JPS61148757A - Charged particle ray device - Google Patents
Charged particle ray deviceInfo
- Publication number
- JPS61148757A JPS61148757A JP27088884A JP27088884A JPS61148757A JP S61148757 A JPS61148757 A JP S61148757A JP 27088884 A JP27088884 A JP 27088884A JP 27088884 A JP27088884 A JP 27088884A JP S61148757 A JPS61148757 A JP S61148757A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- charged particle
- lead
- resistor
- charged
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/063—Geometrical arrangement of electrodes for beam-forming
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は、微細構造製作および材料評価を指向した荷電
粒子線装置に係り、低コストで且つ安定な荷電粒子ビー
ムを得ることができる荷電粒子線装置に関する。[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to a charged particle beam device intended for microstructure fabrication and material evaluation, and a charged particle beam capable of obtaining a stable charged particle beam at low cost. Regarding equipment.
引出電極と後段加速電極を必要とする高エネルギー荷電
ビーム照射系（荷電粒子線装置）において、例えば、日
本学術振興会第１３２委員会第８８回研究会資料第１３
頁から第１７頁に記載されているように１．イオン引出
電位を調整する必要から電圧調整が可能な電圧可変高電
源が新たに設けられている。この方法は必要に応じて引
出電圧が任意に調整でき、引出しう７る荷電粒子ビーム
を制御できるが、荷電粒子ビームの一部が引出電極をた
たき、二次電子を励起してその結果としてイオン源エミ
ッタと引出電極との間で放電現象が誘起される。放電が
起ると引出電極に印加する引出電源およびイオン源エミ
ッタに印加する高圧電源に過電流が流れ電源を破損する
とともに取り出されるイオンビームの不安定性をまねく
。In a high-energy charged beam irradiation system (charged particle beam device) that requires an extraction electrode and a subsequent accelerating electrode, for example, the Japan Society for the Promotion of Science 132nd Committee 88th Research Meeting Material No. 13
As described on pages 17 to 1. Because of the need to adjust the ion extraction potential, a variable voltage high power source that can adjust the voltage is newly provided. In this method, the extraction voltage can be arbitrarily adjusted as needed, and the charged particle beam to be extracted can be controlled. However, a part of the charged particle beam hits the extraction electrode, excites secondary electrons, and as a result ions are generated. A discharge phenomenon is induced between the source emitter and the extraction electrode. When discharge occurs, an overcurrent flows through the extraction power supply applied to the extraction electrode and the high voltage power supply applied to the ion source emitter, damaging the power supply and causing instability of the extracted ion beam.
本発明の目的は、荷電粒子線装置におけ”る電源省略に
よるコスト低減と安定な荷電粒子ビームを得ることがで
きる荷電粒子線装置を提供することにある。An object of the present invention is to provide a charged particle beam device that can reduce costs by omitting a power source in a charged particle beam device and can obtain a stable charged particle beam.
本発明の基本的な考え方は、後段加速を必要とするよう
な高エネルギー荷電粒子ビーム照射系（荷電粒子線装置
Ｉ）において、第一の荷電粒子引出電極を抵抗値が任意
に可変できる抵抗を通して ・接地し、該電極に流入す
る荷電粒子流と抵抗によって生ずる電位と荷電粒子源（
エミッタ）電位との差を荷電粒子引出電圧として利用す
ることにある。これにより電源の省−ができるとともに
荷電粒子の安定引出が達成でき、従来の問題点が改良さ
れた。The basic idea of the present invention is that in a high-energy charged particle beam irradiation system (charged particle beam device I) that requires post-acceleration, the first charged particle extraction electrode is connected through a resistor whose resistance value can be arbitrarily changed.・The electric potential generated by the charged particle flow flowing into the electrode and the resistance and the charged particle source (grounded)
(emitter) potential is used as a charged particle extraction voltage. This makes it possible to save the power supply and achieve stable extraction of charged particles, thereby improving the problems of the conventional method.
〔発明の実施例〕
以下１本発明の一実施例を第１図により説明する。はじ
めに実施例の構成を説明する。本発明の装置構成は、荷
電粒子源１．２ （２；荷電粒子源エミッタ）、制御電
極３．荷電粒子ビームを引出讐ための荷電粒子引出電極
４．荷電粒子ビームをａの後段加速電極５．収来用レン
ズとしての静電レンズ６、試料７．高圧電源８２分圧器
９、本発明の電気抵抗手段としての抵抗器１０である。[Embodiment of the Invention] An embodiment of the present invention will be described below with reference to FIG. First, the configuration of the embodiment will be explained. The device configuration of the present invention includes a charged particle source 1.2 (2; charged particle source emitter), a control electrode 3. Charged particle extraction electrode for extracting the charged particle beam4. The charged particle beam is transferred to the subsequent accelerating electrode 5. Electrostatic lens 6 as a collection lens, sample 7. They are a high voltage power supply 82, a voltage divider 9, and a resistor 10 as an electrical resistance means of the present invention.
