JPS61195328A - Interferometer with semispherical lens - Google Patents
Interferometer with semispherical lensInfo
- Publication number
- JPS61195328A JPS61195328A JP3808785A JP3808785A JPS61195328A JP S61195328 A JPS61195328 A JP S61195328A JP 3808785 A JP3808785 A JP 3808785A JP 3808785 A JP3808785 A JP 3808785A JP S61195328 A JPS61195328 A JP S61195328A
- Authority
- JP
- Japan
- Prior art keywords
- lens
- aberration
- wave
- symmetrical
- waves
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
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- Physics & Mathematics (AREA)
- Geometry (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
Abstract
Description
【発明の詳細な説明】
a、技術分野
本発明は、一般的なレンズの収差測定のための干渉計測
装置に関するもので、特に1球面収差などの対称的な収
差と、コマ収差のような非対称な収差とを分けて観測す
る干渉計に関するものである。Detailed Description of the Invention: a. Technical Field The present invention relates to an interferometric measurement device for measuring aberrations of general lenses, and particularly for measuring symmetrical aberrations such as unispherical aberration and asymmetrical aberrations such as coma aberration. This relates to an interferometer that separately observes aberrations.
b、従来技術及びその問題点
従来、一般的なレンズの収差測定を行う手段として、被
検レンズの集光点に平面鏡又は凹面鏡を配したフィゾー
型又はトワイマン型の干渉計が用いられている。この干
渉計は比較的簡単に安価に構成できる特長を持っている
が、観測されるレンズの収差は、球面収差や非点収差の
ような対称的な収差、又はこれらの対称的な収差とコマ
収差のような非対称な収差とを合わせた総合的な収差で
あり、非対称な収差のみをM測することはできない。従
って、コマ収差の打ち消しを目標とするレンズ組立てに
おける芯出し作業の場合、球面収差や非点収差を間違え
て調整してしまう可能性がある。b. Prior Art and its Problems Conventionally, as a means for measuring the aberration of a general lens, a Fizeau type or Twyman type interferometer, in which a plane mirror or a concave mirror is arranged at the focal point of the lens to be tested, has been used. This interferometer has the advantage of being relatively easy and inexpensive to construct, but the observed lens aberrations are symmetrical aberrations such as spherical aberration and astigmatism, or coma with these symmetrical aberrations. It is a comprehensive aberration that includes asymmetrical aberrations such as aberrations, and it is not possible to measure only asymmetrical aberrations. Therefore, in the case of centering work in lens assembly where the goal is to cancel coma aberration, there is a possibility that spherical aberration or astigmatism will be adjusted incorrectly.
また、対称成分、非対称成分に収差を分離した形で出力
できる装置としては、デジタル干渉計があげられるが、
この装置はかなり高価なものである。Additionally, a digital interferometer is a device that can output aberrations separated into symmetrical and asymmetrical components.
This equipment is quite expensive.
C0目 的
本発明は、上記の従来の問題点を解消すべくなされたも
ので、参照波と被検波を重ね合わせる干渉計において、
被測定レンズの集光点に曲率中心をもつ半球レンズを置
くことによって、安価に収差の対称成分と非対称成分を
分離した出力を可能とする干渉計を提供することを目的
とする。C0 Purpose The present invention was made in order to solve the above-mentioned conventional problems.In an interferometer that superimposes a reference wave and a test wave,
The object of the present invention is to provide an interferometer that can output separated symmetrical and asymmetrical components of aberration at low cost by placing a hemispherical lens having a center of curvature at the focal point of a lens to be measured.
d、実施例の構成
上記目的を達成するため、本発明は、参照波と被検波を
干渉させる一般的なレンズ性能測定のための干渉計にお
いて、被検レンズの集光点に半球レンズの曲率中心を位
置させるよう構成されており、被検レンズおよび半球レ
ンズからの反射波を干渉させることによって得られる干
渉縞を観測し。d. Configuration of Embodiment In order to achieve the above object, the present invention provides an interferometer for measuring the performance of a general lens in which a reference wave and a test wave are made to interfere with each other. It is configured to locate the center of the lens, and observes the interference fringes obtained by interfering the reflected waves from the test lens and the hemispherical lens.
レンズの諸収差を分けて測定するものである。This method measures the various aberrations of the lens separately.
第1図は本発明の要部構成図であり、この図は、干渉計
の平面原器(参照体)lから被検レンズ2゜そして半球
レンズ3までを示したもので、参照レンズである平面原
器1には平行光が入射している。FIG. 1 is a block diagram of the main parts of the present invention. This figure shows the interferometer's planar prototype (reference body) 1, the test lens 2°, and the hemispherical lens 3, which is the reference lens. Parallel light is incident on the flat prototype 1.
■、■、■は干渉させるべき3つの光を示している。■, ■, ■ indicate three lights to be caused to interfere.
