JPS6113951B2 - - Google Patents
Info
- Publication number
- JPS6113951B2 JPS6113951B2 JP53153937A JP15393778A JPS6113951B2 JP S6113951 B2 JPS6113951 B2 JP S6113951B2 JP 53153937 A JP53153937 A JP 53153937A JP 15393778 A JP15393778 A JP 15393778A JP S6113951 B2 JPS6113951 B2 JP S6113951B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- machining
- ferrite
- polycrystalline
- fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005498 polishing Methods 0.000 claims description 33
- 238000003754 machining Methods 0.000 claims description 31
- 229910000859 α-Fe Inorganic materials 0.000 claims description 29
- 239000013078 crystal Substances 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 21
- 238000012545 processing Methods 0.000 claims description 21
- 239000012530 fluid Substances 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 18
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 16
- 239000000126 substance Substances 0.000 claims description 12
- 239000000843 powder Substances 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 5
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 230000002378 acidificating effect Effects 0.000 claims 1
- 238000007517 polishing process Methods 0.000 claims 1
- 238000003672 processing method Methods 0.000 description 19
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 230000003746 surface roughness Effects 0.000 description 9
- 230000006866 deterioration Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 239000006061 abrasive grain Substances 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 230000005389 magnetism Effects 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000011162 core material Substances 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000002562 thickening agent Substances 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 238000002003 electron diffraction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012847 fine chemical Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- DKAGJZJALZXOOV-UHFFFAOYSA-N hydrate;hydrochloride Chemical compound O.Cl DKAGJZJALZXOOV-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Description
【発明の詳細な説明】
本発明は、多結晶材料の表面を鏡面に加工する
研摩方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a polishing method for processing the surface of a polycrystalline material into a mirror surface.
近年の電子部品用材料には、結晶構造の乱れ、
もしくは残留応力のない完全な鏡面加工を必要と
するものが多い。例えば、シリコン単結晶等の半
導体材料においては、材料が高純度の単結晶であ
ることを利用して、最終加工として化学研摩を行
つているが、工業的に用いられる多くの材料は多
結晶材料であり、多結晶材料を化学研摩すると、
各結晶面の加工速度異方性のために結晶粒ごとの
段差が研摩面に生じる。一般的な前加工法である
ポリツシングによる加工変質を化学研摩で除去す
ると、この結晶粒ごとの段差は数百オングストロ
ームにも達し、もはや鏡面ではあり得ない。 In recent years, materials for electronic components have a disordered crystal structure,
Or, many require complete mirror finishing with no residual stress. For example, for semiconductor materials such as silicon single crystals, chemical polishing is performed as a final processing to take advantage of the fact that the materials are highly pure single crystals, but many materials used industrially are polycrystalline materials. And when polycrystalline material is chemically polished,
Due to the anisotropy of the machining speed of each crystal plane, a difference in level between each crystal grain occurs on the polished surface. When the process deterioration caused by polishing, which is a common pre-processing method, is removed by chemical polishing, the step difference between each crystal grain reaches several hundred angstroms, and it is no longer possible to have a mirror surface.
特に、近年磁気記録の高密度化が進み、VTR
等の磁気ヘツドに用いられるMn−Znフエライト
においては表面あらさ50Å以下の無変質鏡面の生
成が強く望まれているが、高性能ヘツドの材料と
して用いられているMn−Zn多結晶フエライトに
おいては、従来その要求を完全に満足させること
ができなかつた。 In particular, as the density of magnetic recording has increased in recent years, VTR
For Mn-Zn ferrites used in magnetic heads such as, it is strongly desired to produce an unaltered mirror surface with a surface roughness of 50 Å or less; Until now, it has not been possible to completely satisfy this requirement.
