JPS61168633U - - Google Patents
Info
- Publication number
- JPS61168633U JPS61168633U JP5201285U JP5201285U JPS61168633U JP S61168633 U JPS61168633 U JP S61168633U JP 5201285 U JP5201285 U JP 5201285U JP 5201285 U JP5201285 U JP 5201285U JP S61168633 U JPS61168633 U JP S61168633U
- Authority
- JP
- Japan
- Prior art keywords
- base
- vacuum container
- ring
- plasma
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001020 plasma etching Methods 0.000 claims description 2
- 230000001681 protective effect Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5201285U JPS61168633U (es) | 1985-04-08 | 1985-04-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5201285U JPS61168633U (es) | 1985-04-08 | 1985-04-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61168633U true JPS61168633U (es) | 1986-10-20 |
Family
ID=30571576
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5201285U Pending JPS61168633U (es) | 1985-04-08 | 1985-04-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61168633U (es) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009252635A (ja) * | 2008-04-09 | 2009-10-29 | Tokyo Electron Ltd | プラズマ処理装置のシール構造、シール方法およびプラズマ処理装置 |
-
1985
- 1985-04-08 JP JP5201285U patent/JPS61168633U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009252635A (ja) * | 2008-04-09 | 2009-10-29 | Tokyo Electron Ltd | プラズマ処理装置のシール構造、シール方法およびプラズマ処理装置 |