■は平面原器1の基準面1′で反射した参照波を表わし
、■は被検レンズ2を通り半球レンズ3の平面3′で反
射した被検波であり、その反射点は平面3′上にあるの
で■波は反射時に入射光線と反射光線の位置が入れ換わ
る。また、■は被検レンズ2を通り半球レンズ3の球面
3″で反射した被検波であり、この■波は被検レンズ2
の焦点と半球レンズ3の中心を合わせであるので反射光
は入射した光路と同じ光路を逆向きにたどる。■ represents the reference wave reflected on the reference surface 1' of the flat prototype 1, ■ represents the test wave that passed through the test lens 2 and was reflected on the flat surface 3' of the hemispherical lens 3, and the reflection point is on the flat surface 3'. Therefore, when the wave is reflected, the positions of the incident ray and the reflected ray are swapped. Also, ■ is a test wave that passes through the test lens 2 and is reflected by the spherical surface 3'' of the hemispherical lens 3;
Since the focal point of the hemispherical lens 3 is aligned with the center of the hemispherical lens 3, the reflected light follows the same optical path as the incident optical path in the opposite direction.
■波と■波の干渉では、■波の主光線と下光線が入れ換
わったことにより、収差の対称成分のみがあられされ、
即ち、この時の干渉縞は球面収差や非点収差を表わして
いることがわかる。In the interference between ■ waves and ■ waves, only the symmetrical component of aberration is caused by the exchange of the chief ray and lower ray of ■ waves.
That is, it can be seen that the interference fringes at this time represent spherical aberration and astigmatism.
■波と■波の干渉では、平面波(即ち参照波)と球面で
反射される一般的な被検波の重ね合わせで対称的な収差
と非対称の収差を合わせた総合的な収差があられされる
。In the interference between the ■ wave and the ■ wave, a comprehensive aberration that is a combination of symmetrical aberration and asymmetrical aberration is generated by superimposing a plane wave (ie, a reference wave) and a general test wave reflected by a spherical surface.
また、■波と■波の干渉では、共に被検レンズを通った
光の重ね合わせで、一方の波■は主光線と下光線が入れ
かわり、もう一方の波■はそのままの光が反射されるこ
とにより、この干渉縞は。In addition, in the interference of ■ waves and ■ waves, the light that has passed through the test lens is superimposed, and the principal ray and lower ray of one wave ■ are switched, and the other wave ■ is the same light that is reflected. This interference pattern is created by
コマ収差のような非対称の収差をあられしていることが
わかる。It can be seen that asymmetrical aberrations such as coma are suppressed.
以下、上記構成を有する本発明の一実施例について説明
する。第2図は本発明の干渉計を示す説明図である。光
路に従って説明すると、光源4は)(a −N eレー
ザーで、その光はビームエクスパンダ−5によって広げ
られ、ビームスピリツタ−6を通して平面原器(参照体
)1に入射する。この平面原器1に入射した光の一部は
平面原器の基準面1′で反射して参照波(■波)となり
観測面9に導かれ、残りの光は通り抜けて被検レンズ2
に達する。更に、この光は、被検レンズ2を通り。An embodiment of the present invention having the above configuration will be described below. FIG. 2 is an explanatory diagram showing the interferometer of the present invention. Explaining according to the optical path, the light source 4 is an (a-N e laser), and its light is expanded by a beam expander 5 and enters a flat prototype (reference body) 1 through a beam spiriter 6. A part of the light incident on the device 1 is reflected by the reference surface 1' of the flat prototype device and becomes a reference wave (■ wave) and guided to the observation surface 9, and the remaining light passes through and enters the test lens 2.
reach. Furthermore, this light passes through the lens 2 to be tested.
該被検レンズ2の集光点にその曲率中心がくるように配
置された半球レンズ3に達し、半球レンズの平面3′で
反射する光と、球面31で反射する光とに分かれ、それ
ぞれ異なる性質をもった被検波(■波、■波)となる。The light reaches the hemispherical lens 3, which is arranged so that its center of curvature is at the focal point of the test lens 2, and is divided into light that is reflected on the flat surface 3' of the hemispherical lens and light that is reflected on the spherical surface 31, each of which is different. It becomes a test wave (■ wave, ■ wave) with characteristics.
