JPS61153934A - Variable focus x-ray tube - Google Patents

Variable focus x-ray tube

Info

Publication number
JPS61153934A
JPS61153934A JP59273634A JP27363484A JPS61153934A JP S61153934 A JPS61153934 A JP S61153934A JP 59273634 A JP59273634 A JP 59273634A JP 27363484 A JP27363484 A JP 27363484A JP S61153934 A JPS61153934 A JP S61153934A
Authority
JP
Japan
Prior art keywords
cathode
focusing electrode
ray
focusing
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59273634A
Other languages
Japanese (ja)
Inventor
Hiroshi Takahashi
宏 高橋
Norio Harao
原尾 紀男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP59273634A priority Critical patent/JPS61153934A/en
Publication of JPS61153934A publication Critical patent/JPS61153934A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/04Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/06Cathodes
    • H01J35/066Details of electron optical components, e.g. cathode cups
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/14Arrangements for concentrating, focusing, or directing the cathode ray
    • H01J35/153Spot position control

Abstract

PURPOSE:To move the focus ion an anode target by required amount with low deflection voltage by arranging a pair of electrostatic deflection electrodes at the inside of the focus groove of a focusing electrode forming a cathode structure while isolating electrically from the focusing electrode. CONSTITUTION:A rotary anode 21 supported on a rotor 33 and a cathode ray structure 35 for producing an electron beam held an a cathode support 34 are contained in a vacuum container 29 while facing each other to constitute a rotary anode X-ray tube. Here, the cathode structure 35 is formed by arranging a thin board filament cathode 42 for emitting electrons in a recess in the bottom of a focus groove 40 made in a focusing electrode 39 while arranging a pair of electrostatic deflection electrodes 44 made of metal plate in a recess 43 near the cathode 42 while insulating from the deflection electrode 39 through an insulation board 45. since it is deflected in such region where the acceleration filed of electron beam is relatively low, the focus on the anode target 37 can be moved effectively with low deflection voltage.

Description

【発明の詳細な説明】 (発明の技術分野) この発明は例えば医療診断用X1lii影装置に使用し
て好適なX線焦点位置可変形X線管の改良に関する。
DETAILED DESCRIPTION OF THE INVENTION (Technical Field of the Invention) The present invention relates to an improvement in an X-ray tube with a variable focal position suitable for use in, for example, an X1lii imaging device for medical diagnosis.

〔発明の技術的背景及び問題点〕[Technical background and problems of the invention]

今日実用になっているxi*m影装置によるX線撮影に
おいては、被写体内から発生する散乱X線により再生画
像の分解能やコントラストが損われる場合が少なくない
。一方近来、高速、短時間の撮影が可能な装置の開発が
強く望まれており、この場合はとくに放射XII量を増
す必要があるが、一般的にはそれに伴なって散乱X線が
増加し、画像のS/N比が低下してしまう。
In X-ray photography using the xi*m shadow device that is in practical use today, the resolution and contrast of reproduced images are often impaired by scattered X-rays generated from within the subject. On the other hand, in recent years, there has been a strong desire to develop a device that can take images at high speed and in a short time.In this case, it is necessary to increase the amount of XII radiation, but in general, the amount of scattered X-rays increases accordingly. , the S/N ratio of the image decreases.

