JPS61144576A - Semiconductor acceleration sensor - Google Patents

Semiconductor acceleration sensor

Info

Publication number
JPS61144576A
JPS61144576A JP26518484A JP26518484A JPS61144576A JP S61144576 A JPS61144576 A JP S61144576A JP 26518484 A JP26518484 A JP 26518484A JP 26518484 A JP26518484 A JP 26518484A JP S61144576 A JPS61144576 A JP S61144576A
Authority
JP
Japan
Prior art keywords
semiconductor
stopper
resistance
substrate
variation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP26518484A
Other languages
Japanese (ja)
Other versions
JPH0660906B2 (en
Inventor
Koichi Murakami
浩一 村上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Motor Co Ltd
Original Assignee
Nissan Motor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Motor Co Ltd filed Critical Nissan Motor Co Ltd
Priority to JP59265184A priority Critical patent/JPH0660906B2/en
Publication of JPS61144576A publication Critical patent/JPS61144576A/en
Publication of JPH0660906B2 publication Critical patent/JPH0660906B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Pressure Sensors (AREA)

Abstract

PURPOSE:To simplify production processes, to eliminate the temp. variation and distortion due to piezoresistance and to prevent the resistance variation of the piezoresistance by forming the lower part stopper of the cantilever of semiconductor on the substrate to package semiconductor tip and by forming the upper part stopper separate from aluminum bonding pad. CONSTITUTION:A recessed part 15b is formed on HIC substrate 23 and made as the lower part stopper for semiconductor cantilever 7 and semiconductor weight 5, also the upper part stopper 13b is formed in channel shape on the outer peripheral part of the gap 3 of the above of a silicon tip 1. The number of components can therefore be reduced without the necessity to form the stop per 15b as simple substance due to the recessed part of the substrate 23 being used as the lower part stopper 15 of the weight 5. The output errors and temp. variation of the case of using a piezoresistance 9 as bridge can be reduced because of there being no necessity of performing the electrical connection of the resistance 9 and outer part with using high density diffusion zone as well. Further due to the stopper 13b being formed on the outer peripheral part of the gap of the tip 1 the effect due to heat is relieved and the resistance variation of the resistance 9 can be prevented.

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は半導体片持ちばつを有し、ピエゾ効果を利用
して加速度を測定する半導体加速度ごンサに関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor acceleration sensor that has a semiconductor cantilever and measures acceleration using a piezo effect.

[従来の技術] 従来の半導体加速度セン奢すとしては例えば第2図に示
すようなものがある。これは文献rL、M。
[Prior Art] A conventional semiconductor acceleration sensor is shown in FIG. 2, for example. This is from the literature rL,M.

10 ylanco  、   and  、   、
ノ 、  B 、  Δ ngell   、   ”
ABatch−Fabricated  5ilico
n  Accelero−Ieter 、  “I E
3  E Iectron  1)evices、 v
ol 。
10 ylanco, and, ,
ノ、B、Δngell、”
ABatch-Fabricated 5ilico
n Accelero-Ieter, “I E
3 E Iectron 1) evices, v
ol.

ED−26,No  、12.PP、191 1〜19
17.1979Jに詳しい説明があるが、ここで第2図
に基づいてその概略を説明する。
ED-26, No, 12. PP, 191 1-19
17.1979J, a detailed explanation will be given below based on FIG. 2.

第2図(a)は半導体加速度センサの平面図、同図(b
)は側面図であり、同図に示されるように、半導体チッ
プ(以下シリコーンチップと称する)1上に空隙3が形
成されることによって端部に半導体おもり(以下シリコ
ンおもりと称する)5を有する半導体片持ちぼり(以下
シリコン片持ちばっと称する)7がシリコンチップ1に
形成される。シリコン片持ちぼり7表面には不純物拡散
によりピエゾ抵抗9が形成され、又シリコンチップ1上
にはピエゾ抵抗9に隣接して高りa度拡散領域11が形
成される。
Figure 2(a) is a plan view of the semiconductor acceleration sensor, and Figure 2(b) is a plan view of the semiconductor acceleration sensor.
) is a side view, and as shown in the figure, a void 3 is formed on a semiconductor chip (hereinafter referred to as a silicone chip) 1, so that a semiconductor weight (hereinafter referred to as a silicone weight) 5 is provided at the end. A semiconductor cantilever (hereinafter referred to as a silicon cantilever) 7 is formed on the silicon chip 1. A piezoresistor 9 is formed on the surface of the silicon cantilever 7 by impurity diffusion, and a high a degree diffusion region 11 is formed on the silicon chip 1 adjacent to the piezoresistor 9.

過大な加速度が加わった時にシリコン片持ちばり7の過
度の変形を防止する為に、シリコンチップ1の上下にそ
れぞれ上部ストッパ13及び下部ストッパ15が段Cノ
られる。該上部ストッパ13及び下部ストッパ15には
シリコン片持ちばり7が変形できるように夫々凹部13
’a、15aが形成される。
In order to prevent excessive deformation of the silicon cantilever beam 7 when excessive acceleration is applied, an upper stopper 13 and a lower stopper 15 are provided in steps C above and below the silicon chip 1, respectively. The upper stopper 13 and the lower stopper 15 each have a recess 13 so that the silicon cantilever beam 7 can be deformed.
'a, 15a is formed.

上部ストッパ13の下面には高濃度拡散領域11に隣接
してアルミニウムボンディングパット1つが形成され、
該アルミニウムボンディングパット19に取り出し線2
1が接続される。
One aluminum bonding pad is formed on the lower surface of the upper stopper 13 adjacent to the high concentration diffusion region 11,
A lead wire 2 is attached to the aluminum bonding pad 19.
1 is connected.

このような半導体加速II tンサを用いC加速度を測
定するには次のようにして行なう。即ら加速度を受()
るど9912片持ちばり7がたわみ、これによりシリコ
ン片持ちぼり7表面に形成されたごニジ抵抗9の抵抗値
が変化する。該ピエゾ抵抗9は高濃度拡散1bX11、
アルミニウムボンディングパット19を介して取り出し
PJ21により外部と電気的に接続されており、ピエゾ
抵抗9の抵抗値が変化し、出力電圧がかわることにより
加速度が測定される。
The C acceleration is measured using such a semiconductor acceleration II sensor as follows. That is, it receives acceleration ()
The 9912 cantilever beam 7 is deflected, thereby changing the resistance value of the rainbow resistor 9 formed on the surface of the silicon cantilever beam 7. The piezoresistor 9 is a high concentration diffusion 1bX11,
It is electrically connected to the outside via an aluminum bonding pad 19 and a lead PJ 21, and the acceleration is measured by changing the resistance value of the piezoresistor 9 and changing the output voltage.

[発明が解決しようとする問題点] しかしながら、このようなピエゾ抵抗効果を用いた半導
体加速度センサは、一般に感度が低くまた感度の温度抵
抗依存性が大きいので増幅回路及び温度補償回路等の外
付番ノ回路を要する。そして、信頼性を向上し、コトス
を低廉にするにはこのような外付は回路を一体的に形成
する必要がある。
[Problems to be Solved by the Invention] However, semiconductor acceleration sensors using piezoresistance effects generally have low sensitivity, and the sensitivity is highly dependent on temperature resistance, so it is difficult to connect external amplifier circuits and temperature compensation circuits. It requires a number of circuits. In order to improve reliability and reduce cost, it is necessary to integrally form such external circuits.

しかし、調整用の抵抗等も必要な為、通常このために厚
膜抵抗の形成が可能なHI C基板23上に実装されて
いる。
However, since adjustment resistors and the like are also required, they are usually mounted on the HIC substrate 23 on which thick film resistors can be formed.

而して、このようなHIC基板23上に半導体加速度セ
ンサを実装する場合には以下に示されるような問題点が
あった。
However, when mounting a semiconductor acceleration sensor on such an HIC board 23, there are problems as shown below.

■ シリコンチップ1に下部ストッパ15の片面を接着
した後、更にこの下部ストッパの他面をHIC基板23
に接着する必要があり、作業工程が多い。
■ After bonding one side of the lower stopper 15 to the silicon chip 1, the other side of the lower stopper is attached to the HIC substrate 23.
It requires many work steps.

