JPS61115900A - Method of filling inside of piping with liquid - Google Patents

Method of filling inside of piping with liquid

Info

Publication number
JPS61115900A
JPS61115900A JP59231529A JP23152984A JPS61115900A JP S61115900 A JPS61115900 A JP S61115900A JP 59231529 A JP59231529 A JP 59231529A JP 23152984 A JP23152984 A JP 23152984A JP S61115900 A JPS61115900 A JP S61115900A
Authority
JP
Japan
Prior art keywords
liquid
valve
pipe
piping
relief valve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59231529A
Other languages
Japanese (ja)
Other versions
JPH021760B2 (en
Inventor
二宮 一男
門田 利雄
宮沢 貞行
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP59231529A priority Critical patent/JPS61115900A/en
Publication of JPS61115900A publication Critical patent/JPS61115900A/en
Publication of JPH021760B2 publication Critical patent/JPH021760B2/ja
Granted legal-status Critical Current

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  • Loading And Unloading Of Fuel Tanks Or Ships (AREA)
  • Fluid-Pressure Circuits (AREA)
  • Pipeline Systems (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は液槽間の管路系の液体移送に関し、詳しくは液
体移送に先立って行う液槽間管路系内の液体充填、抜気
に関する。
Detailed Description of the Invention (Industrial Application Field) The present invention relates to liquid transfer in a pipe system between liquid tanks, and more specifically, liquid filling and degassing in a pipe system between liquid tanks prior to liquid transfer. Regarding.

(従来技術) 液体の移送に於ては多くの場合、1つの液槽から他の液
槽へ、もしくは加工工程装置への合目的に設計配管され
た管路系による移送が行われる。
BACKGROUND OF THE INVENTION Liquids are often transferred from one liquid tank to another, or by a purpose-designed piping system to processing equipment.

該液体移送が単なる液体の移し替え、移送量の問題に止
る間は管路系内の大きな気泡塊或は微小な気泡量の存在
、存在量は問題にされないが、移送量/時即ち移堺速度
、他種等への供給速度が問題になる場合、例えば1つの
液槽に貯えた反応液を他の液槽の反応液中忙添加すると
か1つの液槽にある仕上り液を連続加工工程装置に於て
一定面積或は一定容積に割当供給する等の場合、特に時
間が分、秒の単位で制約されていたシ、供給単位が精密
少量である場合忙は、両槽間管路系中の気泡量はその大
なる時は勿論率なる時忙も両液の反応に影響を与え或は
加工精度にばらつき、製品に理疵を与える。
As long as the liquid transfer is just a matter of transferring the liquid or transferring the amount, the presence or amount of large bubbles or minute bubbles in the pipe system is not a problem, but the transfer amount/time, that is, the transfer amount. If speed or supply speed to other species is a problem, for example, the reaction liquid stored in one liquid tank may be added to the reaction liquid in another liquid tank, or the finished liquid in one liquid tank may be added to the reaction liquid in a continuous processing process. When supplying equipment to a fixed area or a fixed volume, especially when the time is limited to minutes or seconds, or when the supply unit is a precise small quantity, the pipe system between the two tanks is difficult. Not only the amount of bubbles inside the product, but also the amount of time the product is busy, will affect the reaction between the two liquids, or will cause variations in processing accuracy, resulting in defects in the product.

以後の記述を簡略にするために移送すべき液体を貯えた
液槽を供給槽を称し、一方管路系を通じて放出された移
送液を受容する液槽もしくは加工工程装置を加工槽と称
するならば、従来供給槽、加工槽の液体間に充分にヘッ
ドの差がある場合には、前記管路系内の抜気処置は従来
常用される抜気技術によって満足に行なうことができた
To simplify the following description, the liquid tank storing the liquid to be transferred will be referred to as the supply tank, and the liquid tank or processing equipment that receives the transferred liquid released through the pipeline system will be referred to as the processing tank. Conventionally, when there is a sufficient head difference between the liquids in the supply tank and the processing tank, air removal from the pipe system can be satisfactorily carried out by conventional air removal techniques.