本発明は多結晶材料を微粉末粒子研摩による除
去作用と化学研摩による除去作用を組み合せた複
合加工により完全な無変質鏡面とするものであ
る。特に本発明は、Mn−Zn多結晶フエライトの
加工に有効であり、以下Mn−Zn多結晶フエライ
トを用いた磁気ヘツドのギヤツプ面加工の例につ
いて詳細に説明する。 The present invention provides a polycrystalline material with a completely unaltered mirror surface through a composite process that combines the removal action of fine powder particle polishing and the removal action of chemical polishing. The present invention is particularly effective in machining Mn-Zn polycrystalline ferrite, and an example of machining the gap surface of a magnetic head using Mn-Zn polycrystalline ferrite will be described in detail below.
フエライトは電子部品用材料として汎く用いら
れている金属酸化物磁性体であり、中でもMn−
Znフエライトは、高硬度、高透磁率の材料とし
て、磁気ヘツドのコア材料として使用されており
その加工にあたつては極めて高い精度が要求され
る。 Ferrite is a metal oxide magnetic material that is widely used as a material for electronic components, especially Mn-
Zn ferrite is a material with high hardness and high magnetic permeability that is used as the core material of magnetic heads, and extremely high precision is required when processing it.
特に、近年、磁気記録密度が著しく進歩し、記
録波長が１μｍ以下となるような高密度の記録、
再生が実用化されてくると、その要求はますます
厳しくなつてきた。磁気ヘツドにおいて特に重要
なのは、磁気ギヤツプを構成するギヤツプ対向面
の鏡面加工であるが、記録波長が短かくなるに従
つて磁気ギヤツプの幅も狭小化し、最近では0.3
μｍ以下にもなつてきている。このため鏡面加工
も完全鏡面といえるものでなければならない。特
に、フエライトはその磁気的特性が、結晶構造お
よび応力に対して敏感であり、加工方法を誤まる
と、著しい特性劣化を生じる。 In particular, in recent years, magnetic recording density has significantly improved, and high-density recording where the recording wavelength is 1 μm or less,
As regeneration has come into practical use, its requirements have become increasingly strict. What is particularly important in a magnetic head is the mirror finishing of the gap facing surface that constitutes the magnetic gap, but as the recording wavelength becomes shorter, the width of the magnetic gap also becomes narrower, and recently the width of the magnetic gap has become 0.3 mm.
It is becoming smaller than μm. For this reason, the mirror finishing must also be a perfect mirror finish. In particular, the magnetic properties of ferrite are sensitive to crystal structure and stress, and if the processing method is incorrect, significant deterioration of the properties will occur.
磁気ヘツド用フエライトのギヤツプ面は、従
来、ラツピングやポリツシングで鏡面に加工され
ているが、従来多く用いられているのは、軟質金
属たとえば錫、鉛等をラツプとして、平均粒径３
μｍ以下のダイヤモンドを砥粒とする研摩方法で
ある。この場合の表面あらさは0.05μｍ以下で、
磁気ギヤツプは、マクロに見れば一応美しくシヤ
ープに出来あがつているが、0.3μｍのギヤツプ
を詳細に観察すれば、第１図に示すように、平均
的なギヤツプ長0.3μｍに対して、表面あらさ
0.05μｍは無視できない大きさであつて、磁気ヘ
ツドの周波数特性を劣化させることになる。な
お、第１図において、１はギヤツプを形成するた
めの非磁性スペーサ、たとえば、蒸着、スパツタ
リング等で作成されたガラスであり、２，２′は
フエライトコアである。 Conventionally, the gap surface of ferrite for magnetic heads has been processed into a mirror surface by wrapping or polishing, but what has been commonly used is a soft metal such as tin or lead as a wrap with an average grain size of 3.
This is a polishing method that uses diamond grains of µm or less as abrasive grains. In this case, the surface roughness is 0.05μm or less,
When viewed macroscopically, the magnetic gap appears to be beautifully sharp, but when a 0.3 μm gap is observed in detail, as shown in Figure 1, the average gap length is 0.3 μm, and the surface Roughness
0.05 .mu.m is a size that cannot be ignored and will deteriorate the frequency characteristics of the magnetic head. In FIG. 1, numeral 1 is a nonmagnetic spacer for forming a gap, for example, glass made by vapor deposition or sputtering, and numerals 2 and 2' are ferrite cores.