■ 半導体加速度センサをHIG基板23で配線する場
合、電源・出力調整抵抗用等の端子数が多くなり、第2
図のような構成ではボンディングワイアを使うことが困
難である。
■ When wiring the semiconductor acceleration sensor with the HIG board 23, the number of terminals for power supply, output adjustment resistance, etc. increases, and the second
In the configuration shown in the figure, it is difficult to use bonding wires.

■ 高濃度拡散領bA11を形成してあり、ピエゾ抵抗
9をブリッジとして使用する時には温度変化及びひずみ
により誤差がでやすい。
(2) A high concentration diffusion region bA11 is formed, and when the piezoresistor 9 is used as a bridge, errors are likely to occur due to temperature changes and distortion.

■ 上部ストッパ13との間での熱ひずみによりピエゾ
抵抗9の抵抗変化を招き易い。
(2) Thermal strain between the upper stopper 13 and the piezoresistor 9 tends to change its resistance.

[問題点を解決する為の手段] この発明はこのような従来の問題点に着目してなされた
もので、半導体チップを実装する基板に半導体片持ちば
つの下部ストッパを形成し、アルミニウムボンディング
パットから離れて上部ストッパを形成することにより上
記問題点を解決するものである。
[Means for Solving the Problems] The present invention was made by focusing on the problems of the conventional art, and includes forming a lower stopper of a semiconductor cantilever on a substrate on which a semiconductor chip is mounted, and an aluminum bonding pad. The above problem is solved by forming the upper stopper apart from the upper stopper.

[実施例] 以下この発明を図面に基づいて説明する。[Example] The present invention will be explained below based on the drawings.

第1図はこの発明の一実施例を示す図であり、同図(a
)、(b)は夫々半導体加速度センサの平面図及び側面
図である。同図において第2図に示した従来の半導体加
速度センサと同一の(1能を果たす要素には同一の番号
を付している。
FIG. 1 is a diagram showing an embodiment of the present invention, and FIG.
) and (b) are a plan view and a side view of a semiconductor acceleration sensor, respectively. In the same figure, elements that perform the same functions as those of the conventional semiconductor acceleration sensor shown in FIG. 2 are given the same numbers.

この実施例では第2図に示す従来の半導体加速度センサ
の下部ストッパ15を設けず、これに代えてト1■0基
板23上に凹部15bを形成して、これをシリコン片持
らばり7及びシリ」ンおちり5の下部ストッパとづると
ともに、上部ス1へツバ13bは、シリコンチップ1上
のアルミニウムボンディングパット19側で支持するこ
となく、シリコンチップ1上に形成された空隙3の外周
部にコの字形に形成している。
In this embodiment, the lower stopper 15 of the conventional semiconductor acceleration sensor shown in FIG. Along with the lower stopper of the silicone dust 5, the collar 13b of the upper part 1 is not supported on the side of the aluminum bonding pad 19 on the silicon chip 1, but is attached to the outer periphery of the gap 3 formed on the silicon chip 1. It is formed into a U-shape.

シリコンチップ1のHIC基板23への取付は方法とし
ては金(Au )のダイボンディング、はんだづけ、エ
ボシキ等による接着を行う等の方法がある。
The silicon chip 1 can be attached to the HIC substrate 23 by gold (Au) die bonding, soldering, embossment, or the like.

この実施例ではピエゾ抵抗9がシリコンチップ1上に形
成されたiJA積回路25部に接続されるとともに、該
集積回路25周辺にアルミニウムボンディングパット1
9が自由に設けられ、HIC基板23上に設けられたト
11cii板ボンディングパット27と前記アルミニウ
ムボランディングパット19とがボンディングワイヤ2
9によって接続される。前記集積回路25は増幅及び温
度補償等の機能を有するものであり、シリコンチップ1
に形成されている。。
In this embodiment, a piezoresistor 9 is connected to an iJA integrated circuit 25 formed on a silicon chip 1, and an aluminum bonding pad 1 is placed around the integrated circuit 25.
9 is freely provided, and the bonding pad 27 provided on the HIC board 23 and the aluminum bolanding pad 19 are connected to the bonding wire 2.
Connected by 9. The integrated circuit 25 has functions such as amplification and temperature compensation, and is made of silicon chip 1.
is formed. .

