JPS61155428A - Production of polyimide resin - Google Patents

Production of polyimide resin

Info

Publication number
JPS61155428A
JPS61155428A JP28059084A JP28059084A JPS61155428A JP S61155428 A JPS61155428 A JP S61155428A JP 28059084 A JP28059084 A JP 28059084A JP 28059084 A JP28059084 A JP 28059084A JP S61155428 A JPS61155428 A JP S61155428A
Authority
JP
Japan
Prior art keywords
polyimide resin
polyimide
tda
diamine
hours
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28059084A
Other languages
Japanese (ja)
Inventor
Yoshiaki Kimura
木村 芳明
Shoji Maekawa
前川 昌二
Yuji Kawashima
川嶋 右次
Keiun Kodo
黄堂 慶雲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
New Japan Chemical Co Ltd
Original Assignee
New Japan Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by New Japan Chemical Co Ltd filed Critical New Japan Chemical Co Ltd
Priority to JP28059084A priority Critical patent/JPS61155428A/en
Publication of JPS61155428A publication Critical patent/JPS61155428A/en
Pending legal-status Critical Current

Links

Landscapes

  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

Abstract

PURPOSE:To obtain a polyimide of a high MW and good properties reading, by subjecting 3,4-dicarboxy-1,2,3,4-tetrahydro-1-naphthalenesuccinic dianhydride and a prim. diamine to dehydration and imidation by ring closure in a phenolic solvent. CONSTITUTION:3,4-Dicarboxy-1,2,3,4-tetrahydro-1-naphthalenesuccinic dianhydride (TDA) and a prim. diamine are subjected to dehydration and imidation by ring closure in a phenolic solvent. Solvents having an atmospheric b.p. of about 170-300 deg.C and a m.p. <=45 deg.C are preferable, and examples include cresol and 2,4-dimethylphenol. As said prim. diamines, any of aromatic ones (e.g., 4,4'- diaminodiphenylmethane) and aliphatic ones (e.g., ethylenediamine) can be used. TDA and the diamine are used preferably in equimolar amounts.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、ポリイミド樹脂の製造方法に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a method for producing polyimide resin.

[従来の技術] ポリイミド樹脂はその優れた耐熱性から近年とみに注目
をあびているが、一般的には高価なため、まだまだその
使用滲が少ないのが現状である。ポリイミド樹脂の原料
となるテトラカルボン酸もしくはその酸無水物が8価な
中にあって、3.4−ジカルボキシ−1,2,3,4−
テトラヒドロ−1−ナフタレンコハク酎二無水物(以下
、1’ D Aと称する)はスチレンと無水マレイン酸
とからDiels−Alder反応によって比較的容易
に合成でる化合物であり、ポリイミド樹wa原料として
有望である。
[Prior Art] Polyimide resins have been attracting a lot of attention in recent years because of their excellent heat resistance, but because they are generally expensive, their use is still limited. Tetracarboxylic acid or its acid anhydride, which is a raw material for polyimide resin, is octavalent, and 3,4-dicarboxy-1,2,3,4-
Tetrahydro-1-naphthalene succinic anhydride (hereinafter referred to as 1' DA) is a compound that can be synthesized relatively easily from styrene and maleic anhydride through the Diels-Alder reaction, and is a promising raw material for polyimide wood. be.

TDAを用いたポリイミド樹脂の製造方法としては、ジ
メチルホルムアミド、ピリジン、ジメチルアセトアミド
、ジメチルスルホキシド中でポリアミド酸を生成させ、
ポリアミド酸が溶解しない溶媒(例えば水や酢酸エチル
等)中で再沈殿を行ない、その後加熱脱水イミド化を行
なうという方法(特公昭45−37994)がある。
As a method for producing polyimide resin using TDA, polyamic acid is produced in dimethylformamide, pyridine, dimethylacetamide, or dimethyl sulfoxide,
There is a method (Japanese Patent Publication No. 45-37994) in which reprecipitation is performed in a solvent in which polyamic acid does not dissolve (for example, water, ethyl acetate, etc.), followed by thermal dehydration and imidization.

更には、アセトンフェノン、シクロヘキサノン、イソホ
ロン等の溶媒中で加熱脱水と同時に11111イミド化
せしめる方法(米国特許3,501.443号)も提案
されている。
Furthermore, a method (US Pat. No. 3,501,443) has also been proposed in which 11111 is imidized simultaneously with heat dehydration in a solvent such as acetonephenone, cyclohexanone, or isophorone.