また、従来の研摩法によるフエライトの加工変
質と、それによる磁気特性の劣化に関しては多く
の報告がなされており、我々自身も、ほぼ0.2μ
ｍ程度の加工変質深さの存在を確認している。一
例として、Mn−Zn多結晶フエライトにおける加
工変質層の状態を第２図に示す。加工面からの深
さ0.02〜0.03μｍの範囲は、ベイルビー層とも呼
ばれる非晶質層Ａとなつており、この部分ではフ
エライトは磁性を失つていると考えられる。その
下には、結晶が微細化された層Ｂがあり、ほぼ
0.1μｍの深さにまで達する。さらにその下は、
転位、すべり等の結晶欠陥を伴う有ひずみ層Ｃが
0.2μｍの深さにまで達しており、その下はほぼ
バルクと見なせる結晶構造層Ｄとなつている。フ
エライトの磁性も結晶微細化層Ｂ、有ひずみ層Ｃ
と回復していくが、バルク層Ｄに達してもフエラ
イト本来の磁性（たとえば、透磁率）にはならな
い。これは、加工変質層には大きな圧縮残留応力
が作用しており、これとバランスする引張応力が
バルク層に作用して、弾性的なひずみを生じてい
るからである。 In addition, many reports have been made regarding processing alteration of ferrite caused by conventional polishing methods and the resulting deterioration of magnetic properties, and we ourselves have reported
It has been confirmed that there is a depth of deterioration due to machining of approximately m. As an example, FIG. 2 shows the state of a process-affected layer in Mn--Zn polycrystalline ferrite. The depth range of 0.02 to 0.03 μm from the machined surface is an amorphous layer A also called Beilby layer, and it is thought that the ferrite has lost its magnetism in this part. Below that, there is a layer B with finer crystals, which is approximately
It reaches a depth of 0.1μm. Further below,
A strained layer C with crystal defects such as dislocations and slips
It reaches a depth of 0.2 μm, and below it is a crystal structure layer D that can be considered to be almost a bulk. The magnetism of ferrite also depends on the crystalline refinement layer B and the strained layer C.
However, even when the bulk layer D is reached, the original magnetism (for example, magnetic permeability) of ferrite is not achieved. This is because a large compressive residual stress acts on the process-affected layer, and a tensile stress that balances this acts on the bulk layer, causing elastic strain.
さて、このような加工変質層を持つた面で構成
されるギヤツプは、実効的には拡大していること
になり、しかもギヤツプエツヂの磁気的なシヤー
プさが失われており、磁気ヘツドの高周波特性を
劣化させている。すなわち、VTR等の高密度記
録用磁気ヘツドのギヤツプ面としては、表面あら
さがギヤツプ長に比べて相対的に無視できる程
度、たとえば0.3μｍのギヤツプに対して表面あ
らさ0.01μｍ以下であつて、加工変質がほとんど
無いことが要求される。 Now, the gap made up of the surfaces with such a process-altered layer is effectively expanding, and the magnetic sharpness of the gap edge has been lost, which affects the high frequency characteristics of the magnetic head. is deteriorating. In other words, the gap surface of a magnetic head for high-density recording such as a VTR should have a surface roughness that is relatively negligible compared to the gap length, for example, a gap of 0.3 μm should have a surface roughness of 0.01 μm or less, and should not be processed. It is required that there is almost no deterioration.
これを実現する具体的な方法として、アルミナ
等の極微細砥粒を用いようとするのが一般的であ
るが、我々の実験では、アルミナを用いた研摩で
は加工変質はほとんど改善されない。別の手段と
して、加工によつて生じた変質を、化学的もしく
は電気化学的な方法で除去することが考えられ、
一部で実用されている。しかし、Mn−Zn多結晶
フエライトの場合は、結晶粒の各面によつて化学
的な除去速度に差があり、結晶粒ごとの段差が生
じるために、この方法は有効でない。 As a concrete method to achieve this, it is common to use ultrafine abrasive grains such as alumina, but in our experiments, polishing using alumina hardly improves processing deterioration. Another method is to remove the deterioration caused by processing using chemical or electrochemical methods.
