JPS61163171A - Manufacture of ceramic plate - Google Patents

Manufacture of ceramic plate

Info

Publication number
JPS61163171A
JPS61163171A JP60004757A JP475785A JPS61163171A JP S61163171 A JPS61163171 A JP S61163171A JP 60004757 A JP60004757 A JP 60004757A JP 475785 A JP475785 A JP 475785A JP S61163171 A JPS61163171 A JP S61163171A
Authority
JP
Japan
Prior art keywords
ceramic
base material
metal base
manufacturing
ceramic plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60004757A
Other languages
Japanese (ja)
Inventor
黒田 一昭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osaka Fuji Corp
Original Assignee
Osaka Fuji Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osaka Fuji Kogyo KK filed Critical Osaka Fuji Kogyo KK
Priority to JP60004757A priority Critical patent/JPS61163171A/en
Publication of JPS61163171A publication Critical patent/JPS61163171A/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明はセラミックプレートの製造法、特に、耐熱性、
耐摩耗性、耐食性、絶縁性に優れたセラミックプレート
の製造法に関する。
[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to a method for manufacturing a ceramic plate, in particular, heat resistance,
This article relates to a method for manufacturing ceramic plates with excellent wear resistance, corrosion resistance, and insulation properties.

(従来の技術) 一般に、セラミック製品は、原料を混合、混練した後、
形状及び用途に応じて加圧、押出、鋳込射出等により成
形し、ついで乾燥、焼成する工程を経て製造されている
(Prior art) Ceramic products are generally made by mixing and kneading raw materials, and then
It is manufactured through a process of molding by pressure, extrusion, injection molding, etc. depending on the shape and purpose, followed by drying and firing.

(発明が解決しようとする問題点) しかし、従来の方法でセラミックプレートを製造する場
合、原料の化学的純度、結晶化の程度、粒度及び粒度分
布に厳密な精度が要求され、また焼成に少なくとも10
時間以上は必要であり、しかも焼成の際の温度管理もセ
ラミックプレートの品質面で大きな要因をしめている。
(Problems to be Solved by the Invention) However, when manufacturing ceramic plates using the conventional method, strict precision is required for the chemical purity of the raw materials, the degree of crystallization, particle size and particle size distribution, and at least 10
In addition, temperature control during firing is a major factor in the quality of ceramic plates.

また、乾燥や焼成の際、収縮の大きさが3軸方向でそれ
ぞれ異なっているため、一部分のみならず全体において
も形状の変化を起こす恐れがあり、成形の際に複雑な調
整が必要となる。また、収縮が異なるために、セラミッ
クプレートの形状が大きくなるほど、当然乾燥の際に亀
裂や変形を生じる危険性が大きくなる。
In addition, during drying and firing, the size of shrinkage is different in each of the three axes, so there is a risk that the shape will change not only in one part but also in the whole, requiring complicated adjustments during molding. . Also, due to the differential shrinkage, the larger the shape of the ceramic plate, the greater the risk of cracking and deformation during drying.

更に、製造に要する時間や費用さらには製造のための設
備投資等、非常にコストがかかりその結果セラミックプ
レート自体の価格が高くなるという問題があった。
Furthermore, there is a problem in that the time and cost required for manufacturing, as well as the investment in equipment for manufacturing, are very costly, and as a result, the price of the ceramic plate itself becomes high.

(問題を解決するための手段) 本発明は、前記問題を解決する為、20000°C以上
の超高温プラズマによりセラミック材料を金属母材表面
に溶射してセラミック層を形成し、次いでそのセラミッ
ク層を金属母材から分離することによってセラミックプ
レートを製造するようにしたらのである。
(Means for solving the problem) In order to solve the above problem, the present invention forms a ceramic layer by spraying a ceramic material onto the surface of a metal base material using ultra-high temperature plasma of 20,000°C or higher, and then forms a ceramic layer on the surface of the metal base material. The ceramic plate was manufactured by separating the metal from the metal base material.

