasingly difficult to obtain a matte silver film, while as the amount exceeds 59/12, the precipitated silver film tends to discolor and is also economically disadvantageous. becomes.

(作用) 本発明の銀めっき液に含まれる有機添加剤は、析出銀皮
膜に無光沢性を付与するとともに、めっき液に高速めっ
き性を付与するものである。
(Function) The organic additive contained in the silver plating solution of the present invention imparts mattness to the precipitated silver film and also imparts high-speed plating properties to the plating solution.

(実施例及び比較例) 以下、本発明をその実施例について説明するとともに、
本発明に関連して行った比較例を併せて挙げる。
(Examples and Comparative Examples) Hereinafter, the present invention will be explained with reference to Examples thereof, and
Comparative examples conducted in connection with the present invention will also be listed.

1適■」 シアン化銀カリウム120g/lリン酸カリウム40g
/β、ナフタリンスルホン酸ホルマリン縮合物(ナトリ
ウム塩)50η/1を含有し、pHwA整試薬1.:J
:すpH’ヲ8.2、温度を65℃としためつき液を使
用し、白金板を陽極として高速度めっき(ジェットめっ
き)を行った。
1 suit ■ Potassium silver cyanide 120g/l Potassium phosphate 40g
/β, naphthalene sulfonic acid formalin condensate (sodium salt) 50η/1, pHwA adjustment reagent 1. :J
: High-speed plating (jet plating) was performed using a tamping solution with a pH of 8.2 and a temperature of 65° C. and a platinum plate as an anode.

N流密度60〜80A/d−dの範囲で良好な無光沢銀
皮膜が得られた。得られた銀皮膜は、ボンディング性、
半田付は性、耐熱性等の物理特性が良好であった。
A good matte silver film was obtained when the N flow density was in the range of 60 to 80 A/dd. The obtained silver film has bonding properties,
Physical properties such as solderability and heat resistance were good.

1五■1 シアン化銀カリウム120g/β、リン酸カリウム40
g/f、ナフタリンスルホン酸ホルマリン縮合物(ナト
リウム塩)500ay/J2を含有し、pH調整試薬に
よりpHを8.2、温度を65℃としためつき液を使用
し、白金板を陽極として高速度めっき(ジェットめっき
)を行った。
15■1 Potassium silver cyanide 120g/β, potassium phosphate 40
g/f, naphthalene sulfonic acid formalin condensate (sodium salt) 500 ay/J2, using a tightening solution with a pH of 8.2 using a pH adjusting reagent and a temperature of 65°C, and using a platinum plate as an anode at high speed. Plating (jet plating) was performed.

電流密度50〜80A/ddの範囲で良好な無光沢銀皮
膜が得られた。得られた銀皮膜は、ボンディング性、半
田付は性、耐熱性等の物理特性は良好であった。
A good matte silver film was obtained at a current density of 50 to 80 A/dd. The obtained silver film had good physical properties such as bondability, solderability, and heat resistance.

支illニ ジアン化銀カリウム120g/i、リン酸カリウム40
g/12、ナフタリンスルホン酸ホルマリン縮合物(ナ
トリウム塩)19/nを含有し、pH1l整試薬により
pHを8.2、温度を65℃としためつき液を使用し、
白金板を陽極として高速度めっき(ジェットめっき)を
行った。
Potassium silver dianide 120g/i, potassium phosphate 40g/i
g/12, using a tightening solution containing naphthalene sulfonic acid formalin condensate (sodium salt) 19/n, adjusted to pH 8.2 and temperature to 65°C with a pH 1l adjusting reagent,
High-speed plating (jet plating) was performed using a platinum plate as an anode.

電流密度50〜90A/dmの範囲で良好な無光沢銀皮
膜が得られた。得られた銀皮膜は、ボンディング性、半
田付は性、耐熱性等の物理特性は良好であった。
A good matte silver film was obtained at a current density in the range of 50 to 90 A/dm. The obtained silver film had good physical properties such as bondability, solderability, and heat resistance.