It is used in some areas. However, in the case of Mn--Zn polycrystalline ferrite, this method is not effective because the chemical removal rate differs depending on each side of the crystal grains, and a step difference occurs for each crystal grain.
本発明の加工法は、このように従来困難であつ
た多結晶材の鏡面研摩を容易に、かつ完全に実施
できるものであり、以下加工法について説明す
る。 The processing method of the present invention allows mirror polishing of polycrystalline materials, which has been difficult in the past, to be carried out easily and completely, and the processing method will be explained below.
第３図は、本発明加工法において用いる研摩装
置の一例である。円板状のラツプ３は回転軸４で
回転駆動され、ラツプ３の外周は円筒状の外壁５
で囲まれて液体容器を構成している。ここに加工
液６が入れられて液中研摩を行うようになつてい
る。工作物のフエライト７は試料ホルダ８に熱軟
化性樹脂等で接着されており、試料ホルダ８は軸
受１２で支えられる回転軸９に結合されており、
回転駆動軸１３、歯車１１および歯車１０で回転
駆動される。回転軸９は軸受１２中で軸方向には
拘束されておらず、静止時には自重でラツプ３に
フエライト７が接しているが、ラツプ３および試
料ホルダ８が回転すると加工液６の流体圧によつ
て、ラツプ３とフエライト７の間に動圧の流体軸
受の状態が作られ、試料ホルダ８は浮上する。な
お、必要に応じて、歯車１０の上からバネ等で圧
力を付加したり、荷重を追加することもなされ
る。装置は剛性の高いベース１４で構築されてお
り、高精度の回転運動が可能になつている。 FIG. 3 is an example of a polishing device used in the processing method of the present invention. The disc-shaped wrap 3 is rotationally driven by a rotating shaft 4, and the outer periphery of the wrap 3 is surrounded by a cylindrical outer wall 5.
It is surrounded by and forms a liquid container. A machining fluid 6 is placed here to perform submerged polishing. The ferrite 7 of the workpiece is bonded to a sample holder 8 with thermoplastic resin or the like, and the sample holder 8 is connected to a rotating shaft 9 supported by a bearing 12.
It is rotationally driven by a rotational drive shaft 13, a gear 11, and a gear 10. The rotating shaft 9 is not restrained in the axial direction in the bearing 12, and when it is stationary, the ferrite 7 is in contact with the lap 3 due to its own weight, but when the lap 3 and sample holder 8 rotate, the ferrite 7 is in contact with the lap 3 due to the fluid pressure of the machining fluid 6. As a result, a dynamic pressure fluid bearing condition is created between the lap 3 and the ferrite 7, and the sample holder 8 floats up. Note that, if necessary, pressure may be applied from above the gear 10 using a spring or the like, or a load may be added. The device is constructed with a highly rigid base 14, allowing highly accurate rotational movement.
第３図では、試料ホルダ８が強制駆動されて、
ラツプ３との間で遊星運動を行う装置の例を示し
たが、他にも修正輪方式の平面研摩装置を用いて
も、試料とラツプとの間に動圧の流体軸受状態が
実現されれば同様の効果を得ることができる。こ
の動圧流体軸受を実現するためには、加工液６の
流速を高めること、もしくは粘性を高めることが
有効である。具体的には、流速を高める手段とし
て、ラツプ３もしくは試料ホルダ８の回転数を高
めることが直接的な手段であるが、平面研摩装置
においては一般に高速運動は精度劣化の原因とな
りがちであつて好ましくない。他の手段として、
ラツプ３の表面に溝を設けること、およびラツプ
３の表面あらさを大きくすることが有効である。
本加工法では、ラツプ３とフエライト７が加工中
には直接接触しないことが一つの特徴であるため
通常の研摩装置のようにラツプ表面の表面あらさ
が仕上り面に特に影響するようなことはない。 In FIG. 3, the sample holder 8 is forcibly driven,
Although we have shown an example of a device that performs planetary motion between the sample and Lap 3, it is also possible to use a modified wheel type surface polishing device to achieve a hydrodynamic bearing state between the sample and the Lap. A similar effect can be obtained if In order to realize this hydrodynamic bearing, it is effective to increase the flow rate or increase the viscosity of the machining fluid 6. Specifically, a direct means of increasing the flow velocity is to increase the rotational speed of the lap 3 or the sample holder 8, but in general, high-speed motion tends to cause deterioration of accuracy in surface polishing equipment. Undesirable. As another means,
It is effective to provide grooves on the surface of the lap 3 and to increase the surface roughness of the lap 3.
