JPS61147539A - Manufacture of semiconductor rectifier - Google Patents

Manufacture of semiconductor rectifier

Info

Publication number
JPS61147539A
JPS61147539A JP26841584A JP26841584A JPS61147539A JP S61147539 A JPS61147539 A JP S61147539A JP 26841584 A JP26841584 A JP 26841584A JP 26841584 A JP26841584 A JP 26841584A JP S61147539 A JPS61147539 A JP S61147539A
Authority
JP
Japan
Prior art keywords
solder
melting point
metal electrode
point solder
high melting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26841584A
Other languages
Japanese (ja)
Inventor
Kazuo Sonoda
園田 和夫
Kazuyoshi Naito
内藤 一芳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP26841584A priority Critical patent/JPS61147539A/en
Publication of JPS61147539A publication Critical patent/JPS61147539A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L24/33Structure, shape, material or disposition of the layer connectors after the connecting process of a plurality of layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/838Bonding techniques
    • H01L2224/8385Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/013Alloys
    • H01L2924/014Solder alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/06Polymers
    • H01L2924/078Adhesive characteristics other than chemical
    • H01L2924/07802Adhesive characteristics other than chemical not being an ohmic electrical conductor

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Die Bonding (AREA)

Abstract

PURPOSE:To readily automate manufacturing steps by disposing solders of different melting points between a metal electrode and semiconductor substrate, individually heating them, and executing scribing step. CONSTITUTION:Laminated parts of a high melting point solder tablet 2 and a rectifier 3 are maintained at approx. 360 deg.C in a wide portion 5 of a metal electrode 1, and engaged with a heater 6 disposed in atmosphere of H2:N2=1:9. When the high melting point solder is melted, scribing step is executed to remove air bubbles contained in the solder layer, and the smoothness of the wide portion 5 is compensated. After the solder layer is cooled, other metal electrode 1 by low malting point solder and the rectifier 3 are secured. Then, laminated reversely to the case of high melting point solder, heated and scribing step is similarly executed.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は車輌用に好適する半導体整流装置の製造方法に
係り、特に車輌用発電機に設置する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a method for manufacturing a semiconductor rectifier suitable for use in a vehicle, and in particular is installed in a generator for a vehicle.

〔発明の技術的背景〕[Technical background of the invention]

車輌用半導体整流装置は1例えば三相ブリッジ回路をも
つ装置として組立てられ、これを車輌に搭載されたオル
タネータに取付けるのが通常の手法であるにの半導体整
流装置に要求される特性としては、苛酷な条件にも対応
出来るよう熱疲労特性(T P T)に優れたものが賞
月されると共に、経済的な要因から低価格な製品が要求
されている。
Semiconductor rectifiers for vehicles are normally assembled as a device with, for example, a three-phase bridge circuit, and attached to an alternator mounted on the vehicle. However, the characteristics required of semiconductor rectifiers are Products with excellent thermal fatigue properties (TPT) are being prized so that they can be used under various conditions, and low-cost products are also being demanded due to economic factors.

ところで、この種の半導体整流装置には1対の金属電極
間に半導体基板を半田で固着する種類があるが、その手
法としては第4図に示すようにガイド治具(4)の中に
配置した一対の金属電極(1)の間に半田(2)を介し
て半導体整流素子(3)を重ね、この1体化したものを
水素炉内に通過させていた。
By the way, in this type of semiconductor rectifier, there is a type in which a semiconductor substrate is fixed between a pair of metal electrodes with solder, but the method for this is to place it in a guide jig (4) as shown in Figure 4. A semiconductor rectifying element (3) was stacked between the pair of metal electrodes (1) with solder (2) interposed therebetween, and this integrated structure was passed through a hydrogen furnace.

〔背景技術の問題点〕[Problems with background technology]

前述のように、車輌に搭載するオルタネータに取付ける
関係上、前記金属電極(1)の寸法は車種にもよるが一
定の規格を満す必要があり、−力学導体整流素子の外径
も経済的な制約から成る可く小径のものを採用せざるを
得ず、従って前記金属電極(1)より径小の半導体整流
素子を採用している。とすると、前記治具(4)によっ
て半田(2)ならびに半導体整流素子(3)をガイドす
ることができず、したがって前記水素炉内での加熱時両
部品が移動し溶融半田層が衝合して半田ブリッジ不良を
発生した。
As mentioned above, since it is attached to the alternator mounted on the vehicle, the dimensions of the metal electrode (1) must meet certain standards, depending on the vehicle model, and the outer diameter of the mechanical conductor rectifying element must also be economical. Due to such restrictions, it is necessary to use a rectifying element as small as possible, and therefore a semiconductor rectifying element having a smaller diameter than the metal electrode (1) is used. In this case, the solder (2) and the semiconductor rectifier (3) cannot be guided by the jig (4), and therefore both parts move during heating in the hydrogen furnace, causing the molten solder layers to collide. This caused a solder bridge failure.