放射X線量を増大するため例えば円筒状の回転陽極ター
ゲットを使用し、これに陰極構体から発生される電子ビ
ームをN磁偏向装置により所定距離偏向させることが考
えられている。しかしながらこれは構造が複雑で、また
大型化し、実用性に乏しい不都合がある。一方、特開昭
53−7190号公報に開示されるようにX線発生器を
実質的に線状又は面状の陽極ターゲットに電子ビームを
偏向走査してX線焦点を移動するように構成し、このX
線発生器と被写体との間にピンホール又はX線透過用ス
リットをもつX線遮蔽板を配置しその後方にxsii像
検出器を置いてX線像を再生するXm撮影装置も提案さ
れている。しかしなお同公報に開示されている装置のX
線発生器では、必要充分なXIImを得ることが困難で
ありやはり実用には種々の問題点がある。
In order to increase the amount of emitted X-rays, it has been considered to use, for example, a cylindrical rotating anode target and to deflect the electron beam generated from the cathode assembly a predetermined distance by an N magnetic deflection device. However, this has the disadvantage of being complicated in structure and large in size, and lacking in practicality. On the other hand, as disclosed in Japanese Unexamined Patent Publication No. 53-7190, an X-ray generator is configured to deflect and scan an electron beam on a substantially linear or planar anode target to move the X-ray focal point. , this X
An Xm imaging device has also been proposed in which an X-ray shielding plate with a pinhole or an X-ray transmission slit is placed between the ray generator and the subject, and an XSII image detector is placed behind it to reproduce the X-ray image. . However, the device disclosed in the same publication still has
With a line generator, it is difficult to obtain the necessary and sufficient XIIm, and there are various problems in practical use.

〔発明の目的〕[Purpose of the invention]

この発明は以上のような問題点を解決し、比較的簡単な
構造で実用性の高いX線焦点可変形X線管を提供するも
のである。
The present invention solves the above-mentioned problems and provides a variable focus X-ray tube that has a relatively simple structure and is highly practical.

〔発明の概要〕[Summary of the invention]

この発明は、陰極構体の一部を構成する集束電極の集束
溝の内側に、ビーム偏向用の一対の静電偏向Nliをこ
の集束電極から電気的に絶縁して配設してなることを特
徴とする焦点位置可変形X5il管である。
This invention is characterized in that a pair of electrostatic deflectors Nli for beam deflection are arranged inside a focusing groove of a focusing electrode constituting a part of the cathode structure, electrically insulated from the focusing electrode. This is a variable focal position X5il tube.

これによって電子ビームの加速電界が比較的低い領域で
静電偏向するので、小さい偏向電圧で陽極ターゲット上
の焦点を必要量移動させることができる。そしてとくに
従来から実用になっている通常形式の回転陽極型X線管
とほとんど変らない形状として製作しつる利点がある。
As a result, the electron beam is electrostatically deflected in a region where the accelerating electric field is relatively low, so that the focal point on the anode target can be moved by the required amount with a small deflection voltage. In particular, it has the advantage of being manufactured in a shape that is almost the same as the normal type of rotating anode X-ray tube that has been in practical use for some time.

〔発明の実施例〕[Embodiments of the invention]

以下、この発明の詳細な説明する。なお同一部分は同一
符号であられす。
The present invention will be explained in detail below. Identical parts are designated by the same reference numerals.

まずこの発明のX線管を使用が好適なXm撮影装置の例
を第1図により説明する。すなわち本発明の回転陽極(
21)をもつX線管を内蔵したXWA発生器(22)と
、これから所定間隔を置いて配設され互いに平行に複数
個の細長いX線透過用スリット(23)をもつコリメー
タすなわちスリット板(24)と、被写体(25)の後
方に配設されたX線像検出器(26)と、このX線像検
出器(26)で得られる電気信号を処理するとともに表
示装置(27)もしくは図示しない記録装置に再生画像
の信号を送る信号処理装置(28)とを備えている。X
線発生器(22)は、後述するように真空容器内に傘状
の回転陽極ターゲットが設けられ駆動モータにより回転
可能になっており、これに相対向して設けられた陰極構
体から発生される電子ビームが射突しX線ビームが発生
される。X11A焦点(F)は、ターゲット上を矢印(
3)の如く移動させられ、このX線焦点(F)からのx
laビームをX線遮蔽材からなるスリット板(24)の
各スリット(23)を通し、その後方に生じる複数の扇
状X線ビームを被写体く25)に照射するようになされ
ている。
First, an example of an Xm imaging apparatus suitable for using the X-ray tube of the present invention will be explained with reference to FIG. That is, the rotating anode of the present invention (
an XWA generator (22) having a built-in X-ray tube with an ), an X-ray image detector (26) disposed behind the subject (25), and a display device (27) or a display device (not shown) that processes electrical signals obtained by the X-ray image detector (26). It also includes a signal processing device (28) that sends a reproduced image signal to the recording device. X
As will be described later, the ray generator (22) has an umbrella-shaped rotating anode target provided in a vacuum container and is rotatable by a drive motor, and the rays are generated from a cathode structure provided opposite to the umbrella-shaped rotating anode target. The electron beam collides and an X-ray beam is generated. The X11A focus (F) points on the target with an arrow (
3), and the x from this X-ray focus (F)
The LA beam is passed through each slit (23) of a slit plate (24) made of an X-ray shielding material, and a plurality of fan-shaped X-ray beams generated behind the slit plate (24) are irradiated onto the subject (25).

