JPS61120142A - Photosensitive resin plate forming method - Google Patents

Photosensitive resin plate forming method

Info

Publication number
JPS61120142A
JPS61120142A JP24048084A JP24048084A JPS61120142A JP S61120142 A JPS61120142 A JP S61120142A JP 24048084 A JP24048084 A JP 24048084A JP 24048084 A JP24048084 A JP 24048084A JP S61120142 A JPS61120142 A JP S61120142A
Authority
JP
Japan
Prior art keywords
photosensitive resin
acid
plate
composition
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24048084A
Other languages
Japanese (ja)
Other versions
JPH073581B2 (en
Inventor
Kuniaki Minonishi
箕西 国秋
Reijiro Sato
佐藤 礼二郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP59240480A priority Critical patent/JPH073581B2/en
Publication of JPS61120142A publication Critical patent/JPS61120142A/en
Publication of JPH073581B2 publication Critical patent/JPH073581B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To remove a viscosity of a surface of a cured material composed of a relief forming photosensitive resin by incorporating a specific alcohol, an acid, or an amide of a satd. or an unsatd. long chain hydrocarbon to a photosensitive resin composition and then by making the plate. CONSTITUTION:The photosensitive resin composition comprises a prepolymer. A compound shown by the formula R1-X (wherein X is -CH2OR2, -COOH, -CONH2, R1 is CnH2n+1, CnH2n-1, (n) is 11-21, R2 is H, -CO-R3-S-R3-COOH2-R1, R3 is a hydrocarbon residue, is incorporated to the obtd. composition. The obtd. composition is exposured in an aqueous solution contg. >=0.01wt% an alkaline metal of a sulfurous acid, and the photosensitive resin is cured. A compd. shown by the formula R1-X comprises erucic acidamide and myristic acid. The compd. shown by the formula R1-X is incorporated to the titled plate, thereby removing a tacky adhesion of the titled plate.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は表面粘着性がないレリーフ像を有する感光性樹
脂版を作成する方法に関する。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to a method for producing a photosensitive resin plate having a relief image without surface tackiness.

(従来の技術および問題点) 感光性樹脂を用いるレリーフ像の作成は、基本的には、
画像形成露光工程および現儂工liKよって行われる。
(Prior art and problems) The creation of relief images using photosensitive resin basically involves the following steps:
The image forming exposure process is carried out by the current factory.

また、現像工徨後にレリーフ像の機械的強度を向上し、
表面粘着性を減少するために1通常、再露光工程が付加
される。現像が液体現像液によって行われる場合には、
乾燥が行われる。
In addition, the mechanical strength of the relief image is improved after the development process,
A re-exposure step is usually added to reduce surface tack. If development is done with a liquid developer,
Drying takes place.

しかしながら、活性光線によシ重合する感光性樹脂は、
m4した工程だけでは、得られた硬化物の表面粘着性が
大きく実用土問題となる。硬化物の表面粘着性は、像形
成時にレリーフ像の頭頂部が感光性樹脂版の表層に位置
するため、空気中の酸素により重合が阻害されることに
゛よっておこ〕、樹脂組成によっては著しい粘着性を示
す。またレリーフ像の側面及び底部は、重合が不完全で
あるために、粘着性を示す。特に現像液組成のson以
上が水である現像液を用いる場合、半硬化した部分が側
面及び底部に残存し易いため粘着性が顕著にあられれる
。廃液処理、作業環境の改善のため最近では界面活性剤
水溶液やアルカリ水溶液または水単独で現像を行なう方
法が主に実施されており、粘着性は依然として大きい。
However, photosensitive resins that are polymerized by actinic rays,
If only the m4 step is carried out, the surface tackiness of the obtained cured product becomes large and becomes a problem for practical use. The surface tackiness of the cured product is caused by the fact that the top of the relief image is located on the surface layer of the photosensitive resin plate during image formation, so polymerization is inhibited by oxygen in the air, and depending on the resin composition, it may be noticeable. Shows stickiness. Also, the sides and bottom of the relief image exhibit stickiness due to incomplete polymerization. In particular, when using a developer whose developer composition includes water or more, semi-cured portions tend to remain on the sides and bottom, resulting in significant stickiness. Recently, in order to treat waste liquid and improve the working environment, methods of developing with an aqueous surfactant solution, an aqueous alkaline solution, or water alone have been mainly practiced, but the tackiness remains high.

このような硬化物の表面粘着性の九めに1硬化物を取シ
扱う際に作業者の手に付着したシ、硬化物同志の粘着に
よる作業性の悪化やノミの付着による品質低下をひきお
こす等の問題が生じる。また硬化物を印刷版として使用
する場合、上述の欠点以外に、版のli!ii儂部表面
中部表面部表面に印刷中にf ミや紙粉が付着して印刷
物の汚れが生じ、印刷中に印刷機を停止して版をふく必
要が生じたシ、又、被印刷物が紙の場合紙ムケを起こす
ことがあるなど作業性−の′低下、印刷収率の低下をひ
きおこしていた。
The surface tackiness of such cured products is 1 in 9. When handling the cured product, it may stick to the hands of the worker, deterioration of workability due to adhesion of the cured products to each other, and quality deterioration due to the adhesion of chisels. Problems such as this arise. Furthermore, when using the cured product as a printing plate, in addition to the above-mentioned drawbacks, the plate's li! ii) During printing, dirt or paper dust adheres to the surface of the middle surface of the inner part, causing stains on the printed matter, making it necessary to stop the printing machine and wiping the plate during printing, or when the substrate is In the case of paper, paper smudges may occur, resulting in a decrease in workability and a decrease in printing yield.

このような問題を解消する方法が種々試みられてきた。Various methods have been attempted to solve these problems.