One feature of this processing method is that the lap 3 and ferrite 7 do not come into direct contact during processing, so the roughness of the lap surface does not particularly affect the finished surface, unlike in ordinary polishing equipment. .
加工液６は微粉末研摩剤を化学研摩液に混合し
たものである。その濃度および水素イオン濃度は
工作物によつて最適の組合せ、条件が選ばれる。 The machining fluid 6 is a mixture of a fine powder abrasive and a chemical polishing fluid. The optimum combination and conditions for the concentration and hydrogen ion concentration are selected depending on the workpiece.
流体軸受状態を安定にする目的で、加工液６の
粘度を高める手段として、グリセリン等の増粘剤
を添加することが有効であるが、増粘剤の量を多
くすると加工能率が低下する傾向となる。 For the purpose of stabilizing the fluid bearing condition, it is effective to add a thickener such as glycerin as a means of increasing the viscosity of the machining fluid 6, but increasing the amount of the thickener tends to reduce machining efficiency. becomes.
微粉末研摩剤以外の固体粒子が加工液６に混入
すると鏡面の生成が困難となるため、加工液の管
理、雰囲気の清浄度維持には細心の注意が必要で
あるが、さらに重要なのはラツプ３の材質と加工
および管理状態である。ダイヤモンド砥粒等を用
いる研摩方法では、使用する砥粒を用いてラツプ
の平面度を管理、維持しており、初期のラツプ表
面の加工法を特に限定する必要は無いが、本加工
法では、ラツプ３の減耗が極めてわずかであるた
めに、初期に平面度を出しておく必要がある。ま
たラツプ面を加工した後に不純物が残留すること
も防止しなければならない。この様な条件を満足
するために、ラツプ３の材質としては軟質金属を
用い、旋盤で切削を行う。また本加工法では化学
研摩液を加工液として用いるため、各部の材質は
耐触性の優れたものを選ぶ必要がある。 If solid particles other than fine powder abrasives are mixed into the machining fluid 6, it will be difficult to create a mirror surface, so careful attention is required to manage the machining fluid and maintain the cleanliness of the atmosphere. material, processing and management conditions. In polishing methods that use diamond abrasive grains, etc., the flatness of the laps is managed and maintained using the abrasive grains used, and there is no need to particularly limit the processing method for the initial lap surface, but in this processing method, Since the wear of the lap 3 is extremely small, it is necessary to obtain flatness at an early stage. It is also necessary to prevent impurities from remaining after processing the lap surface. In order to satisfy these conditions, a soft metal is used as the material for the wrap 3, and it is cut using a lathe. Furthermore, since this processing method uses a chemical polishing liquid as the processing liquid, it is necessary to select materials with excellent contact resistance for each part.
次に工作物がMn−Zn多結晶フエライトの場合
の加工液について説明する。第４図から第９図は
Mn−Zn多結晶フエライトの各結晶面の加工速度
を定量的に知るために、同成分のMn−Zn単結晶
フエライトの代表的な面である（100）、（110）、
（111）面について調べた結果である。 Next, we will explain the machining fluid when the workpiece is Mn-Zn polycrystalline ferrite. Figures 4 to 9 are
In order to quantitatively know the machining speed of each crystal plane of Mn-Zn polycrystalline ferrite, typical planes of Mn-Zn single-crystal ferrite with the same composition (100), (110),
This is the result of investigating the (111) plane.