前者の方法は、再沈澱を行なう必要があること及び加熱
脱水するときに生成水により、TDAは非対称であるた
め一方のアミド結合が切断されやすり、品分子mのポリ
イミド樹脂が生成しにくい等の欠点をもつ。
The former method requires re-precipitation, and because TDA is asymmetrical, one amide bond is broken due to the water produced during heating and dehydration, making it difficult to form a polyimide resin with the product molecule m. have shortcomings.

侵者は、再沈澱を11なう必要はないが、生成したポリ
イミドの粘度が轟く取扱いが困難であり、また成型品や
フィルムにした場合の強度もあまり大きいものではない
等の欠点を有する。
Although there is no need for reprecipitation, the polyimide produced has a high viscosity and is difficult to handle, and the strength of molded products or films is not very high.

]発明が解決しようとする問題点1 本発明者らは上記問題点に鑑み、へ分子投で、かつ、簡
便で良好な物性を有するポリイミド樹脂の製造方法を開
発すべく説!検討をすすめた中で、フェノール系化合物
を反応媒体とすることにより所期の目的が達成されるこ
とを見い出し、本発明を完成したのである。
] Problem 1 to be Solved by the Invention In view of the above-mentioned problems, the present inventors proposed to develop a method for producing a polyimide resin that is simple, simple, and has good physical properties. After further investigation, they discovered that the intended purpose could be achieved by using a phenolic compound as a reaction medium, and completed the present invention.

即ち、本発明はTDAと1@ジアミンとをフェノール系
溶媒中で脱水閉環イミド化せしめることを′vg徴とす
るポリイミド樹脂の新規な製造方法を提供することを目
的とする。
That is, an object of the present invention is to provide a novel method for producing a polyimide resin, in which the 'vg feature is dehydration and ring-closing imidization of TDA and 1@diamine in a phenolic solvent.

[問題を解決するための手段〕 本発明で用いるフェノール系溶媒は沸点が常圧で170
〜300℃で、融点が45℃以下のものであればいずれ
でもよく、具体的には、クレゾール(0−1m−、D一
体43よびそれらの混合vIJ)、2.4−ジメチルフ
ェノール、りOロフェノール(0−、m−、D一体およ
びそれらの混合物)、ブロムフェノール(0−、m−、
D一体およびそれらの混合物)、りOルヒドロキシトル
エンなどの溶媒の単独又は上記溶媒の混合物が用いられ
る。
[Means for solving the problem] The phenolic solvent used in the present invention has a boiling point of 170 at normal pressure.
~300°C, and any substance with a melting point of 45°C or less may be used. Specifically, cresol (0-1m-, D-143, and a mixture thereof vIJ), 2,4-dimethylphenol, and Bromophenol (0-, m-, D monolithic and mixtures thereof), Bromophenol (0-, m-,
A single solvent such as hydroxytoluene or a mixture of the above-mentioned solvents is used.

また、本発明で用いられる1級ジアミンは芳香族、脂肪
族のいずれでもよく、芳香族としては、4.4′−ジア
ミノジフェニルメタン、4.4′−ジアミノジフェニル
プロパン、4.4′−ジアミノジフェニルエーテル、フ
ェニレンジアミン(m−、C)一体およびそれらの混合
物)、キシリレンジアミン(m−、D一体およびそれら
の混合物)、4.4−−ジアミノジフェニルスルフィド
、4.4′−ジアミノジフェニルスルホン、脂肪族とし
ては、エチレンジアミン、ヘキサメチレンジアミン、ヘ
プタメチレンジアミン、オクタメチレンジアミン、ドデ
カメチレンジアミン、ジ(バラ−アミノシクロヘキシル
)メタンなどの単独又は混合物が用いられるが、これら
により特定されるものではない。
Further, the primary diamine used in the present invention may be either aromatic or aliphatic, and aromatic examples include 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane, and 4,4'-diaminodiphenyl ether. , phenylenediamine (m-, C) and mixtures thereof), xylylenediamine (m-, D and mixtures thereof), 4,4-diaminodiphenylsulfide, 4,4'-diaminodiphenylsulfone, fat Examples of the group include ethylenediamine, hexamethylenediamine, heptamethylenediamine, octamethylenediamine, dodecamethylenediamine, di(varaminocyclohexyl)methane, and the like, used alone or in mixtures, but are not limited to these.

