JPS61159730A - Method of removing particle in emulsion mask - Google Patents
Method of removing particle in emulsion maskInfo
- Publication number
- JPS61159730A JPS61159730A JP60000371A JP37185A JPS61159730A JP S61159730 A JPS61159730 A JP S61159730A JP 60000371 A JP60000371 A JP 60000371A JP 37185 A JP37185 A JP 37185A JP S61159730 A JPS61159730 A JP S61159730A
- Authority
- JP
- Japan
- Prior art keywords
- jig
- particles
- mask
- particle
- charged
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 title claims abstract description 40
- 239000000839 emulsion Substances 0.000 title claims abstract description 21
- 238000000034 method Methods 0.000 title claims description 17
- 239000002184 metal Substances 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 5
- 230000005611 electricity Effects 0.000 abstract description 9
- 230000003068 static effect Effects 0.000 abstract description 9
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 abstract description 5
- 239000010419 fine particle Substances 0.000 abstract 1
- 238000004140 cleaning Methods 0.000 description 4
- 229920002160 Celluloid Polymers 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 238000005273 aeration Methods 0.000 description 1
- -1 aeration Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、エマルジョンマスクに付着しｆｌ ／＜−
ティクル（不純具＋！１Ｊ）ｔ−除去する方法に関する
ものである。[Detailed Description of the Invention] [Industrial Field of Application] The present invention provides an emulsion mask with fl/<-
This relates to a method for removing tickles (impurities +!1J).
従来、フォトマスク等に付着したパーティクルを除去す
る方法としては、高圧水洗浄法やブラシ等を用いた洗浄
法が行なわれている。この種の洗浄法は例えばクロムマ
スク等のように硬質材のものでは行なうことができるが
、エマルジョンマスクは文献（５ＡＫＵＲＡ、ＰＭ、Ｎ
ＥＷＳ、 瀧５ｔ−参照）に記載されているように乳
剤（ゼラチン）が用いられているのでパターンが柔らか
く、シたがって上記による洗浄法ではパターンが剥離さ
れたプ傷が付いたシするため不適歯である。このためエ
マルジョンマスクのパーティクル除去Ｂ ＮＨ７’ ａ
−−？綿棒による除去が行なわれていた。Conventionally, as a method for removing particles attached to a photomask or the like, a high-pressure water cleaning method or a cleaning method using a brush or the like has been used. This type of cleaning method can be performed on hard materials such as chrome masks, but emulsion masks are
As described in EWS, Taki 5t-), since emulsion (gelatin) is used, the pattern is soft, so the above cleaning method is not suitable as the pattern will peel off and leave scratches. It's teeth. For this reason, emulsion mask particle removal B NH7' a
--? Removal was done using a cotton swab.
上記のようにエマルジョンマスクのパーティクル除去に
おいては、Ｎｌプローでは風によシ発生したごみがマス
クに付着したり、綿棒ではこれ自体に付着しているパル
ティクルがマスクに付着しゃすい上、綿棒は微小なパー
ティクルが除去しきれない等の間亀点があった。As mentioned above, when removing particles from emulsion masks, Nl blowers tend to cause dust generated by the wind to adhere to the mask, and cotton swabs tend to cause particles attached to themselves to adhere to the mask. There were some downsides, such as not being able to remove all the particles.
この発８Ａは、以上述べた問題点を除去し、マスク上へ
の新次なパーティクルの付着を防止すると共に、微小パ
ーティクルの除去をも行なうことのできるパーティクル
除去方法を提供することを目的とする。The purpose of this invention 8A is to provide a particle removal method that can eliminate the above-mentioned problems, prevent new particles from adhering to the mask, and also remove minute particles. .
この発明におけるパーティクル除去方法は、エマルジョ
ンマスクに付着したパーティクルを静電気が帯電した治
具に吸着し除去するものである。The particle removal method according to the present invention is to remove particles attached to an emulsion mask by adsorbing them to a jig charged with static electricity.
この発明では、エマルジョンマスクに静電気が帯電した
治具を近ずけることによシ、パーティクルがマスクから
離れて治具に吸着させることができる。また静電気は治
具の他の部材による摩擦帯電や帯電器により行なえる。In this invention, by bringing a jig charged with static electricity close to the emulsion mask, particles can be separated from the mask and attracted to the jig. Further, static electricity can be generated by frictional charging using other members of the jig or by a charger.
第１図はこの発明の一実施例を示す概！！囚であって、
ｌはエマルジョンマスク、２はこのマスク１上に付着さ
れたパーティクルを示す。３はガラスまたは金属の針状
治具で、治具３の把持部４は絶縁物からできているｏ５
はパーティクル２のバキュームによる吸引口である。FIG. 1 schematically shows an embodiment of this invention. ! Being a prisoner,
1 indicates an emulsion mask, and 2 indicates particles attached to this mask 1. 3 is a needle-like jig made of glass or metal, and the gripping part 4 of the jig 3 is o5 made of an insulator.
is a suction port for vacuuming particles 2.
次にパーティクルの除去方法について説明する。Next, a method for removing particles will be explained.
まず、針状治具３に静電気を帯電させておき、エマルジ
ョンマスクｌを顕微鏡を通して拡大視した状態で治具３
の針先をパーティクル２に１〜３簡の距離に接近させる
。これによｐ、パーティクル２はエマルジョンマスク１
から分離して静電帯電している治具３の針先に吸着する
ことができ、その後、パーティクル２ｔ−吸着し之治具
３をバキュームの吸引口５に近ずけてパーティクル２を
吸引排出する。このように治具３’ｉ用いて一つずつの
パーティクル２をエマルジョンマスク１から除去するも
のである。First, the needle-like jig 3 is charged with static electricity, and the emulsion mask l is magnified through a microscope.