即ち、本発明は、トーチに高圧の水を供給する一方、陰
極と回転陽極との間に電圧を印加して強制的に直流アー
クを発生させると、水が蒸発、分解してプラズマ状態と
なり、プラズマアークを発生し、これが20000℃〜
約30000℃に達する超高温のプラズマジェットとな
って噴出することに着目し、この超高温のプラズマジェ
ットを用いてセラミック材料を溶融、噴射させると、セ
ラミック材料粒子が球状粒子となって金属母材表面に衝
突し、ち密で強固なセラミック層を形成でき、しかも従
来のプラズマ溶射法と異なり50mmにも達する厚いセ
ラミック層を形成できることを見出だし、これを母材と
分離することによってセラミックプレートを製造するよ
うにしたものである。なお、プラズマジュツトの温度を
20000℃以上としたのは、それ以下の温度では十分
な肉厚のものが得られず、しかも気孔率が小さく緻密で
十分な機械的強度のセラミックプレートが得られないか
らである。
That is, in the present invention, when high-pressure water is supplied to the torch and a voltage is applied between the cathode and the rotating anode to forcibly generate a DC arc, the water evaporates and decomposes and becomes a plasma state. Generates a plasma arc, which reaches temperatures of 20,000℃~
We focused on the fact that it ejects as an ultra-high temperature plasma jet reaching approximately 30,000 degrees Celsius, and when the ceramic material is melted and ejected using this ultra-high temperature plasma jet, the ceramic material particles become spherical particles and are released into the metal base material. We discovered that it is possible to form a dense and strong ceramic layer by colliding with the surface, and unlike the conventional plasma spraying method, it is possible to form a thick ceramic layer of up to 50 mm.By separating this from the base material, we can manufacture ceramic plates. It was designed to do so. The temperature of the plasma jut was set at 20,000°C or higher because at a temperature lower than that, a sufficiently thick wall could not be obtained, and a ceramic plate with small porosity, denseness, and sufficient mechanical strength could be obtained. That's because there isn't.

具体的には、まず、金属母材表面に水プラズマ溶射装置
を用いてセラミック材料を溶射して所定の厚さのセラミ
ック層を形成する。なお、金属母材の材質については特
に厳密な選択を必要としない。また、セラミック層を形
成するためのセラミック溶射材料としては、セラミック
プレートの使用用途に応じて耐熱性、耐摩耗性、耐食性
等の性能を有する任意の材料を使用できる。例えば、ア
ルミナ、グレーアルミナ、アルミナ・チタニア、アルミ
ナ・ジルコニアなどのアルミナ系セラミック材料、ジル
コニア、ジルコニア・イツトリア、ジルコンなどのジル
コニア系セラミック材料、酸化チタン、あるいは酸化ク
ロムなど目的に応じて選択すれば良い。
Specifically, first, a ceramic material is sprayed onto the surface of a metal base material using a water plasma spraying device to form a ceramic layer with a predetermined thickness. Note that there is no need for a particularly strict selection of the material of the metal base material. Further, as the ceramic spraying material for forming the ceramic layer, any material having properties such as heat resistance, wear resistance, corrosion resistance, etc. can be used depending on the intended use of the ceramic plate. For example, alumina ceramic materials such as alumina, gray alumina, alumina titania, alumina zirconia, zirconia ceramic materials such as zirconia, zirconia ittria, and zircon, titanium oxide, or chromium oxide may be selected depending on the purpose. .

次いで、所定厚のセラミック層が形成された時点で、溶
射を停止し、その層を強制的にあるいは故意に金属母材
表面より剥離もしくは、金属母材を除去することによっ
てセラミックプレートを製造できる。
Next, when a ceramic layer of a predetermined thickness is formed, the thermal spraying is stopped, and the layer is forcibly or intentionally peeled off from the surface of the metal base material, or the metal base material is removed, thereby producing a ceramic plate.

剥離ならびに除去方法としては、溶射における金属母材
とセラミック層との熱膨張差を利用する方法、セラミッ
ク層表面に超音波の振動をあたえて母材金属表面からは
く離する方法、水プラズマ溶射施工以前に金属母材表面
に離型剤を塗布することにより、故意に剥離を生じせし
める方法、あるいは、水プラズマ溶射施工完了の後に金
属母材を王水等の強酸性の水溶液を用いて溶解除去する
か、切削等の機械加工により除去する方法など任意の方
法を採用できる。
Peeling and removal methods include a method that utilizes the difference in thermal expansion between the metal base material and the ceramic layer during thermal spraying, a method that applies ultrasonic vibration to the ceramic layer surface to peel it off from the base metal surface, and a method that uses water plasma spraying before water plasma spraying. A method of intentionally causing peeling by applying a mold release agent to the surface of the metal base material, or dissolving and removing the metal base material using a strong acid aqueous solution such as aqua regia after completing water plasma spraying. Alternatively, any method such as removal by machining such as cutting can be adopted.