ジアミンとTDAのモル比は等@’1″あることが好ま
しいが、一方が数パーセント過剰でも注意深く反応を行
えば十分に強度のあるポリイミド樹脂を轡ることは可能
である。
The molar ratio of diamine and TDA is preferably equal to 1, but even if one is in excess of a few percent, it is possible to cover a sufficiently strong polyimide resin if the reaction is carried out carefully.

次にポリイミド樹脂の代表的な製造条件について詳述す
る。
Next, typical manufacturing conditions for polyimide resin will be explained in detail.

(1)TDAと1級ジアミンとを15〜45℃好ましく
は20〜25℃の温度下、1〜10時間反応させて、ポ
リアミド酸を生成せしめる。温度が45℃より高いとポ
リアミド酸の分子量が低下しやすく、又、15℃より低
いと系の粘度が上昇し、撹拌が困難となる。
(1) TDA and primary diamine are reacted at a temperature of 15 to 45°C, preferably 20 to 25°C, for 1 to 10 hours to produce polyamic acid. If the temperature is higher than 45°C, the molecular weight of the polyamic acid tends to decrease, and if the temperature is lower than 15°C, the viscosity of the system increases, making stirring difficult.

(2)その後徐々にv4湿して最終的には200℃前侵
の温度で0.5〜10時間脱水閉環イミド化を行ない、
ポリイミド樹脂を生成せしめる。
(2) After that, gradually v4 wet, and finally perform dehydration and ring-closing imidization at a temperature of 200 ° C. for 0.5 to 10 hours,
Generates polyimide resin.

脱水を容易にするためにキシレン等の水と共沸する溶媒
を使用することは好ましい。
It is preferred to use a solvent that is azeotropic with water, such as xylene, to facilitate dehydration.

(3)反応雰囲気は空気下でも可能であるが、最終生成
物である樹脂の着色を抑制するために好ましくは窒素等
の不活性ガストとする。
(3) Although the reaction atmosphere can be air, it is preferably an inert gas such as nitrogen gas in order to suppress coloring of the final product, the resin.

【実施例1 以下に実施例を示し、本発明を詳説する。[Example 1 The present invention will be explained in detail with reference to Examples below.

実施例1 TDA30.03!J (0,1モル)、4.4−−ジ
アミノジフェニルメタン19.839 (0゜1モル)
を150gのクレゾール中で、窒素雰囲気のもと20〜
25℃で2時間かきまぜながら反応させ、その機体々に
昇温し、90℃でキシレン259を加えて200℃まで
2時間かけて昇温し、200℃でさらに2時間反応させ
た。この間、留出する水およびキシレンはコンデンサー
を通して28gが回収された。このようにして定彊的に
得られたポリイミドVAIllWI液をガラス板上に塗
布し、100℃、10gm+HGで1時間、さらに20
0℃、10gmHQで1時間の条件下でクレゾールを除
去せしめて膜厚50μmのポリイミドフィルムを得た。
Example 1 TDA30.03! J (0.1 mol), 4.4-diaminodiphenylmethane 19.839 (0°1 mol)
in 150 g of cresol under nitrogen atmosphere for 20~
The reaction was carried out at 25°C for 2 hours with stirring, the temperature of each body was raised, xylene 259 was added at 90°C, the temperature was raised to 200°C over 2 hours, and the reaction was further carried out at 200°C for 2 hours. During this period, 28 g of distilled water and xylene were collected through a condenser. The polyimide VAIllWI solution thus obtained was coated onto a glass plate, heated at 100°C and 10gm+HG for 1 hour, and then heated for 20 hours.
The cresol was removed under conditions of 0° C. and 10 gmHQ for 1 hour to obtain a polyimide film with a thickness of 50 μm.

実施例2 TDA30.03g(0,1モル)、4.4”−ジアミ
ノジフェニルエーテル20.03g(0゜1モル)を1
50gの0−クロロワ1ノール中で、窒素雰囲気下のも
と20〜25℃r2時間かきまぜながら反応させ、その
後徐々に昇温し、90℃でキシレン25gを加えて17
5℃まで2時間かけて昇温し、175℃でさらに2時間
反応させた。
Example 2 30.03 g (0.1 mol) of TDA, 20.03 g (0.1 mol) of 4.4"-diaminodiphenyl ether
The reaction was carried out in 50 g of 0-chlorine 1-nor under a nitrogen atmosphere at 20-25°C with stirring for 2 hours, and then the temperature was gradually raised, and 25 g of xylene was added at 90°C.
The temperature was raised to 5°C over 2 hours, and the reaction was continued at 175°C for an additional 2 hours.