炭１作原理を示す。荷電粒子源１．２より放出されたイ
オンビーム１１は、その大部分が引出電極４に孔を通過
し、一部は引出電極４の孔周辺をたたき本発明の抵抗器
１０を通って流れる。Demonstrates the principle of charcoal production. Most of the ion beam 11 emitted from the charged particle source 1.2 passes through the hole in the extraction electrode 4, and a portion hits the vicinity of the hole in the extraction electrode 4 and flows through the resistor 10 of the present invention.
この場合引出電極電位Ｖｅは、抵抗１０の値をＲｂ、流
入荷電粒子流をＩ、とするとＲｈ−１，となり、工、が
定まればＶｅはＲｈの関数として任意°に変えら九る。In this case, the extraction electrode potential Ve is Rh-1, where Rb is the value of the resistor 10 and I is the incoming charged particle flow, and Ve can be changed arbitrarily as a function of Rh if .
さらに該抵抗器１０とし讐分割またはしゆう動抵抗を利
用し、′任意分割抵抗値、のどころからリードをとり出
し、レンズ電極６に必要なレンズ電圧を供給できる。最
後１本発明の具体的な実施例を述べる。第１図において
荷電粒子源１，２としてｃ、ｃ ｎ を混入させた焼
結タングステンエミッタ２を利用した。抵抗器１０の抵
抗値は分割抵抗により１０７〜１ｏ１１１Ωまで可変で
きるものを採用した。後段引出゛し電極５は接地電位窓
分割抵抗値にセットすることによって与えた゛。Further, by using the resistor 10 and a divided resistance or a shearing resistance, a lead can be taken out from an arbitrary divided resistance value, and a necessary lens voltage can be supplied to the lens electrode 6. Finally, a specific example of the present invention will be described. In FIG. 1, a sintered tungsten emitter 2 mixed with c and c n was used as the charged particle sources 1 and 2. The resistance value of the resistor 10 can be varied from 107 to 1011 ohms by dividing resistors. The latter stage lead-out electrode 5 was provided by setting the ground potential window dividing resistance value.
本実施例により、Ｃ１またはＣＱ−め正または負イオン
ビームを安一定に引出すことができ、且つ抵抗値１０ｉ
調整することにより電流値を任意に変えられることが実
証され゛た。ま九抵抗値を任□意に変えることにより試
料７上に集束できる′ことが明の後段加速電極５と、ｉ
れに必要な数の、後段加速電極５と対になる抵抗！ｎ１
０を設ける構成も可能である。According to this embodiment, it is possible to stably extract a C1 or CQ-me positive or negative ion beam, and the resistance value is 10i.
It has been demonstrated that the current value can be changed arbitrarily by adjusting it. It is clear that the light can be focused on the sample 7 by changing the resistance value arbitrarily.
The required number of resistors to be paired with the rear-stage accelerating electrode 5! n1
A configuration in which 0 is provided is also possible.
本実施例により次のような効果が確認された。The following effects were confirmed in this example.
１）荷電粒子ｇ１，２と引出電極４との間では放電現象
は皆無にでき、放電による電源破損がなくなった。1) There was no discharge phenomenon between the charged particles g1, 2 and the extraction electrode 4, and damage to the power supply due to discharge was eliminated.
２）上記１）の効果によりビーム電流の安定度が従来の
１０％／ｈｒがく０．５ ％／ｈｒと１桁以上改善され
た。 −
ここでは、荷電粒子源１，２としてイオン源につい゛で
の結集のみ示したが、ヘアピン形電子源および電界放出
電子源についても実廁し、同様効果が得ら′れた。2) Due to the effect of 1) above, the stability of the beam current has been improved by more than one order of magnitude from the conventional 10%/hr to 0.5%/hr. - Here, only the concentration was shown for ion sources as charged particle sources 1 and 2, but hairpin electron sources and field emission electron sources were also used, and similar effects were obtained.
本発明に゛よれば、高エネルギー加速の荷電粒子線照射
系においで荷電粒手引出のための引出電源が省略でき且
う引出される荷電粒子ビームに安定化のための自動制御
がかかるので、以下に列挙するような効果がある。According to the present invention, in a high-energy accelerated charged particle beam irradiation system, an extraction power source for manual extraction of charged particles can be omitted, and the extracted charged particle beam is automatically controlled for stabilization. It has the following effects.