しかし両槽液体ヘッドがはy同水準にある時には抜気は
甚だ困難であシ、この困難を排除する手段が2.3提案
されている。例えは米国特許3,821゜002号には
配管管路系にバイパス管路を設ける循環配管とする方法
が開示されておシ、また特開昭49−65824号には
管路に減圧飽和水蒸気を満す方法が示されている。更に
特願昭58−97229号には管路系に純水を満してお
き、移送液で純水を先に押遺りながら気泡を入れること
なく移送液で管路を満す方法が提案されている。
However, when the liquid heads of both tanks are at the same level, it is extremely difficult to vent air, and a means to eliminate this difficulty has been proposed in 2.3. For example, U.S. Patent No. 3,821°002 discloses a method for creating circulation piping in which a bypass line is provided in a piping line system, and Japanese Patent Application Laid-open No. 49-65824 discloses a method in which a bypass line is provided in a piping line system, and Japanese Patent Application Laid-open No. 49-65824 discloses a method for using reduced pressure saturated steam in a pipe line. It shows how to meet the requirements. Furthermore, Japanese Patent Application No. 58-97229 proposes a method in which the pipe system is filled with pure water, and the pipe is filled with the transferred liquid without introducing air bubbles while pushing the pure water away first with the transferred liquid. has been done.

しかしながら前記バイパスを設ける方法は循環経路があ
るため、設備的に複雑になシ、かつ配管中の残液等の問
題がある。
However, since the method of providing a bypass has a circulation path, it is complicated in terms of equipment and has problems such as residual liquid in the piping.

又、必ず循環させるためにポンプが必要で、精密に流量
を制御する場合、ポンプの脈動が問題となる。
In addition, a pump is required to ensure circulation, and pulsation of the pump poses a problem when precisely controlling the flow rate.

ポンプを使用するとデッドスペースが増え、ラインの空
気が抜けにくく時間がかかる、又、微小気泡を作シやす
く、気泡がライン中から抜けにくい欠点を残しておシ、
また減圧蒸気を満す方法では減圧蒸気を必要とするため
減圧蒸気の発生装量が必要で、且つ脱気した水も必要で
あるため゛装置が複雑で、イニシャル・コスト及びラン
ニングコストもかかることが問題になる。
Using a pump increases dead space, making it difficult for air to escape from the line and taking time.Also, it tends to create microbubbles, leaving the problem that air bubbles are difficult to escape from the line.
In addition, the method of filling with reduced pressure steam requires reduced pressure steam, which requires generation of reduced pressure steam, and also requires deaerated water, so the equipment is complicated and the initial cost and running cost are high. becomes a problem.

更に管路に純水を満す方法は予じめ管路中に純水を詰め
て、移送液で該純水を押し出しながら管路内を置換する
ため正規の移送液になるまで移送液を系外に排出しなけ
ればならないので移送液のロスを伴うので管路内容積が
小さい場合に適用され、−膜性にや\欠ける所がある。
Furthermore, the method of filling the pipe with pure water is to fill the pipe with pure water in advance, and then use the transfer liquid to push out the pure water and replace the inside of the pipe, so the transfer liquid is pumped until it becomes the regular transfer liquid. Since it has to be discharged out of the system, there is a loss of the transferred liquid, so it is applied when the internal volume of the pipe is small, and it may be somewhat lacking in membrane properties.

(発明の目的) 前記したように供給槽と加工槽の液体ヘッドがtt x
同水準にある場合の両槽間管路系に於る気泡を排除した
液体充填には尚不満足な点が多く、一方空間の効率的利
用の面から#1ソ同水準に液槽を配置する要請は大きい
(Object of the invention) As described above, the liquid heads of the supply tank and the processing tank are
There are still many unsatisfactory points in liquid filling that eliminates air bubbles in the piping system between both tanks when they are at the same level.On the other hand, from the standpoint of efficient use of space, the liquid tanks are placed at the same level in #1. The demands are great.

従って本発明の目的は、はソ同水準に配置された液槽間
に配管された管路系に於て4該管路系に気泡を存在せし
めることなく液体を充填する方法を提供することであシ
、且つ該方法を適用しうる配管形態を提供することであ
る。
Therefore, an object of the present invention is to provide a method for filling a liquid in a pipe system piped between liquid tanks arranged at the same level without creating air bubbles in the pipe system. The object of the present invention is to provide a reed and a piping configuration to which the method can be applied.