U璽A シアン化銀カリウム12(1/f、リン酸カリウム40
9/12、ナフタリンスルホン酸ホルマリン縮合物(ナ
トリウム塩)3g/、eを含有し、pH3l整試薬によ
りpHを8.2、温度を65℃としためつき液を使用し
、白金板を陽極として高速度めっき(ジェットめっき)
を行った。
U Seal A Potassium silver cyanide 12 (1/f, potassium phosphate 40
9/12, using a tightening solution containing 3g/e of naphthalene sulfonic acid formalin condensate (sodium salt), adjusting the pH to 8.2 with a 3l pH adjustment reagent, and adjusting the temperature to 65°C, using a platinum plate as an anode. Speed plating (jet plating)
I did it.

電流密度50〜90A/dmの範囲で良好な無光沢銀皮
膜が得られた。得られた銀皮膜は、ボンディング性、半
田付は性、耐熱性等の物理特性は良好であった。
A good matte silver film was obtained at a current density in the range of 50 to 90 A/dm. The obtained silver film had good physical properties such as bondability, solderability, and heat resistance.

衷111互 シアン化銀カリウム1 ’20 SF / f、リン酸
カリウム409/It、安息香酸ナトリウム塩1g/β
を含有し、pH調整試薬によりE)Hを8.2、温度を
65℃としためっき液を使用し、白金板を陽極として高
速度めっき(ジェットめっき)を打つ。
111 potassium silver cyanide 1'20 SF/f, potassium phosphate 409/It, sodium benzoate 1g/β
High-speed plating (jet plating) is performed using a plating solution containing E)H of 8.2 and a temperature of 65° C. using a pH adjusting reagent, and using a platinum plate as an anode.

た。Ta.

電流密度50〜70A/d−の範囲で良好な無光沢銀皮
膜が得られた。得られた銀皮膜は、ボンディング性、半
田付は性、耐熱性等の物理特性は良好であった。
A good matte silver film was obtained at a current density in the range of 50 to 70 A/d-. The obtained silver film had good physical properties such as bondability, solderability, and heat resistance.

支i■玉 シアン化銀カリウム120g/J、リン酸カリウム40
g/l脂肪族ポリカルボン酸ナトリウム塩(炭素数5〜
20)5ooIIy/iを含有し、pH調整試薬により
DHを8.2、温度を65℃としためっき液を使用し、
白金板を陽極として高速度めっき(ジェットめっき)を
行った。
Support i ■ Potassium silver cyanide 120g/J, potassium phosphate 40
g/l aliphatic polycarboxylic acid sodium salt (carbon number 5~
20) Using a plating solution containing 5ooIIy/i, with a DH of 8.2 and a temperature of 65°C using a pH adjustment reagent,
High-speed plating (jet plating) was performed using a platinum plate as an anode.

電流密度50〜90A/dTItの範囲で良好な無光沢
銀皮膜が得られた。得られた銀皮膜は、ボンディング性
、半田付は性、耐熱性等の物理特性は良好であった。
A good matte silver film was obtained at a current density in the range of 50 to 90 A/dTIt. The obtained silver film had good physical properties such as bondability, solderability, and heat resistance.

区笠1 シアン化銀カリウム12097β、リン酸カリウム40
g/11を含有し、1)Hll整試薬により口Hを8.
2、温度を65℃としためつき液を使用し、白金板を陽
極として高速度めっき(ジェットめっき)を行った。
Ward Kasa 1 Potassium silver cyanide 12097β, Potassium phosphate 40
1) 8.g/11.
2. High-speed plating (jet plating) was performed using a tamping solution at a temperature of 65° C. and using a platinum plate as an anode.

電流密度10〜30A/ dゴの範囲で無光沢銀皮膜が
得られた。実施例1〜6と比較すると無光沢銀皮膜が得
られる電流密度範囲は極めて狭く低電流密度であり、高
電流密度での使用ができず高速性は明らかに劣っていた
A matte silver film was obtained at a current density of 10 to 30 A/d. Compared with Examples 1 to 6, the current density range in which a matte silver film was obtained was extremely narrow and the current density was low, making it impossible to use at high current densities and clearly inferior in high speed performance.

