JPS61152055A - Resistance adjusting method for thick-film resistance element - Google Patents

Resistance adjusting method for thick-film resistance element

Info

Publication number
JPS61152055A
JPS61152055A JP59272933A JP27293384A JPS61152055A JP S61152055 A JPS61152055 A JP S61152055A JP 59272933 A JP59272933 A JP 59272933A JP 27293384 A JP27293384 A JP 27293384A JP S61152055 A JPS61152055 A JP S61152055A
Authority
JP
Japan
Prior art keywords
resistance
resistance element
resistor
voltage
thick
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59272933A
Other languages
Japanese (ja)
Inventor
Isao Kaneda
金田 勲
Teruo Takai
高井 輝男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59272933A priority Critical patent/JPS61152055A/en
Publication of JPS61152055A publication Critical patent/JPS61152055A/en
Pending legal-status Critical Current

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  • Apparatuses And Processes For Manufacturing Resistors (AREA)

Abstract

PURPOSE:To accomplish high-precision, high-reliability adjustment toward decreasing the resistance value of a thick-film resistance element, once subjected to a baking process, by a method wherein a DC voltage is applied across both ends of the once- baked thick-film resistance element and the current generated by the voltage is subjected to measurement during the application of a beam to raise the temperature of the resistance element. CONSTITUTION:A voltage is applied to a trimming laser 7 for increasing the resistance of a resistance element 2 or 8 positioned on a substrate 1 or for a beam 4 for decreasing the resistance of the same. The mechanism is so arranged as to determine the value of resistance by measuring the current generated by an applied voltage whereunder the value will increase or decrease. A DC voltage out of a power source 5 is applied across conductors 3 made of silver-palladium or the like connected to both ends of the thick-film resistance element 2. The resistance presented by the resistance element 2 is determined by measuring the current through the resistance element 2 by means of the ammeter 6. The elevated temperature attributable to the resistance- decreasing beam 4 thrown upon the element 2 causes silver out of the silver-palladium combination constituting the electrodes 3 to diffuse into the resistance element 2, which decreases the resistance to a target value.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、厚膜抵抗体の微調整に係り、特に抵抗値を高
い方から低い方に調整を行なう場合に利用することので
きる厚膜抵抗体の抵抗値調整方法に閃するものである。
[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to fine adjustment of a thick film resistor, and particularly relates to a thick film resistor that can be used when adjusting the resistance value from a high value to a low value. I was inspired by the way the body adjusts its resistance.

〔発明の背景〕[Background of the invention]

従来のかかる抵抗値調整装置は、特公昭47−2593
9号公報に記載のように、抵抗体に高圧のパルス状の電
圧を印加して、抵抗値を変化させてゆくようになってい
た。しかしこの方法によるとデジタル的にしか抵抗値を
変化させることが出来ない、又1パルスに対する抵抗値
の変化量が一定でないためつねに安定して調整を行なう
ことが出来ない。さらに抵抗体の信頼性の点でも、高圧
電圧をパルス的に抵抗体に与え、衝撃を加えているため
、抵抗体が破壊モードに走っている。以上のように従来
技術は高精度な調整、および信頼性の面で配慮がなされ
ていなかった。
Such a conventional resistance value adjusting device is disclosed in Japanese Patent Publication No. 47-2593.
As described in Japanese Patent No. 9, a high pulsed voltage is applied to a resistor to change its resistance value. However, according to this method, the resistance value can only be changed digitally, and since the amount of change in the resistance value with respect to one pulse is not constant, stable adjustment cannot always be performed. Furthermore, in terms of the reliability of the resistor, high voltage is applied to the resistor in pulses and shock is applied, which puts the resistor in a destructive mode. As described above, in the conventional technology, consideration has not been given to highly accurate adjustment and reliability.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、一度焼成された厚膜抵抗体を抵抗値が
下がる方向に高精度に信頼性良く調整することのできる
厚膜抵抗体の抵抗値調整方法を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for adjusting the resistance value of a thick film resistor, which can adjust the resistance value of a fired thick film resistor with high accuracy and reliability in a direction in which the resistance value decreases.