そして、それらの反射光は再び被検レンズ2と平面原器
lを通り、ビームスピリツタ−6で往路とわけられ、結
像レンズ7を通して観測面9上に干渉縞をあられす、こ
の時、結像レンズ7と観測面9の間には、・対称的な収
差、総合的収差、非対称な収差の3種の収差をe、実施
例の作用
第3図を用いて観測面9上にあられれる干渉縞、即ち上
記各収差を観測(区別)する方法を説明する。第3図は
半球レンズ3から観測面9までの反射光の光学系を示し
たものである。Then, those reflected lights pass through the test lens 2 and the flat prototype l again, are split into an outgoing path by the beam spiriter 6, and pass through the imaging lens 7 to form interference fringes on the observation surface 9. At this time, Between the imaging lens 7 and the observation surface 9, three types of aberrations, symmetrical aberration, comprehensive aberration, and asymmetrical aberration, are generated on the observation surface 9 using the working example shown in FIG. A method of observing (distinguishing) the interference fringes, that is, each of the above-mentioned aberrations, will be explained. FIG. 3 shows the optical system for reflected light from the hemispherical lens 3 to the observation surface 9.
収差の対称成分を観測する場合、即ち、■波と■波の干
渉縞を見る場合は、半球レンズ3を光軸に垂直な方向ヘ
シフトさせる。このとき球面3′からの反射光(■波)
は空間フィルタ8面で中心からずれた場所に集光し、こ
の光はカットされる。When observing the symmetrical component of the aberration, that is, when observing the interference fringes of the ■wave and ■wave, the hemispherical lens 3 is shifted in a direction perpendicular to the optical axis. At this time, the reflected light from the spherical surface 3' (■ wave)
is focused on a location shifted from the center by the spatial filter 8 surface, and this light is cut.
従って被検レンズの対称的な収差だけが観測できる。Therefore, only symmetrical aberrations of the lens to be tested can be observed.
収差の非対称成分をw4測する場合、即ち■波と■波の
干渉縞を見る場合は、平面原器1を少し傾ける。このと
き平面原器1からの反射光(■波)は前述と同様に空間
フィルタ8によってカットされる。従って被検レンズの
非対称な収差だけが観測できる。When measuring the asymmetric component of the aberration w4, that is, when looking at the interference fringes of the ■ wave and ■ wave, the flat prototype 1 is slightly tilted. At this time, the reflected light (■ wave) from the flat prototype 1 is cut by the spatial filter 8 as described above. Therefore, only the asymmetric aberration of the lens to be tested can be observed.
総合的な収差を観測する場合、即ち■波と■波の干渉縞
を見る場合は、平面原器1.半球レンズ3を共に同じ角
度傾け、空間フィルタ8も、それに伴い移動し、■波の
みが空間フィルタ8によってカットされるようにする。When observing comprehensive aberrations, that is, when looking at the interference fringes of the ■wave and ■wave, use the flat prototype 1. Both hemispherical lenses 3 are tilted at the same angle, and the spatial filter 8 is also moved accordingly, so that only the ■ wave is cut by the spatial filter 8.
これにより被検レンズの総合的な収差が観測できる。尚
、上記実施例では結像レンズ7と観測面9の間には空間
フィルター8が設けられているが、第1図の説明より明
らかなように、これは必ずしも必要なものではない。即
ち、不要な光は半球レンズ3や平面原器1の傾き量や、
ズレ量を適当に調整することによって結像レンズ系に入
射しないようにするようにすればよい。This makes it possible to observe the overall aberration of the lens to be tested. In the above embodiment, a spatial filter 8 is provided between the imaging lens 7 and the observation surface 9, but as is clear from the description of FIG. 1, this is not necessarily necessary. In other words, unnecessary light is caused by the amount of inclination of the hemispherical lens 3 or the flat prototype 1,
By appropriately adjusting the amount of deviation, it is possible to prevent the light from entering the imaging lens system.
f、効 果
以上説明したように本発明によれば、干渉計に半球レン
ズを用いたことにより、被検レンズにおける収差の対称
成分と非対称成分を分離して観測することが可能となっ
た。従ってレンズの芯出し作業の場合、球面収差や非点
収差にまどわされる心配もなく、収差を見ながら作業が
容易にできるようになる。また、簡単に対称な収差に切
り換えて見ることが可能なため、芯出しを伴うレンズ組
立てをしながらも球面収差補正を必要とするレンズ加工
へと、作業をフィードバックすることができるようにな
り、実際のレンズ生産に対して極めて工業的利用価値の
高いものである。f. Effect As explained above, according to the present invention, by using a hemispherical lens in the interferometer, it is possible to separate and observe the symmetrical component and the asymmetrical component of the aberration in the lens to be tested. Therefore, when centering a lens, there is no need to worry about being confused by spherical aberration or astigmatism, and the work can be easily done while observing the aberrations. In addition, since it is possible to easily switch to and view symmetrical aberrations, it is now possible to assemble lenses that involve centering and feed back the work to lens processing that requires correction of spherical aberrations. It has extremely high industrial utility value for actual lens production.
