JPS61180204A - Diffusing method for metal by heating - Google Patents

Diffusing method for metal by heating

Info

Publication number
JPS61180204A
JPS61180204A JP60021049A JP2104985A JPS61180204A JP S61180204 A JPS61180204 A JP S61180204A JP 60021049 A JP60021049 A JP 60021049A JP 2104985 A JP2104985 A JP 2104985A JP S61180204 A JPS61180204 A JP S61180204A
Authority
JP
Japan
Prior art keywords
metal
holder
substrate
heating
crystal substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60021049A
Other languages
Japanese (ja)
Inventor
Katsuyoshi Sunago
砂子 勝好
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP60021049A priority Critical patent/JPS61180204A/en
Publication of JPS61180204A publication Critical patent/JPS61180204A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13Integrated optical circuits characterised by the manufacturing method
    • G02B6/134Integrated optical circuits characterised by the manufacturing method by substitution by dopant atoms
    • G02B6/1342Integrated optical circuits characterised by the manufacturing method by substitution by dopant atoms using diffusion

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)

Abstract

PURPOSE:To prevent the bonding in the contact part between an Li2B4O7 crystal substrate and holder as a result of the reaction induced therein by supporting the holder to be imposed with the Li2B4O7 crystal substrate and the Li2B4O7 crystal substrate by means of the Li2B4O7 crystal piece disposed therebetween in the position except the metal diffusing surface in the stage of diffusing the metal by heating. CONSTITUTION:A diffused optical waveguide 5 is manufactured by heating and holding the Li2B4O7 crystal substrate 1 having the metallic layer 2 patterned after vapor deposition or sputtering of the metal and imposed on the holder 4 to and at a high temp. and diffusing the metal by heating into the substrate 1. The substrate 1 and the holder 4 are supported by the other Li2B4O7 crystal piece 3 disposed therebetween in the position without including the surface where the metal layer 2 is diffused by heating to the substrate 1. The substrate 1 and holder are heated and held in such a state. The bonding of the substrate 1 and the holder 4 by the reaction induced therebetween is thus obviated.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、結晶基板の一部へ金属を加熱拡散し、屈折率
を高めて光導波路を作製する金属加熱拡散方法に関し、
とくに誘電体材料Li1B40−1結晶基板を用いた金
属加熱拡散時におけるL i 2 B60.結晶基板の
支持方法に関するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a metal heating diffusion method for fabricating an optical waveguide by heating and diffusing metal into a part of a crystal substrate to increase the refractive index.
In particular, Li 2 B60 during metal heating diffusion using a dielectric material Li1B40-1 crystal substrate. The present invention relates to a method for supporting a crystal substrate.

〔従来の技術〕[Conventional technology]

従来、ガラスまたは誘電体L i HA 03などの結
晶基板へ金属を加熱拡散して光導波路を作製することは
行われている。然し、誘電体材料Li2B401 結晶
基板へ金属を加熱拡散して光導波路を作製することは未
だ行われていない。
Conventionally, optical waveguides have been fabricated by heating and diffusing metal onto a crystal substrate such as glass or dielectric L i HA 03. However, it has not yet been possible to fabricate an optical waveguide by heating and diffusing metal into a crystal substrate of dielectric material Li2B401.

〔発明の概要〕[Summary of the invention]

本発明は、LL* 11140g結晶基板を用いて金属
を加熱拡散し光導波路を作製する方法において、金属加
熱拡散時に、Li*B、O1結晶基板を載置するホルダ
とLzJ40g結晶基板の間を、金属拡散面以外の位置
に配置したLi@B4O1結晶片で支持することにより
、Li2B60−1 結晶基板とホルダとの接触部に反
応が起り結合する現象を除去したLi2B60−1 結
晶基板の金属加熱拡散方法を提供するものである。
The present invention provides a method for fabricating an optical waveguide by heating and diffusing metal using a LL*11140g crystal substrate. Metal heating diffusion of the Li2B60-1 crystal substrate eliminates the phenomenon of reaction and bonding occurring at the contact area between the Li2B60-1 crystal substrate and the holder by supporting it with a Li@B4O1 crystal piece placed at a position other than the metal diffusion surface. The present invention provides a method.

