JPS6115420B2 - - Google Patents

Info

Publication number
JPS6115420B2
JPS6115420B2 JP53071113A JP7111378A JPS6115420B2 JP S6115420 B2 JPS6115420 B2 JP S6115420B2 JP 53071113 A JP53071113 A JP 53071113A JP 7111378 A JP7111378 A JP 7111378A JP S6115420 B2 JPS6115420 B2 JP S6115420B2
Authority
JP
Japan
Prior art keywords
silver
layer
image
silver halide
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53071113A
Other languages
English (en)
Japanese (ja)
Other versions
JPS54162546A (en
Inventor
Masamichi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP7111378A priority Critical patent/JPS54162546A/ja
Publication of JPS54162546A publication Critical patent/JPS54162546A/ja
Publication of JPS6115420B2 publication Critical patent/JPS6115420B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Drying Of Semiconductors (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
JP7111378A 1978-06-13 1978-06-13 Image formation method Granted JPS54162546A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7111378A JPS54162546A (en) 1978-06-13 1978-06-13 Image formation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7111378A JPS54162546A (en) 1978-06-13 1978-06-13 Image formation method

Publications (2)

Publication Number Publication Date
JPS54162546A JPS54162546A (en) 1979-12-24
JPS6115420B2 true JPS6115420B2 (enrdf_load_stackoverflow) 1986-04-24

Family

ID=13451170

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7111378A Granted JPS54162546A (en) 1978-06-13 1978-06-13 Image formation method

Country Status (1)

Country Link
JP (1) JPS54162546A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5731197A (en) * 1980-07-31 1982-02-19 Sharp Kk Method of producing multilayer circuit board
JPS5750304A (en) * 1980-09-08 1982-03-24 Toppan Printing Co Ltd Production of information recording carrier
KR20030015604A (ko) * 2001-08-16 2003-02-25 씨엘디 주식회사 유기 전계 발광소자 제조 방법

Also Published As

Publication number Publication date
JPS54162546A (en) 1979-12-24

Similar Documents

Publication Publication Date Title
US3960560A (en) Method for producing a photomask
JPS6249614B2 (enrdf_load_stackoverflow)
US3567447A (en) Process for making masks photographically
US3966473A (en) Method for producing a photomask
JPS6113576B2 (enrdf_load_stackoverflow)
GB1570081A (en) Image formation process using silver halide element
US3639125A (en) Process for producing photographic relief patterns
US4336316A (en) Image forming method
DE2739947A1 (de) Verfahren zur herstellung von masken- oder abdeckbildern
US4110114A (en) Image forming method
US3892571A (en) Photomasks
US4362807A (en) Photomask-forming photographic material and method for producing photomask using same
US4284713A (en) Image forming method
JPS6115420B2 (enrdf_load_stackoverflow)
GB1565825A (en) Process for forming positive images
US4207105A (en) Plasma-etching image in exposed AgX emulsion
JPS55137528A (en) Negative image forming method
US4168168A (en) Method of making durable photomasks with metal ion diffusion
US4108661A (en) Lippmann-emulsions and reversal processing thereof
US3716363A (en) Method of making photomasks of the type used in the fabrication of microelectronic circuits
US3222175A (en) Process for forming metallic nonsilver images
JPS6113577B2 (enrdf_load_stackoverflow)
JPH0290170A (ja) パターン形成方法
US3547635A (en) Vacuum deposited light-sensitive titanium dioxide
JPS6335014B2 (enrdf_load_stackoverflow)