そして偏向走査される電子ビームにより定まるX線焦点
(F)の位置の情報を常に信号処理装置(28)に電気
信号で与えるようになっている。スリット板(24)は
、鉛のような重金属の薄板でつくられ、11数個の細長
いスリット(23)が形成され、その長手方向はxII
焦点(F)の移動方向(S)と直交する方向に配置され
ている。なおスリット(23)にアルミニウム<AI 
>やベリリウム(Be )のようなX線透過率の高い金
属を充填した構造にしてもよい。Xls像検出器(26
)は、被写体の撮影部位を充分カバーできる大きさのX
線シンチレータをもち、同図に符号(A>で示すように
各スリット(23)を通過した各瞬間ごとのX線ビーム
によるX線像を受け、このXll像に対応する電気信号
を得る。X線像検出器(2G)としては、例えばX線蛍
光増倍管(Xll)と光導層形撮像ターゲットをもつ撮
像管とを組み合わせた構成や、あるいは多数の微小X線
検出素子を配列した平板状シンチレータなどを採用しつ
る。各部の寸法例を示すと、X[1発生器のX線焦点(
F)の短径が0.41、長径が2.5mmの楕円形で、
スリット板方向からみた実効X線焦点(F)は略0,4
Iの円形となるように電子ビームを陽極ターゲット上に
斜めに当てられる。そして焦点(F)の移動距離は5m
lこの焦点位置からスリット板(24)までの距離は1
m(r*)である。スリット板(24)は厚さ2++1
R1の鉛板を使用し、各スリット(23)はそのスリッ
ト幅が0.2mm、ピッチ間隔が21111で互いに平
行に100個形成されている。このスリット板からX線
像検出装置F(26)のX線検出面までの距離は同じ<
1+l1(F=)である。X線検出面は一辺の長さが約
50cmの正方形である。そして検出装置に近い方の領
域に被写体(25)が置かれるように構成されている。
Information on the position of the X-ray focal point (F) determined by the deflected and scanned electron beam is always supplied to the signal processing device (28) as an electrical signal. The slit plate (24) is made of a thin plate of heavy metal such as lead, and has eleven or more elongated slits (23) formed in it, the longitudinal direction of which is xII.
It is arranged in a direction perpendicular to the moving direction (S) of the focal point (F). Note that the slit (23) has aluminum<AI
The structure may be filled with a metal having high X-ray transmittance such as beryllium (Be) or beryllium (Be). Xls image detector (26
) is large enough to cover the area to be photographed of the subject.
It has a ray scintillator, receives an X-ray image by the X-ray beam at each instant of passing through each slit (23) as shown by the symbol (A> in the figure), and obtains an electrical signal corresponding to this Xll image.X The ray image detector (2G) may be, for example, a combination of an X-ray fluorescence intensifier tube (Xll) and an image pickup tube with a light guide layer-type imaging target, or a flat plate-like detector in which a large number of minute X-ray detection elements are arranged. A scintillator, etc. is used.An example of the dimensions of each part is the X-ray focus of the X[1 generator (
F) has an elliptical shape with a minor axis of 0.41 and a major axis of 2.5 mm,
The effective X-ray focal point (F) seen from the slit plate direction is approximately 0.4
The electron beam is applied obliquely onto the anode target so as to form a circular shape of I. And the moving distance of the focal point (F) is 5m
lThe distance from this focal position to the slit plate (24) is 1
m(r*). The slit plate (24) has a thickness of 2++1
An R1 lead plate is used, and 100 slits (23) are formed parallel to each other with a slit width of 0.2 mm and a pitch interval of 21111. The distance from this slit plate to the X-ray detection surface of X-ray image detection device F (26) is the same <
1+l1(F=). The X-ray detection surface is a square with a side length of approximately 50 cm. The object (25) is placed in an area closer to the detection device.

