JPS61149272A - Method for immersion coating of cylindrical substrate - Google Patents

Method for immersion coating of cylindrical substrate

Info

Publication number
JPS61149272A
JPS61149272A JP27508384A JP27508384A JPS61149272A JP S61149272 A JPS61149272 A JP S61149272A JP 27508384 A JP27508384 A JP 27508384A JP 27508384 A JP27508384 A JP 27508384A JP S61149272 A JPS61149272 A JP S61149272A
Authority
JP
Japan
Prior art keywords
coating
cylindrical substrate
substrate
immersion
temp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27508384A
Other languages
Japanese (ja)
Inventor
Yoshihiko Eto
嘉彦 江藤
Yoshiaki Takei
武居 良明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP27508384A priority Critical patent/JPS61149272A/en
Publication of JPS61149272A publication Critical patent/JPS61149272A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To eliminate coating irregularity by preventing the generation of air bubbles at the time of immersion, by adjusting the relation between the temp. of a coating solution and that of gas in a cylindrical substrate prior to immersion. CONSTITUTION:In forming a thin film of a chemical substance to the surface of a cylindrical substrate such as an electrophotographic photosensitive drum, the penetration of a coating solution 2 into the cylindrical substrate 1 is obstructed in immersion coating by utilizing the pressure of air confined in the cylindrical substrate 1 and only the coating solution 2 is adhered to the surface of the substrate 1. In this case, in order to prevent the generation of air bubbles resulting in the disturbance of the uniformity of a coating layer, the temp. difference between the temp. of the gas in the cylindrical substrate 1 and the temp. of the coating solution 2 is adjusted to a range of -3-15 deg.C. As an adjustment means, a heating means such as heater or a cooling means such as a cooling pipe cooling through a cooling medium can be provided.

Description

【発明の詳細な説明】 r産業上の利用分野) 本発明は、浸漬塗布方法に関し、更に詳しくは電子写真
感光体ドラムの如き円筒状基体の表面に例えば感光層等
の化学物質の薄層を塗布する円筒状基体の浸漬塗布方法
に関する。
DETAILED DESCRIPTION OF THE INVENTION (r) Industrial Application Field The present invention relates to a dip coating method, and more particularly to a method for applying a chemical substance, such as a photosensitive layer, on the surface of a cylindrical substrate such as an electrophotographic photosensitive drum. The present invention relates to a dip coating method for a cylindrical substrate to be coated.

〔従来技術〕[Prior art]

電子写真感光体のごとく円筒状の基体上に感光層等の薄
層を有するものを製造するには、必要な化学組成物を溶
液とし基体上に塗布乾燥する方法が広く行われている。
BACKGROUND OF THE INVENTION In order to manufacture an electrophotographic photoreceptor having a thin layer such as a photosensitive layer on a cylindrical substrate, a widely used method is to prepare a solution of a necessary chemical composition and apply it onto the substrate and dry it.

この場合基体円筒部の全面にむらのない均一な厚みの層
を形成することが重要である。
In this case, it is important to form a layer of uniform thickness over the entire surface of the cylindrical portion of the base.

こうした層を形成し得る塗布方法として、特開昭59−
71058号公報には一端が閉鎖され、他が開口されて
いる円筒状基体を開口部を下にして塗布液に浸漬し引上
げるものが開示されている。
As a coating method capable of forming such a layer, JP-A-59-
Japanese Patent No. 71058 discloses a cylindrical substrate having one end closed and the other open, immersed in a coating liquid with the opening facing down, and then pulled up.