り酸化剤、還元剤等の薬品による処理、■)レリーフ作
成後、レリーフ表面を各種コーティング剤で塗布する方
法等、化学的処理や物理的処理によシ表面改質する方法
が知られている・ ■゛)の方法については特公昭5G
−389,64号1%公昭50−31487号、特開昭
58−97043号の各公報明細書く記載の方法に示さ
れる、ワックスあるいは還元性物質によシ後露光時の酸
素阻害を防止する方法等が知られている。しかし、これ
らの方法は後述する様に粘着性除去効果が充分でなかっ
た。
There are known methods for surface modification through chemical and physical treatments, such as treatment with chemicals such as oxidizing agents and reducing agents, and ■) coating the relief surface with various coating agents after creating the relief.・ ■゛) For the method, please refer to the special public Sho 5G.
-389,64 1% Method for preventing oxygen inhibition during post-exposure with wax or reducing substances, as shown in the methods described in the specifications of Publications No. 50-31487 and JP-A No. 58-97043. etc. are known. However, these methods did not have a sufficient adhesive removal effect as described below.

またI)の方法では、初期の効果はあるが煩雑な工程の
増加や効果の持続性が少ないことが問題となってい友。
In addition, although method I) has an initial effect, there are problems with the increase in complicated steps and the lack of sustainability of the effect.

(問題点を解決するための手段) 本発明者は、上述した様な硬化物の表面粘着性がもたら
す問題を解決すべく、既存の粘着除去方法の問題点を考
慮し、レリーフ形成用感光性樹脂硬化物の表面粘着性を
除くため鋭意検討した結果、一般式R,−X(ここでX
は一〇H!OR富。
(Means for Solving the Problem) In order to solve the problem caused by the surface tackiness of the cured product as described above, the present inventor took into consideration the problems of existing tack removal methods, and developed a photosensitive material for relief formation. As a result of intensive studies to eliminate the surface tackiness of the cured resin product, we found that the general formula R, -X (where X
10H! OR wealth.

−Coonまたは−CONHs s R1はCn H2
,。□またはCnHの−価炭化水素基で凰は11以上2
1以n−1 下の整数、R寓はHlたは−Co−Rs  8 Rm 
−COOCHs−R1、Rsは炭素数1以上6以下の二
価炭化水素基でおる)で示される化合物■を含有する感
光性樹脂組成物を用いて、亜RrHのアルカリ金属塩ま
たはアルカリ土類金属塩を0.01重量%以上含有する
水溶液中で後露光することによって製版直後よシ安定的
に表面貼、着性の全くない感光性樹脂板を作成する方法
を完成した。
-Coon or -CONHs s R1 is Cn H2
,. □ or CnH -valent hydrocarbon group, 凰 is 11 or more 2
An integer of 1 or less n-1, R is Hl or -Co-Rs 8 Rm
-COOCHs-R1, Rs is a divalent hydrocarbon group having 1 to 6 carbon atoms) By post-exposure in an aqueous solution containing 0.01% by weight or more of salt, we have completed a method for producing photosensitive resin plates that stably stick to the surface immediately after plate making and have no adhesive properties.

本発明における感光性樹脂組成物において、主体となる
感光性樹脂組成物すなわち化合物■を含有せしめる前の
組成物は、活性゛光線によって不溶化する性質のもので
、代表的なものとして、エチVン重合性不飽和基を有す
るプレポリマーと必要によジエチレン性不飽和単量体、
光重合増感剤、熱重合禁止剤からなる組成物があげられ
る。
In the photosensitive resin composition of the present invention, the main photosensitive resin composition, that is, the composition before containing compound (2), has the property of being insolubilized by actinic light, and a typical example is ethyl V. A prepolymer having a polymerizable unsaturated group and optionally a diethylenically unsaturated monomer,
Examples include compositions comprising a photopolymerization sensitizer and a thermal polymerization inhibitor.

プレポリマーとしては、不飽和ポリエステル、不飽和ポ
リウレタン、不飽和ポリアミド、不飽和Iす(メタ)ア
クリレート、およびこれらの各゛種変性体、炭素−炭素
二重結合を有する各種♂ム化合物等を例示することがで
きる。さらに詳細に説明すると不飽和ポリエステルとし
ては例えばマレイン酸、フマル酸、イタコン酸のような
不飽和二垣基酸又はその酸無水物とエチレングリコール
、プロピレングリコール、ジエチレングリコ−ルミトリ
゛エチレングリコール、グリセリン、トリメチロールゾ
ロノンなどの多価アルコールとのポリエステル、あるい
は前記酸成分の一部をコハク酸、アジピン酸、フタル酸
、イソフタル酸、無水フタル酸、トリメリット酸などの
飽和多塩基酸におき換えたポリエステル々どが挙げられ
る。不飽和ボ。
Examples of prepolymers include unsaturated polyesters, unsaturated polyurethanes, unsaturated polyamides, unsaturated (meth)acrylates, modified versions of these, and various male compounds having carbon-carbon double bonds. can do. To explain in more detail, examples of unsaturated polyesters include unsaturated acids such as maleic acid, fumaric acid, and itaconic acid, or their acid anhydrides, ethylene glycol, propylene glycol, diethylene glycol, triethylene glycol, glycerin, and triethylene glycol. Polyesters with polyhydric alcohols such as methylolzolonone, or polyesters in which part of the acid component is replaced with saturated polybasic acids such as succinic acid, adipic acid, phthalic acid, isophthalic acid, phthalic anhydride, and trimellitic acid. There are many examples. Unsaturated Bo.