さて、次に第2図乃至第5図により本発明の詳細な説明
する。真空容器(29)は径大な金属容器(30)の両
端部が径小にされてガラス容器(31)、(32)が気
密接合されてなる。この真空容器内に、一方からロータ
(33)に支持された回転陽極(21)が突設され、他
方から陰極支持体(34)に保持された電子ビーム(e
)発生用の陰極構体く坦)が管軸から偏心して突設され
てなる。回転陽極(21)は、グラフフィトブロック(
36)の上に重金属からなる陽極ターゲット(37)が
設けられてなる。そしてX線放射窓(38)からX線が
矢印(X)の方向に放射されるようになっている。
Next, the present invention will be explained in detail with reference to FIGS. 2 to 5. The vacuum container (29) is formed by making both ends of a large-diameter metal container (30) smaller in diameter, and glass containers (31) and (32) hermetically sealed together. In this vacuum vessel, a rotating anode (21) supported by a rotor (33) is protruded from one side, and an electron beam (e) held by a cathode support (34) is protruded from the other side.
) A cathode structure for generation (knot) is provided eccentrically and protruding from the tube axis. The rotating anode (21) is made of graphite block (
An anode target (37) made of heavy metal is provided on top of the target (36). Then, X-rays are emitted from the X-ray emission window (38) in the direction of the arrow (X).

陰極構体(劾−)は、集束電極(39)に穿設された集
束溝(40)の底凹部(41)に、薄板状の電子放出用
フィラメント陰極(42)が配設されてなる。
The cathode structure includes a thin plate-shaped electron-emitting filament cathode (42) disposed in a bottom recess (41) of a focusing groove (40) formed in a focusing electrode (39).

集束溝(40)のフィラメント陰極位置の近傍に、四部
(43) 、(43)が形成されており、これら凹部に
金属板からなる一対の静電偏向電極(44)、(44)
が、集束電極(39)から電気的に絶縁して配設されて
いる。偏向電極(44)、(44)は、フィラメント陰
極(42)の長手方向に沿って長く延長され電子ビーム
路に面して配置されており、そして絶縁体(45)によ
りリード(46)が引出されている。
Four parts (43) and (43) are formed near the filament cathode position of the focusing groove (40), and a pair of electrostatic deflection electrodes (44) and (44) made of metal plates are formed in these recessed parts.
is arranged electrically insulated from the focusing electrode (39). The deflection electrodes (44), (44) extend long along the longitudinal direction of the filament cathode (42) and are disposed facing the electron beam path, and the lead (46) is drawn out by an insulator (45). has been done.

このX線管の動作においては、静′!qi偏向電極に集
束電極とほぼ同じ平均電位を与えるとともに、フィラメ
ント陰極から発生される断面が細長い帯状の電子ビーム
をその長手方向に垂直な方向に偏向するための偏向電圧
を印加する。これにより電子ビーム焦点は、陽極ターゲ
ット上で矢印(S)で示すようにほぼ焦点軌道(47)
に沿って所定距離移動さVられる。
In the operation of this X-ray tube, it is silent! Approximately the same average potential as that of the focusing electrode is applied to the qi deflection electrode, and a deflection voltage is applied to deflect the electron beam, which has an elongated cross section and a strip shape, generated from the filament cathode in a direction perpendicular to its longitudinal direction. As a result, the electron beam focus is approximately on the focal trajectory (47) as shown by the arrow (S) on the anode target.
is moved a predetermined distance along V.