まず本加工法の基本概念について説明する。第
４図は、研摩剤としてFe2O3の微粒子を用い、こ
れを蒸留水に10重量％混ぜた場合の各面の加工速
度の測定結果であり、（111）面が他の面に比べて
高い加工速度となつている。この条件でMn−Zn
多結晶フエライトを研摩した面の表面あらさが第
１０図であり、300Å程度の結晶粒段差が現われ
ている。この加工面の反射電子回折像は化学研摩
と同様の結晶性を示しており、結晶構造的には無
変質の面が得られている。 First, the basic concept of this processing method will be explained. Figure 4 shows the results of measuring the machining speed of each surface when fine particles of Fe 2 O 3 are used as an abrasive and mixed with distilled water at 10% by weight. This results in high machining speed. Under these conditions, Mn−Zn
Figure 10 shows the surface roughness of the polished surface of polycrystalline ferrite, and a crystal grain step of about 300 Å appears. The backscattered electron diffraction image of this processed surface shows crystallinity similar to that of chemical polishing, and a surface with no changes in crystal structure has been obtained.
一方第５図はPH２の塩酸とPH12の水酸化ナトリ
ウムで各結晶面を化学研摩したときの加工速度を
示したものである。塩酸での加工速度は、第４図
の場合と逆の傾向となつているのに対し、水酸化
ナトリウムでの結果は第４図の傾向と同じであ
る。この二つの結果から、Fe2O3による研摩と塩
酸による化学研摩を併用すれば結晶面による加工
速度の差が減少すると考えられる。第６図は、
Fe2O3を研摩剤として、加工液の水素イオン濃度
を塩酸あるいは水酸化ナトリウムの添加によつて
変化させたときの各結晶面の加工速度を示してい
る。 On the other hand, Figure 5 shows the processing speed when each crystal face was chemically polished with hydrochloric acid at pH 2 and sodium hydroxide at pH 12. The processing speed with hydrochloric acid has a tendency opposite to that in FIG. 4, while the results with sodium hydroxide have the same tendency as in FIG. From these two results, it is thought that if polishing with Fe 2 O 3 and chemical polishing with hydrochloric acid are used together, the difference in processing speed depending on the crystal plane will be reduced. Figure 6 shows
It shows the machining speed of each crystal plane when Fe 2 O 3 is used as the abrasive and the hydrogen ion concentration of the machining fluid is changed by adding hydrochloric acid or sodium hydroxide.
加工液が強い酸になると、エツチングの効果に
より非常に高い加工速度が各面で得られている。
また比率的にみて、各加工速度が平均化されてい
る。酸としては、他にも硫酸、リン酸、硝酸等も
有効であり、いずれも（111）面の加工速度が最
も小さく、Fe2O3によつて生じる凹凸を平坦化す
ることが可能であるが、各結晶面の加工速度の絶
対値、相対速度差は酸の種類によつて異なつてお
り、Fe2O3との組合せを考える場合は、塩酸が最
も有効である。第７図〜第９図は塩酸水でPH２お
よびPH７にした場合に研摩剤であるFe2O3の濃度
を変化させた場合の各結晶面の加工速度を求めた
ものである。これより研摩剤濃度を変えることに
よつて加工速度を制御することが可能となり、各
結晶面の加工速度が平均化される最適条件は0.2
重量％の研摩剤濃度であることがわかる。第１１
図はこの最適条件でMn−Zn多結晶フエライトを
研摩した表面をチリステツプで測定した結果であ
り、表面あらさ20Å程度で、結晶粒段差はほとん
ど解消されている。 When the machining fluid becomes a strong acid, extremely high machining speeds are obtained on all surfaces due to the etching effect.