リフレタンとしては、2g1A以上の末端水酸基を有す
るポリオールとポリイソシアネートから誘導されたウレ
タン基を介して連結した化合物の末端イソシアネート基
あるいは水酸基を利用して付加重合性不飽和基を導入し
たもの、例えば前記した多価アルコール、ポリエステル
ポリオール、ポリエーテルポリオールなどのポリオール
末端水酸基を有スる、1,4・−ポリブタジェン、水添
又は非水添1.2−ポリブタジエン、ツタジエン−スチ
レン共重合体、ブタジェン−アクリロニトリル共重合体
とトルイレンジイソシアネート、ジフェニルメタン−4
,42−ジイソシアネート、ヘキサメチレンジイソシア
ネートなどのポリイソシアネートとのポリウレタンの末
端インシアネートあるいは水酸基の反応性を利用して不
飽和基を導入したもの、すなわち前記した不飽和カルI
ン酸又はそのエステルのうち水酸基、カルIキシル基、
アミノ基などの活性水素を有する化合物とインシアネー
トとの反応により不飽和基を導入したり、カル−キシル
基を有するものと水酸基との反応により不飽和基を導入
した化合物、又は前記の不飽和ポリエステルをポリイソ
シアネートで連結した化合物などがあげられる(特公昭
51−37320号、特公昭52−7761号、特公昭
52−36444号、特公昭52−7363号、特公昭
55−34930号 各公報明細書に記載の感光性樹脂
組成物)。他に特開昭56−120718号、特公昭4
g−43126号等に記載されている感光性樹脂組成物
が挙げられる。これらのプレポリマーの数平均分子量は
一般的にSOO以上のものが使用されるが、二重結合1
個当シの分子量がi、o o oを超えると表面粘着性
が大きくなる場合が多く、特に二重結合1個当シの分子
量がs、oooを超えると粘着性は著しく、ウレタンプ
レポリマーのように末端に二重結合を導入する形のもの
は二重結合間の分子量が大きくなシ表面粘着性はさらに
増大し本発明の効果が著しく有効である。
Refletane is one in which an addition-polymerizable unsaturated group is introduced using the terminal isocyanate group or hydroxyl group of a compound linked via a urethane group derived from a polyol and polyisocyanate having a terminal hydroxyl group of 2g1A or more, such as those mentioned above. 1,4-polybutadiene, hydrogenated or non-hydrogenated 1,2-polybutadiene, tutadiene-styrene copolymer, butadiene-acrylonitrile Copolymer, toluylene diisocyanate, diphenylmethane-4
, 42-diisocyanate, hexamethylene diisocyanate, and other polyisocyanates into which an unsaturated group is introduced using the terminal incyanate of polyurethane or the reactivity of the hydroxyl group, that is, the above-mentioned unsaturated Cal I
hydroxyl group, Cal I xyl group,
Compounds into which an unsaturated group is introduced by reacting a compound having active hydrogen such as an amino group with incyanate, or a compound into which an unsaturated group is introduced by reacting a car-xyl group with a hydroxyl group, or the unsaturated group mentioned above. Examples include compounds in which polyesters are linked with polyisocyanate (Japanese Patent Publication No. 51-37320, Japanese Patent Publication No. 7761-1982, Japanese Patent Publication No. 36444-1988, Japanese Patent Publication No. 7363-1973, Japanese Patent Publication No. 34930-1985) Specifications of each publication photosensitive resin compositions described in the book). In addition, JP-A No. 56-120718, JP-A No. 4
Examples include photosensitive resin compositions described in No. g-43126. The number average molecular weight of these prepolymers is generally SOO or higher, but the double bond 1
When the molecular weight of each double bond exceeds i, o o o, the surface tackiness often becomes large. In particular, when the molecular weight of one double bond exceeds s, ooo, the tackiness becomes significant, and the urethane prepolymer In the case of a type in which a double bond is introduced at the end, the molecular weight between the double bonds is large, so the surface tackiness is further increased, and the effect of the present invention is extremely effective.

上記以外のプレポリマーとして、エチレン性二重結合の
付加以外の機構によシ光重合する該二重結合を含有しな
い化合物を用いても差しつかえない。
As prepolymers other than those mentioned above, it is also possible to use compounds that do not contain double bonds and are photopolymerized by a mechanism other than the addition of ethylenic double bonds.

エチレン性不飽和単量体としては、公知の種々の化合物
を使用できるが、このような化合物の例としては、アク
リル酸、メタクリル酸のような不飽和カルボン酸、又は
そのエステル、例えばアルキル−、シクロアル中ルー、
ハログ/化アルキル−、アルコキシアルキル−、ヒドロ
キシアルキル−、アミノアルキル−、テトラヒドロフル
フリル−、アリル−、グリシジル−、ベンジル−、フェ
ノキシ−アクリレート及びメタクリレート、アルキレン
グリ、コーーール、Iリオキシアルキレン!リコールの
モノ又はジアクリレート及びメタクリレート、トリメチ
ロ・−ルプロノ々/トリアクリレート及びメタクリレー
ト、ペンタエリトリットテトラアクリレート及びメタク
リレートなど、アクリルアミド、メタクリルアミド又は
その誘導体、例えばアルキル、ヒドロキシアルキルのN
−置換又はN、N’−置換アクリルアミド及びメタクリ
ルアミド、ジアセトンアクリルアミド及びメタクリルア
ミド、N、N’−アルキレンビスアクリルアミド及びメ
タクリルアミドなど、アリル化合物、例えばアリルアル
コール、アリルイソシアネート、リアリル7タレート、
トリアリルシアヌレートなど、マレイン酸、無水マレイ
ン酸、フマル酸又はそのエステル、例、tばアルキル、
ハロゲン化アルキル、アルコキシアルキルのモノ又はジ
マレエート及びフマレートなど、その他の不飽和化合物
例えばスチレン、ビニルトルエン、ジビニルベンゼン、
N−ビニルカルバゾール、N−ビニルピロリドンなどを
あげることが出来る。又これらの単量体の1部をアジド
系化合物例えば4.41−ジアジドスチルベン、p−7
二二レンーピスアジF、4.4’−ジアジドベンゾフェ
ノ、4−4’−ジアジドスチルベン、4.4′−ジアジ
ドカルコン、2 、6(4’−アジドベンザル)−シク
ロヘキナノン、4 a 4’−ジアジドスチルベンーα
−、/7/L/メン[,4#4’−ジアジドジフェニル
、4 、4’−ジアジドスチルペy−2.2’−ジスル
ホン酸ソーダなどK 置! カえるととができる。
Various known compounds can be used as the ethylenically unsaturated monomer, and examples of such compounds include unsaturated carboxylic acids such as acrylic acid and methacrylic acid, or esters thereof, such as alkyl-, Cycloal medium roux,
Halog/alkyl-, alkoxyalkyl-, hydroxyalkyl-, aminoalkyl-, tetrahydrofurfuryl-, allyl-, glycidyl-, benzyl-, phenoxy-acrylate and methacrylate, alkylenegly, coal, I-lyoxyalkylene! Recall mono- or diacrylates and methacrylates, trimethylo-luprono/triacrylates and methacrylates, pentaerythritol tetraacrylates and methacrylates, acrylamide, methacrylamide or derivatives thereof, such as alkyl, hydroxyalkyl N
Allyl compounds, such as allyl alcohol, allyl isocyanate, allyl heptatarate,
triallyl cyanurate, maleic acid, maleic anhydride, fumaric acid or its esters, e.g. t-alkyl,
Other unsaturated compounds such as mono- or dimaleates and fumarates of alkyl halides, alkoxyalkyl, such as styrene, vinyltoluene, divinylbenzene,
Examples include N-vinylcarbazole and N-vinylpyrrolidone. Also, a part of these monomers may be added to an azide compound such as 4.41-diazidostilbene, p-7
22lene-pisaziF, 4,4'-diazidobenzopheno, 4-4'-diazidostilbene, 4,4'-diazidochalcone, 2,6(4'-azidobenzal)-cyclohequinanone, 4 a 4' -Diazidostilbene-α
-, /7/L/men[,4#4'-diazide diphenyl, 4,4'-diazidostilpey-2,2'-sodium disulfonate, etc. K placement! A frog and a tortoise can be made.

