JPS6115721U - High frequency LC circuit element - Google Patents

High frequency LC circuit element

Info

Publication number
JPS6115721U
JPS6115721U JP10035284U JP10035284U JPS6115721U JP S6115721 U JPS6115721 U JP S6115721U JP 10035284 U JP10035284 U JP 10035284U JP 10035284 U JP10035284 U JP 10035284U JP S6115721 U JPS6115721 U JP S6115721U
Authority
JP
Japan
Prior art keywords
high frequency
circuit element
inductance
conductive film
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10035284U
Other languages
Japanese (ja)
Inventor
良彦 芦田
容平 石川
Original Assignee
株式会社村田製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社村田製作所 filed Critical 株式会社村田製作所
Priority to JP10035284U priority Critical patent/JPS6115721U/en
Publication of JPS6115721U publication Critical patent/JPS6115721U/en
Pending legal-status Critical Current

Links

Landscapes

  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Filters And Equalizers (AREA)
  • Coils Or Transformers For Communication (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、この考案の一実施例の斜視図である。 第2図は、第1図に示す実施例の底面図である。 第3図は、第1図の線■−■に沿う切断面端面図である
。 第4図は、第1図に示す実施例の等価回路図である。 第5図は、第1図に示す実施例′に生じる磁束を説明す
るための図である。 第6図は、コンデンサ用導電膜とインダクタンス用導電
膜の好ましい配列例を示す平面図である。 第7図は、この考案の他の実施例を示す平面図である。 第8図および第9図は、第7図に示す実施例の等価回路
図である。 第10図はローパスフィルタの等価回路図である。 第11図および第12図は、共に、従来のローパスフィ
ルタの=例を示す斜視図である。 図において、1は誘電体基板、2はコンデンサ用の導電
膜、8はローパスフィルタ、9,9a,9bt 9ct
9dは透孔、10,10a,10b,Incまインダ
クタンス用導電膜を示す。
FIG. 1 is a perspective view of an embodiment of this invention. FIG. 2 is a bottom view of the embodiment shown in FIG. 1. FIG. 3 is a cross-sectional end view taken along the line ■--■ in FIG. 1. FIG. 4 is an equivalent circuit diagram of the embodiment shown in FIG. 1. FIG. 5 is a diagram for explaining the magnetic flux generated in the embodiment ' shown in FIG. FIG. 6 is a plan view showing a preferred arrangement example of a conductive film for a capacitor and a conductive film for an inductance. FIG. 7 is a plan view showing another embodiment of this invention. 8 and 9 are equivalent circuit diagrams of the embodiment shown in FIG. 7. FIG. 10 is an equivalent circuit diagram of a low-pass filter. 11 and 12 are both perspective views showing examples of conventional low-pass filters. In the figure, 1 is a dielectric substrate, 2 is a conductive film for a capacitor, 8 is a low-pass filter, 9, 9a, 9bt 9ct
9d indicates a through hole, and 10, 10a, 10b, Inc. indicate a conductive film for inductance.

Claims (2)

【実用新案登録請求の範囲】[Scope of utility model registration request] (1)誘電体基板の表面にコンデンサ用の導電膜が形成
され、該コンデンサ用導電膜にインダクタンス素子が接
続されて構成される高周波比回− 路素子において、 前記インダクタンス素子は、前記誘電体基板に透孔が形
成され、該透孔を介して基板の表裏面を巡るインダクタ
ンス用導電膜で形成されていることを特徴とする、高周
波比回路素子。
(1) In a high frequency ratio circuit element configured by forming a conductive film for a capacitor on the surface of a dielectric substrate and connecting an inductance element to the conductive film for the capacitor, the inductance element is formed on the dielectric substrate. 1. A high frequency ratio circuit element, characterized in that a through hole is formed in the substrate, and a conductive film for inductance is formed around the front and back surfaces of a substrate through the through hole.
(2)前記インダクタンス素子は、少な・くとも2個形
成され、隣合う位置に形成されたインダクタンス素子が
相互誘導を起こすように接続されている、実用新案登録
請求の範囲第1項記載の高周波圧回路素子。
(2) The high frequency device according to claim 1 of the utility model registration claim, wherein at least two inductance elements are formed and the inductance elements formed at adjacent positions are connected to cause mutual induction. Pressure circuit element.
JP10035284U 1984-07-02 1984-07-02 High frequency LC circuit element Pending JPS6115721U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10035284U JPS6115721U (en) 1984-07-02 1984-07-02 High frequency LC circuit element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10035284U JPS6115721U (en) 1984-07-02 1984-07-02 High frequency LC circuit element

Publications (1)

Publication Number Publication Date
JPS6115721U true JPS6115721U (en) 1986-01-29

Family

ID=30659813

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10035284U Pending JPS6115721U (en) 1984-07-02 1984-07-02 High frequency LC circuit element

Country Status (1)

Country Link
JP (1) JPS6115721U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000022480A (en) * 1998-06-29 2000-01-21 Taiyo Yuden Co Ltd Laminated filter
WO2006088146A1 (en) * 2005-02-21 2006-08-24 Tokyo Electron Limited Inductance element

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS501364A (en) * 1973-05-10 1975-01-08
JPS5020156B2 (en) * 1972-01-11 1975-07-12

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5020156B2 (en) * 1972-01-11 1975-07-12
JPS501364A (en) * 1973-05-10 1975-01-08

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000022480A (en) * 1998-06-29 2000-01-21 Taiyo Yuden Co Ltd Laminated filter
WO2006088146A1 (en) * 2005-02-21 2006-08-24 Tokyo Electron Limited Inductance element

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