〔発明が解決しようとする問題点) 前記の方法は電1図Aのように円筒内に閉じこめられた
空気の圧力を利用し基体1内部への塗布液2の浸入を止
め、基体の表面にのみ塗布液を付着せしめ、円筒内側へ
の不要の塗布液付着を防I卜しようとするものであるが
、安定して良好な電子写真感光体が得られないことが判
明した。即ち、塗布液に浸漬中に、しばしば基体の開口
端より気体が溢出し第1図Bのように気泡4となって上
昇することが原因であることがわかった。このため塗層
の均一性を乱す欠点がある。特に電子写真感光体におい
ては画偉形成特性に影響を与え好ましくない。これは浸
漬時日筒内に封じこまれた空気が塗布液の温度1こよっ
て熱膨張すること、また塗布液の溶媒蒸発による内部圧
力上昇に原因していると思われる。また円筒内の空気温
度が塗布液温より高かった場合空気は収縮して第1図C
のように円筒内に塗布液が引きこまれ円筒内面に不要の
塗布液付着が起き、また円筒内部に付着していた塵埃等
を塗布液中に引き出し以後の塗布故障の原因となると共
に、基体浸漬後塗布液の液面が低下して基体上端部に塗
布むらを生ずるなどの問題が発生する。
[Problems to be Solved by the Invention] The above method utilizes the pressure of the air confined in the cylinder as shown in Figure 1A to stop the coating liquid 2 from entering the inside of the substrate 1 and to coat the surface of the substrate. Although this attempt was made to prevent unnecessary adhesion of the coating liquid to the inside of the cylinder by only allowing the coating liquid to adhere to the inside of the cylinder, it was found that a stable and good electrophotographic photoreceptor could not be obtained. That is, it was found that the cause was that gas often overflowed from the open end of the substrate during immersion in the coating liquid and rose as bubbles 4 as shown in FIG. 1B. This has the disadvantage of disturbing the uniformity of the coating layer. Particularly in electrophotographic photoreceptors, this is undesirable because it affects the image formation characteristics. This is thought to be caused by the thermal expansion of the air sealed in the immersion cylinder due to the temperature of the coating solution, and the increase in internal pressure due to evaporation of the solvent in the coating solution. Also, if the air temperature inside the cylinder is higher than the coating liquid temperature, the air contracts and
As shown in the figure, the coating liquid is drawn into the cylinder, causing unnecessary coating liquid to adhere to the inner surface of the cylinder, and dust etc. adhering to the inside of the cylinder are drawn out into the coating liquid, causing subsequent coating failures, and causing damage to the substrate. After dipping, the level of the coating liquid decreases, causing problems such as uneven coating on the upper end of the substrate.

〔問題点を解決するための手段) 本発明者等は種々検討の結果、実際には塗布液の温度(
以下TLとすることがある。)と浸漬前における円筒状
基体内部の気体の温度(以下TAとすることがある。)
の関係を調整することにより前記の問題を解決し得るこ
とを見出した。特に好ましくは−とTAの関係を−3(
0)≦TA −Tt、≦15 (’O)I!:gll整
することにより塗布むら等の故障を防止できることを見
い出した。
[Means for solving the problem] As a result of various studies, the present inventors found that the temperature of the coating liquid (
Hereinafter, it may be referred to as TL. ) and the temperature of the gas inside the cylindrical substrate before immersion (hereinafter sometimes referred to as TA).
It has been found that the above problem can be solved by adjusting the relationship. Particularly preferably, the relationship between - and TA is -3(
0)≦TA−Tt,≦15 ('O)I! : It has been found that malfunctions such as uneven coating can be prevented by adjusting the gll.

円筒状基体内の気体温度TAと塗布液温産乳の差TA−
Tt、が−3℃乃至15℃の範囲内にあれば空気の溢出
ζこよる泡の発生もなく、基体内への塗布液の過度の引
き込みも起らず適正な塗布を行うことができるが、基体
内の気体の熱膨張、収縮及び塗布液の溶媒蒸発による内
部圧力の変化は基体素材の熱伝導性やその厚み等によっ
て異なり、アルミニウムのような熱伝導性の高い素材を
用いた基体の場合には、その厚み1闘以上の場合 =2℃≦TA −TL≦10℃、 11i1以下の場合
1こけ一1°0≦TA−Tt+≦3°Cとすることがよ
り好ましい。
The difference between the gas temperature TA in the cylindrical substrate and the temperature of the coating solution TA-
If Tt is within the range of -3°C to 15°C, proper coating can be performed without the generation of bubbles due to overflow of air and without excessive drawing of the coating liquid into the substrate. Changes in internal pressure due to thermal expansion and contraction of the gas in the substrate and evaporation of the solvent in the coating solution vary depending on the thermal conductivity of the substrate material and its thickness. In this case, it is more preferable that if the thickness is 1° or more, 2°C≦TA-TL≦10°C, and if it is 11i1 or less, 1°0≦TA-Tt+≦3°C.

