JPS61177447U - - Google Patents

Info

Publication number
JPS61177447U
JPS61177447U JP6152285U JP6152285U JPS61177447U JP S61177447 U JPS61177447 U JP S61177447U JP 6152285 U JP6152285 U JP 6152285U JP 6152285 U JP6152285 U JP 6152285U JP S61177447 U JPS61177447 U JP S61177447U
Authority
JP
Japan
Prior art keywords
detected portion
pattern
slit light
irradiates
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6152285U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6152285U priority Critical patent/JPS61177447U/ja
Publication of JPS61177447U publication Critical patent/JPS61177447U/ja
Pending legal-status Critical Current

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  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の使用状態を示す斜視図、第2
図a〜cはスリツト光の反射パターンを示す図、
第3図a,bは接着剤の量が異常に塗布された状
態を示す図、第4図は接着剤が正規の位置からず
れて塗布された状態を示す図である。 1……光源装置、2……パターン認識装置、3
……リードフレーム、4……接着剤、L……スリ
ツト光、S……反射パターン。
Figure 1 is a perspective view showing how the present invention is used;
Figures a to c are diagrams showing reflection patterns of slit light.
FIGS. 3a and 3b are diagrams showing a state in which an abnormal amount of adhesive has been applied, and FIG. 4 is a diagram showing a state in which the adhesive has been applied at a position deviated from the normal position. 1...Light source device, 2...Pattern recognition device, 3
...Lead frame, 4...Adhesive, L...Slit light, S...Reflection pattern.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 被検出部に対しスリツト光を斜め上方から照射
する光源装置と、上記被検出部における上記スリ
ツト光の反射パターンを上記被検出部の真上から
検出するパターン認識装置とから成ることを特徴
とするパターン検出装置。
The present invention is characterized by comprising a light source device that irradiates the detected portion with slit light from diagonally above, and a pattern recognition device that detects a reflection pattern of the slit light on the detected portion from directly above the detected portion. Pattern detection device.
JP6152285U 1985-04-24 1985-04-24 Pending JPS61177447U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6152285U JPS61177447U (en) 1985-04-24 1985-04-24

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6152285U JPS61177447U (en) 1985-04-24 1985-04-24

Publications (1)

Publication Number Publication Date
JPS61177447U true JPS61177447U (en) 1986-11-05

Family

ID=30589878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6152285U Pending JPS61177447U (en) 1985-04-24 1985-04-24

Country Status (1)

Country Link
JP (1) JPS61177447U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0362597A (en) * 1989-07-28 1991-03-18 Matsushita Electric Ind Co Ltd Viscous fluid spreading method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0362597A (en) * 1989-07-28 1991-03-18 Matsushita Electric Ind Co Ltd Viscous fluid spreading method

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