１）・引出される荷電粒子線−が抵抗を流れる時に生ず
る電位を直接引出電圧として利用しているので、放電に
よる電源の破損やビーム変動がさけら九る。1) Since the potential generated when the extracted charged particle beam flows through a resistor is directly used as the extraction voltage, damage to the power supply and beam fluctuation due to discharge are minimized.
２）上記に示したように電源が省略できるので。2) As shown above, the power supply can be omitted.
コスト低減ができる。Cost can be reduced.
３）上記１）の効果により、ビーム安定度が従来法の５
％／ｈｒに対して０．５ ％／ｈｒ以下に改善できる。3) Due to the effect of 1) above, the beam stability is 5 times higher than that of the conventional method.
%/hr can be improved to 0.5%/hr or less.
断面図である。FIG.
１・・・荷電粒子源 、２・・・荷電粒
子エミッタ、 ３・・・制御電極
、４・・・荷電粒子引出電極、５・・・後段加速電極、
６・・・静電レンズ、７・・・試料、８・・・高圧電源
、９・・・分圧器、１０・・・京阜琲尋抵抗器。DESCRIPTION OF SYMBOLS 1... Charged particle source, 2... Charged particle emitter, 3... Control electrode, 4... Charged particle extraction electrode, 5... Post-acceleration electrode,
6... Electrostatic lens, 7... Sample, 8... High voltage power supply, 9... Voltage divider, 10... Kyofu Hohiro resistor.
１、ｆ、 ＋ 口1, f, + mouth
Claims (1)
第１の電極の後段の前記荷電粒子ビームを加速するため
の第２の電極よりなる荷電粒子線装置において、前記第
１の電極は電気抵抗手段を介して前記第２の電極に電気
的に接続されていることを特徴とする荷電粒子線装置。 ２、荷電粒子ビームを引出すための第１の電極と、前記
第１の電極の後段の前記荷電粒子ビームを加速するため
の第２の電極と、前記第２の電極の後段の前記荷電粒子
ビームを収来しまたは拡大するためのレンズよりなる荷
電粒子線装置において、前記第１の電極は第１の電気抵
抗手段を介して前記第２の電極に電気的に接続され、前
記レンズは第２の電気抵抗手段を介して前記第１の電極
と前記第２の電極の少なくとも一方に電気的に接続され
ていることを特徴とする荷電粒子線装置。[Claims] 1. A charged particle beam device comprising a first electrode for extracting a charged particle beam and a second electrode for accelerating the charged particle beam downstream of the first electrode, A charged particle beam device, wherein the first electrode is electrically connected to the second electrode via electrical resistance means. 2. A first electrode for extracting a charged particle beam, a second electrode for accelerating the charged particle beam after the first electrode, and a second electrode for accelerating the charged particle beam after the second electrode. In a charged particle beam device comprising a lens for collecting or enlarging the A charged particle beam device characterized in that the charged particle beam device is electrically connected to at least one of the first electrode and the second electrode via an electrical resistance means.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59270888A JPH0722007B2 (en) | 1984-12-24 | 1984-12-24 | Charged particle beam device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59270888A JPH0722007B2 (en) | 1984-12-24 | 1984-12-24 | Charged particle beam device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61148757A true JPS61148757A (en) | 1986-07-07 |
| JPH0722007B2 JPH0722007B2 (en) | 1995-03-08 |
Family
ID=17492361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59270888A Expired - Fee Related JPH0722007B2 (en) | 1984-12-24 | 1984-12-24 | Charged particle beam device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0722007B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2264738A1 (en) * | 2009-06-18 | 2010-12-22 | Carl Zeiss SMT Limited | Electron gun used in a particle beam device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58158844A (en) * | 1982-03-17 | 1983-09-21 | Jeol Ltd | Ion gun |
| JPS58158849A (en) * | 1982-03-16 | 1983-09-21 | Jeol Ltd | Ion gun power source |
-
1984
- 1984-12-24 JP JP59270888A patent/JPH0722007B2/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58158849A (en) * | 1982-03-16 | 1983-09-21 | Jeol Ltd | Ion gun power source |
| JPS58158844A (en) * | 1982-03-17 | 1983-09-21 | Jeol Ltd | Ion gun |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2264738A1 (en) * | 2009-06-18 | 2010-12-22 | Carl Zeiss SMT Limited | Electron gun used in a particle beam device |
| US8890444B2 (en) | 2009-06-18 | 2014-11-18 | Carl Zeiss Microscopy Limited | Electron gun used in particle beam device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0722007B2 (en) | 1995-03-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |