JPS61147256A - Spray developing device - Google Patents
Spray developing deviceInfo
- Publication number
- JPS61147256A JPS61147256A JP26924284A JP26924284A JPS61147256A JP S61147256 A JPS61147256 A JP S61147256A JP 26924284 A JP26924284 A JP 26924284A JP 26924284 A JP26924284 A JP 26924284A JP S61147256 A JPS61147256 A JP S61147256A
- Authority
- JP
- Japan
- Prior art keywords
- filter
- nozzle
- passage
- clogging
- developing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【発明の詳細な説明】
(1)発明の技術分野
本発明はスプレー現像装置に係り、特にフィルタあるい
はスプレーのノズル不良を簡単に見分けることの出来る
スプレー現像装置の改良に関する。DETAILED DESCRIPTION OF THE INVENTION (1) Technical Field of the Invention The present invention relates to a spray developing device, and more particularly to an improvement in a spray developing device that allows easy identification of filter or spray nozzle defects.
(2)技術の背景
IC,LSIの製造工程において、ホトマスクやレチク
ル等の種々のマスクが用いられているが。(2) Background of the Technology Various masks such as photomasks and reticles are used in the manufacturing process of ICs and LSIs.
これらマスクは一般的にはマスクの欠陥が次のプロセス
に大きな影響を与え、最終的にはユニノ1−セル等の欠
陥を引き起こすので傷がついたり汚れがついていないも
のを選択しなければならないマスクとしては一般に写真
乳剤マスク、金属薄膜マスク等が用いられ2例えば、該
金属薄膜マスクとしてはガラス基板上に蒸着金属として
ニッケル。In general, these masks must be selected to be free from scratches and dirt, as any defects in the mask will have a major impact on the next process, eventually causing defects such as unino 1-cells. Generally, a photographic emulsion mask, a metal thin film mask, etc. are used as the metal thin film mask.2For example, the metal thin film mask uses nickel as a vapor deposited metal on a glass substrate.
クロム等が用いられ、その上にポジ又はネガ用のフォト
レジストが塗布されプレベータの後に密着焼付を行い、
現像処理が行われている。Chromium, etc. is used, and a positive or negative photoresist is applied on top of it, followed by contact baking after pre-baking.
Development processing is being performed.
現像処理システムにおける現像はレジストの種類によっ
て異なり、ポジ型はディップ方式がネガ型はスプレ一方
式が一般に用いられているが、現像機構そのものには大
きな差はないのが現状である。Development in the development processing system differs depending on the type of resist, and generally a dip method is used for positive types and a spray method is used for negative types, but at present there is no major difference in the development mechanism itself.
(3)従来技術と問題点
第4図は従来の現像処理システムに用いられているスプ
レ一方式の系統図である。第4図において、1は窒素ガ
ス(N2)等を供給すると共に操作制御部をも有するガ
ス駆動制御部であり、該ガス駆動制御部1からガス供給
管5を通じて加圧タンク2に窒素ガス4を供給して、該
加圧タンクを加圧する。該加圧タンク内には有機溶剤か
らなる現像液3が満たされていて、上記窒素ガスで所定
圧力に加圧された現像液3は第1の通路6とフィルタ7
を介して現像チャンバ8のノズル9からスピンナーチャ
ック10上の被現像体11に現像液3をスプレーするよ
うになされている。(3) Prior Art and Problems FIG. 4 is a system diagram of a spray type used in a conventional developing processing system. In FIG. 4, reference numeral 1 denotes a gas drive control section that supplies nitrogen gas (N2), etc. and also has an operation control section. is supplied to pressurize the pressurized tank. The pressurized tank is filled with a developer 3 made of an organic solvent, and the developer 3 pressurized to a predetermined pressure with the nitrogen gas is passed through a first passage 6 and a filter 7.
The developer 3 is sprayed from the nozzle 9 of the developing chamber 8 onto the object 11 on the spinner chuck 10 through the nozzle 9 of the developing chamber 8.