上記構成により、シリコンおもりの下部ストッパとして
H[C基板の凹部を用いる為、下部ストツバを単体とし
て形成する必要がなく、部品点数を減らせるとともに取
り(=lけ回数も減らすことができる。
With the above configuration, since the concave portion of the H[C substrate is used as the lower stopper of the silicon weight, there is no need to form the lower stopper as a single unit, and the number of parts can be reduced as well as the number of times it can be removed.

さらに、シリコンチップ1のうち、ト+rc基板23へ
の取付部の厚さよりシリコンおもり5の厚さを薄くする
事によりHIG基板23に凹部15bを設けなくてもよ
い。
Furthermore, by making the thickness of the silicon weight 5 thinner than the thickness of the attachment portion of the silicon chip 1 to the RC substrate 23, it is not necessary to provide the recess 15b in the HIG substrate 23.

又、上部ストッパはアルミニウムボンディングバット上
に形成されていない為、アルミニウムボランディングバ
ットをボンディングワイヤによって簡単に接続できるの
で、配線が容易となり又配線工程も簡単となる。
In addition, since the upper stopper is not formed on the aluminum bonding bat, the aluminum bonding bat can be easily connected with a bonding wire, which facilitates wiring and also simplifies the wiring process.

更に、高濃度拡散領域を用いてピエゾ抵抗と外部の電気
的接続を行なう必要がないので、ピエゾ抵抗をブリッジ
として用いる場合の出力誤差及び温度変化を低減できる
Furthermore, since there is no need to make external electrical connections to the piezoresistor using a heavily doped diffusion region, output errors and temperature changes when using the piezoresistor as a bridge can be reduced.

又、更に、上部ストッパへの支持部はシリコンチップの
空隙外周部に形成されている為上部ストッパに熱等によ
るひずみが加わったとしてもシリコン片持ちばりへのひ
ずみの影響を緩和でき、ピエゾ抵抗の抵抗変化を防止で
きる。
Furthermore, since the support part for the upper stopper is formed on the outer periphery of the silicon chip, even if the upper stopper is subjected to strain due to heat, etc., the effect of the strain on the silicon cantilever beam can be alleviated, and the piezoresistor can prevent resistance changes.

[発明の効果] 以上説明したこの発明によれば、製作工程が簡略化され
、自由にボンデングワイヤを使うことができ、ピエゾ抵
抗による温度変化やひずみが少なく、ピエゾ抵抗の抵抗
変化を招くことのない半導体加速度セ”ンサを提供する
ことができる。
[Effects of the Invention] According to the invention described above, the manufacturing process is simplified, bonding wires can be used freely, temperature changes and distortions caused by piezoresistors are small, and resistance changes of piezoresistors are avoided. It is possible to provide a semiconductor acceleration sensor without