Also, in terms of ratio, each machining speed is averaged. Other effective acids include sulfuric acid, phosphoric acid, and nitric acid; all of them have the lowest machining speed on the (111) surface and are capable of flattening the unevenness caused by Fe 2 O 3 . However, the absolute value and relative speed difference of the processing speed of each crystal plane differ depending on the type of acid, and when considering a combination with Fe 2 O 3 , hydrochloric acid is the most effective. FIGS. 7 to 9 show the processing speeds of each crystal plane when the concentration of Fe 2 O 3 as an abrasive was changed when the pH was set to 2 and 7 using hydrochloric acid water. From this, it is possible to control the machining speed by changing the abrasive concentration, and the optimal condition for averaging the machining speed of each crystal face is 0.2
It can be seen that the abrasive concentration in weight percent. 11th
The figure shows the results of millistep measurements of the surface of Mn-Zn polycrystalline ferrite polished under these optimal conditions.The surface roughness is approximately 20 Å, and the grain level difference has almost been eliminated.
以上のように本加工法によれば、Mn−Zn多結
晶フエライトの場合、Fe2O3微粒子による研摩と
塩酸による化学研摩を組み合せることによつて、
結晶粒段差のほとんどない無変質鏡面を得ること
ができた。本加工法は原理的には他の組み合せも
可能であり、また他の多結晶材料にも有効であ
る。 As described above, according to this processing method, in the case of Mn-Zn polycrystalline ferrite, by combining polishing with Fe 2 O 3 fine particles and chemical polishing with hydrochloric acid,
We were able to obtain an unaltered mirror surface with almost no grain steps. In principle, other combinations are possible with this processing method, and it is also effective for other polycrystalline materials.
Mn−Zn多結晶フエライトの場合に、表面あら
さと結晶粒段差を含めた凹凸が100Å以下となる
条件は、Fe2O3微粉末の濃度が0.1〜1.0重量％、
塩酸水溶液の水素イオン濃度がPH１〜４で限定さ
れる。 In the case of Mn-Zn polycrystalline ferrite, the conditions for the surface roughness and unevenness including crystal grain steps to be 100 Å or less are that the concentration of Fe 2 O 3 fine powder is 0.1 to 1.0% by weight,
The hydrogen ion concentration of the hydrochloric acid aqueous solution is limited to PH1-4.
この条件でもビデオヘツドを製作し、従来加工
法によるヘツドと、その特性を比較した結果、低
周波域では両者に顕著な差は認められなかつたが
高周波域では、本加工法の方が明らかに優れてい
た。すなわち、5MHz（記録波長１μｍ相当）に
おける出力は、本加工法によるヘツドの方が２〜
3dB高かつた。これは、本加工法によつて無変質
の鏡面が得られた効果であるが、さらに本加工法
の加工面は極めて清浄な面でもあり、従来加工法
では種々の洗浄を行つていたのに比べて、簡略化
した洗浄ですませることができる。 A video head was manufactured under these conditions and its characteristics were compared with a head made using the conventional processing method. As a result, there was no noticeable difference between the two in the low frequency range, but in the high frequency range, it was clear that this processing method was superior. It was excellent. In other words, the output at 5 MHz (corresponding to a recording wavelength of 1 μm) is 2 to 2 times higher for the head produced by this processing method.
It was 3dB high. This is due to the fact that this processing method provides an unaltered mirror surface, but the surface processed using this method is also extremely clean, unlike conventional processing methods that require various cleaning methods. Compared to other methods, cleaning can be simplified.
このように本発明は、磁気ヘツド用磁性材料の
加工に用いた場合に特に有効であり、高性能の磁
気ヘツドを安定かつ容易に作ることを可能にする
ものである。 As described above, the present invention is particularly effective when used for processing magnetic materials for magnetic heads, and makes it possible to stably and easily manufacture high-performance magnetic heads.