円筒状基体を浸漬している時間とは、該基体が塗布液と
接触する塗布開始時点から隔れるまでの間である。実質
的に円筒状基体が塗布液と接触している時間は基体を浸
漬する速度と引き上げ塗布する速度から決まる。浸漬速
度、塗布速度としては0.1〜10α/seeが好まし
い。また、蒸気圧の高い溶媒を用いた塗布液を塗布する
場合は、液温をやや低めにずらしておくことが好ましい
The time during which the cylindrical substrate is immersed is the period from the time when the substrate comes into contact with the coating liquid until the coating starts. The time period during which the cylindrical substrate is in contact with the coating solution is determined by the speed at which the substrate is immersed and the speed at which the substrate is pulled up and coated. The dipping speed and coating speed are preferably 0.1 to 10 α/see. Further, when applying a coating liquid using a solvent with a high vapor pressure, it is preferable to shift the liquid temperature to a slightly lower level.

円筒状基体内の気体温度を調整するζこは浸漬前基体内
部に所定温度に調整した気体を強制的に吹き込む等の手
段をとってもよい。また、塗布工程の雰囲気の温度と塗
布液温度をその差が本発明の範囲内となるよう予め調整
して塗布作業を行うことが好ましい。気体温度及び塗布
液温度を調整するには、ヒーター等の加熱手段、冷却媒
体を通して冷却する冷却管等の冷却手段を設けることが
望ましい。
The temperature of the gas inside the cylindrical substrate may be adjusted by forcibly blowing gas adjusted to a predetermined temperature into the substrate before immersion. Further, it is preferable to perform the coating operation by adjusting the temperature of the atmosphere in the coating process and the temperature of the coating liquid in advance so that the difference between them falls within the range of the present invention. In order to adjust the gas temperature and the coating liquid temperature, it is desirable to provide a heating means such as a heater, and a cooling means such as a cooling pipe that cools through a cooling medium.

本発明の基体はアルミニウム等自由に選択された材料に
よって作成することができ、その成型方法もインパクト
加工、絞り加工の外、引抜加工による円管の一方を別部
材で閉塞する等任意の方法を選ぶことができる。
The base of the present invention can be made of a freely selected material such as aluminum, and its molding method can be any method such as impact processing, drawing processing, or closing one side of a circular tube by drawing with another member. You can choose.

本発明の基体に塗布される電子写真感光層の組成、層構
成、等は特に限定されるものではなく、各種の光導電体
とバインダ物質との分散液、溶液、或いは光導電体層の
基体に対する付着を強化する下引液等各種の塗布液を任
意に塗布することかでき、その例としては有機光導電体
感光層を形成するための、下引液、電荷発生層塗布液、
電荷輸送層塗布液等が挙げられる。
The composition, layer structure, etc. of the electrophotographic photosensitive layer applied to the substrate of the present invention are not particularly limited. Various coating liquids such as a subbing liquid can be optionally applied to strengthen the adhesion to the organic photoconductor, such as a subbing liquid, a charge generation layer coating liquid,
Examples include a charge transport layer coating liquid.