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)、(b)はこの実施例に係る半導体加速度
センサの平面図及び側面図、第2図(a)、(b)は従
来の半導体加速度センサの正面図及び側面図である。 1・・・半導体チップ  7・・・半導体片持らばり9
・・・ピエゾ抵抗   13a・・・上部ストッパ15
b・・・下部ストッパ(凹部) 19・・・アルミニウムボンディングバット23・・・
HIC基板  25・・・集積回路第1図(a) 第1図(b) 1       5   15b 第2図(Q) 第2図(b) 1’5  1        5   15Q手続補正
型(方式) 特許庁長官   志 賀  学  殿 1、事件の表示   特願昭 59−265184月2
、発明の名称   半導体加速度センサス3、補正をす
る者 事件との関係 特許出願人 住所(居所) 神奈川ms浜市神奈川用宝町2番地氏名
(名称)(399)日産自動車株式会社代表者  石 
原  俊 4、代理人 住 所    〒105東京都港区虎ノ門1丁目2番3
号虎ノ門第−ビル5階 6、補正の対象 「明M書」 7、補正の内容 (1)明細11頁第17行目に、 「これは文献rL、M、J とあるのを、 Fこれは文献エル、エム、ローランス・およびジエイ、
ど−、アンジェルのrlクツチ式シリコン加速度セン+
jIJEEEAlj格、エレクトロンデバイス、197
9年第εD26巻、第12号、第1911〜1917頁
rL、M、J と補正する。
FIGS. 1(a) and (b) are a plan view and a side view of a semiconductor acceleration sensor according to this embodiment, and FIGS. 2(a) and (b) are a front view and a side view of a conventional semiconductor acceleration sensor. . 1... Semiconductor chip 7... Semiconductor single-sided beam 9
...Piezo resistor 13a...Upper stopper 15
b... Lower stopper (recess) 19... Aluminum bonding butt 23...
HIC board 25...Integrated circuit Figure 1 (a) Figure 1 (b) 1 5 15b Figure 2 (Q) Figure 2 (b) 1'5 1 5 15Q procedural amendment type (method) Commissioner of the Patent Office Manabu Shiga 1, Indication of the incident Patent application Sho 59-26518 April 2
, Title of the invention Semiconductor Acceleration Census 3, Relationship to the person making the amendment Patent applicant address (residence) 2 Yotakaramachi, Kanagawa, MS Hama-shi Name (name) (399) Nissan Motor Co., Ltd. Representative Ishi
Shun Hara 4, Agent address: 1-2-3 Toranomon, Minato-ku, Tokyo 105
No. Toranomon No. 5, Building 5th Floor 6, Subject of amendment: ``Mei M Book'' 7. Contents of amendment (1) On page 11, line 17 of the specification, ``This is Document rL, M, J. References L., M., Laurence and G.I.
What, Angel's RL Kutsuchi type silicon acceleration sensor +
JIJEEEEAlj, Electron Device, 197
9, Vol. εD, Vol. 26, No. 12, pp. 1911-1917 rL, M, J.

Claims (1)

【特許請求の範囲】[Claims]  半導体チップを実装する基板に半導体片持ちばりの下
部ストッパを形成し、前記半導体片持ちばりの上部にア
ルミニウムボンディングパットから離れて上部ストッパ
を形成したことを特徴とする半導体加速度センサ。
A semiconductor acceleration sensor characterized in that a lower stopper of a semiconductor cantilever is formed on a substrate on which a semiconductor chip is mounted, and an upper stopper is formed on the upper part of the semiconductor cantilever apart from an aluminum bonding pad.
JP59265184A 1984-12-18 1984-12-18 Semiconductor acceleration sensor Expired - Lifetime JPH0660906B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59265184A JPH0660906B2 (en) 1984-12-18 1984-12-18 Semiconductor acceleration sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59265184A JPH0660906B2 (en) 1984-12-18 1984-12-18 Semiconductor acceleration sensor

Publications (2)

Publication Number Publication Date
JPS61144576A true JPS61144576A (en) 1986-07-02
JPH0660906B2 JPH0660906B2 (en) 1994-08-10

Family

ID=17413730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59265184A Expired - Lifetime JPH0660906B2 (en) 1984-12-18 1984-12-18 Semiconductor acceleration sensor

Country Status (1)

Country Link
JP (1) JPH0660906B2 (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4829822A (en) * 1986-09-22 1989-05-16 Nippondenso Co., Ltd. Semiconductor accelerometer
US4848157A (en) * 1986-11-20 1989-07-18 Aisin Seiki Kabushiki Kaisha Acceleration detecting device
US4882933A (en) * 1988-06-03 1989-11-28 Novasensor Accelerometer with integral bidirectional shock protection and controllable viscous damping
US5111693A (en) * 1988-01-13 1992-05-12 The Charles Stark Draper Laboratory, Inc. Motion restraints for micromechanical devices
US5121633A (en) * 1987-12-18 1992-06-16 Nissan Motor Co., Ltd. Semiconductor accelerometer
US5126812A (en) * 1990-02-14 1992-06-30 The Charles Stark Draper Laboratory, Inc. Monolithic micromechanical accelerometer
US5129983A (en) * 1991-02-25 1992-07-14 The Charles Stark Draper Laboratory, Inc. Method of fabrication of large area micromechanical devices
US5203208A (en) * 1991-04-29 1993-04-20 The Charles Stark Draper Laboratory Symmetrical micromechanical gyroscope
US5216490A (en) * 1988-01-13 1993-06-01 Charles Stark Draper Laboratory, Inc. Bridge electrodes for microelectromechanical devices
US5438859A (en) * 1991-09-24 1995-08-08 Murata Manufacturing Co. Ltd. Acceleration sensor having fault diagnosing device
US5520051A (en) * 1989-09-27 1996-05-28 Nippondenso Co., Ltd. Strain sensing device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS519593A (en) * 1974-07-12 1976-01-26 Sharp Kk Hakumakuhatsukososhi

