JPS61133388A - Dry etching device - Google Patents

Abstract

PURPOSE:To prevent effectively the corrosion of a material to be treated owing to the reaction with the atm. air in a dry etching device by connecting integrally a post treatment chamber to the rear stage side of an etching chamber so that the post treatment can be executed right after the end of the etching. CONSTITUTION:The material to be treated is lifted by the rise of a pusher pin 7 and a conveyor 9 is positioned below the material to be treated via a gate valve 18c when the treatment of the material to be treated ends in the etching chamber 2. The pin 7 is lowered to place the material to be treated on the conveyor 9 and said material is conveyed to an unloading chamber 3. The material to be treated is then fed above a pusher pin 10 and the material to be treated is lifted by the pin 10 and is placed on a belt conveyor 11, by which the material is conveyed to a heat treatment chamber 5. A hot plate 13 is raised to carry the material to be treated when the material to be treated is positioned below a nozzle 14, then the air heated by a heater 17 is blown from the nozzle 14 toward the material to be treated by which the material to be treated is dried. The material is then fixed to a chuck 22 for rinsing and is subjected to rinsing; thereafter the material is conveyed to an outlet side cassette 29.

Description

DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a dry etching apparatus, and more particularly to a dry etching apparatus capable of continuously performing a post-processing process after an etching process.

[Technical background of the invention and its problems]

Usually, when etching the A1 layer on the substrate of the workpiece, 5iCjl, CCl2, BCj, Cj
A chlorine-based gas such as □ is used as an etching gas, and etching is performed by a chemical reaction between the etching gas and Aj. In addition, in single-wafer etching equipment that processes objects one by one, the etching chamber is always kept under vacuum to prevent corrosion caused by the hydrochloric acid produced when chlorine-based gas reacts with moisture in the atmosphere. is maintained.

Furthermore, since IIHa is generated when the object is exposed to the atmosphere after etching,
Post-treatment such as heat treatment or water washing is performed to remove chlorine-based particles.

However, in the past, the etching equipment and the post-processing equipment were installed separately, which resulted in the problem that the equipment required a large amount of space.Furthermore, it took a long time to perform the post-processing after the etching process was completed. Since it takes a long time to transport the object, there is a problem in that the object to be treated is more likely to be corroded.

[Purpose of the invention]

The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide a dry etching apparatus that can quickly perform post-processing of a workpiece and is highly space efficient.

(Summary of the Invention) In order to achieve the above object, a dry etching apparatus according to the present invention includes a pair of electrodes disposed facing each other in an etching chamber, and high frequency power is applied to the electrodes while introducing an etching gas into the etching chamber. This dry etching apparatus is characterized in that a post-processing chamber is integrally connected to the downstream side of the etching chamber.

[Embodiments of the invention]

Embodiments of the present invention will be described below with reference to the drawings.

The drawing shows a dry etching apparatus according to the present invention, in which a loading chamber 1, an etching chamber 2, an unloading chamber 3, a buffer chamber 4, and a heat treatment chamber 5 as a post-treatment chamber are successively provided. An electrode 6 is provided inside and below 2. A button pin 7 is provided below the electrode 6 and moves up and down through the electrode 6. Inside the loading chamber 1 and unloading chamber 3, two pairs of arms are connected in a pantograph shape. and a conveying device 8.9 which has a mounting plate at its tip and linearly conveys the object to be processed by rotating this arm.
is installed.

Further, a belt conveyor 11 having a push pin is provided inside the buffer 4, and a belt conveyor 12 is provided inside the heat treatment chamber 5.
A hot plate 13 is disposed below the belt conveyor 12 and is vertically movable and whose upper surface is higher than the upper surface of the belt conveyor 12 in the upper position. However, above the belt conveyor 12, a dryer 15 having two nozzles 14°14 is arranged.
Heaters 16 and 17 are built inside the hot plate 13 and the dryer 15, respectively.

In addition, gate valves 18a, 18b, 18c, and 18d are provided in each of the chambers 1.2.3 except for the heat treatment chamber 5 and between the loading chamber 1 and the outside so as to be openable and closable. 1. The etching chamber 2 and the unloading chamber 3 have exhaust pipes 20.2 connected to a vacuum pump (not shown) via pulp 19, 19, 19, respectively.
1 is connected.

Roughly speaking, a belt conveyor 23 having a water washing chuck 22 which is vertically movable and freely rotatable is disposed on the downstream side of the heat treatment v5, and a vertically movable inlet chuck 22 is provided on the entrance side of the loading chamber 1. Belt conveyor 2 having a cassette 24, a conveyor belt 25 and a vertically movable center 26
7 is provided, and a conveyor belt 28 and an outlet side cassette 29 are provided on the downstream side of the water washing chuck 22.