有機光導電体感光層を形成する場合の塗布液成分として
は、溶媒としてはn−ブチルアミン、ジエチルアミン、
エチレンジアミン、イソプロパツールアミン、トリエタ
ノールアミン、トリエチレンジアミン、N、N−ジメチ
ルホルムアミド、アセトン、メチルエチルケトン、シク
ロヘキサノン、ベンゼン、トルエン、キシレン、クロロ
ホルム、1.2−ジクロロエタン、ジクロロメタン、テ
トラヒドロフラン、ジオキサン、メタノール、エタノー
ル、イソプロパツール、酢酸エチル、酢酸ブチル、ジメ
チルスルホキシド、メチルセロソルブ、エチルセロソル
ブ、メチルセロソルブアセテート等が挙げられる。また
、溶媒に溶解せしめる塗膜材料としてはアゾ化合物、キ
ノン化合物、フタロシアニン化合物、トリアゾール化合
物、オキサジアゾール化合物、イミダゾール化合物、ピ
ラゾリン化合物、トリアリールアルカン化合物、フエニ
レンジアミン化合物、ヒドラゾン化合物、ア゛ミノ置換
カルフン化合物、トリアリールアミン化合物、カルバゾ
ール化合物、スチルベン化合物等の素材及び、バインダ
ーとしてポリカーボネート、ポリエステル、メタクリル
樹脂、アクリル樹脂、ポリ塩化ビニル、ポリ塩化ビニリ
デン、ポリスチレン、ポリビニルアセテート、ポリビニ
ルブチラール、スチレン共重合体、塩化ビニル−酢酸ビ
ニル共重合体等、更にその他の各種添加剤が挙げられる
In the case of forming an organic photoconductor photosensitive layer, the coating liquid components include n-butylamine, diethylamine,
Ethylenediamine, isopropaturamine, triethanolamine, triethylenediamine, N,N-dimethylformamide, acetone, methyl ethyl ketone, cyclohexanone, benzene, toluene, xylene, chloroform, 1,2-dichloroethane, dichloromethane, tetrahydrofuran, dioxane, methanol, ethanol , isopropanol, ethyl acetate, butyl acetate, dimethyl sulfoxide, methyl cellosolve, ethyl cellosolve, methyl cellosolve acetate and the like. Coating film materials that can be dissolved in solvents include azo compounds, quinone compounds, phthalocyanine compounds, triazole compounds, oxadiazole compounds, imidazole compounds, pyrazoline compounds, triarylalkane compounds, phenylene diamine compounds, hydrazone compounds, and imino compounds. Materials such as substituted carhun compounds, triarylamine compounds, carbazole compounds, stilbene compounds, and binders such as polycarbonate, polyester, methacrylic resin, acrylic resin, polyvinyl chloride, polyvinylidene chloride, polystyrene, polyvinyl acetate, polyvinyl butyral, and styrene copolymer. In addition, various other additives such as vinyl chloride-vinyl acetate copolymer and the like can be mentioned.

〔実施例〕〔Example〕

下記処方の塗布液を調製し、一端が閉鎖され他端が開口
となっている直径801111.長さ300龍肉厚2 
Illの円筒状アルミニウム基体に浸漬塗布して電子写
真感光体を作成した。
Prepare a coating solution with the following formulation, and prepare a coating solution with a diameter of 801111.mm with one end closed and the other end open. Length 300 Dragon Thickness 2
An electrophotographic photoreceptor was prepared by dip coating a cylindrical aluminum substrate of Ill.