そしてとくに偏向!ffiが集束溝の内側のフィラメン
ト陰極寄りに配置されているので、それによりi極少−
ゲットからの電子ビーム加速電界が比較的低い領域でビ
ームに偏向力が与えられ比較的低い偏向電圧で所定距m
s向移動させうる。たとえば、陰極−電極間のビーム加
速電圧が100kV、集束電極の上面から陽極ターゲッ
トまでの距離が12mm、フィラメント陰極と集束電極
とが同一の電位で動作させられる場合、フィラメント陰
極から0.51の位置に偏向電極の下端を位置させ、両
偏向電極の間隔を101!lIとし、ビーム路に沿う偏
向電極の幅を3nv 、集束溝の深さを1101I1に
すれば、一対の偏向電極間に印加する偏向電圧は19k
V程度でターゲット上のビーム焦点を片側に2.511
111偏向移動させることができる。しかも偏向電極の
平均電位を集束電極と同一電位にすることにより電子ビ
ームの集束作用にはほとんど悪影響を及ぼさない。
And especially deflection! Since ffi is placed close to the filament cathode inside the focusing groove, it minimizes i.
A deflection force is applied to the beam in a region where the electric field for accelerating the electron beam from the target is relatively low, and a predetermined distance m is applied to the beam with a relatively low deflection voltage.
It can be moved in the s direction. For example, if the cathode-electrode beam acceleration voltage is 100 kV, the distance from the top surface of the focusing electrode to the anode target is 12 mm, and the filament cathode and focusing electrode are operated at the same potential, then the position 0.51 from the filament cathode Position the lower end of the deflection electrode at , and set the distance between both deflection electrodes to 101! lI, the width of the deflection electrode along the beam path is 3nv, and the depth of the focusing groove is 1101I1, then the deflection voltage applied between the pair of deflection electrodes is 19k.
The beam focus on the target is 2.511 to one side at about V
111 deflection movement. Moreover, by making the average potential of the deflection electrode the same as that of the focusing electrode, there is almost no adverse effect on the focusing action of the electron beam.

第6図および第7図に示す実施例は、陰極構体(政)と
して、その集束溝(40)をテーバ状に形成するととも
にその一部に形成した凹部(43)に、セラミック絶縁
板(51)の−面側に被着した金属膜からなる一対の偏
向電極(44)を相対面させて配置したものである。絶
縁板(51)は、周辺部に形成した接着剤層(52)に
より集束電極(39)に接着して支持させている。そし
てリード(46)を絶縁板(51)を貫通させ外部に引
出している。
In the embodiment shown in FIGS. 6 and 7, the focusing groove (40) is formed in a tapered shape as a cathode structure (body), and a ceramic insulating plate (51 ) A pair of deflection electrodes (44) made of a metal film deposited on the negative side of the deflection electrode (44) are arranged so as to face each other. The insulating plate (51) is adhered to and supported by the focusing electrode (39) by an adhesive layer (52) formed around the periphery. Then, the lead (46) is passed through the insulating plate (51) and drawn out to the outside.

この実施例のX線管も前述の実施例と同様の作用効果を
奏するとともに、とくに偏向電極を絶縁板に被着した金
属膜で構成しているので、組立てが容易でる。
The X-ray tube of this embodiment also has the same functions and effects as those of the previous embodiment, and is particularly easy to assemble because the deflection electrode is made of a metal film adhered to an insulating plate.

なお絶縁板(51)は、第8図に示すように偏向電極(
44)と接着剤層(52)との間の沿面距離を増加して
その間の耐電圧を高めるように、波状部(53)、(5
3)を一体形成してもよい、。
Note that the insulating plate (51) has a deflection electrode (
44) and the adhesive layer (52) to increase the withstand voltage therebetween.
3) may be formed integrally.