これらの単量体はプレポリマー100重量部に対し、0
〜200重量部の範囲で添加すればよい。
These monomers are used in an amount of 0 per 100 parts by weight of the prepolymer.
It may be added in a range of 200 parts by weight.

本発明に使用する化合物Qは下記一般式で示される。Compound Q used in the present invention is represented by the following general formula.

一般式R七−X(ここでXは一〇H,OR意、 −CO
OHまたは−CON)II 、 R,はCnI(tたは
Cn H2n++、のzn+i −価炭化水素基でnは11以上21以下の整数、R3は
[または−Co−R3〜S −Rs  C00CH雪−
R1m R1は炭素数1以上6以下の二価炭化水素基で
ある)化合物(1)は基体となる感光性樹脂への溶解性
及び添加量に対する粘着性除去効果の面で感光性樹脂の
組成に応じて選択することが好ましい、炭素数の少ない
ものは一般に溶解しやすいが、表面粘着性除去効果は小
さく、″1九炭素数が増大すると粘着性除去効果は大き
いが樹脂の白濁を生じ画像再現性を低下させることがあ
る。溶解性、粘着性除去効果のバランスの点で式中のR
1は炭素数11〜21の範囲が好ましく、また特にXが
ヒドロキシル基、カルー中シル基、アミド基で示される
化合物または −CH1OC−R1S Rm  C−0CHIRIで示
されるチオジエステルが粘着性除去に効果が大きく好適
である。さらにXがヒドロキシル基、カル−キシル基の
場合R1”CIl〜Clハまたアミド基の場合はR1−
C11の飽和炭化水素及びctyllms  の不飽和
炭化水素、またチオジエステルの場合にはat−ctt
〜C1?、R1富C3の化合物が粘着性除去効果、樹脂
に対する溶解度が大きく特に効果的である。これらの化
合物■は単独あるいは組み合わせて使用することが出来
る。
General formula R7-X (where X is 10H, OR, -CO
OH or -CON) II, R, is a zn+i -valent hydrocarbon group of CnI (t or Cn H2n++, n is an integer of 11 to 21, R3 is [or -Co-R3~S -Rs C00CH snow-
R1m (R1 is a divalent hydrocarbon group having 1 to 6 carbon atoms) Compound (1) has an effect on the composition of the photosensitive resin in terms of solubility in the base photosensitive resin and tack removal effect depending on the amount added. It is preferable to select one based on the number of carbon atoms.Those with a small number of carbon atoms are generally easy to dissolve, but the effect of removing surface tackiness is small.As the number of carbon atoms increases, the effect of removing tackiness is large, but the resin becomes cloudy and image reproduction becomes difficult. In terms of the balance between solubility and adhesive removal effect, R in the formula
1 preferably has a carbon number in the range of 11 to 21, and in particular, a compound in which X is a hydroxyl group, a syl group, an amide group, or a thiodiester represented by -CH1OC-R1S Rm C-0CHIRI is effective in removing stickiness. is highly suitable. Further, when X is a hydroxyl group or a car-xyl group, R1''CIl~Cl is also an amide group, R1-
C11 saturated hydrocarbons and ctyllms unsaturated hydrocarbons, and in the case of thiodiesters at-ctt
~C1? , R1-rich C3 compounds are particularly effective in removing tack and have high solubility in resins. These compounds (1) can be used alone or in combination.

