JPS61153339U - - Google Patents
Info
- Publication number
- JPS61153339U JPS61153339U JP3604685U JP3604685U JPS61153339U JP S61153339 U JPS61153339 U JP S61153339U JP 3604685 U JP3604685 U JP 3604685U JP 3604685 U JP3604685 U JP 3604685U JP S61153339 U JPS61153339 U JP S61153339U
- Authority
- JP
- Japan
- Prior art keywords
- plasma etching
- etching apparatus
- drive
- section
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001020 plasma etching Methods 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims description 2
- 239000012212 insulator Substances 0.000 claims description 2
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3604685U JPS61153339U (fi) | 1985-03-15 | 1985-03-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3604685U JPS61153339U (fi) | 1985-03-15 | 1985-03-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61153339U true JPS61153339U (fi) | 1986-09-22 |
Family
ID=30540879
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3604685U Pending JPS61153339U (fi) | 1985-03-15 | 1985-03-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61153339U (fi) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016122491A (ja) * | 2014-12-24 | 2016-07-07 | 東京エレクトロン株式会社 | プラズマ処理装置 |
-
1985
- 1985-03-15 JP JP3604685U patent/JPS61153339U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016122491A (ja) * | 2014-12-24 | 2016-07-07 | 東京エレクトロン株式会社 | プラズマ処理装置 |