以下図面によ如説明する。This will be explained below with reference to the drawings.

〔実施例〕〔Example〕

第2図に示すように、金属を真空蒸着またはスパッタし
た後パターン形成・した金属層2を有し、ホルダ4上に
載置したLi2B401結晶基板1を高温に加熱保持し
、金属をLi2%0−1結晶基板1に加熱拡散させ、第
3図に示すように拡散光導波路5を作製する。このとき
、第2図に示すような状態のLi2B40y結晶基板1
を直接石英ガラスなどのホルダ4に載置して加熱保持す
ると、LzlZ1407結晶基板1とホルダ4の、たと
えば石英ガラスとの接触部が反応を起し、結合される問
題がある。
As shown in FIG. 2, a Li2B401 crystal substrate 1, which has a metal layer 2 formed by vacuum evaporation or sputtering and then patterning, and is placed on a holder 4, is heated and held at a high temperature, and the metal is coated with Li2% 0. -1 The crystal substrate 1 is heated and diffused to produce a diffused optical waveguide 5 as shown in FIG. At this time, the Li2B40y crystal substrate 1 in the state shown in FIG.
If the LzlZ1407 crystal substrate 1 and the holder 4 are directly placed on a holder 4 such as quartz glass and held under heat, there is a problem in that the contact portion between the LzlZ1407 crystal substrate 1 and the quartz glass, for example, causes a reaction and is bonded.

゛ 本発明は第1図に示すように、Li2B40q 結
晶基板1とホルダ4との間を、Li2B<01結晶基板
1に金属層2が加熱拡散する面を含まない位置に配置し
た他のLi2B4O7結晶片3で支持して加熱保持する
ことにより、Li2B、07結晶基板1とホルダ4との
間に反応が起り結合する現象を除去している。
゛ As shown in FIG. 1, the present invention provides another Li2B4O7 crystal which is arranged between the Li2B40q crystal substrate 1 and the holder 4 in a position that does not include the surface where the metal layer 2 heats and diffuses into the Li2B<01 crystal substrate 1. By supporting the Li2B, 07 crystal substrate 1 with the piece 3 and holding it under heat, a phenomenon in which a reaction occurs between the Li2B, 07 crystal substrate 1 and the holder 4 and the holder 4 is bonded can be eliminated.

なおLi2B、01結晶片3の数は、本実施例では2個
を用いたが、1個でも任意の複数個でもよく、Li2B
4O,1結晶基板1の金属層2のパターンが形成され、
金属熱拡散する面を含まない位置を支持するよう配置す
ればよい。
Although two Li2B,01 crystal pieces 3 were used in this example, it may be one or any plurality of Li2B,01 crystal pieces 3.
A pattern of the metal layer 2 of the 4O,1 crystal substrate 1 is formed,
It may be arranged so as to support a position that does not include a surface where metal heat is diffused.