(塗布液処方) 塗布時の液温−及び室温即ち円筒状基体内の室気温度T
Aをそれぞれ第1表のように調整して浸漬試験1.2に
おいては浸漬、引き上げの過程も第1図Aのごとく順調
で均一な塗布が行われたのに対し、室温の低い試験3の
場合基体内部の空気が膨張し第1図Bのように引上げの
途中で円筒の下端から溢出し気泡となって上昇し塗膜に
大きなむらを生じた。また室温の高い試験4の場合には
浸漬中に円筒状基体内の空気が収縮し第1図Cのごとく
基体内の液面がLだけ上昇しそれに伴って外部の液面が
lだけ低下したため塗膜−上端部に段むらを生じたが、
他に気泡発生による塗膜むらは生じなかった。
(Coating liquid formulation) Liquid temperature during coating and room temperature, that is, room temperature T inside the cylindrical substrate
A was adjusted as shown in Table 1, and in immersion tests 1 and 2, the immersion and lifting processes were smooth and uniform as shown in Figure 1A, whereas in test 3, where the room temperature was lower. In this case, the air inside the substrate expanded and, as shown in FIG. 1B, overflowed from the lower end of the cylinder during the pulling process, forming bubbles and rising upward, causing large unevenness in the coating film. In addition, in the case of Test 4, where the room temperature was high, the air inside the cylindrical substrate contracted during immersion, and as shown in Figure 1C, the liquid level inside the substrate rose by L, and the liquid level outside fell by l accordingly. Paint film - Step unevenness occurred at the upper end, but
No other coating unevenness due to bubble generation occurred.

第    1    表 1 20.020.50.5 2 25.824.0−1.0 3 25.020.0−5.0 4 10.028.018.0 第1図A、R,C,はそれぞれ、試験1,3゜4.2の
場合の塗布時の状況を示す概念図であってT 、fl 
、Iはそれぞれの浸漬直後、引上げ開始時及び引上げ途
中の状況を示す概念図である。図中1は円筒状基体、2
は塗布液、3は塗布容器、4は気泡である。
1st Table 1 20.020.50.5 2 25.824.0-1.0 3 25.020.0-5.0 4 10.028.018.0 Figure 1 A, R, and C are respectively , is a conceptual diagram showing the situation during application in the case of Test 1, 3° 4.2,
, I are conceptual diagrams showing the situations immediately after immersion, at the start of pulling up, and during pulling up, respectively. In the figure, 1 is a cylindrical base, 2
3 is a coating liquid, 3 is a coating container, and 4 is a bubble.

浸漬塗布の方法としては第2図の様に、ギヤポンプ6を
介して塗布液2を、液溜め5から塗布液槽3に送り込み
、前もって塗布液槽3内に固定しておいた円筒状基体1
を浸漬し、その後、所定の速さで液面が降下するように
塗布液を液溜めに戻すという方法でもよい。
As shown in FIG. 2, the dip coating method involves pumping the coating liquid 2 from the liquid reservoir 5 into the coating liquid tank 3 via a gear pump 6, and placing the cylindrical substrate 1 fixed in the coating liquid tank 3 in advance.
Alternatively, the coating liquid may be immersed in the coating liquid, and then the coating liquid is returned to the liquid reservoir so that the liquid level falls at a predetermined speed.

