JPS6116151B2 - - Google Patents

Info

Publication number
JPS6116151B2
JPS6116151B2 JP17829580A JP17829580A JPS6116151B2 JP S6116151 B2 JPS6116151 B2 JP S6116151B2 JP 17829580 A JP17829580 A JP 17829580A JP 17829580 A JP17829580 A JP 17829580A JP S6116151 B2 JPS6116151 B2 JP S6116151B2
Authority
JP
Japan
Prior art keywords
wafer
disk
hole
positioning
groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17829580A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57101327A (en
Inventor
Koji Matsuda
Masahiko Aoki
Katsuo Naito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NITSUSHIN HAIBORUTEEJI KK
Original Assignee
NITSUSHIN HAIBORUTEEJI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NITSUSHIN HAIBORUTEEJI KK filed Critical NITSUSHIN HAIBORUTEEJI KK
Priority to JP17829580A priority Critical patent/JPS57101327A/ja
Publication of JPS57101327A publication Critical patent/JPS57101327A/ja
Publication of JPS6116151B2 publication Critical patent/JPS6116151B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP17829580A 1980-12-16 1980-12-16 Wafer carrier in ion implanting device Granted JPS57101327A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17829580A JPS57101327A (en) 1980-12-16 1980-12-16 Wafer carrier in ion implanting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17829580A JPS57101327A (en) 1980-12-16 1980-12-16 Wafer carrier in ion implanting device

Publications (2)

Publication Number Publication Date
JPS57101327A JPS57101327A (en) 1982-06-23
JPS6116151B2 true JPS6116151B2 (fr) 1986-04-28

Family

ID=16045966

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17829580A Granted JPS57101327A (en) 1980-12-16 1980-12-16 Wafer carrier in ion implanting device

Country Status (1)

Country Link
JP (1) JPS57101327A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63188043U (fr) * 1987-05-26 1988-12-01

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2529383A1 (fr) * 1982-06-24 1983-12-30 Commissariat Energie Atomique Porte-cible a balayage mecanique utilisable notamment pour l'implantation d'ioris
JPS6267458U (fr) * 1985-10-17 1987-04-27
US4941800A (en) * 1988-10-21 1990-07-17 Tokyo Electron Limited Transfer apparatus for plate-like member

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63188043U (fr) * 1987-05-26 1988-12-01

Also Published As

Publication number Publication date
JPS57101327A (en) 1982-06-23

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