(発明の構成) 前記本発明の目的は、液体を移送する配管に於て、移送
すべき液体の受入端及び放出端に夫々管路の開閉の用を
なす受入弁及び放出弁を有し、該受入弁及び放出弁のい
づれよりも高所に、管路内気体の逃し升を備えた配管と
し、該配管に於て下記順序; (a)  移送すべき液体を加圧して受入弁を開いて配
管管路内罠圧入し、受入弁を閉じ、 (b)  配管管路内の気体に前記配管管路の前記高′
所にある逃し弁が露呈する状態に於て逃し弁を開いて管
路内気体を逃す、 (c)  逃し弁を閉じる ことから成る操作単位を繰返すととKよる配管内への液
体の充填方法によって達成することができる0 尚本発明に於て配管管路内の気体に逃し弁が露呈する状
態とは移送すべき液体を加圧して配管管路に圧入した際
、圧入した液体が未だ逃し弁位置に届かぬ状態と、逃し
弁位置を過ぎ受入弁を閉ぢ且つ液体が放出弁に到るまで
の管路を満さぬ際、液体は重力によって気体と入換り気
体は上昇して最高位置におる逃し弁の位置に果りた状態
を指すものである。
(Structure of the Invention) The object of the present invention is to provide a pipe for transferring a liquid, which has a receiving valve and a releasing valve at the receiving end and the discharging end of the liquid to be transferred, respectively, which serve to open and close the pipe. The piping shall be equipped with a relief chamber for the gas in the piping at a location higher than either the receiving valve or the discharge valve, and the piping shall be operated in the following order: (a) Pressurize the liquid to be transferred and open the receiving valve. (b) Pressure-fit the piping into the trap inside the piping, and close the receiving valve;
(c) A method of filling liquid into a pipe by repeating an operation unit consisting of opening the relief valve in a state where the relief valve is exposed and releasing the gas in the pipe, and (c) closing the relief valve. In the present invention, the state in which the relief valve is exposed to the gas in the piping line means that when the liquid to be transferred is pressurized and pressurized into the piping line, the pressurized liquid still escapes. When the liquid does not reach the valve position, and when it passes the relief valve position and closes the intake valve, and the liquid does not fill the pipeline to the discharge valve, the liquid replaces the gas due to gravity, and the gas rises. This refers to the state in which the relief valve is at its highest position.

次に図によって本発明を説明する。Next, the present invention will be explained with reference to the figures.

第1図は本発明の方法に用いられる配管管路系を示すブ
ロック図である。
FIG. 1 is a block diagram showing a piping line system used in the method of the present invention.

同図に於て1は供給槽、Llは供給槽1に貯えられ移送
されるべき液体(懸濁液も含む)、hlは液体L1が供
給槽1で示すヘッド、12は供給槽1に外部から液体L
1を加圧する圧力pなる気体を導入するためのパイプで
あって開閉弁121を備えている。
In the figure, 1 is the supply tank, Ll is the liquid (including suspension) stored in the supply tank 1 and to be transferred, hl is the head where the liquid L1 is shown in the supply tank 1, and 12 is the external part of the supply tank 1. from liquid L
It is a pipe for introducing gas at a pressure p to pressurize the air conditioner 1, and is equipped with an on-off valve 121.

Paは大気圧を意味する。Pa means atmospheric pressure.

3は加工槽、L3は加工槽3の受容している液体であり
、前記液体L1と同種であることもあシ、またL+と他
の液体との反応或は混合液であること′もある。h3は
液体L3の示すヘッド、32は加工槽内の気体が大気P
aの外部に通ずるためのパイプであって開閉弁321を
備えている。
3 is a processing tank, and L3 is a liquid received in processing tank 3. It may be the same type of liquid as the liquid L1, or it may be a reaction or a mixture of L+ and another liquid. . h3 is the head indicated by the liquid L3, and 32 is the head indicated by the gas in the processing tank, which is the atmosphere P.
It is a pipe for communicating with the outside of a, and is equipped with an on-off valve 321.

2は供給槽1から加工槽3への配管の管路系であって、
11は液体L1を管路系2へ受入る受入弁、31は管路
系2に導入された液体L1を加工槽3内に放出するため
の放出弁である。21及び23は管路であって、管路2
1と23の接合部に気体逃し弁22が設けられている。
2 is a pipe system of piping from the supply tank 1 to the processing tank 3,
Reference numeral 11 designates a receiving valve for receiving the liquid L1 into the pipe line system 2, and reference numeral 31 represents a discharge valve for discharging the liquid L1 introduced into the pipe line system 2 into the processing tank 3. 21 and 23 are conduits, of which conduit 2
A gas relief valve 22 is provided at the junction between 1 and 23.