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS519593A (en) * 1974-07-12 1976-01-26 Sharp Kk Hakumakuhatsukososhi

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4829822A (en) * 1986-09-22 1989-05-16 Nippondenso Co., Ltd. Semiconductor accelerometer
US4848157A (en) * 1986-11-20 1989-07-18 Aisin Seiki Kabushiki Kaisha Acceleration detecting device
US5121633A (en) * 1987-12-18 1992-06-16 Nissan Motor Co., Ltd. Semiconductor accelerometer
US5111693A (en) * 1988-01-13 1992-05-12 The Charles Stark Draper Laboratory, Inc. Motion restraints for micromechanical devices
US5216490A (en) * 1988-01-13 1993-06-01 Charles Stark Draper Laboratory, Inc. Bridge electrodes for microelectromechanical devices
US4882933A (en) * 1988-06-03 1989-11-28 Novasensor Accelerometer with integral bidirectional shock protection and controllable viscous damping
US5520051A (en) * 1989-09-27 1996-05-28 Nippondenso Co., Ltd. Strain sensing device
US5126812A (en) * 1990-02-14 1992-06-30 The Charles Stark Draper Laboratory, Inc. Monolithic micromechanical accelerometer
US5129983A (en) * 1991-02-25 1992-07-14 The Charles Stark Draper Laboratory, Inc. Method of fabrication of large area micromechanical devices
US5203208A (en) * 1991-04-29 1993-04-20 The Charles Stark Draper Laboratory Symmetrical micromechanical gyroscope
US5438859A (en) * 1991-09-24 1995-08-08 Murata Manufacturing Co. Ltd. Acceleration sensor having fault diagnosing device
US5517845A (en) * 1991-09-24 1996-05-21 Murata Manufacturing Co., Ltd. Acceleration sensor having fault diagnosing device

Also Published As

Publication number Publication date
JPH0660906B2 (en) 1994-08-10

Similar Documents

Publication Publication Date Title
US5663508A (en) Silicon flow sensor
US4295115A (en) Semiconductor absolute pressure transducer assembly and method
JPS6341080A (en) Semiconductor acceleration sensor
JPS61144576A (en) Semiconductor acceleration sensor
JP2804874B2 (en) Semiconductor acceleration detector
US5828116A (en) Semiconductor device with bonded wires
US4908693A (en) Wiring structure of semiconductor pressure sensor
JP3117925B2 (en) Semiconductor acceleration sensor
JPH0814517B2 (en) Semiconductor pressure sensor
JPH0694744A (en) Semiconductor acceleration detector
JP3345649B2 (en) Silicon accelerometer
JPH05281251A (en) Acceleration sensor and manufacture thereof
JP3019549B2 (en) Semiconductor acceleration sensor
JPH05340956A (en) Acceleration sensor
JPH02196938A (en) Pressure sensor
JPH09196967A (en) Semiconductor dynamic-quantity sensor
JP3034620B2 (en) 3D acceleration sensor
JPS59172266A (en) Hybrid integrated circuit and manufacture thereof
JP2855885B2 (en) Semiconductor type flow detector
JPH06216396A (en) Acceleration sensor
JPH02218171A (en) Semiconductor pressure sensor
JPH05281248A (en) Semiconductor acceleration sensor
JPH04278462A (en) Semiconductor acceleration sensor
JP3341371B2 (en) Semiconductor device
JPH0666831A (en) Semiconductor starin gauge unit