第１図は従来加工法による磁気ヘツドのギヤツ
プ部の詳細説明図、第２図は従来加工法による加
工変質層の説明図、第３図は本発明の加工法にお
いて用いる加工装置の一例を示す側断面図、第４
〜第９図は、それぞれ本発明の研摩方法の原理を
説明するための各結晶面と加工速度の関係を示す
図、第１０図はFe2O3微粒子により研摩された
Mn−Znフエライト材の表面を示す図、第１１図
は本発明により研摩されたMn−Znフエライト表
面を示す図である。
Fig. 1 is a detailed explanatory diagram of the gap portion of the magnetic head by the conventional processing method, Fig. 2 is an explanatory diagram of the processed damaged layer by the conventional processing method, and Fig. 3 shows an example of the processing equipment used in the processing method of the present invention. Side sectional view, 4th
~ Figure 9 is a diagram showing the relationship between each crystal plane and processing speed to explain the principle of the polishing method of the present invention, and Figure 10 is a diagram showing the relationship between each crystal plane and processing speed for explaining the principle of the polishing method of the present invention, and Figure 10 is a diagram showing the relationship between each crystal plane and the processing speed
FIG. 11 is a diagram showing the surface of Mn-Zn ferrite material polished according to the present invention.
Claims (1)
より加工速度に差異を有する微粉末研摩剤と化学
研摩液とを、微粉末研摩剤による加工速度が最大
である結晶面が、化学研摩液では最低の加工速度
となる組み合わせとして混合して加工液とし、そ
の加工液中で前記加工物の加工面とラツプを相対
運動させて、加工面とラツプを動圧流体軸受状態
として研摩することを特徴とする多結晶材料の研
摩方法。 ２ 加工物がMn−Zn多結晶フエライトであり、
微粉末研摩剤がFe2O3、化学研摩液が酸性水であ
ることを特徴とする特許請求の範囲第１項記載の
多結晶材料の研摩方法。 ３ 加工物がMn−Zn多結晶フエライトであり、
加工液が水素イオン濃度１〜４の塩酸水溶液で、
0.1〜1.0重量％のFe2O3の微粉末を含有すること
を特徴とする特許請求の範囲第１項記載の多結晶
材料の研摩方法。[Scope of Claims] 1. A fine powder abrasive and a chemical polishing liquid, which have different machining speeds depending on the type of crystal plane of a workpiece made of a polycrystalline material, are used on the crystal plane on which the machining speed with the fine powder abrasive is maximum. However, with chemical polishing fluid, the combination that gives the lowest machining speed is mixed to form a machining fluid, and the machining surface and the lap of the workpiece are moved relative to each other in the machining fluid, so that the machining surface and the lap are in a hydrodynamic bearing state. A method for polishing a polycrystalline material, characterized by polishing it as a polycrystalline material. 2 The workpiece is Mn-Zn polycrystalline ferrite,
2. The method of polishing a polycrystalline material according to claim 1, wherein the fine powder abrasive is Fe 2 O 3 and the chemical polishing liquid is acidic water. 3 The workpiece is Mn-Zn polycrystalline ferrite,
The processing fluid is a hydrochloric acid aqueous solution with a hydrogen ion concentration of 1 to 4,
A method for polishing a polycrystalline material according to claim 1, characterized in that the polishing method contains 0.1 to 1.0% by weight of fine powder of Fe 2 O 3 .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15393778A JPS5583561A (en) | 1978-12-12 | 1978-12-12 | Abrasion method of polycrystal material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15393778A JPS5583561A (en) | 1978-12-12 | 1978-12-12 | Abrasion method of polycrystal material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5583561A JPS5583561A (en) | 1980-06-24 |
| JPS6113951B2 true JPS6113951B2 (en) | 1986-04-16 |
Family
ID=15573333
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15393778A Granted JPS5583561A (en) | 1978-12-12 | 1978-12-12 | Abrasion method of polycrystal material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5583561A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57197884A (en) * | 1981-05-29 | 1982-12-04 | Sony Corp | Composite substrate |
| JPS60191763A (en) * | 1984-03-12 | 1985-09-30 | Nippon Telegr & Teleph Corp <Ntt> | Method of machining ferrite crystal |
| JPH02262955A (en) * | 1988-12-15 | 1990-10-25 | Nippon Steel Corp | Method of cutting si ingot by wire saw |
-
1978
- 1978-12-12 JP JP15393778A patent/JPS5583561A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5583561A (en) | 1980-06-24 |
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