又、水素炉を使用するためいわゆるスクラブ工程が採用
できず、半田層の濡れ性が悪く、半田のボイドが発生す
る頻度が多かった。
Furthermore, since a hydrogen furnace is used, a so-called scrub process cannot be employed, and the wettability of the solder layer is poor, resulting in frequent occurrence of solder voids.

このような製造方法にあっては必要な治具が極めて多く
なる外、自動化が難しい。即ち、治具への部品供給、更
にマウント済み部品の治具からの取外しに人手が要る外
、その自動化には可成りの設備費が必要となる。
This manufacturing method requires an extremely large number of jigs and is difficult to automate. That is, in addition to requiring human labor to supply components to the jig and to remove mounted components from the jig, automation requires considerable equipment costs.

〔発明の目的〕[Purpose of the invention]

本発明は上記の難点を克服し、特に自動化が容易な簡単
な半導体整流素子の製造方法を提供する。
The present invention overcomes the above-mentioned difficulties and provides a simple method for manufacturing semiconductor rectifying elements that is particularly easy to automate.

〔発明の概要〕[Summary of the invention]

本発明は1対の金属電極の半導体整流素子を固着するに
当り、融点の異なる半田を使用して別々に加熱スクラブ
しても、低融点半田層と高融点半田層が橋絡しない事実
確認を基に完成した。これらの半田選定には前記オルネ
タータへの前記金属ff1lの半田付は温度より高融点
であることが必要である。
In fixing a semiconductor rectifying element with a pair of metal electrodes, the present invention has confirmed the fact that the low melting point solder layer and the high melting point solder layer do not bridge even if they are heated and scrubbed separately using solders with different melting points. Completed on the basis of In selecting these solders, it is necessary that the metal ff1l be soldered to the ornetator at a higher melting point than the soldering temperature.

〔発明の実施例〕[Embodiments of the invention]

実施例を第1図乃至第3図を参照して詳述するが、第4
図と共通部品には同一番号をつけ、第1図には本発明を
適用した半導体整流装置の縦断面図を示した。図示した
半導体整流素子(3)はN型のシリコン半導体基板に硼
素を拡散してP+層を形成し、そのPN接合端を前記半
導体基板側部に露出したいわゆるボタンダイオードであ
る。このボタンダイオードの側部には、いわゆる正ベベ
ル加工を施して耐圧向上を計っている。その具体的手法
としは化学食刻方法及びドライフオーニング加工等が良
く知られている。
The embodiment will be described in detail with reference to FIGS. 1 to 3.
Components common to the figures are given the same numbers, and FIG. 1 shows a longitudinal sectional view of a semiconductor rectifier to which the present invention is applied. The illustrated semiconductor rectifying element (3) is a so-called button diode in which boron is diffused into an N-type silicon semiconductor substrate to form a P+ layer, and its PN junction end is exposed on the side of the semiconductor substrate. The sides of this button diode are treated with so-called positive bevel processing to improve withstand voltage. As specific methods thereof, chemical etching methods, dry awning processing, etc. are well known.

一方、断面T字状の金属電極(1)はCuで構成し、表
面にはNi鍍金膜を形成するが、その寸法は車輌側の要
求から車種にも依るが一定の値を満す必要がある。
On the other hand, the metal electrode (1) with a T-shaped cross section is made of Cu, and a Ni plating film is formed on the surface, but its dimensions must meet certain values depending on the vehicle model due to the requirements of the vehicle. be.

この金属電極(1)には幅広部(5)が形成されており
、その端面がは望平坦にされているが、その平滑度は完
全でなく最大2°程度の傾斜をもつものが存在している
This metal electrode (1) has a wide part (5) formed thereon, and its end face is made perfectly flat, but its smoothness is not perfect and there are parts with a maximum slope of about 2 degrees. ing.

次に、この金属電極(1)に前記半導体整流素子(3)
を固着するが、使用される半田としてはpb −In 
−Agを適用した。高融点半田としてはIn含有量が5
%、 Ag 2.5%、 Ba1. Pbを、低融点半
田としてはIn 15%、 Ag2.5%、 Ba1.
 Pbを採用し、前者の融点を約302℃、後者のそれ
は280℃位である。
Next, the semiconductor rectifying element (3) is attached to this metal electrode (1).
The solder used is pb-In.
-Ag was applied. As a high melting point solder, the In content is 5
%, Ag 2.5%, Ba1. Pb, low melting point solder was In 15%, Ag 2.5%, Ba 1.
Pb is used, and the former has a melting point of about 302°C, and the latter has a melting point of about 280°C.