〔発明の効果〕〔Effect of the invention〕

本発明の方法により円筒状基体表面にむらのない均一な
塗布層を簡単に形成せしめることができた。尚前記実施
例は塗布層として電子写真用感光体を形成する場合であ
るが本発明の方法による浸漬塗布を行いつる塗布液はこ
れに限定されず自由に選択することができる。
By the method of the present invention, it was possible to easily form a uniform coating layer on the surface of a cylindrical substrate. In the above embodiment, an electrophotographic photoreceptor is formed as a coating layer, but dip coating is carried out by the method of the present invention, and the coating liquid can be freely selected without being limited thereto.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は浸漬塗布時における液面の状況を示す概念図、
第2図は液面の移動による塗布方法の概要図である。 1・・・・・・円筒状基体 2・・・・・・塗布液 3・・・・・・塗布容器 4・・・・・・気泡 代理人 弁理士 野 1)義 親 第1図 I   I[ 手続補正書 1.事件の表示 昭和59年特許m第275083号 2、発明の名称 円筒状基体の浸漬塗布方法 3、補正をする者 事件との関係 特許出願人 住所 東京都新宿区西新宿1丁目26番2号〒191 東京都日野市さくら町1番地 小西六写真工業株式会社 (電話0425−83−1.
521 )特  許  部 4、補正命令の日付 (も1.3.22’! 5、補正の対象 明細書の「発明の詳細な説明」の欄。 6、補正の内容 1〕明細書第7頁第16行目 「ポリカーボネート」とあるを 「ポリカーボネートL−1,250Jと訂正し、 2〕同第7頁第17行目 1’−4,,10,ジブロム」とあるをJ4,10.−
ジブロム」と訂正します。
Figure 1 is a conceptual diagram showing the liquid level situation during dip coating.
FIG. 2 is a schematic diagram of a coating method using movement of the liquid level. 1...Cylindrical substrate 2...Coating liquid 3...Coating container 4...Bubble agent Patent attorney Field 1) Parent-in-law Figure 1 I I [Procedural amendment 1. Case description 1982 Patent M No. 275083 2 Name of the invention Dip coating method for cylindrical substrates 3 Person making the amendment Relationship to the case Patent applicant address 1-26-2 Nishi-Shinjuku, Shinjuku-ku, Tokyo 191 Konishiroku Photo Industry Co., Ltd., 1 Sakuracho, Hino City, Tokyo (Tel: 0425-83-1.
521) Patent Part 4, Date of amendment order (1.3.22'! 5, "Detailed description of the invention" column of the specification to be amended. 6, Contents of amendment 1) Page 7 of the specification Line 16, "Polycarbonate" has been corrected to "Polycarbonate L-1,250J," 2] Page 7, Line 17, "1'-4,,10, dibrom" has been replaced with J4,10.-
Jibrom,” I am corrected.

Claims (1)

【特許請求の範囲】[Claims] 一方の端部が実質的に閉鎖され、他の端部が開口されて
いる円筒状基体を、開口端を下にして塗布液中に浸漬し
て、該円筒状基体表面に前記塗布液を塗布する円筒状基
体の浸漬塗布方法において、前記塗布液の温度と、浸漬
前における円筒状基体内部の気体の温度の関係調整する
ことにより円筒状基体を浸漬塗布している時間内に気泡
の発生を防止することを特徴とする円筒状基体の浸漬塗
布方法。
A cylindrical substrate having one end substantially closed and the other end open is immersed in a coating liquid with the open end facing down, and the coating liquid is applied to the surface of the cylindrical substrate. In the dip coating method for a cylindrical substrate, generation of air bubbles can be prevented during dip coating of the cylindrical substrate by adjusting the relationship between the temperature of the coating solution and the temperature of the gas inside the cylindrical substrate before dipping. A dip coating method for a cylindrical substrate characterized by preventing
JP27508384A 1984-12-24 1984-12-24 Method for immersion coating of cylindrical substrate Pending JPS61149272A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27508384A JPS61149272A (en) 1984-12-24 1984-12-24 Method for immersion coating of cylindrical substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27508384A JPS61149272A (en) 1984-12-24 1984-12-24 Method for immersion coating of cylindrical substrate

Publications (1)

Publication Number Publication Date
JPS61149272A true JPS61149272A (en) 1986-07-07

Family

ID=17550573

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27508384A Pending JPS61149272A (en) 1984-12-24 1984-12-24 Method for immersion coating of cylindrical substrate

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Country Link
JP (1) JPS61149272A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011095663A (en) * 2009-11-02 2011-05-12 Canon Inc Method for manufacturing electrophotographic photoreceptor
CN103706512A (en) * 2013-12-23 2014-04-09 珠海天威技术开发有限公司 Method and device for applying coating to photosensitive drum

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011095663A (en) * 2009-11-02 2011-05-12 Canon Inc Method for manufacturing electrophotographic photoreceptor
CN103706512A (en) * 2013-12-23 2014-04-09 珠海天威技术开发有限公司 Method and device for applying coating to photosensitive drum
CN103706512B (en) * 2013-12-23 2016-01-27 珠海天威技术开发有限公司 The coating method of coating of photosensitive drums and coating unit

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