本発明に係るセラミックプレートはその使用目的に応じ
て、層の膜厚を変化、設定させ、さらにセラミック溶射
材料を選択することにより、産業上の耐熱、耐摩耗、耐
食、耐絶縁等のあらゆる分野のセラミックプレートとし
て利用が可能となる。
The ceramic plate according to the present invention can be used in various industrial fields such as heat resistance, wear resistance, corrosion resistance, insulation resistance, etc. by changing and setting the layer thickness and selecting the ceramic spraying material according to the purpose of use. It can be used as a ceramic plate.

例えば、電子部品、陶磁器及び粉末冶金等の焼成のため
の治具あるいは電気絶縁体また、溶鋼注入制御用スライ
ディングノズルプレート等に特に有用である。
For example, it is particularly useful for jigs or electrical insulators for firing electronic parts, ceramics, powder metallurgy, etc., and sliding nozzle plates for controlling molten steel injection.

(実施例) 以下、本発明を粉末冶金の焼成のための耐熱セラミック
プレートの製造に適用した実施例について説明する。
(Example) Hereinafter, an example in which the present invention is applied to the production of a heat-resistant ceramic plate for powder metallurgy firing will be described.

母材金属として300++unX 300mmX 6m
mのステンレス鋼板を用い、まず、水プラズマ溶射の際
に最小限必要とされるセラミック層との密着力を得るた
め、母材金属表面にブラスト処理を施して若干の粗さを
あたえ、次いで、母材金属の粗面全面に離型剤を塗布し
た。
300++unX 300mmX 6m as base metal
Using a stainless steel plate of 500 mm, first, the base metal surface was blasted to give it some roughness in order to obtain the minimum adhesion with the ceramic layer required for water plasma spraying, and then A mold release agent was applied to the entire rough surface of the base metal.

酸化アルミニウムを溶射材料として用い、水プラズマ溶
射装置で約30000℃のプラズマジュツトを発生させ
、旋盤に取り付けたステンレス鋼板を回転させつつ、そ
の表面に酸化アルミニウムを溶射して厚み2mmの層を
形成した。
Using aluminum oxide as a thermal spraying material, a water plasma spraying device generates a plasma jet at approximately 30,000℃, and while rotating a stainless steel plate attached to a lathe, aluminum oxide is sprayed onto the surface of the plate to form a 2mm thick layer. did.

水プラズマ溶射施工終了後、放置し自然冷却させ、形成
された酸化アルミニウム層を、酸化アルミニウムとステ
ンレス鋼との熱膨張の差と離型剤との相乗効果によって
、母材金属上より剥離させ、300mmX 300mm
X 2mmの形状の酸化アルミニウムからなるセラミッ
クプレートを得た。このセラミックプレートを焼結合金
の製造用カーボン板・セッターの代わりに用いたところ
、良好な結果が得られた。
After the water plasma spraying process is completed, the aluminum oxide layer is left to cool naturally, and the formed aluminum oxide layer is peeled off from the base metal due to the synergistic effect of the difference in thermal expansion between aluminum oxide and stainless steel and the release agent. 300mmX 300mm
A ceramic plate made of aluminum oxide and having a shape of 2 mm was obtained. When this ceramic plate was used in place of a carbon plate/setter for manufacturing sintered alloys, good results were obtained.

(効果) 本発明によれば、従来のプラズマ溶射法では不可能であ
った肉厚の厚いセラミックプレートを製造でき、しかも
ガスプラズマ溶射法のようにアルゴン、ヘリウムその他
の高価なガスを使用する必要がなく、安価にセラミック
プレートを製造できる。
(Effects) According to the present invention, it is possible to manufacture thick ceramic plates, which was impossible with conventional plasma spraying methods, and there is no need to use argon, helium, or other expensive gases as with gas plasma spraying methods. Ceramic plates can be produced at low cost.