第9図に示す実施例は、陰極構体(政)として、その集
束電極(39)をプレス加工によりカップ状に成形し、
そのテーバ状集束溝(40)の底部に形成した凹部(4
3)に一対の偏向電極(44)、(44)を絶縁して配
置したものである。そしてこの集束電極の底部には、両
偏向電極の間隔よりも狭い寸法のビーム透過孔(54)
を形成しである。さらにこの底部には、集束溝底凹部(
41)にフィラメント陰極(42)を配置した集束電極
補助ブロック(39a)を接合しである。
In the embodiment shown in FIG. 9, the focusing electrode (39) is formed into a cup shape by press working as the cathode structure (body).
A recess (4) formed at the bottom of the tapered focusing groove (40)
3), a pair of deflection electrodes (44), (44) are arranged in an insulated manner. At the bottom of this focusing electrode, there is a beam transmission hole (54) with dimensions narrower than the distance between both deflection electrodes.
It is formed. Furthermore, this bottom has a focusing groove bottom recess (
A focusing electrode auxiliary block (39a) on which a filament cathode (42) is arranged is bonded to 41).

これによって集束電極内の底口部(41)を含む集束溝
領域は、フィラメント陰極配置領域と偏向電極配置領域
とが実質的に区切られるので、ビーム集束作用が一層改
善される。
As a result, in the focusing groove region including the bottom opening (41) in the focusing electrode, the filament cathode arrangement region and the deflection electrode arrangement region are substantially separated, so that the beam focusing effect is further improved.

第10図に示す実施例は、陰極構体(辻)として、その
コイル状に巻いたフィラメント陰極(42)を使用した
ものである。また集束溝(40)を階段的に拡大したも
のである。
The embodiment shown in FIG. 10 uses a coiled filament cathode (42) as the cathode assembly (crosspiece). Moreover, the focusing groove (40) is enlarged in a stepwise manner.

第11図に示す実施例は、ターゲラ1−上の焦点(F)
がX線放射方向に沿って矢印(S)の如く偏向移動させ
るようにしたものである。これはフィラメント陰極、集
束溝および偏向電極の長手方向をターゲットの回転の接
線方向にほぼ沿って配置すればよい。この場合、X線放
射方向からみたX線焦点は細長い線状となるので、これ
を第1図に示すスリット板のスリット長手方向と平行に
なるように配置して使用する。 なお静電偏向電極の平
均電位は、集束電極の電位と同一電位にすることに限ら
ず、集束電極電位に近い電位であれば異なる平均電位を
与えて動作させることもできる。
The embodiment shown in FIG.
is deflected and moved along the X-ray emission direction as shown by the arrow (S). This can be done by arranging the filament cathode, focusing groove, and deflection electrode in a longitudinal direction substantially along the tangential direction of rotation of the target. In this case, since the X-ray focal point viewed from the X-ray emission direction is in the form of an elongated line, it is used by arranging it parallel to the longitudinal direction of the slits of the slit plate shown in FIG. Note that the average potential of the electrostatic deflection electrode is not limited to being the same as the potential of the focusing electrode, but a different average potential may be applied as long as it is close to the focusing electrode potential.

また陰極に対する集束電極の電位も、同一電位とするこ
とに限らず、陰極に対し集束電極をマイナス電位にして
も、あるいはプラス電位にして動作させることもできる
Further, the potential of the focusing electrode with respect to the cathode is not limited to the same potential, and the focusing electrode may be operated with a negative potential or a positive potential with respect to the cathode.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明は、陰極構体の一部を構成す
る集束電極の集束溝の内側に、ビーム偏向用の一対の静
電偏向電極をこの集束電極から電気的に絶縁して配設し
てなることを特徴とする焦点位置可変形xm管である。
As explained above, in the present invention, a pair of electrostatic deflection electrodes for beam deflection are arranged inside the focusing groove of the focusing electrode constituting a part of the cathode structure so as to be electrically insulated from the focusing electrode. This is a variable focal position XM tube characterized by the following characteristics.