上記構成によれば、被現像体であるマスク等を現像する
ことができるが、上記フィルタ7内に塵埃等がつまって
目づまりを起こしたり、現像チャンバ内のノズルが目づ
まりあるいは腐蝕によってスプレー状態の悪化を来たし
た場合にフィルタネ良に基づくものか現像チャンバ内の
ノズル不良に基づくものかが、解からないためにその保
守に多くの時間を消貿し、現像システムに連なる他のシ
ステムも含めてダウンタイムが長くなる欠点を有する。According to the above configuration, it is possible to develop the object to be developed, such as a mask, but the filter 7 may be clogged with dust, etc., or the nozzle in the developing chamber may become clogged or corroded, resulting in a spray state. If a problem occurs, it is not clear whether the problem is caused by a faulty filter or a faulty nozzle in the developing chamber, so a lot of time is spent on maintenance, including other systems connected to the developing system. This has the disadvantage of increasing downtime.
(4)発明の目的
本発明は上記欠点に鑑みなされたもので、フィルタの目
づまりかあるいはノズルの腐蝕又は目づまりに基づくス
プレー状態の悪化かを簡単に見分けることのできるスプ
レー現像装置を提供することを目的とするものである。(4) Purpose of the Invention The present invention has been made in view of the above-mentioned drawbacks, and it is an object of the present invention to provide a spray developing device in which it is possible to easily distinguish whether the spray condition is deteriorated due to clogging of the filter or corrosion or clogging of the nozzle. The purpose is to
(5)発明の構成
そして上記目的は本発明によれば、スピンナーチャック
上に載置した被現像体にノズルより現像液を噴出させる
ようになした現像チャンバ手段と。(5) Structure of the Invention According to the present invention, the above object is a developing chamber means configured to eject a developer from a nozzle onto an object to be developed placed on a spinner chuck.
該現像チャンバ手段に現像液を供給する加圧タンク手段
と、上記現像チャンバ手段と、該加圧タンク手段間に第
1の流量調節手段と、フィルタを介して該加圧タンク内
の現像液を現像チャンバ手段内のノズルに供給する第1
の通路と、上記フィルタをバイパスする第2の通路内に
第2の流量調節手段を有することを特徴とするスプレー
現像装置を提供することで達成される。a pressurized tank means for supplying a developer to the developing chamber means; a first flow rate adjusting means between the developing chamber means and the pressurized tank means; and a filter for supplying the developer in the pressurized tank. a first supplying a nozzle within the development chamber means;
This is achieved by providing a spray developing device characterized in that it has a second flow rate regulating means in a passageway and a second passageway that bypasses the filter.
(6)発明の実施例
以下2本発明の一実施例を第1図乃至第3図に5 一
ついて詳記する。第1図は本発明のスプレー現像装置の
系統図、第2図は本発明の第1図と同様のバイパス通路
部分の他の実施例を示す系統図、第3図は本発明の第1
図と同様のバイパス通路部分の更に他の実施例を示す系
統図である。(6) Embodiments of the Invention The following two embodiments of the present invention will be described in detail with reference to FIGS. 1 to 3. FIG. 1 is a system diagram of the spray developing device of the present invention, FIG. 2 is a system diagram showing another embodiment of the bypass passage portion similar to that in FIG. 1 of the present invention, and FIG.
It is a system diagram showing still another example of a bypass passage part similar to the figure.
第1図乃至第3図において、第4図と同一部分には同一
符号を付して重複説明は省略する。In FIGS. 1 to 3, the same parts as in FIG. 4 are given the same reference numerals, and redundant explanation will be omitted.
第4図において、ガス駆動制御部1から加圧タンクに加
えるガスとして不活性のN2ガスを用いた場合を説明し
たが、これらは充分に塵埃の除去されたドライエア等で
もよく、第1図において。In FIG. 4, we have explained the case where inert N2 gas is used as the gas added to the pressurized tank from the gas drive control unit 1, but dry air etc. from which dust has been sufficiently removed may be used as the gas, and in FIG. .
必要に応じて前記ガス駆動制御部1と加圧タンク2間の
ガス供給管5の途中に塵埃除去用のフィルタを介在させ
るようにしてもよい。If necessary, a filter for removing dust may be interposed in the middle of the gas supply pipe 5 between the gas drive control section 1 and the pressurized tank 2.