化合物■の異体例を示すと、ラウリルアルコール、ミリ
スチルアルコール、セチルアルコール、ステアリルアル
コール、エイコシルアルコール、ラウリン酸、ミリスチ
ン酸、ノルミチン酸、ステアリン酸、エイ:2!L ラ
ウリン酸アミド、ミリスチン酸アミド、ノルミチン識ア
ミド、ステアリン酸アミド、エルカ酸アミド、ジラクリ
ルチオジッロビオネート、シミリスチルチオジプロピオ
ネート、ジステアリルチオジプロピオネート、オレイル
アルコール、エルシルアルコール、オレイン酸、エルカ
酸、オレイン酸アミド、エルカ酸アミド、などが挙げら
れる。
Examples of variants of compound ■ are lauryl alcohol, myristyl alcohol, cetyl alcohol, stearyl alcohol, eicosyl alcohol, lauric acid, myristic acid, normitic acid, stearic acid, and stearic acid: 2! L Lauric acid amide, myristic acid amide, normitin amide, stearic acid amide, erucic acid amide, diracryl thiodillobionate, simiristyl thiodipropionate, distearyl thiodipropionate, oleyl alcohol, erucyl alcohol, olein acids, erucic acid, oleic acid amide, erucic acid amide, and the like.

化合物■を感光性樹脂組成物中に単独あるいは組み合わ
せて添加する場合、その添加量の総量が組成物基体に対
し0.1重量憾未満では表面粘着性除去に実質的に効果
はなく、6重量%よ〕多い場合は表面粘着性除去効果は
十分く発揮されるが、組成物基体への溶解性が低下し樹
脂が白濁するためiiigR再現性の低下をひきおこし
、さらに硬化物の機械的物性強度が低下し好ましくない
、最適添加量は組成物基体の構造によって溶解度も異な
るため各々の樹脂に対して決定されなければならないが
、0.1〜6重量%が適当であシ、特に表面粘着性除去
効果、硬化物の機械的物性強度の点から0.5〜4重量
%の範囲がよ〕好ましい。
When compound (1) is added alone or in combination to a photosensitive resin composition, if the total amount added is less than 0.1% by weight based on the base of the composition, it will not be substantially effective in removing surface tackiness; %], the surface tack removal effect is sufficiently exhibited, but the solubility of the composition in the substrate decreases and the resin becomes cloudy, resulting in a decrease in iiigR reproducibility and furthermore, the mechanical strength of the cured product decreases. The optimum amount to be added must be determined for each resin since the solubility varies depending on the structure of the base composition, but 0.1 to 6% by weight is suitable, especially for surface tackiness. From the viewpoint of the removal effect and the mechanical strength of the cured product, a range of 0.5 to 4% by weight is preferred.

感光性樹脂組成物に化合物(4)を含有させる方法とし
ては、あらかじめプレポリマー中に混合した後にエチレ
ン性不飽和単量体、重合開始剤等と混合する方法、エチ
レン性不飽和単量体に混合した後にプレポリマー、重合
開始剤等と混合する方法、および感光性樹脂組成物に添
加し混合する方法等が採用されるが、いずれの方法で添
加しても、その効果はわからない。
Methods for incorporating the compound (4) into the photosensitive resin composition include a method in which the compound (4) is mixed in advance into a prepolymer and then mixed with an ethylenically unsaturated monomer, a polymerization initiator, etc.; A method of mixing it with a prepolymer, a polymerization initiator, etc. after mixing, a method of adding it to a photosensitive resin composition and mixing it, etc. are adopted, but the effect of adding it is not known no matter which method is used.

そのほか、通常、使用されるもの、すなわち、光重合増
感剤としては公知の種々の光増感剤を使用し得る。この
ようなものとして、例えばベンゾインやベンゾインエチ
ルエーテル、ベンゾイン−n−プロピルエーテル、ベン
ゾイン−イソプロピルエーテル、ベンゾインイソブチル
−エーテルなどのベンゾインアルキルエーテル類、ジメ
トキシフェニルアセトフェノン、ベンゾフェノン、ヘノ
ジル、ジアセチル、ジフェニルスルフィド、ニオシン、
チオニン、チオキサントン類などかあシ、組成物に対し
て、0.001〜10重量係の範囲で使用することがで
きる。
In addition, various commonly used photosensitizers, ie, photopolymerization sensitizers, may be used. Examples of such substances include benzoin, benzoin alkyl ethers such as benzoin ethyl ether, benzoin n-propyl ether, benzoin isopropyl ether, and benzoin isobutyl ether, dimethoxyphenylacetophenone, benzophenone, henosyl, diacetyl, diphenyl sulfide, and niosin. ,
Thionine, thioxanthone, etc. can be used in an amount of 0.001 to 10% by weight of the composition.

まえ、熱重合禁止剤として、ハイドロキノン、峰ノ第三
ブチルハイドロキノン、ベンゾキノン、2.5−ジフェ
ニル−p−ベンゾキノン、ヒフリフ酸、ジ−p−フルオ
ロフェニルアミン、P−/トキシフェノール、2,6−
ジ第三ブチル−p−クレゾールなどをあげることができ
る。これらの熱重合禁止剤社、光反応を抑制することな
く、ただ熱重合反応(暗反応)を防止するものであるこ
とが望ましい。し九がって、熱重合禁止剤の添加量は、
プリポリi−と架橋剤との総IK対し、o、oos〜&
O重量慢の範囲でめることか望ましい。
As a thermal polymerization inhibitor, hydroquinone, Mineno-tert-butylhydroquinone, benzoquinone, 2,5-diphenyl-p-benzoquinone, hyfurific acid, di-p-fluorophenylamine, P-/toxyphenol, 2,6-
Examples include di-tert-butyl-p-cresol. It is desirable that these thermal polymerization inhibitors only prevent thermal polymerization reactions (dark reactions) without suppressing photoreactions. Therefore, the amount of thermal polymerization inhibitor added is
For the total IK of prepoly i- and crosslinking agent, o, oos ~ &
It is desirable to set it within a moderate range.

本発明で用いられる亜硫酸のアルカリ金属環またはアル
カリ土類金属塩は、具体的には亜硫酸ナトリウム、亜b
ILr1/Lカリウム、亜硫酸カルシウム等が挙げられ
る。
The alkali metal ring or alkaline earth metal salt of sulfite used in the present invention is specifically sodium sulfite,
Examples include ILr1/L potassium and calcium sulfite.