Bring the tip of the needle close to particle 2 at a distance of 1 to 3 feet. With this, p, particle 2 is emulsion mask 1
The particles 2t can be separated from the particles and adsorbed to the electrostatically charged needle tip of the jig 3, and then the particles 2t are attracted to the suction port 5 of the vacuum and the particles 2 are sucked out. do. In this way, the particles 2 are removed one by one from the emulsion mask 1 using the jig 3'i.
治具３への静電気の帯電は摩擦による方法が適用され、
静電気はガラス、ａ気、樹脂およびセルロイドの順に負
に帯電しやすいので、例えばガラス製の治具３はセルロ
イド板に摩擦して帯電させればよく、また金属製の治具
３の場合はガラス板に摩擦して帯電させれはよい。The jig 3 is charged with static electricity by a friction method.
Static electricity tends to charge negatively in the order of glass, aeration, resin, and celluloid, so for example, a glass jig 3 can be charged by rubbing it against a celluloid plate, and a metal jig 3 can be charged with a glass jig 3. It is good to be charged by rubbing against the plate.
第２図は治具の他の実施例を示すもので、ｆ３はエマル
ジョンマスクｌと略同じ大きさの金属平板治具で、エマ
ルジョンマスクｌと１〜３閤の間隔を隔てて配置させで
ある。７は治具６へ高電圧を帯電させるための帯電器で
、帯電圧は治具７が放電をおこさない範囲で最大にする
とよい。上記のような除去方法では除去可能なパーティ
クルは凡そ１０〜５０μ程度のものまで除去できる。Fig. 2 shows another example of the jig, where f3 is a flat metal jig of approximately the same size as the emulsion mask l, and is placed at an interval of 1 to 3 tassels from the emulsion mask l. . Reference numeral 7 denotes a charger for charging the jig 6 with a high voltage, and the charging voltage is preferably maximized within a range where the jig 7 does not cause discharge. The above-mentioned removal method can remove particles with a size of about 10 to 50 microns.
以上、説明したようにこの発明によれば、エマルジョン
マスクに付着したパーティクルを帯電した治具に吸着し
除去できるようにしたので、パーティクルの除去がマス
クに無接触で行なえ、柔らかい材質のパターンに傷を付
けることなく微小なパーティクルの除去も可能であると
共に、新たなパーティクルの付着も防止できる。これに
よシ無欠陥なマスクを安価に、しかも簡単に製作できる
。As explained above, according to the present invention, particles attached to an emulsion mask can be removed by adsorption to a charged jig, so particles can be removed without contacting the mask, and patterns made of soft material can be scratched. It is possible to remove minute particles without attaching them, and it is also possible to prevent new particles from adhering. This allows defect-free masks to be produced easily and inexpensively.
第１１ｉＶはこの発明のパーティクル除去方法を実施す
るための概ｌ！図、第２図は他の例の概ｌ！崗であるＯ
１…エマルジヨンマスク、２１・ｅパーティクル、３・
・・針状治具、５・・・吸引口、６・・・金属平板治具
、７・・・帯電器。The 11th iV is a general procedure for carrying out the particle removal method of the present invention! Figure 2 shows another example. O 1...emulsion mask, 21・e particles, 3・
... Needle jig, 5... Suction port, 6... Metal plate jig, 7... Charger.
Claims (3)
除去する方法において、エマルジヨンマスクに帯電した
治具を近ずけ、この治具にパーティクルを吸着すること
を特徴とするエマルジョンマスクのパーティクル除去方
法。(1) A method for removing particles from an emulsion mask, which comprises bringing a charged jig close to the emulsion mask and adsorbing the particles to the jig.
特徴とする特許請求の範囲第１項記載のパーティクル除
去方法。(2) The particle removal method according to claim 1, wherein the jig is a needle-like jig made of glass or metal.
ることを特徴とする特許請求の範囲第１項記載のパーテ
ィクル除去方法。(3) The particle removal method according to claim 1, wherein the jig is a flat metal jig having approximately the same size as the mask.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60000371A JPS61159730A (en) | 1985-01-08 | 1985-01-08 | Method of removing particle in emulsion mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60000371A JPS61159730A (en) | 1985-01-08 | 1985-01-08 | Method of removing particle in emulsion mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61159730A true JPS61159730A (en) | 1986-07-19 |
Family
ID=11471931
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60000371A Pending JPS61159730A (en) | 1985-01-08 | 1985-01-08 | Method of removing particle in emulsion mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61159730A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08254817A (en) * | 1994-12-27 | 1996-10-01 | Siemens Ag | Method and apparatus for cleaning of photomask |
| US7306680B2 (en) | 2002-09-12 | 2007-12-11 | Asml Netherlands B.V. | Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus |
| US7522263B2 (en) | 2005-12-27 | 2009-04-21 | Asml Netherlands B.V. | Lithographic apparatus and method |
| WO2009091642A3 (en) * | 2008-01-17 | 2009-09-24 | Applied Materials, Inc. | Electrostatic surface cleaning |
-
1985
- 1985-01-08 JP JP60000371A patent/JPS61159730A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08254817A (en) * | 1994-12-27 | 1996-10-01 | Siemens Ag | Method and apparatus for cleaning of photomask |
| US7306680B2 (en) | 2002-09-12 | 2007-12-11 | Asml Netherlands B.V. | Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus |
| US7522263B2 (en) | 2005-12-27 | 2009-04-21 | Asml Netherlands B.V. | Lithographic apparatus and method |
| US8064038B2 (en) | 2005-12-27 | 2011-11-22 | Asml Netherlands B.V. | Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample |
| WO2009091642A3 (en) * | 2008-01-17 | 2009-09-24 | Applied Materials, Inc. | Electrostatic surface cleaning |
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