加圧タンク2には現像液3となる有機溶剤がN2ガスに
よって加圧されて第1の通路6に配された第1の流量調
節用弁13塵埃除去フィルタ7゜第3の流量調節用弁1
4を介して現像チャンバ8内のノズル9先端から現像液
3を被現像体11上にスプレー12するには第1及び第
3の流量調節用弁13,14を開状態とし、第1の通路
6の第1の流量調節用弁13と塵埃除去フィルタフに並
列に配設した第2の通路16のバイパス機能を果す第2
の流量調節用弁15を閉状態とする。In the pressurized tank 2, an organic solvent to be used as the developer 3 is pressurized with N2 gas, and a first flow rate adjustment valve 13 disposed in the first passage 6 is provided with a dust removal filter 7゜a third flow rate adjustment valve. 1
In order to spray 12 the developer 3 onto the object to be developed 11 from the tip of the nozzle 9 in the developing chamber 8 via the first and third flow rate regulating valves 13 and 14, the first passage is opened. A second flow rate regulating valve 13 of No. 6 and a second passage 16 disposed in parallel with the dust removal filter have a bypass function.
The flow rate adjustment valve 15 is closed.
次に塵埃除去フィルタフの目づまりかあるいは現像チャ
ンバ8内のノズル9の目づまり又は腐蝕によるスプレー
状態の悪化かを見分けるためには第1の流量調節用弁1
3を閉じると共に、第2及び第3の流量調節用弁15.
14を開いて塵埃除去フィルタフに現像液3を通さずに
バイパスの第2の通路16のみに現像液を通すようにし
てノズル9よりのスプレー状態が良好であれば2塵埃除
去フイルタ7の目づまりであることが直ちに解り。Next, in order to determine whether the dust removal filter is clogged or the nozzle 9 in the developing chamber 8 is clogged or the spray condition is deteriorated due to corrosion, the first flow rate adjustment valve 1 is used.
3, and the second and third flow rate regulating valves 15.
14 to allow the developer to pass only through the bypass second passage 16 without passing the developer 3 through the dust removal filter 2. If the spray condition from the nozzle 9 is good, the dust removal filter 7 is clogged. I understood something immediately.
スプレー状態が不良であればスプレー用のノズルに目づ
まりあるいは劣化を生じていることが解るので所定の部
品交換を行うようにする。If the spray condition is poor, this indicates that the spray nozzle is clogged or has deteriorated, so the specified parts should be replaced.
第2図は本発明の他の実施例を示す第2のバイパス用通
路部分は同じであるが、第1の通路の第3の流量調節用
弁14を省略したものでスプレーしてi現像体を現像す
る場合は第2の流量調節用〜6−
弁15を閉じ、第1の流量調節用弁13を開けばよく、
又チェック時には第1の流量調節用弁13を閉じ、第2
の流N調節用弁15を開けばよい。FIG. 2 shows another embodiment of the present invention, in which the second bypass passage portion is the same, but the third flow rate regulating valve 14 of the first passage is omitted, and the i-developer is sprayed. When developing, it is sufficient to close the second flow rate adjustment valve 15 and open the first flow rate adjustment valve 13.
Also, when checking, the first flow rate adjustment valve 13 is closed and the second flow rate adjustment valve 13 is closed.
All you have to do is open the flow N adjustment valve 15.
第3図の場合は第1の/M、M調節側弁13と塵埃除去
フィルタ7並に第3の流量調節用弁14をバイパスする
ような第2通路16を設けたもので現像時は第1及び第
3の流量調節用弁13.14を開。In the case of FIG. 3, a second passage 16 is provided that bypasses the first /M, M regulating side valve 13, the dust removal filter 7, and the third flow rate regulating valve 14. Open the first and third flow control valves 13 and 14.