後露光の際に用いる水溶液濃度は0.01重量%以上で
あれはよく、それよシ少ない場合は製版直後の粘着力を
除去する効果がない。また感光性樹脂組成物中の化合物
(1)の麺類、含有量により粘層除去効果νζ差がある
ため、安定的に粘着力のない硬化板を得るために、o、
osxt%以上であることがより好ましい。上限は特に
lk<、懸濁しても効果は示すが、後露光工程が物性付
与の目的を兼ねているため、懸濁による露光時間の遅延
が生じ作業時間がのびること、および経済性の点から上
限を設定すればよい。
The concentration of the aqueous solution used in post-exposure should be at least 0.01% by weight; if it is less than that, it will not be effective in removing the adhesive force immediately after plate making. In addition, since there is a difference in the sticky layer removal effect νζ depending on the noodle content of compound (1) in the photosensitive resin composition, o,
More preferably, it is osxt% or more. The upper limit is particularly limited to lk<, suspension is effective, but since the post-exposure step also serves as the purpose of imparting physical properties, suspension delays the exposure time, prolonging the working time, and from the economic point of view. Just set an upper limit.

本発明の感光性樹脂版を作成するには、まず定法に依っ
てレリーフ像を有する感光性樹脂版を作成し、すなわち
、炭素アーク灯、超高圧水銀灯、高圧水銀灯、低圧水銀
灯、紫外螢光ランプ、メタルハライドランプ、キセノン
ランプ、太陽光等の光源を用い、ネガフィルムを通して
露光すると、露光された画偉部が硬化する。jl光され
ない非画儂部は空気を吹きつけて除去するか、又は、未
硬化の感光性樹脂組成物を溶解または分散する液体、例
えば水、酸アルカリ水溶液、または界面活性剤の水溶液
、有機溶剤を含む水溶液で溶解あるいは分散除去する。
To prepare the photosensitive resin plate of the present invention, first, a photosensitive resin plate having a relief image is prepared according to a standard method. When a negative film is exposed to light using a light source such as a metal halide lamp, a xenon lamp, or sunlight, the exposed areas of the image harden. jl The non-image area that is not exposed to light is removed by blowing air, or a liquid that dissolves or disperses the uncured photosensitive resin composition, such as water, an acid-alkali aqueous solution, an aqueous solution of a surfactant, or an organic solvent. Dissolve or disperse in an aqueous solution containing

それから、この樹脂板のレリーフ像が形成されている#
I儂面を亜硫酸のアルカリ金属塩または、アルカリ土類
金属塩の水溶液に浸漬し、炭素アーク灯、超高圧水銀灯
、高圧水銀灯、紫外螢光う゛ンプ、メタルハライドラン
プ、キセノンランプ、殺菌灯、太陽光等の光源を用い画
像面側よ〕照射する。照射時間は通常の物性向上の目的
で後露光する時間と同様に設定すれば良い、照射終了後
、乾燥する。
Then, the relief image of this resin plate is formed#
Immerse the surface in an aqueous solution of an alkali metal salt of sulfite or an alkaline earth metal salt, and then apply a carbon arc lamp, ultra-high pressure mercury lamp, high-pressure mercury lamp, ultraviolet fluorescent lamp, metal halide lamp, xenon lamp, germicidal lamp, or sunlight. Irradiate the image side using a light source such as The irradiation time may be set to be the same as the time for post-exposure for the purpose of improving physical properties. After irradiation, drying is performed.

(作用) 露光硬化後の非粘着性の評価は次のようKして行われる
。第1図において、試料片1すなわち、厚さ3Hの硬化
板を、乾燥した後に、温度20℃でその樹脂面を上面に
して水平な架台2上に置き、樹脂面の平滑な部分に半径
50鵡、巾13mのアルミニウム輪3を接触させ、アル
ミニウム輪3KsooIIの荷重を掛けて4秒間放置し
た後、毎分30鵡の一定速度でアルミ二り五輪3を引き
上げ、アルミニウム輪3が試料片1から離れる時の粘着
力をプツシニブルゲージ4で読み堆る。
(Function) Evaluation of non-adhesion after exposure and curing is performed using K as follows. In Fig. 1, a sample piece 1, that is, a cured plate with a thickness of 3H, is dried and then placed on a horizontal pedestal 2 with the resin side facing upward at a temperature of 20°C. The aluminum ring 3 with a width of 13 m was brought into contact with the parrot, and a load of Ksoo II was applied to the aluminum ring 3 and left for 4 seconds. Then, the aluminum ring 3 was pulled up at a constant speed of 30 meters per minute, and the aluminum ring 3 was removed from the sample piece 1. Read the adhesion force when it is separated using Pushinible Gauge 4.

この粘着力が小さいものが非粘着性が良い。前記の測定
法による指示値がso!iを超えると、取扱中に硬化物
の粘着性表面同志が重なった場合に、ひき剥すことが固
層となる。また支持体として各種フィルム、箔、板材を
用い、その上・にレリーフ像を形成している場合でも、
硬化物を積み重ねておくと、粘着性表面と支持体が粘着
して剥離し難くなる。そのため粘着力は5oIi以下で
ある必要がある。また特に印刷版として使用する場合に
は、粘着面に紙粉が付着して、印刷物の汚れを生じたシ
、被印刷物が紙である場合には印刷面と紙との粘着によ
シ、紙ムケの現象が起こる。これを防止するためには、
粘着力が3011以下であることが好ましい。
The lower the adhesive force, the better the non-adhesive property. The indicated value by the above measurement method is so! If it exceeds i, when the adhesive surfaces of the cured product overlap each other during handling, a solid layer is formed that is difficult to peel off. In addition, even when various films, foils, and plate materials are used as supports and relief images are formed on them,
If cured products are piled up, the adhesive surface and the support will stick together, making it difficult to separate them. Therefore, the adhesive force needs to be 5oIi or less. In addition, especially when used as a printing plate, paper dust may adhere to the adhesive surface and cause stains on the printed matter. The phenomenon of baldness occurs. To prevent this,
It is preferable that the adhesive strength is 3011 or less.