該逃し弁22は前記受入弁11、放出弁31、のいづれ
より高所にあシ、該逃し弁を開くことによって大気圧P
aの外部に管路内部を通ずることができる。
The relief valve 22 is located at a higher place than either the receiving valve 11 or the discharge valve 31, and by opening the relief valve, atmospheric pressure P is released.
The inside of the conduit can be passed to the outside of a.

また24は管路系2に於る流量を調節するニードル弁等
の流−tiIiJ節弁、部は管路系2に於る流量計であ
る。
Further, 24 is a flow control valve such as a needle valve for regulating the flow rate in the pipeline system 2, and 24 is a flow meter in the pipeline system 2.

また第2図は本発明に係る配管管路系をハロゲン化銀写
真乳剤の製造装置に適用した例を示したものである。
FIG. 2 shows an example in which the piping system according to the present invention is applied to an apparatus for producing a silver halide photographic emulsion.

第1図に於ける供給槽1から加工槽3に到るまでは全く
同様の管路系を加工槽3に対し2系統になりている。
From the supply tank 1 to the processing tank 3 in FIG. 1, there are two completely similar pipe systems for the processing tank 3.

液体LL及びLl′の配管管路系への充填は夫々第1図
と同様の方iで行なう。
The liquids LL and Ll' are filled into the piping line system in the same way i as in FIG. 1, respectively.

液体Llは硝酸銀溶液(又はハロゲン化物浴数)、液体
Llはハロゲン化物溶液(又は硝酸銀溶液)、液体L3
は反応液である。      ′また第3図に本発明に
係る配管管路系を写真感光材料の塗布装置に適用した例
を示した。
Liquid Ll is a silver nitrate solution (or halide bath number), liquid Ll is a halide solution (or silver nitrate solution), liquid L3
is the reaction solution. 'Furthermore, FIG. 3 shows an example in which the piping system according to the present invention is applied to a coating apparatus for photographic light-sensitive materials.

第1図に於る供給槽1から加工槽3に到る放出弁31ま
でとは全く同様でその先が塗布装置のスライドホッパ3
aに代えられている。4は塗布ローラ、5は写真感光乳
剤を塗設するウェブである。
The flow from the supply tank 1 to the processing tank 3 up to the discharge valve 31 in Fig. 1 is exactly the same, and beyond that is the slide hopper 3 of the coating device.
It has been replaced by a. 4 is a coating roller, and 5 is a web on which the photographic emulsion is applied.

次に前記配管管路系2に液体を充填する手順を第4図に
示したフローチャートによって説明する。   □まづ
供給槽1、配管管路系2及び加工槽3の空の状態で受入
弁11、逃し弁22及び放出弁31が閉ぢられる(処理
1)。次いで液体′L1が供給槽1に入れられる(処理
2)。これに続く次ぎの処理から管路系2への液体充填
の操作が始められる。まづ、液体L1を圧力pなる気体
を供給槽に導入することによって加圧し、受入弁11を
開け(処理3)、管路系2に圧入する(処理4)。
Next, the procedure for filling the piping system 2 with liquid will be explained with reference to the flowchart shown in FIG. 4. □First, the receiving valve 11, the relief valve 22, and the discharge valve 31 are closed when the supply tank 1, piping system 2, and processing tank 3 are empty (processing 1). Next, liquid 'L1 is put into supply tank 1 (process 2). Following this, the operation of filling the pipe system 2 with liquid starts from the next process. First, the liquid L1 is pressurized by introducing gas at a pressure p into the supply tank, the receiving valve 11 is opened (process 3), and the liquid L1 is pressurized into the pipe system 2 (process 4).

この際適用される圧力p Fii’〜10 Kf / 
c’d Gであり、装置の耐圧性から考へると好ましく
は1〜3KIi/ crd G 、更に供給槽を法規に
定める第2株圧力容器の範−からはずすには2に4F/
dG未満であることが好しい。また液体L1が酸化され
易い場合には窒素等の不活性ガスを用いてもよい。
The pressure applied at this time p Fii' ~ 10 Kf /
c'd G, and considering the pressure resistance of the device, preferably 1 to 3 KIi/crd G, and further 2 to 4 F/crd to remove the supply tank from the range of No. 2 pressure vessels stipulated by law.
Preferably, it is less than dG. Further, if the liquid L1 is easily oxidized, an inert gas such as nitrogen may be used.