〔発明の効果〕〔Effect of the invention〕

以上述べたように、本発明はLi2B<01結晶基板と
ホルダの間を、L i 2 B40−1結晶基板に金属
層のパターンが加熱拡散する面を含まない位置に配置し
たLi2B40−1結晶片で支持して加熱保持する方法
であるから、Li2B60q結晶基板とホルダが直接接
触し反応して結合することがなく 、L t 2 B4
0g結晶基板に金属を安定に加熱拡散することができ、
Li2’B、at結晶基板を用いた金属熱拡散法による
光導波路の作製に適用して効果がある。
As described above, the present invention provides a Li2B40-1 crystal piece that is arranged between the Li2B<01 crystal substrate and the holder in a position that does not include the surface where the metal layer pattern heats and diffuses on the Li2B40-1 crystal substrate. Since the Li2B60q crystal substrate and the holder do not come into direct contact and react to form a bond, L t 2 B4
It is possible to stably heat and diffuse metal onto a 0g crystal substrate,
It is effective when applied to the fabrication of optical waveguides by the metal thermal diffusion method using Li2'B, at crystal substrates.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の金属加熱拡散方法を説明する図、 第2図は考えられるLi2B40−1結晶基板を用いた
金属加熱拡散方法を説明する図、 第3図はLi2B<01結晶基板に金属加熱拡散方法で
作製した拡散光導波路の状態を示す図である。 1・・・Li1B<01結晶基板 2・・・金属層 5・・・Li1B60−1結晶片 4・・・ホルダ 5、・・・拡散光導波路
Figure 1 is a diagram explaining the metal heating diffusion method of the present invention, Figure 2 is a diagram explaining a possible metal heating diffusion method using a Li2B40-1 crystal substrate, and Figure 3 is a diagram explaining the metal heating diffusion method using a Li2B<01 crystal substrate. It is a figure which shows the state of the diffused optical waveguide produced by the heating diffusion method. 1... Li1B<01 crystal substrate 2... Metal layer 5... Li1B60-1 crystal piece 4... Holder 5,... Diffusing optical waveguide

Claims (1)

【特許請求の範囲】 ホルダ上に載置した誘電体材料Li_2B_4O_7結
晶基板へ金属層のパターンを形成し、金属加熱拡散を行
い拡散光導波路を作製する方法において、前記Li_2
B_4O_7結晶板と前記ホルダの間を、前記Li_2
B_4O_7結晶基板の金属拡散面を含まぬ位置に配置
したLi_2B_4O_7結晶片により支持して前記L
i_2B_4O_7結晶基板を加熱保持する ことを特徴とする金属加熱拡散方法。
[Claims] In a method of forming a metal layer pattern on a dielectric material Li_2B_4O_7 crystal substrate placed on a holder and performing metal heating diffusion to produce a diffused optical waveguide, the Li_2
Between the B_4O_7 crystal plate and the holder, the Li_2
The above-mentioned L
A metal heating diffusion method characterized by heating and holding an i_2B_4O_7 crystal substrate.
JP60021049A 1985-02-06 1985-02-06 Diffusing method for metal by heating Pending JPS61180204A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60021049A JPS61180204A (en) 1985-02-06 1985-02-06 Diffusing method for metal by heating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60021049A JPS61180204A (en) 1985-02-06 1985-02-06 Diffusing method for metal by heating

Publications (1)

Publication Number Publication Date
JPS61180204A true JPS61180204A (en) 1986-08-12

Family

ID=12044061

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60021049A Pending JPS61180204A (en) 1985-02-06 1985-02-06 Diffusing method for metal by heating

Country Status (1)

Country Link
JP (1) JPS61180204A (en)

Similar Documents

Publication Publication Date Title
JPH04234005A (en) Manufacture of lightguide tube by ion exchange method
KR870007563A (en) Semiconductor device manufacturing method
CA2341192A1 (en) Non-lambertian glass diffuser and method of making
KR970072031A (en) Manufacturing method of optical wave optical circuit on flat plane
JPS61180204A (en) Diffusing method for metal by heating
JPH02440Y2 (en)
JPS63184708A (en) Thin film optical circuit
JPH10177103A (en) Microlens structure
JPH0875941A (en) Production of optical waveguide
JPS62212605A (en) Production of optical waveguide
JPH0462644B2 (en)
JPS6365619B2 (en)
JPH06214128A (en) Optical waveguide circuit
JPS5897028A (en) Optical waveguide switch
JPS58134609A (en) Production of optical waveguide
JPH0688913A (en) Optical waveguide
JP2823971B2 (en) Method of forming optical waveguide and jig for heat treatment used therefor
JPS58156906A (en) Fresnel lens of thin film and its production
JPH0350241B2 (en)
JPS5776830A (en) Semiconductor substrate
JPS63148685A (en) Manufacture of solar cell element
JPS6298678A (en) Manufacture of substrate for solar cell
JPH03155506A (en) Optical waveguide and its manufacture
JPS61219929A (en) Focus variable lens
JP2000331948A (en) Plate for diffusing boron