そして偏向電極が集束溝の内側のフィラメント陰極帯り
に配置されているので;陽極ターゲットからの電子ビー
ム加速電界が比較的低い領域でビームに偏向力が与えら
れ比較的低い偏向電圧でターゲット上のビーム焦点を所
定距離偏向移動させうる。しかも偏向電極の平均電位を
集束電極と同−又はそれに近い電位にすることにより電
子ビームの集束作用にはほとんど悪影響を及ぼさない。
And since the deflection electrode is placed on the filament cathode strip inside the focusing groove; a deflection force is applied to the beam in the region where the electron beam acceleration electric field from the anode target is relatively low, and a relatively low deflection voltage is applied to the target. The beam focus can be deflected and moved a predetermined distance. Furthermore, by setting the average potential of the deflection electrode to be the same as or close to that of the focusing electrode, the focusing effect of the electron beam is hardly affected.

このようにして従来から実用になっている通常形式の回
転陽極型X線管とほとんど変らない形状として製作しう
る利点があり、実用性の高い焦点位置可変形X線“管を
実現しつる。
In this way, a highly practical variable focal position X-ray tube has the advantage of being manufactured in a shape that is almost the same as the normal rotating anode X-ray tube that has been in practical use.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明のX線管を使用したxwalll影@置
の一例装示す概略構成図、第2図は本発明X線管の一実
施例を示す要部縦断面図、第3図はその横断面図、第4
図はその要部縦断面図、第5図はその要部拡大斜視図、
第6図は本発明の他の実施例を示す要部縦断面図、第7
図はその要部斜視図、第8図はさらに他の実施例を示す
要部断面図、第9図は本発明のさらに他の実施例を示す
要部縦断面図、第10図はさらに他の実施例を示す要部
縦断面図、第11図はさらに他の実施例を示す要部平面
図である。 (21)・・・回転陽極、(29)・・・真空容器、(
35)−・・陰極構体、(37)・・・陽極ターゲット
、(38)・・・Xll1I放射窓、(39)・・・集
束電極、(40)・・・集束溝、(42)・・・フィラ
メント陰極、(43)・・・凹部、(44)・・・静電
偏向電極、(51)・・・絶縁板、(F)・・・焦点、
(S)焦点移動方向、(e )・・・電子ビーム、(X
)・・・X線放射方向。 代理人 弁理士 則 近 憲 佑(ほか1名)第1図 η 第2図 第4図 第5図 第6図 第8図 S2 第9図 第10図 第11図
FIG. 1 is a schematic configuration diagram showing an example of an xwall shadow @ installation using the X-ray tube of the present invention, FIG. 2 is a vertical cross-sectional view of essential parts showing an embodiment of the X-ray tube of the present invention, and FIG. Its cross-sectional view, No. 4
The figure is a vertical cross-sectional view of the main part, FIG. 5 is an enlarged perspective view of the main part,
FIG. 6 is a vertical cross-sectional view of main parts showing another embodiment of the present invention, and FIG.
The figure is a perspective view of the main part, FIG. 8 is a cross-sectional view of the main part showing still another embodiment, FIG. 9 is a longitudinal sectional view of the main part showing still another embodiment of the present invention, and FIG. 10 is a still another embodiment. FIG. 11 is a longitudinal cross-sectional view of a main part showing an embodiment, and FIG. 11 is a plan view of a main part showing still another embodiment. (21)... Rotating anode, (29)... Vacuum vessel, (
35) - Cathode structure, (37) Anode target, (38) Xll1I radiation window, (39) Focusing electrode, (40) Focusing groove, (42)... - Filament cathode, (43)... recess, (44)... electrostatic deflection electrode, (51)... insulating plate, (F)... focus,
(S) Focus movement direction, (e)...electron beam, (X
)...X-ray radiation direction. Agent Patent Attorney Noriyuki Chika (and 1 other person) Figure 1 η Figure 2 Figure 4 Figure 5 Figure 6 Figure 8 S2 Figure 9 Figure 10 Figure 11

Claims (3)