〔発明の概要〕[Summary of the invention]

本発明の概要は、焼成された厚膜抵抗体の両端に直流電
圧をかけ、それによる電流により、抵抗値の測定を行な
いながら、同時にイオンの移動を行なわせて、抵抗体の
両端に接続されている導体である銀パラジーラム等の成
分中の銀の拡散を起こさせやすくしておいて、ビーム方
式により抵抗体の温度を800℃、もしくは、ガラスの
溶ける温度にまで上げ、銀の拡散を起こさせて、厚膜抵
抗体の抵抗値を下げるようにしたことである。
The outline of the present invention is to apply a DC voltage to both ends of a fired thick film resistor, and use the resulting current to measure the resistance value and at the same time cause ions to move. The silver in the conductor, such as silver parasilum, is made to diffuse easily, and the temperature of the resistor is raised to 800°C or the temperature at which glass melts using the beam method, causing the diffusion of silver. In this way, the resistance value of the thick film resistor is lowered.

なお、抵抗体の色は黒系統が良い。Note that the color of the resistor is preferably black.

〔発明の実施例〕[Embodiments of the invention]

次に図を参照して本発明の詳細な説明する。 The present invention will now be described in detail with reference to the drawings.

第1図は本発明の一実施例を示す斜視図、第2図は第1
図におけるA−AM断面図である。
FIG. 1 is a perspective view showing one embodiment of the present invention, and FIG. 2 is a perspective view showing one embodiment of the present invention.
It is an A-AM sectional view in a figure.

これらの図において、1は基板、2は厚膜紙°抗体、3
は導体、4はレーザビーム、5は電源、6は電流計、7
はトリミング用レーザ、8は厚膜抵抗体、である。
In these figures, 1 is the substrate, 2 is the thick paper antibody, and 3
is a conductor, 4 is a laser beam, 5 is a power supply, 6 is an ammeter, 7
8 is a trimming laser, and 8 is a thick film resistor.

まず第1図に示したこの装置は、抵抗体の抵抗値の微調
整を行なうためのものである。この装置は抵抗体の抵抗
値を上げるためのトリミング用レーザ7と、抵抗値を下
げるためのビーム4(たとえば、レーザビーム、光ビー
ム、赤外線ビーム)の2種類のビームと抵抗体2,8に
電圧を加えて、そのことにより流れる電流の値で、抵抗
値を測定する機構を持ち、抵抗体の軌抗値を自由に上げ
下げすることか出来る様な構造になりている装置である
First, this device shown in FIG. 1 is for finely adjusting the resistance value of a resistor. This device uses two types of beams: a trimming laser 7 to increase the resistance value of the resistor, and a beam 4 (for example, a laser beam, a light beam, an infrared beam) to lower the resistance value, and a trimming laser 7 to increase the resistance value of the resistor. This device has a mechanism that measures the resistance value by applying a voltage and measuring the current flowing as a result, and has a structure that allows the resistance value of the resistor to be freely raised or lowered.

この装置の利用方法としては、基板1上に厚膜抵抗体2
,8を目標の抵抗値になる様に焼成を行なう。この時焼
成の誤差、抵抗体のバラツキにより、全部の抵抗体が目
標値になるとは考えられない。そこでこの装置を持ちい
て、抵抗値の低い抵抗体8は、トリミング用レーザ7を
使用して、抵抗値の高い抵抗体2は、抵抗値を下げるレ
ーザビーム4を用いて、微調整を行なう。このことによ
り、微調整を行なわなくても良い抵抗体が出てくる。さ
らに、トリミングを行なう抵抗体はかなり少なくなり、
行なっても   ・深く削りこむことはなくなり不良も
起こりにくくなる。
The method of using this device is to place a thick film resistor 2 on a substrate 1.
, 8 are fired to the target resistance value. At this time, due to errors in firing and variations in resistors, it is unlikely that all resistors will reach the target value. Therefore, using this device, the trimming laser 7 is used for the resistor 8 having a low resistance value, and the laser beam 4 for lowering the resistance value is used for the resistor 2 having a high resistance value for fine adjustment. This results in a resistor that does not require fine adjustment. Additionally, there are far fewer resistors to trim;
Even if you do this, you won't have to carve deeply, and defects will be less likely to occur.

