JPS61142443U - - Google Patents
Info
- Publication number
- JPS61142443U JPS61142443U JP2693985U JP2693985U JPS61142443U JP S61142443 U JPS61142443 U JP S61142443U JP 2693985 U JP2693985 U JP 2693985U JP 2693985 U JP2693985 U JP 2693985U JP S61142443 U JPS61142443 U JP S61142443U
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- pair
- ion etching
- reactive gas
- reactive ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001020 plasma etching Methods 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2693985U JPS61142443U (de) | 1985-02-26 | 1985-02-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2693985U JPS61142443U (de) | 1985-02-26 | 1985-02-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61142443U true JPS61142443U (de) | 1986-09-03 |
Family
ID=30523424
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2693985U Pending JPS61142443U (de) | 1985-02-26 | 1985-02-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61142443U (de) |
-
1985
- 1985-02-26 JP JP2693985U patent/JPS61142443U/ja active Pending