【特許請求の範囲】[Claims] (1)電子ビーム集束電極に穿設された集束溝の内側に
電子放射陰極が配設されてなる陰極構体と、 この陰極構体に相対向して配置された陽極 ターゲットとを具備し、 上記陰極構体から発生される電子ビームが 電気的に偏向されて陽極ターゲット上のX線焦点位置が
移動される如く構成された焦点位置可変形X線管におい
て、 上記集束電極の集束溝の内側に、電子ビー ム偏向用の一対の静電偏向電極が前記集束電極から電気
的に絶縁されて配設されてなることを特徴とする焦点位
置可変形X線管。
(1) A cathode assembly including an electron emitting cathode disposed inside a focusing groove formed in an electron beam focusing electrode, and an anode target disposed opposite to the cathode assembly; In a variable focal position X-ray tube configured so that the electron beam generated from the structure is electrically deflected to move the X-ray focal position on the anode target, an electron beam is placed inside the focusing groove of the focusing electrode. A variable focal position X-ray tube, characterized in that a pair of electrostatic deflection electrodes for beam deflection are arranged electrically insulated from the focusing electrode.
(2)一対の静電偏向電極は、集束電極の集束溝の一部
に形成された凹部内に配設されてなる特許請求の範囲第
1項記載の焦点位置可変形X線管。
(2) The variable focal position X-ray tube according to claim 1, wherein the pair of electrostatic deflection electrodes are disposed within a recess formed in a part of the focusing groove of the focusing electrode.
(3)一対の静電偏向電極は、セラミック絶縁板の面に
被着された導電膜からなり、該セラミック絶縁板が集束
電極の一部に機械的に接着されてなる特許請求の範囲第
1項記載の焦点位置可変形X線管。
(3) The pair of electrostatic deflection electrodes are made of a conductive film deposited on the surface of a ceramic insulating plate, and the ceramic insulating plate is mechanically bonded to a part of the focusing electrode. Variable focus position X-ray tube as described in .
JP59273634A 1984-12-27 1984-12-27 Variable focus x-ray tube Pending JPS61153934A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59273634A JPS61153934A (en) 1984-12-27 1984-12-27 Variable focus x-ray tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59273634A JPS61153934A (en) 1984-12-27 1984-12-27 Variable focus x-ray tube

Publications (1)

Publication Number Publication Date
JPS61153934A true JPS61153934A (en) 1986-07-12

Family

ID=17530429

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59273634A Pending JPS61153934A (en) 1984-12-27 1984-12-27 Variable focus x-ray tube

Country Status (1)

Country Link
JP (1) JPS61153934A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2644931A1 (en) * 1989-03-24 1990-09-28 Gen Electric Cgr SCANNING X-RAY TUBE WITH DEFLECTION PLATES
EP0715333A1 (en) * 1994-11-28 1996-06-05 Picker International, Inc. X-ray tube assemblies
JP2002197930A (en) * 2000-12-27 2002-07-12 Asahi Tec Corp Suspension strain insulator set
JP2005056843A (en) * 2003-08-04 2005-03-03 Ge Medical Systems Global Technology Co Llc Focal spot position adjusting device for imaging tube
WO2011018729A1 (en) * 2009-08-13 2011-02-17 Koninklijke Philips Electronics N.V. X-ray tube with independent x- and z- dynamic focal spot deflection

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2644931A1 (en) * 1989-03-24 1990-09-28 Gen Electric Cgr SCANNING X-RAY TUBE WITH DEFLECTION PLATES
EP0715333A1 (en) * 1994-11-28 1996-06-05 Picker International, Inc. X-ray tube assemblies
JP2002197930A (en) * 2000-12-27 2002-07-12 Asahi Tec Corp Suspension strain insulator set
JP2005056843A (en) * 2003-08-04 2005-03-03 Ge Medical Systems Global Technology Co Llc Focal spot position adjusting device for imaging tube
WO2011018729A1 (en) * 2009-08-13 2011-02-17 Koninklijke Philips Electronics N.V. X-ray tube with independent x- and z- dynamic focal spot deflection

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