(効果) 本発明は、従来の銀めっき液では30A/dd程度以下
の低電流密度でしか無光沢析出銀が得られないが、上記
の添加剤を共存させることにより50〜90A/ dゴ
の高電流密度で無光沢銀皮膜が得られ、この析出皮膜の
ボンディング性、半田付は性、耐熱性等の物理的特性は
良好であり、従来の銀めっき液の低電流密度で得られる
無光沢銀皮膜の物理特性と差異は認められない。
(Effects) In the present invention, matte precipitated silver can only be obtained at a low current density of about 30 A/dd or less with a conventional silver plating solution, but by coexisting with the above additives, a matte precipitated silver can be obtained at a current density of 50 to 90 A/dd. A matte silver film can be obtained at a high current density, and the physical properties such as bondability, solderability, and heat resistance of this deposited film are good, and the matte silver film can be obtained at a low current density using a conventional silver plating solution. No difference is observed in the physical properties of the silver film.

Claims (2)

【特許請求の範囲】[Claims] (1)芳香族スルホン酸及びその塩のホルマリン縮合物
、芳香族カルボン酸及びその塩、並びに、脂肪族ポリカ
ルボン酸及びその塩よりなる群から選ばれる少なくとも
一つの物質からなる有機添加剤を含有することを特徴と
する無光沢高速銀めっき液。
(1) Contains an organic additive consisting of at least one substance selected from the group consisting of formalin condensates of aromatic sulfonic acids and their salts, aromatic carboxylic acids and their salts, and aliphatic polycarboxylic acids and their salts. A matte high-speed silver plating solution that is characterized by:
(2)銀めっき液の前記有機添加剤含有量は5mg/l
乃至5g/lであることを特徴とする特許請求の範囲第
1項に記載の無光沢高速銀めっき液。
(2) The content of the organic additive in the silver plating solution is 5 mg/l
The matte high-speed silver plating solution according to claim 1, characterized in that the concentration is from 5 g/l to 5 g/l.
JP3616785A 1985-02-25 1985-02-25 Lusterless high-velocity silver plating liquid Pending JPS61195985A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3616785A JPS61195985A (en) 1985-02-25 1985-02-25 Lusterless high-velocity silver plating liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3616785A JPS61195985A (en) 1985-02-25 1985-02-25 Lusterless high-velocity silver plating liquid

Publications (1)

Publication Number Publication Date
JPS61195985A true JPS61195985A (en) 1986-08-30

Family

ID=12462197

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3616785A Pending JPS61195985A (en) 1985-02-25 1985-02-25 Lusterless high-velocity silver plating liquid

Country Status (1)

Country Link
JP (1) JPS61195985A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003147572A (en) * 2001-10-02 2003-05-21 Shipley Co Llc Plating bath and method for depositing metallic layer on substrate
WO2021261066A1 (en) * 2020-06-23 2021-12-30 Dowaメタルテック株式会社 Composite material, composite material manufacturing method, and terminal

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50120435A (en) * 1974-03-01 1975-09-20
JPS552745A (en) * 1978-06-21 1980-01-10 Furukawa Electric Co Ltd:The Hard silver plating bath
JPS5743995A (en) * 1980-08-27 1982-03-12 Sumitomo Electric Ind Ltd Silver plating liquid and silver plating method

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JPS552745A (en) * 1978-06-21 1980-01-10 Furukawa Electric Co Ltd:The Hard silver plating bath
JPS5743995A (en) * 1980-08-27 1982-03-12 Sumitomo Electric Ind Ltd Silver plating liquid and silver plating method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003147572A (en) * 2001-10-02 2003-05-21 Shipley Co Llc Plating bath and method for depositing metallic layer on substrate
WO2021261066A1 (en) * 2020-06-23 2021-12-30 Dowaメタルテック株式会社 Composite material, composite material manufacturing method, and terminal

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