この間、留出する水およびキシレンはコンデンサーを通
して289が回収された。このようにして定量的に得ら
れたポリイミド樹脂溶液をガラス板上に塗布し、80℃
、10asHQで1時間、さらに200℃、10履HQ
で1時間の条件下ぐ0−クロロフェノールを除去せしめ
て膜厚50uTrLのポリイミドフィルムを得た。
During this period, water and xylene distilled out passed through a condenser and 289 ml of the water was recovered. The polyimide resin solution quantitatively obtained in this way was applied onto a glass plate and heated to 80°C.
, 1 hour at 10 as HQ, then 200℃, 10 shoes HQ
The 0-chlorophenol was removed under the following conditions for 1 hour to obtain a polyimide film with a thickness of 50 uTrL.

実施例3 実施例1で作成したポリイミド樹脂溶液をガラス板に塗
布し、80℃、常圧下で3時間、100℃、常圧下で3
時間、100℃、10履H1lで1時間、200℃、−
10awHOで1時間の条件下でクレゾールを除去せし
めて膜厚1厘のポリイミドフィルムを得た。
Example 3 The polyimide resin solution prepared in Example 1 was applied to a glass plate and heated at 80°C and normal pressure for 3 hours, and at 100°C and normal pressure for 3 hours.
Time, 100℃, 1 hour with 10 shoes, 1 liter, 200℃, -
The cresol was removed under 10 aw HO for 1 hour to obtain a polyimide film with a thickness of 1 liter.

比較例1 79.2g(0,4モル)の4.4−−ジアミノジフェ
ニルメタンを470gのピリジンに溶解させ、1209
のTDA (0,4モル)を4時間にわたって添加する
反応の量温度を35℃以下に保つ。
Comparative Example 1 79.2 g (0.4 mol) of 4,4-diaminodiphenylmethane was dissolved in 470 g of pyridine, and 1209
of TDA (0.4 mol) is added over a period of 4 hours, keeping the reaction temperature below 35°C.

粘稠な溶液が生成するので、これを189gのピリジン
で希釈する。生成したポリアミド酸は酢酸エチル中に沈
澱し、濾過して回収し、真空中200℃に加熱してポリ
イミドに転化しせしめた。
A viscous solution forms and is diluted with 189 g of pyridine. The polyamic acid produced was precipitated in ethyl acetate, collected by filtration, and converted to polyimide by heating to 200° C. in vacuo.

さらに300℃、100Kg/−の条件トで加圧成形し
、厚ざ1jwIのポリイミド樹脂板を得た。
Further, pressure molding was performed at 300° C. and 100 kg/− to obtain a polyimide resin plate with a thickness of 1 jwI.

比較例2 15.62SF (0,52モル)のTDA、4゜4′
−ジアミノジフェニルメタン14.109(0,52モ
ル)を7セトフエノン中で165℃以下の温度で2時間
かきまぜた。この間留出する水はコンデンサーを通して
3.6gが回収された。
Comparative Example 2 15.62 SF (0.52 mol) of TDA, 4°4'
14.109 (0.52 mol) of -diaminodiphenylmethane were stirred in 7cetophenone at a temperature below 165°C for 2 hours. During this period, 3.6 g of water distilled out was collected through a condenser.

このようにして得られたポリイミド樹脂溶液をガラス板
上に塗布し、100℃、10履HQで1時間、さらに2
00℃、10#lHQで1時間なる条件でアセトフェノ
ンを除去せしめてポリイミドフィルムを得た。
The polyimide resin solution thus obtained was applied onto a glass plate, heated at 100°C for 1 hour at 10 feet of HQ, and then heated for 2 hours.
Acetophenone was removed under the conditions of 00° C. and 10#lHQ for 1 hour to obtain a polyimide film.

実施例1.2.3、比較例1.2で得られたポリイミド
フィルム及びポリイミドm1lilliiの物性値を表
1に示す。
Table 1 shows the physical property values of the polyimide films and polyimide mlillii obtained in Example 1.2.3 and Comparative Example 1.2.

イミド転化率は、赤外吸収スペクトルのイミド基の吸収
に基づ<1770cm−’の吸光度とアミドM%の吸収
に基づ<1720cm−’の吸光度との比から求める。
The imide conversion rate is determined from the ratio of the absorbance at <1770 cm-' based on the absorption of imide groups in the infrared absorption spectrum and the absorbance at <1720 cm-' based on the absorption of amide M%.