尚、この半田はタブレット状に成形されている。Note that this solder is formed into a tablet shape.

第2図に示すように前記金属電極(1)の幅広部(5)
に高融点半田タブレット(2)及び整流素子(3)を重
ねた積層部品を、約360℃に維持しH2: N2=1
 : 9の雰囲気内に配置された加熱部(6)に係止す
る。
As shown in Figure 2, the wide part (5) of the metal electrode (1)
A laminated component in which a high melting point solder tablet (2) and a rectifying element (3) were stacked on top of each other was maintained at approximately 360°C, and H2: N2 = 1.
: It is locked to the heating part (6) placed in the atmosphere of 9.

前記高融点半田が溶融時点でスクラブ工程を施してこの
半田層に包含する気泡を除去すると共に、幅広部(5)
の平滑度を補償する。この半田層が冷却後低融点半田に
よる他の金属電極(1)と前記半導体整流素子(3)を
固着する。この場合は前記高融点半H3(2)に固着し
た前記半導体整流素子(3)に低融点半田のタブレット
(2)及び他の金属電極(1)の幅広部(5)をこの順
に積層し、この積層部品を320°C程度に加熱した加
熱部(6)に係止するが、雰囲気はI+2: N2=−
1: 9とし、前記高融点半田を使用した場合と同様に
スクラブ工程を前記低融点半田の溶融時に施して、全く
同様な効果を得る。
When the high melting point solder is melted, a scrubbing process is performed to remove air bubbles contained in the solder layer, and the wide part (5) is removed.
compensate for the smoothness of After cooling, this solder layer fixes the semiconductor rectifying element (3) to another metal electrode (1) using low melting point solder. In this case, a tablet of low melting point solder (2) and a wide part (5) of another metal electrode (1) are laminated in this order on the semiconductor rectifying element (3) fixed to the high melting point half H3 (2), This laminated component is held in a heating part (6) heated to about 320°C, but the atmosphere is I+2: N2=-
1:9, and the same scrubbing process as in the case of using the high melting point solder is performed when the low melting point solder is melted, to obtain exactly the same effect.

次に、第1図に示すように、相対向する金属電極の幅広
部(5)間の空所にシリコーン樹脂(7)を充填して前
記半導体整流素子(3)のベベル面をエンキャップする
。更に、前記半導体整流素子(3)と1体化した金属電
極(1)(1)にエポキシ樹脂(8)をトランスファー
モールドして半導体整流装置(9)を完成する。
Next, as shown in FIG. 1, silicone resin (7) is filled in the space between the wide parts (5) of the opposing metal electrodes to encap the beveled surface of the semiconductor rectifier (3). . Further, an epoxy resin (8) is transfer-molded onto the metal electrode (1) (1) integrated with the semiconductor rectifier (3) to complete a semiconductor rectifier (9).

〔発明の効果〕〔Effect of the invention〕

このように融点の異なる半田によって金属電極の半導体
整流素子が固着され、更にスクラブ工程を施した半導体
整流装置は半田ブリッジ不良発生率が従来の1〜2%に
比較して約l/10の0.1%以下に激減した。更に、
従来の水素炉内加熱に代えて、フォーミングガス雰囲気
での加熱を採用したので、いわゆるスクラブ工程の実施
が可能となった。この結果、前記半田層と、これに隣接
する前記金属電極及び前記半導体整流素子間に発生する
ボイドを抑えることができた。前記半田層の濡れ性を判
断するものとして、発生してボイドの面積を半田層の面
積に対する百分率で示すと、従来方法では1〜10%で
あったのが本発明にあっては2%以下であった。又、前
にも記載したように、前記金属電極(1)の幅広部(5
)の平滑度は完全でなく、最大約2°傾斜しているもの
あるが、前記スクラブ工程によって溶融半田層がその補
償をしてほぼ平滑な面が得られるので、熱疲労特性が向
上する。更に又、前記加熱工程はフォーミングガス雰囲
気で実施するので、水素雰囲気を使用する従来方法に比
べて安全である。
In this way, the semiconductor rectifier device in which the semiconductor rectifier element of the metal electrode is fixed with solder having a different melting point and is further subjected to a scrubbing process has a solder bridge failure rate of about 1/10, compared to the conventional 1 to 2%. .1% or less. Furthermore,
Instead of conventional heating in a hydrogen furnace, heating in a forming gas atmosphere was used, making it possible to perform a so-called scrub process. As a result, it was possible to suppress voids generated between the solder layer, the metal electrode adjacent thereto, and the semiconductor rectifying element. In order to judge the wettability of the solder layer, the area of generated voids expressed as a percentage of the area of the solder layer is 1 to 10% in the conventional method, but 2% or less in the present invention. Met. Moreover, as described previously, the wide part (5) of the metal electrode (1)
) is not perfect and has a maximum inclination of about 2°, but the molten solder layer compensates for this by the scrubbing process and a substantially smooth surface is obtained, improving thermal fatigue properties. Furthermore, since the heating step is performed in a forming gas atmosphere, it is safer than conventional methods that use a hydrogen atmosphere.