Next, the operation of this embodiment will be explained.

First, the entrance side cassette 24 is lowered to place the workpiece A on the upper surface of the conveyor belt 25, and the workpiece is moved above the center 26 by driving the conveyor belt 25. Then, it is positioned at the end of the center 26, lifts the workpiece A while avoiding the center 26, and opens the gate valve 18a.
The conveying device 8' is driven to position the mounting plate below the object to be processed A. Thereafter, the button pin 25a is lowered to place the object to be processed on the mounting plate 15, and the object to be processed A is placed on the O-
Transfer to the loading room 1.

Next, after closing the gate valve 18a and evacuating the ading chamber 1 through the exhaust pipe 21, the gate valve 18b on the etching chamber 2 side is opened to send the object A to the etching chamber 2, and the button pin 7 is By rising, the object A to be processed is lifted above the mounting plate.

Then, the transport device 8 returns to the loading chamber 1 while lowering the pusher bin 7 to place the object A on the upper surface of the electrode 6. In this state, the object to be processed A is etched, and after the processing is finished, the bushing bin 7 is raised again and the object to be processed A is lifted up. Then, after opening the gate valve 18c on the unloading chamber 3 side and positioning the mounting plate of the conveyance device 9 below the workpiece, the bushing bin 7 is lowered and placed on the mounting plate F of the conveyance device 9. Place the processed material A. After the workpiece A is transported to the unloading chamber 3'c, the gate valve 18c is closed, the gate valve 18d on the buffer chamber 4 side is opened, and the workpiece A is sent above the bushing bin 10, and as in the case of the etching chamber 2, As the shovel bin 10 rises, the workpiece A is lifted up and the transport device 9 returns to the unloading chamber 3. Then the shovel bin 10 is lowered and the workpiece A is placed on the belt conveyor 11. place Then, the belt conveyor 11 is driven to transport the workpiece A to the heat treatment chamber 5, and when the workpiece A is located below the nozzle 14, the hot plate 13 heated by the heater 16 is raised from the belt conveyor 12 to be heated. Hot plate 13 for processing material
1 on the top! place At this time, from the nozzle 14 to the heater 1
After drying the object to be treated by blowing the air heated by 7 onto it, the hot plate 13 is lowered and the object to be treated A is transferred to the belt conveyor 12 for heat treatment 1! It is transported from the P chamber 5 to above the chuck 22 for washing with water. Then, the washing chuck 22 is raised and fixed to the back surface of the object A by a vacuum chuck, and the object is rotated while spraying pure water from a washing nozzle (not shown) to uniformly wash the object. After washing with water, the workpiece A is dried by rotating at high speed while blowing air from the nozzle. After drying, the water washing chuck 22 is lowered and the vacuum chuck is released, and the workpiece A is placed on the belt conveyor 23. It is loaded and sent to the outlet side cassette 29 via the conveyor belt 28.

Therefore, in this example, after the etching is completed,
The object to be treated can be post-treated immediately, and corrosion of the object to be treated can be effectively prevented. Also, Honji 7
In mW4, each chamber was connected linearly, but for example, U
By connecting the chambers in a letter-like shape, the device can be formed extremely compactly, making it possible to downsize the device and improve space efficiency.

〔Effect of the invention〕

As described above, the dry etching apparatus according to the present invention is configured such that the post-processing chamber is integrally connected to the downstream side of the etching chamber, so that the workpiece can be post-processed immediately after etching is completed. Therefore, corrosion due to reaction with the atmosphere can be effectively prevented. Further, since there is no need to provide a separate post-processing device, space efficiency can be greatly improved, and production efficiency can be improved.

[Brief explanation of drawings]

The drawings are schematic diagrams showing one embodiment of the present invention. 1... Loading sky, 2... Etching chamber, 3...
...Unloading room, 4...Buffer room, 5...
・Heat treatment] I! Chamber, 6... Electrode, 7, 10... Butsushabin, 8.9... Transport device, 11, 12.23.2
7... Belt conveyor, 13... Hot plate,
14... Nozzle, 15... Dryer, 16.17.
...Jeater, 18...Gate valve, 19...Valve,
20゜21...Exhaust pipe, 22...Water washing chuck,
24゜29...cassette, 25.28 river conveyor belt,
26...sec.

Claims (1)

[Claims] In a dry etching apparatus in which a pair of electrodes are disposed facing each other in an etching chamber, and a workpiece is etched by applying high frequency power to the electrodes while introducing an etching gas into the etching chamber, the dry etching apparatus is used in a downstream stage of the etching chamber. A dry etching device characterized by a post-processing chamber integrally connected to the side.