液体L1が管路系2に圧入された後受入弁11が閉ちら
れる(処理5)。この場合液体Llは逃し弁22に届い
ていないか或は逃し弁22の位置を過ぎて管路23に侵
入しているかのいづれかであり、前者の場合逃し弁22
は管路内気体に露呈しておシ、後者の場合も液体L1は
自重のために放出弁31の方に流下し管路内気体と入換
シ、逃し弁22は気体に露呈するに到る。その状態は耐
圧覗き窓を逃し弁22の下部に設ける等の手段によって
認定される(判断1及び処理6)。逃し弁22が露呈さ
れている状態にありて逃し弁22を開くと圧縮されてい
た管路内気体は大気に逃散し、管路内気体の圧は外圧P
aと等しくなる(処理7)O次いで閉じられる(処理8
)。
After the liquid L1 is pressurized into the pipeline system 2, the receiving valve 11 is closed (process 5). In this case, either the liquid Ll has not reached the relief valve 22 or has passed the position of the relief valve 22 and entered the pipe line 23. In the former case, the liquid Ll has not reached the relief valve 22.
In the latter case, the liquid L1 flows toward the release valve 31 due to its own weight and replaces the gas in the pipe, until the relief valve 22 is exposed to the gas. Ru. This state is recognized by means such as providing a pressure-resistant viewing window at the bottom of the relief valve 22 (Judgment 1 and Process 6). When the relief valve 22 is opened and the relief valve 22 is exposed, the compressed gas inside the pipeline escapes to the atmosphere, and the pressure of the gas inside the pipeline becomes the external pressure P.
becomes equal to a (process 7) O is then closed (process 8
).

前記処理ボックス及び判断ボックスに示す操作によって
液体Llが管路系2に導入されるが、咳操作によりて液
体Llが管路系2一杯に充填されたか否かは例えは前記
逃し弁22の下部に設けた覗き窓等によって検知される
(判断2)。
The liquid Ll is introduced into the pipe line system 2 by the operations shown in the processing box and the judgment box, but whether or not the liquid Ll is completely filled in the pipe line system 2 by the coughing operation is determined by checking, for example, the lower part of the relief valve 22. (Judgment 2).

もし管路系2がまだ満されていなけれは前記処理3から
処理8及び判断2までの操作単位がループとして繰返−
えされる。
If the pipeline system 2 is not yet filled, the operation units from process 3 to process 8 and judgment 2 are repeated as a loop.
be fed.

管路系2が液体L1で充填されるに到シ、受入弁11及
び放出弁31が開かれ(処理9及び処理10 )、供給
槽1の液体Llは本発明に関わる管路糸2を通って加工
槽3へ気泡を含むことなく移送される。
When the pipe system 2 is filled with the liquid L1, the receiving valve 11 and the discharge valve 31 are opened (processes 9 and 10), and the liquid Ll in the supply tank 1 passes through the pipe thread 2 according to the present invention. and transferred to the processing tank 3 without containing any air bubbles.

尚移送に先立って逃し弁22付近に残留する゛管路内気
体は逃し弁22を開いて逃してもよいが、供給槽1の加
圧が保たれておれば、残留したま\でも差支えない。
Note that the gas remaining in the pipeline near the relief valve 22 may be released by opening the relief valve 22 prior to transfer, but as long as the pressure in the supply tank 1 is maintained, there is no problem in leaving it as it is. .

また管路系に用いる管径には制約はなく、必要とする流
量で自由に定めることができる0尚通常、管内流速は2
 m / 511c8W、 Kとられる。
In addition, there are no restrictions on the diameter of the pipe used in the pipe system, and it can be freely determined according to the required flow rate.Normally, the flow velocity in the pipe is 2.
m/511c8W, K taken.

更に本発明に係わる管路系に必要に応じて、温度や圧力
、流量外どを検出するためのセンサー類や制御する制御
装置などを介在させる事は自白であシ、又更に、濾過器
などの移送液浄化装置や保温のための機構を介在させる
ことも出来る。
Furthermore, it is self-evident that sensors for detecting temperature, pressure, flow rate, etc., and control devices for controlling the pipe system according to the present invention may be interposed as necessary, and further, filters, etc. It is also possible to provide a transfer liquid purification device or a mechanism for heat retention.