従来方法では多くの治具が必要である外、水素炉及び組
立に5人程度必要であったが、本発明は自動化が可能で
あるばかりでなく所要人員は1人程度で可能である。
The conventional method requires many jigs and about five people for the hydrogen furnace and assembly, but the present invention not only allows automation but also requires about one person.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る半導体整流装置の断面図、第2図
および第3図は本発明に係る半導体整流素子と金属電極
の半田付状態を示す断面図であり、第4図は治具方式に
よる従来方式の組立時の縦断面図である。 ■−−−金属電極 2−−一半田 3−m−半導体整流素子 4−m−治具 5−一一幅広部 6−−一加熱部 7−m−シリコン樹脂 8−一一エボキシ樹脂、 旦−m−半導体整流装置
FIG. 1 is a cross-sectional view of a semiconductor rectifier according to the present invention, FIGS. 2 and 3 are cross-sectional views showing a soldered state of a semiconductor rectifier element and a metal electrode according to the present invention, and FIG. 4 is a jig. FIG. 3 is a longitudinal cross-sectional view of the conventional method during assembly. ■---Metal electrode 2--1 Solder 3-m-Semiconductor rectifier 4-m-Jig 5-11 Wide part 6--1 Heating part 7-m-Silicon resin 8-11 Epoxy resin, once -m- semiconductor rectifier

Claims (1)

【特許請求の範囲】[Claims] 内部に接合を形成した半導体基板を、より長大でほゞ平
坦な一面を持つ1対の金属電極間に固着するに当り、こ
の金属電極と前記半導体基板間に融点の異なる半田を配
置して別個に加熱すると共に夫々スクラブ工程を施すこ
とを特徴とする半導体整流装置の製造方法。
When a semiconductor substrate with a bond formed therein is fixed between a pair of metal electrodes that are longer and have a substantially flat surface, solder with a different melting point is placed between the metal electrode and the semiconductor substrate to separate them. 1. A method for manufacturing a semiconductor rectifying device, which comprises heating the device to a temperature of 100.degree. C. and performing a scrubbing step.
JP26841584A 1984-12-21 1984-12-21 Manufacture of semiconductor rectifier Pending JPS61147539A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26841584A JPS61147539A (en) 1984-12-21 1984-12-21 Manufacture of semiconductor rectifier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26841584A JPS61147539A (en) 1984-12-21 1984-12-21 Manufacture of semiconductor rectifier

Publications (1)

Publication Number Publication Date
JPS61147539A true JPS61147539A (en) 1986-07-05

Family

ID=17458160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26841584A Pending JPS61147539A (en) 1984-12-21 1984-12-21 Manufacture of semiconductor rectifier

Country Status (1)

Country Link
JP (1) JPS61147539A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6891265B2 (en) 1999-11-24 2005-05-10 Denso Corporation Semiconductor device having radiation structure

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6891265B2 (en) 1999-11-24 2005-05-10 Denso Corporation Semiconductor device having radiation structure
US6960825B2 (en) 1999-11-24 2005-11-01 Denso Corporation Semiconductor device having radiation structure
US6967404B2 (en) 1999-11-24 2005-11-22 Denso Corporation Semiconductor device having radiation structure
US6992383B2 (en) 1999-11-24 2006-01-31 Denso Corporation Semiconductor device having radiation structure
US6998707B2 (en) 1999-11-24 2006-02-14 Denso Corporation Semiconductor device having radiation structure
DE10058446B4 (en) * 1999-11-24 2012-12-27 Denso Corporation Semiconductor device with radiating components
DE10058446B8 (en) * 1999-11-24 2013-04-11 Denso Corporation Semiconductor device with radiating components

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