以下、具体的に抵抗値を下げるための調整動作を説明す
る。厚膜抵抗体2の両端に接続されている導体3である
銀バラジニウム等に電源5によって直流電圧をかけ、電
流計6によって電流値を読むことで抵抗体2の抵抗値を
測定している。
The adjustment operation for lowering the resistance value will be specifically explained below. The resistance value of the resistor 2 is measured by applying a DC voltage to a conductor 3 such as silver valadinium connected to both ends of the thick film resistor 2 using a power source 5 and reading the current value using an ammeter 6.

そしてレーザビー、ム4を抵抗体2に照射して加熱する
ことにより、導体3である銀バラジニウム等の成分中の
銀の抵抗体2内における拡散を起こさせ、その抵抗値を
、目標値まで下げさせる。
Then, by irradiating the resistor 2 with a laser beam and heating it, silver in the silver-valadinium component, which is the conductor 3, is caused to diffuse within the resistor 2, and its resistance value is lowered to the target value. let

〔発明の効果〕〔Effect of the invention〕

本発明によれば、一度焼成された厚膜抵抗体を抵抗体に
衝撃を与えることなく、抵抗体に流れる電流とビーム方
式による加熱により、抵抗値を下げることが出来るため
、一度目の焼成を目標値にもってゆくことが出来る。そ
のため抵抗体の面積をフル活用出来るため、パワーを全
面積で消費することになる、したがって抵抗体の焼き切
れ不良が起きにくくなる、そのことによりさらに、実装
密度を上げることも出来る。
According to the present invention, the resistance value of a thick-film resistor that has been fired once can be lowered by heating the resistor with a current flowing through the resistor and a beam method without applying a shock to the resistor. It is possible to reach the target value. Therefore, since the area of the resistor can be fully utilized, power is consumed over the entire area, which makes it difficult for the resistor to burn out, which also makes it possible to increase the packaging density.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示す斜視図、第2図は第1
図におけるA−AM断面図、である。 符号説明 1・・・基板、 2・・・厚膜抵抗体、 3・・・導体、 4・・・レーザビーム、 5・・・電源、 6・・・電流計、 7・・・トリミング用レーザ、 8・・・厚膜抵抗体。
FIG. 1 is a perspective view showing one embodiment of the present invention, and FIG. 2 is a perspective view showing one embodiment of the present invention.
It is an A-AM sectional view in the figure. Description of symbols 1... Substrate, 2... Thick film resistor, 3... Conductor, 4... Laser beam, 5... Power supply, 6... Ammeter, 7... Trimming laser , 8... Thick film resistor.

Claims (1)

【特許請求の範囲】[Claims]  焼成された厚膜抵抗体の抵抗値を、該抵抗体の両端に
それぞれ接続されている銀パラジウム等を含む導体同士
に電位差を与えることにより生じる電流の値で、測定し
ながら、その全面あるいは、その一部分にビーム方式に
より熱を加えることにより抵抗体の抵抗値を下げて調整
することを特徴とする厚膜抵抗体の抵抗値調整方法。
While measuring the resistance value of the fired thick film resistor by the value of the current generated by applying a potential difference between conductors containing silver palladium etc. connected to both ends of the resistor, the entire surface or A method for adjusting the resistance value of a thick film resistor, characterized by lowering and adjusting the resistance value of the resistor by applying heat to a part of the resistor using a beam method.
JP59272933A 1984-12-26 1984-12-26 Resistance adjusting method for thick-film resistance element Pending JPS61152055A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59272933A JPS61152055A (en) 1984-12-26 1984-12-26 Resistance adjusting method for thick-film resistance element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59272933A JPS61152055A (en) 1984-12-26 1984-12-26 Resistance adjusting method for thick-film resistance element

Publications (1)

Publication Number Publication Date
JPS61152055A true JPS61152055A (en) 1986-07-10

Family

ID=17520785

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59272933A Pending JPS61152055A (en) 1984-12-26 1984-12-26 Resistance adjusting method for thick-film resistance element

Country Status (1)

Country Link
JP (1) JPS61152055A (en)

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