第1図は本発明の要部構成図、第2図は本発明の一実施
例を示す説明図、第3図は3種の干渉縞の区別方法を示
す図である。
1:平面原器(参照体) 2:被検レンズ3:半球
レンズ 4:レーザー光源
5:ビームエキスパンダー 6:ビームスプリツター
7:集光レンズ 8:空間フィルター(spatial
filter)9:11側面
■:参照波
■:被検波(半球レンズの平面での反射)■=被検波(
半球レンズの球面での反射)特許出願人 旭光学工
業株式会社
第2Iコ
手続補正帯
昭和60年11月27日
特願昭60−38087号
一6発明の名称
半球レンズを用いた干渉計
3、補正をする者
事件との関係 特許出願人
住所 東京都板橋区前野町2丁目36番9号名称 (0
52) 旭光学工業株式会社代表者 松本 徹
り1代理人
居所 東京都板橋区前野町2丁目36番9号旭光学工業
株式会社内
6、補正の対象
明細書の「発明の詳細な説明」刀欄、\乙。補正の内容
(1)明細書の「発明の詳細な説明」の欄中、第2頁第
3行目の
「対称的」を
[i’180’方向に対称的」と補正する。
(2)同第2頁第5行目の
「非対称」を
「180°方向に非対称」と補正する。
(3)同第7頁第1行目の
[i’3を共に同じ角度傾け、」を
1i’3の反射像を同じ量動かし、」と補正する。FIG. 1 is a block diagram of the main parts of the present invention, FIG. 2 is an explanatory diagram showing an embodiment of the present invention, and FIG. 3 is a diagram showing a method for distinguishing three types of interference fringes. 1: Planar prototype (reference body) 2: Test lens 3: Hemispherical lens 4: Laser light source 5: Beam expander 6: Beam splitter 7: Condenser lens 8: Spatial filter (spatial
filter) 9:11 Side ■: Reference wave ■: Test wave (reflection on the plane of the hemispherical lens) ■= Test wave (
Reflection on the spherical surface of a hemispherical lens) Patent applicant: Asahi Kogaku Kogyo Co., Ltd. No. 2 I Co-procedural correction belt November 27, 1985 Patent Application No. 1987-38087 16 Name of the invention Interferometer using a hemispherical lens 3, Relationship with the person making the amendment Patent applicant address 2-36-9 Maeno-cho, Itabashi-ku, Tokyo Name (0
52) Asahi Kogaku Kogyo Co., Ltd. Representative: Tori Matsumoto 1 Agent residence: Asahi Kogaku Kogyo Co., Ltd., 2-36-9 Maeno-cho, Itabashi-ku, Tokyo 6, "Detailed description of the invention" in the specification subject to amendment Column, \Otsu. Contents of the amendment (1) In the "Detailed Description of the Invention" section of the specification, "symmetrical" in the third line of page 2 is amended to "symmetrical in the i'180'direction." (2) "Asymmetric" in the 5th line of the second page is corrected to "asymmetric in the 180° direction." (3) In the first line of page 7, "tilt both i'3 at the same angle," is corrected to "move the reflected image of 1i'3 by the same amount."
Claims (1)
ズを透過して得られる被検波とを重ね合わせて干渉縞を
観測する干渉計において、前記被検レンズの集光点に曲
率中心をもつ半球レンズを配したことを特徴とする干渉
計。1. In an interferometer that observes interference fringes by superimposing a reference wave obtained by reflection from a reference surface and a test wave obtained by passing through a test lens, the center of curvature is set at the focal point of the test lens. An interferometer characterized by a hemispherical lens.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3808785A JPS61195328A (en) | 1985-02-26 | 1985-02-26 | Interferometer with semispherical lens |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3808785A JPS61195328A (en) | 1985-02-26 | 1985-02-26 | Interferometer with semispherical lens |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61195328A true JPS61195328A (en) | 1986-08-29 |
JPH0446370B2 JPH0446370B2 (en) | 1992-07-29 |
Family
ID=12515690
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3808785A Granted JPS61195328A (en) | 1985-02-26 | 1985-02-26 | Interferometer with semispherical lens |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61195328A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007078593A (en) * | 2005-09-15 | 2007-03-29 | Fujinon Corp | Light wave interference device |
CN102507153A (en) * | 2011-10-31 | 2012-06-20 | 北京空间机电研究所 | Focal plane calibration method for infrared lens of astronautic camera |
-
1985
- 1985-02-26 JP JP3808785A patent/JPS61195328A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007078593A (en) * | 2005-09-15 | 2007-03-29 | Fujinon Corp | Light wave interference device |
JP4738949B2 (en) * | 2005-09-15 | 2011-08-03 | 富士フイルム株式会社 | Lightwave interference device |
CN102507153A (en) * | 2011-10-31 | 2012-06-20 | 北京空间机电研究所 | Focal plane calibration method for infrared lens of astronautic camera |
Also Published As
Publication number | Publication date |
---|---|
JPH0446370B2 (en) | 1992-07-29 |
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Legal Events
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