通常の感光性樹脂は、粘着力がioo、g以上の硬化物
を与えるようなものが多く、特に低硬度の硬化物を与え
る感光性樹脂組成では、粘着力は高(300gを越える
ものが多かった。
Many ordinary photosensitive resins give cured products with adhesive strength of ioo, g or more, and photosensitive resin compositions that give cured products with particularly low hardness have high adhesive strength (many of them exceed 300 g). Ta.

また、化合物(4)を含有する感光性樹脂組成物を用い
て、亜硫酸のアルカリ金属塩、アルカリ土類金属塩の水
溶液を用いなかった場合は、製版波数時間経過後には粘
着力が301!以下になるが、製版直後では30IIを
超えることかった。
Furthermore, when using a photosensitive resin composition containing compound (4) without using an aqueous solution of an alkali metal salt or alkaline earth metal salt of sulfite, the adhesive strength was 301! As shown below, it exceeded 30 II immediately after plate making.

ところが本発明では、すなわち、亜硫酸のアルカリ金属
塩またはアルカリ土類金属塩中後露光を併用することで
、製版直後よりまったく粘着性のない版ができ喪。
However, in the present invention, by using post-exposure in an alkali metal salt or alkaline earth metal salt of sulfite, a plate with no tackiness can be obtained immediately after plate making.

(実施例) 次に実施例および比較例を記す。これらkおける部数は
原則として重量部を意味する。
(Example) Next, Examples and Comparative Examples will be described. In principle, the number of parts in k means parts by weight.

実施例1− Iリプロピレングリコール(数平均分子量〔以下、Mn
と略す)200G)1部、ぼりプロピレングリコールア
ジペートジオール(Mn=2000)1部、両末端イン
シアネート型ポリクレタンを得た。これにポリプロピレ
ングリコールモノメタクリレ−) (MIS−380)
を反応させて両末端メタクリレート変性ポリウレタンプ
レIリマーを得た(Mn−16500)thこのプレポ
リマー100部に対してポリプロピレングリコールモノ
メタクリレート(Mn=380)25部、ラウリルメタ
クリレート15部、テトラエチレングリコールジメタク
リレート10部、2.2−ジメトキシフェニルアセトフ
ェノン1、5部、2,6−ジーt−ブチル−p−クレゾ
ール0.2部を加え、これにエルカ酸アミド1.5部を
添加混合して、感光性樹脂組成物(4)を得た。次いで
ネガフィルム上にカバーフィルムとして厚さ20μのぼ
りプロピレンフィルムを置き、その上に厚さ3tのスペ
ーサーを設け、その内RKm成物■を注ぎ、その上を支
持体として厚さZooμの4リエメテルフイルムで覆い
、ケミカルランプにより偉形成露光を行なった。次いで
カバーフィルムを剥し、ノニオン系界面活性剤2チを含
む40℃の温水忙よシ現偉した後、現像液を流水により
洗い流し、o、x1亜硫酸ナトリウム水溶液中に浸漬し
ケミカルランプを用^て後露光を行なった。SaCの乾
燥機で1重分間乾燥し硬化版を得た。乾燥直後の表面粘
着力はoIであった。
Example 1-I Lipropylene glycol (number average molecular weight [hereinafter referred to as Mn
(abbreviated as )200G), 1 part of propylene glycol adipate diol (Mn=2000), and both ends incyanate type polycrethane were obtained. Polypropylene glycol monomethacrylate) (MIS-380)
was reacted to obtain a polyurethane pre-I remer (Mn-16500) modified at both ends with methacrylate.To 100 parts of this prepolymer, 25 parts of polypropylene glycol monomethacrylate (Mn=380), 15 parts of lauryl methacrylate, and tetraethylene glycol di 10 parts of methacrylate, 1.5 parts of 2,2-dimethoxyphenylacetophenone, and 0.2 parts of 2,6-di-t-butyl-p-cresol were added, and 1.5 parts of erucic acid amide was added and mixed. A photosensitive resin composition (4) was obtained. Next, a propylene film with a thickness of 20μ was placed on the negative film as a cover film, a spacer with a thickness of 3t was provided on top of the film, RKm product (■) was poured into the spacer, and a 4-layer film with a thickness of Zooμ was placed on top of the film as a support. It was covered with a film and exposed to light using a chemical lamp. Next, the cover film was peeled off, and the sample was washed with warm water at 40°C containing 20% of nonionic surfactant, and then the developer was washed away with running water, and the sample was immersed in an aqueous solution of sodium sulfite using a chemical lamp. A post-exposure was performed. A cured plate was obtained by drying for one minute in a SaC dryer. The surface adhesive strength immediately after drying was oI.

実施例2 実施例Iにおいて、感光性樹脂組成物中のエルカ酸アミ
ドに代えてミリスチン酸を用いる以外は同様に操作を行
なったところ、乾燥直後よ〕表面粘着力oyの硬化版が
得られた。
Example 2 The same procedure as in Example I was carried out except that myristic acid was used instead of erucic acid amide in the photosensitive resin composition, and a cured plate with a surface adhesion of oy was obtained immediately after drying. .

