JPS6117100A - X-ray collimator - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to an X-ray collimator, and particularly to a collimator for soft X-rays.

[Prior Art] Generally, X-ray sources are used in fields such as X-ray analyzers, but in recent years, they have also been used in the field of semiconductor manufacturing such as LSI.
It is used as an exposure source for soft X-ray exposure equipment that performs fine patterning with submicron line widths. X-ray collimators are used in X-ray analysis equipment, X-ray exposure equipment, etc.
Used to collimate X-rays from a radiation source.

Compared to methods that use light exposure such as ultraviolet light, the X-ray exposure method has almost no reduction in resolution due to recirculation, interference, reflection, etc., so it is easy to transfer fine patterns due to the nature of the wood, and it can also be used with high aspect ratios. Although this method has the advantage of being able to obtain a high-quality transfer pattern, it also has the disadvantage of low throughput due to insufficient sensitivity of the resist and low efficiency of the X-ray source.

As shown in FIGS. 1(a) and 1(b), this type of device, which was previously proposed by the inventor, is made of fine particles ((
It is composed of a large number of holes 4 with diameters of about 25 Bm to 100 mm). The thickness of the plate member 9 is usually 0.
．． It is about 5 to 5 fat intestines. When X-rays 1 enter this collimator from above in the figure, the X-rays 2 that pass through the holes 4 without being irradiated onto the surface of the partition wall 5 formed by the holes 4 are emitted as nearly parallelized X-rays 2.

However, as shown in the partial cross-sectional view of FIG. 1(b),
The incident X-rays 1 pass through the partition wall 5 at the opening 4a on the entrance side of the hole 4.
When the edge portion 5a of the partition wall 5 is irradiated, scattered X-rays 7 are generated, and the incident X-rays 1 that collide with the inner surface of the partition wall 5 are absorbed there. Furthermore, the edge portion 5b of the partition wall 5 at the opening 4a on the exit side of the hole 4 also radially diverges the scattered X-rays 7,
The X-rays passing through this collimator have two parallel outgoing X-rays.
And scattered X! jI7 is mixed. Therefore, even if the intensity of the non-parallel scattered X-rays 7 is weak, it is inconvenient for /fi optical devices that require strict parallelism, for example, a submicron resolution line width. In particular, when the incident X-rays 1 are irradiated onto the surface of the partition wall 5 and absorbed, the glass material 9 changes color, changes in quality, and depending on the material, it decomposes.

Furthermore, it is advantageous to make the partition wall 5 formed by a large number of fine holes 4 as thin as possible because it increases the effective transmission area of X-rays, but depending on the wavelength of the X-rays used, they may pass through the partition wall without being absorbed However, it has the disadvantage that it no longer functions as a collimator. Even soft X-rays, which have a relatively long wavelength among X-rays, can easily pass through thinner partition walls, which is inconvenient for exposure equipment.

[Objective] In view of the drawbacks of the conventional examples described above, an object of the present invention is to provide an X-ray collimator that does not cause deterioration of the material.

[Example] The present invention will be described in detail below with reference to the drawings. FIG. 2 is a schematic partial sectional view of one embodiment of the present invention, and FIG.
) and (b), the same reference numerals are given to the same members.

Plate member 90 made of glass with high lead (pb) content
are made of fine holes 4 parallel to each other and having the same cross-sectional shape.
The end 50a of the partition 50 at the entrance side opening 40a of the hole 40 and the end 50b of the partition 50 at the exit side opening 40b of the hole 40 scatter incident X-rays. It is shaped to have a rounded shape. Further, a substance 6 having a high X-ray absorption rate is coated on the surface of the end 50a of the partition wall 50 on the incident side. However, depending on the application, the ends 50a and 50b may be adhered as they are in the square shape.

The method for forming the ends 50a and 50b of the partition wall 50 is to immerse the collimator formed as shown in FIGS. 1(a) and 1(b) in hydrofluoric acid, hydrofluoric acid, etc. If soaked for a long time, the sharp edges are likely to be etched away, resulting in the edges being removed as shown in FIG. There are deposition methods such as vapor deposition and sputtering, and heavy metals such as Au, Pt, and Pb are suitable as substances with high X-ray absorptivity, and an appropriate one can be selected depending on the wavelength and intensity of the X-rays used. is good.

In the above configuration, when X-rays 1 are irradiated from above in the figure from an X-ray source (not shown), the parallel portions thereof pass through the hole 40 and are emitted as parallel X-rays 2, while the non-parallel portions are emitted as parallel X-rays 2. It is absorbed into the plate member 80 including the partition wall 50. In this case, since the ends 50a and 50b of the partition wall 50 are rounded, scattered X-rays do not diverge. Furthermore, the substance 6 reduces the rate at which the surface of the glass material 90 (and the partition wall 50) is directly irradiated with incident X-rays, and it is possible to prevent the glass material 80, which is the partition material, from discoloring or the like.

FIG. 4 shows a modification of the embodiment shown in FIG.
Similarly, an X-ray absorbing substance 6 is also formed on the surface of the end 50b on the emission side.
is covered.

FIG. 5(a) is yet another modification of the embodiment shown in FIGS. 2 and 4, and FIGS. 5(a) and 5(b) are schematic configuration diagrams of an X-ray exposure apparatus. In FIG. 5(a), the X-ray absorbing substance 6 is! All the surfaces of the four walls 50 are coated. In this case, a material with low transmission such as Au is used as the X-ray absorbing material 6. When X-rays are incident on the surface of the substance 6 at an angle of 1 to 2 degrees, they are totally reflected, resulting in approximately parallel outgoing X-rays 3. This totally reflected X-ray 3 and the X-ray 2 that directly passed through the hole 40 are combined to expose the X-ray mask IO having the pattern 11 5, and expose the X-ray strip h12 coated on the wafer 13. do.

[Effect] As explained above, according to the present invention, by coating a material with high X-ray absorption rate on the surface of the partition wall of a plate-like member formed by fine through holes, generation of unuseful scattered X-rays can be prevented. At the same time, it is possible to protect the glass material that is the partition wall material.Also, if the above material is coated on all the surfaces of the partition wall, the reflected light of the incident light can be used, so X-ray If used in an exposure device, the throughput can be increased.

[Brief explanation of drawings]

FIG. 1(a) is a schematic partial sectional view of a conventional X-ray collimator, and FIG. 1(b) is a schematic partial sectional view of FIG. 1(a). FIG. 2 is a schematic partial cross-sectional view of an embodiment of the present invention;
3 is a schematic partial sectional view illustrating the manufacturing process of the embodiment shown in FIG. 2, and FIGS. Figures (a) and (b)
) is a schematic configuration diagram of an X-ray exposure apparatus. 40-m-fine through-holes 40a, 40b-1 opening 50-m-partition 50a, 50b--1 partition end 90-m-plate member 6---X-ray absorbing member m5 section 1j, procedural amendment Type (method) % formula % 1. Indication of the case 1982 Patent Application No. 38732 2. Name of the invention , Address: 1-9-20-5 Akasaka, Minato-ku, Tokyo Date of amendment order: July 30, 1985 6 Column 7 of "Brief explanation of drawings" of the specification subject to amendment; “Figure 4 (a) and (b)” on page 7, line 13 of the statement of contents of the amendment
'' is corrected to ``Figure 5(b) is''.

Claims (1)

[Claims] An X-ray collimator that collimates X-rays from an X-ray source includes a member having a large number of minute through-holes, and has an X-ray absorption coefficient on the surface of at least the end of the partition wall of the member formed by the through-holes. An X-ray collimator characterized by being coated with a substance having a high