分子量は、ゲルパーミェーションクロマトグラフィーに
よるポリスチレン換算の数平均分子量で表わす。
The molecular weight is expressed as a polystyrene-equivalent number average molecular weight determined by gel permeation chromatography.

[発明の効1] 以上の如く、フェノール系溶媒を用いて作成したポリイ
ミド樹脂は、イミド転化率が高く、8分子量であり、常
温、高温の区別なく引張強度の点からも優れていること
が明らかである。
[Effect of the invention 1] As described above, the polyimide resin prepared using a phenolic solvent has a high imide conversion rate, has a molecular weight of 8, and is excellent in terms of tensile strength regardless of whether it is at room temperature or high temperature. it is obvious.

Claims (1)

【特許請求の範囲】[Claims] 3,4−ジカルボキシ−1,2,3,4−テトラヒドロ
−1−ナフタレンコハク酸二無水物と1級ジアミンとを
フェノール系溶媒中で脱水閉環イミド化せしめることを
特徴とするポリイミド樹脂の製造方法。
Production of a polyimide resin characterized by dehydrating and ring-closing imidation of 3,4-dicarboxy-1,2,3,4-tetrahydro-1-naphthalenesuccinic dianhydride and a primary diamine in a phenolic solvent. Method.
JP28059084A 1984-12-27 1984-12-27 Production of polyimide resin Pending JPS61155428A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28059084A JPS61155428A (en) 1984-12-27 1984-12-27 Production of polyimide resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28059084A JPS61155428A (en) 1984-12-27 1984-12-27 Production of polyimide resin

Publications (1)

Publication Number Publication Date
JPS61155428A true JPS61155428A (en) 1986-07-15

Family

ID=17627145

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28059084A Pending JPS61155428A (en) 1984-12-27 1984-12-27 Production of polyimide resin

Country Status (1)

Country Link
JP (1) JPS61155428A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63264631A (en) * 1986-12-26 1988-11-01 Sumitomo Chem Co Ltd Thermosetting imide compound

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63264631A (en) * 1986-12-26 1988-11-01 Sumitomo Chem Co Ltd Thermosetting imide compound

Similar Documents

Publication Publication Date Title
US4271288A (en) Novel polyamic acid polymers and polyimide derivatives thereof
US4075171A (en) Process for preparing aromatic polyimides and some polyimides prepared thereby
US4405770A (en) Novel polyimides, and polyamic acid and ester intermediates thereof
JPH0365214A (en) Gas separation method and membrane used therein
US5493002A (en) Aryl ethynyl phthalic anhydrides and polymers with terminal or pendant amines prepared with aryl ethynyl phthalic anhydrides
WO1998029471A1 (en) Soluble polyimide resin, process for preparing the same, and polyimide resin solution composition
JPH04325523A (en) Manufacture of siloxane-modified polyimide resin
JP4968540B2 (en) Soluble end-modified imide oligomer and varnish and cured product thereof
JPS61271286A (en) Polyimide oligomer, precursor polyamic acid oligomer thereof, and heat-resistant adhesive composed of said oligomer
JP2006312699A (en) Soluble terminal-modified imide oligomer and varnish and cured product thereof
EP0336536B1 (en) Organic-solvent soluble polyimide and production thereof
US5977289A (en) Colorless organic-soluble aromatic poly(ether-imide)s, the organic solutions and preparation thereof
JP2973516B2 (en) Manufacturing method of aromatic polyimide film
JPS61155428A (en) Production of polyimide resin
JPS59199720A (en) Preparation of soluble polyimide compound
US4506100A (en) Aromatic diamines
JPH03207717A (en) Polyamide imide resin
JP3027383B2 (en) Colorless organic soluble aromatic poly (etherimide), its organic solution, and its preparation
JP2651219B2 (en) Method for producing curable resin containing imide ring
JP2883769B2 (en) Polyimide copolymer and method for producing the same
SU370219A1 (en) METHOD OF OBTAINING POLYAMIDOIMIDES
JPH0411631A (en) Polyimide resin
JPS5953287B2 (en) Manufacturing method of polyimide precursor
RU2072370C1 (en) Polyimide and copolyimides intended for production of polyimide materials having improved hydrolytic resistance
JP2867037B2 (en) Polyamide imide resin