実施例3 実施例1!/cおいて、感光性樹脂組成物中のエルカ酸
アミドに代えてシミリスチルチオジプロピオネートを0
.2 i置部、オレイルアマイド1重景部を用い、露光
、現像後、亜硫酸ナトIJウム水溶液の濃度をかえて後
露光を行なった。中心波長254nmの殺菌灯(東芝G
C−15型)とケミカルランプ(中心波長370 nm
 )を用いて約10分間、約15譚の距離をへだてで同
時照射した。乾燥後30分後の粘着力を調べた。
Example 3 Example 1! /c, in place of erucic acid amide in the photosensitive resin composition, cimilistyl thiodipropionate was added to 0.
.. After exposure and development, post-exposure was carried out using a 2 i placement area and an oleylamide 1 overlay area, changing the concentration of the sodium sulfite aqueous solution. Germicidal lamp with a center wavelength of 254 nm (Toshiba G
C-15 type) and chemical lamp (center wavelength 370 nm)
) was used to simultaneously irradiate a distance of about 15 lines for about 10 minutes. The adhesive strength was examined 30 minutes after drying.

辛1 乾燥後30分室温放置時の測定値実施例4および
5 5重施例1において亜tptE酸ナトリウムに代えて表
中に示す化合物を用いた以外は同様の操作を行なった結
果を示した。
Spicy 1 Measured values when left at room temperature for 30 minutes after drying Examples 4 and 5 5-fold The results of the same operation as in Example 1 except that the compounds shown in the table were used instead of sodium tptE acid were shown. .

第2表  後露光水溶液の種類と粘着力壷11重量%水
溶液 辛2 乾燥後30分室温放置後の御淀値比較例1.2お
よび3 化合物(りと再露光時亜硫酸ナトリウムのいづれかまた
は両方除いた方法の表面粘着力を示した。
Table 2 Types and adhesion of post-exposure aqueous solutions 11% by weight aqueous solution 2 Comparative examples 1, 2 and 3 of stagnation values after drying and leaving at room temperature for 30 minutes Compounds (removal of either or both of sodium sulfite during re-exposure) The surface adhesion of this method was shown.

比較例4および5 亜硫酸す) IJウムに代えて、還元性のチオ硫酸ナト
リウム、ブドウ糖を用いた例を示した。粘着力除去効果
はほとんどなかった。
Comparative Examples 4 and 5 (Sulfite) An example was shown in which reducing sodium thiosulfate and glucose were used in place of IJium. There was almost no adhesive force removal effect.

Claims (1)

【特許請求の範囲】[Claims] 感光性樹脂版を作成するに際し、一般式R_1−X(こ
こでXは−CH_2OR_2、−COOHまたは−CO
NH_2、R_1はCnH_2_n_+_1またはCn
H_2_n_−_1の一価炭化水素基でnは11以上2
1以下の整数、R_3はHまたは−CO−R_3−S−
R_3−COOCH_2−R_1、R_2は炭素数1以
上6以下の二価炭化水素基である)で示される化合物を
含有する感光性樹脂組成物を用いて、亜硫酸のアルカリ
金属塩またはアルカリ土類金属塩を0.01重量%以上
含有する水溶液中で後露光することを特徴とする感光性
樹脂層の作成方法
When creating a photosensitive resin plate, the general formula R_1-X (where X is -CH_2OR_2, -COOH or -CO
NH_2, R_1 is CnH_2_n_+_1 or Cn
H_2_n_-_1 monovalent hydrocarbon group, n is 11 or more 2
An integer less than or equal to 1, R_3 is H or -CO-R_3-S-
Using a photosensitive resin composition containing a compound represented by R_3-COOCH_2-R_1 and R_2 are divalent hydrocarbon groups having 1 to 6 carbon atoms, an alkali metal salt or alkaline earth metal salt of sulfite A method for creating a photosensitive resin layer, characterized by post-exposure in an aqueous solution containing 0.01% by weight or more of
JP59240480A 1984-11-16 1984-11-16 How to make a photosensitive resin plate Expired - Lifetime JPH073581B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59240480A JPH073581B2 (en) 1984-11-16 1984-11-16 How to make a photosensitive resin plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59240480A JPH073581B2 (en) 1984-11-16 1984-11-16 How to make a photosensitive resin plate

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JPS61120142A true JPS61120142A (en) 1986-06-07
JPH073581B2 JPH073581B2 (en) 1995-01-18

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01121858A (en) * 1987-09-14 1989-05-15 E I Du Pont De Nemours & Co Anti-adhesion of photopolymer flexographic plate
WO1996002020A1 (en) * 1994-07-12 1996-01-25 Asahi Kasei Kogyo Kabushiki Kaisha Method of removing surface stickiness of relief printing plate made from photosensitive resin
US5856066A (en) * 1996-02-20 1999-01-05 Asahi Kasei Kogyo Kabushiki Kaisha Developer for photosensitive resin printing plate and process for producing photosensitive resin printing plate

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57186754A (en) * 1981-05-07 1982-11-17 Du Pont Surface treatment of printing plate
JPS5897043A (en) * 1981-12-04 1983-06-09 Teijin Ltd Post exposure method in solution

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57186754A (en) * 1981-05-07 1982-11-17 Du Pont Surface treatment of printing plate
JPS5897043A (en) * 1981-12-04 1983-06-09 Teijin Ltd Post exposure method in solution

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01121858A (en) * 1987-09-14 1989-05-15 E I Du Pont De Nemours & Co Anti-adhesion of photopolymer flexographic plate
JPH0524496B2 (en) * 1987-09-14 1993-04-08 Ii Ai Deyuhon De Nimoasu Ando Co
WO1996002020A1 (en) * 1994-07-12 1996-01-25 Asahi Kasei Kogyo Kabushiki Kaisha Method of removing surface stickiness of relief printing plate made from photosensitive resin
GB2305255A (en) * 1994-07-12 1997-04-02 Asahi Chemical Ind Method of removing surface stickiness of relief printing plate made from photosensitive resin
GB2305255B (en) * 1994-07-12 1998-03-11 Asahi Chemical Ind A method of removing surface tack of a photosensitive resin relief printing plate
US5856066A (en) * 1996-02-20 1999-01-05 Asahi Kasei Kogyo Kabushiki Kaisha Developer for photosensitive resin printing plate and process for producing photosensitive resin printing plate

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