第2の流量調節用弁15を閉として現像スプレーを行い
、チェック時には第2の流量調節用弁15を閉じて第1
及び第3の流量調節用弁13.14を閉状態とすれば同
じようにノズルあるいはフィルタの良否を判定すること
が可能となる。Developing spray is performed with the second flow rate adjustment valve 15 closed, and when checking, the second flow rate adjustment valve 15 is closed and the first
If the third flow rate regulating valves 13 and 14 are closed, it is possible to determine the quality of the nozzle or filter in the same way.
(7)発明の効果
本発明は叙上の如く構成させたので、スプレー形状の悪
化がフィルタの目づまりに基づくものかスプレーノズル
の目づまりあるいは腐蝕による劣化なのかを直ちに判断
することができるのでスプレー状態の悪化によってシス
テム全体が受けるダウンタイムを大幅に短縮できる効果
を有する。(7) Effects of the Invention Since the present invention is constructed as described above, it is possible to immediately determine whether the deterioration of the spray shape is due to clogging of the filter or deterioration due to clogging or corrosion of the spray nozzle. This has the effect of significantly reducing the downtime that the entire system suffers due to deterioration of the condition.
第1図は本発明のスプレー現像装置の系統図。
第2図は本発明のスプレー現像装置のバイパス通路部分
の他の実施例を示す系統図。
第3図は本発明のスプレー現像装置のバイパス通路部分
の更に他の実施例を示す系統図。
第4図は従来のスプレー現像装置の系統図である。
1・・・ガス駆動制御部。
2・・・加圧タンク。
3・・・現像液。
4・・・窒素ガス。
5・・・ガス供給管。
6・・・第1の通路。
7・・・塵埃除去フィルタ。
8・・・現像チャンバ。
10・・・スピンナチャック。
11・・・被現像体。
12・・・ノズル。
13、 14..15・・・第1〜第3の流量調節用
弁。
16・・・第2の通路。FIG. 1 is a system diagram of the spray developing device of the present invention. FIG. 2 is a system diagram showing another embodiment of the bypass passage portion of the spray developing device of the present invention. FIG. 3 is a system diagram showing still another embodiment of the bypass passage portion of the spray developing device of the present invention. FIG. 4 is a system diagram of a conventional spray developing device. 1... Gas drive control section. 2... Pressurized tank. 3...Developer. 4...Nitrogen gas. 5...Gas supply pipe. 6...First passage. 7...Dust removal filter. 8...Developing chamber. 10...Spinner Chuck. 11... Object to be developed. 12... Nozzle. 13, 14. .. 15...First to third flow rate adjustment valves. 16...Second passage.
Claims (1)
現像液を噴出させるようになした現像チャンバ手段と、
該現像チャンバ手段に現像液を供給する加圧タンク手段
と、上記現像チャンバ手段と、該加圧タンク手段間に第
1の流量調節手段と、フィルタを介して該加圧タンク内
の現像液を現像チャンバ手段内のノズルに供給する第1
の通路と、上記フィルタをバイパスする第2の通路内に
第2の流量調節手段を有することを特徴とするスプレー
現像装置。a developing chamber means configured to eject a developing solution from a nozzle onto an object to be developed placed on a spinner chuck;
a pressurized tank means for supplying a developer to the developing chamber means; a first flow rate adjusting means between the developing chamber means and the pressurized tank means; and a filter for supplying the developer in the pressurized tank. a first supplying a nozzle within the development chamber means;
A spray developing device comprising a passageway and a second flow rate adjusting means in a second passageway that bypasses the filter.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26924284A JPS61147256A (en) | 1984-12-20 | 1984-12-20 | Spray developing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26924284A JPS61147256A (en) | 1984-12-20 | 1984-12-20 | Spray developing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61147256A true JPS61147256A (en) | 1986-07-04 |
Family
ID=17469629
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP26924284A Pending JPS61147256A (en) | 1984-12-20 | 1984-12-20 | Spray developing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61147256A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007330935A (en) * | 2006-06-19 | 2007-12-27 | Tokyo Ohka Kogyo Co Ltd | Treatment liquid supply apparatus |
-
1984
- 1984-12-20 JP JP26924284A patent/JPS61147256A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007330935A (en) * | 2006-06-19 | 2007-12-27 | Tokyo Ohka Kogyo Co Ltd | Treatment liquid supply apparatus |
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