また、複雑な製造工程ならびに管理を必要とせず、それ
にともなう製造設備も、従来の製造法と比較すると非常
に簡略化され、さらに製造時間にいたっては、10分の
1以下の時間で製造が可能となる。
In addition, it does not require complicated manufacturing processes or management, and the accompanying manufacturing equipment is greatly simplified compared to conventional manufacturing methods, and the manufacturing time can be reduced to less than one-tenth. It becomes possible.

さらに、セラミック溶射材料を30000°Cという超
高温のプラズマジェット炎中を通過させるため、溶射施
工中に自動的に粒形調整が行なわれ、従来法のように原
料の粒径を調整する必要が無く、比較的、安価な材料の
使用が可能となる。
Furthermore, since the ceramic spray material is passed through a plasma jet flame at an ultra-high temperature of 30,000°C, the particle size is automatically adjusted during the spraying process, eliminating the need to adjust the particle size of the raw material as in conventional methods. This makes it possible to use relatively inexpensive materials.

また、成型助剤その他制御剤等の添加を必要としないた
め、比較的安価な材料を使用するにも拘わらず純度の優
れた、高品質の製品が提供できる、など優れた効果が得
られる。さらに、本発明に係るセラミックプレートは焼
結合金等を焼成する際の棚板として使用すると、従来の
カーボン板とセッターの組み合わせた棚板、あるいはカ
ーボン板にアルミナを吹き付けた棚板のようにカーボン
板を使用しなくて良く、焼結合金等の製造コストを下げ
ることも可能である。
Furthermore, since there is no need to add molding aids or control agents, excellent effects such as the ability to provide high-quality products with excellent purity can be obtained despite the use of relatively inexpensive materials. Furthermore, when the ceramic plate according to the present invention is used as a shelf board when firing sintered alloys, etc., it can be used as a shelf board that combines a conventional carbon board and a setter, or as a shelf board that is made by spraying alumina on a carbon board. It is not necessary to use a plate, and it is also possible to reduce the manufacturing cost of sintered alloys and the like.

Claims (3)

【特許請求の範囲】[Claims] (1)20000℃以上の超高温プラズマによりセラミ
ック材料を金属母材表面に溶射してセラミック層を形成
し、次いでそのセラミック層を金属母材から分離するこ
とを特徴とするセラミックプレートの製造法。
(1) A method for manufacturing a ceramic plate, which comprises spraying a ceramic material onto the surface of a metal base material using ultra-high temperature plasma of 20,000° C. or higher to form a ceramic layer, and then separating the ceramic layer from the metal base material.
(2)セラミック層を金属母材表面から強制的にはく離
して分離する特許請求の範囲第1項記載の製造法。
(2) The manufacturing method according to claim 1, wherein the ceramic layer is forcibly peeled off and separated from the surface of the metal base material.
(3)金属母材を溶解させてセラミック層を分離する特
許請求の範囲第1項記載の製造法。
(3) The manufacturing method according to claim 1, wherein the ceramic layer is separated by melting the metal base material.
JP60004757A 1985-01-14 1985-01-14 Manufacture of ceramic plate Pending JPS61163171A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60004757A JPS61163171A (en) 1985-01-14 1985-01-14 Manufacture of ceramic plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60004757A JPS61163171A (en) 1985-01-14 1985-01-14 Manufacture of ceramic plate

Publications (1)

Publication Number Publication Date
JPS61163171A true JPS61163171A (en) 1986-07-23

Family

ID=11592764

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60004757A Pending JPS61163171A (en) 1985-01-14 1985-01-14 Manufacture of ceramic plate

Country Status (1)

Country Link
JP (1) JPS61163171A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009502729A (en) * 2005-08-02 2009-01-29 モギレフスキー、ラディオン Dense block purification and production method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59222308A (en) * 1983-06-01 1984-12-14 九州耐火煉瓦株式会社 Manufacture of thin product made of ceramics

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59222308A (en) * 1983-06-01 1984-12-14 九州耐火煉瓦株式会社 Manufacture of thin product made of ceramics

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009502729A (en) * 2005-08-02 2009-01-29 モギレフスキー、ラディオン Dense block purification and production method

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