本発明に係る態様に於いて、供給槽(1・から逃し弁2
2に至る管路系は移送液が可能な限り、上昇流となるよ
うに登り勾配となし、逃し弁nから加工槽・3に導びか
れた管路系は移送液が可能な限シ下降流となるように下
シ勾配となすように配置することが望ましく、更に該管
路の各勾配は可能な限シ急である方が望ましい。何故な
らば移送液が管路系内忙送シ込まれた後に1管路内の気
体に逃し弁が露呈する状態に達するま′での時間を早め
ることが可能であるととに他ならない。
In an embodiment according to the present invention, the supply tank (1. to the relief valve 2.
The pipe system leading to 2 has an upward slope so that the transferred liquid flows upward as much as possible, and the pipe system leading from the relief valve n to the processing tank 3 allows the transferred liquid to descend as much as possible. It is preferable that the pipes are arranged with a downward slope so that the pipes flow smoothly, and it is also preferable that each slope of the pipe is as steep as possible. This is because it is possible to shorten the time until the relief valve is exposed to the gas in one pipe after the transferred liquid has been pumped into the pipe system.

又、気体逃し弁の位置は受入弁、放出穴ρいずれよりも
高所にあればよく、ヘッドh1及びhs Kより制限を
受けるものでない。
Further, the position of the gas relief valve only needs to be higher than either the receiving valve or the discharge hole ρ, and is not limited by the head h1 and hsK.

更に1本発明による配管管路系を加工槽に対して複数設
けることも本発明に制限を与えるものではない。
Furthermore, the present invention is not limited to providing a plurality of piping line systems according to the present invention in a processing tank.

(発明の効果) 本発明の目的が達成されると同時に、供給槽、加工槽、
の配置に煩わされることなく自由に設置することができ
装置全体としての省空間が計られ全体的に;ンバクトに
なる。
(Effect of the invention) At the same time, the object of the present invention is achieved, and at the same time, the supply tank, the processing tank,
It can be installed freely without having to worry about the arrangement of the equipment, saving space as a whole and making it more compact.

【図面の簡単な説明】[Brief explanation of drawings]

第1図及び第2図、第3図は本発明の方法に用いられる
配管管路系を示すブロック図である。 また第4図は本発明の方法の手順を示すフローチャート
である。 1・・・供給槽、11・・・受入弁、Ll・・・移送さ
れるべき液体、2・・・管路系、21及び23・・・管
路、22・・・逃し弁、3・・・加工槽、31・・・放
出弁、L3・・・受容液体。
FIGS. 1, 2, and 3 are block diagrams showing a piping line system used in the method of the present invention. FIG. 4 is a flowchart showing the procedure of the method of the present invention. DESCRIPTION OF SYMBOLS 1... Supply tank, 11... Receiving valve, Ll... Liquid to be transferred, 2... Pipe line system, 21 and 23... Pipe line, 22... Relief valve, 3... ...Processing tank, 31...Discharge valve, L3...Receiving liquid.

Claims (1)

【特許請求の範囲】 液体を移送する配管に於て、移送すべき液体の受入端及
び放出端に夫々管路の開閉の用をなす受入弁及び放出弁
を有し、該受入弁及び放出弁のいづれよりも高所に管路
内気体の逃し弁を備えた配管とし、該配管に於て下記順
序; (a)移送すべき液体を加圧し受入弁を開いて配管管路
内に圧入し、受入弁を閉じ、 (b)配管管路内の気体に前記配管管路の前記高所にあ
る逃し弁が露呈する状態に於て逃し弁を開いて管路内気
体を逃す、 (c)逃し弁を閉じる ことから成る操作単位を繰返すことによる配管内への液
体の充填方法。
[Scope of Claims] A pipe for transferring a liquid has a receiving valve and a discharge valve at a receiving end and a discharging end of the liquid to be transferred, respectively, for opening and closing the pipe line, and the receiving valve and the discharge valve The piping is equipped with a relief valve for the gas in the piping at a higher location than either of the pipes, and the following steps are carried out in the piping: (a) Pressurize the liquid to be transferred, open the receiving valve, and pressurize it into the piping. , close the receiving valve; (b) open the relief valve to release the gas in the pipeline in a state where the relief valve located at a high place in the pipeline is exposed to the gas in the pipeline; (c) A method of filling a pipe with liquid by repeating a unit of operation consisting of closing a relief valve.
JP59231529A 1984-11-01 1984-11-01 Method of filling inside of piping with liquid Granted JPS61115900A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59231529A JPS61115900A (en) 1984-11-01 1984-11-01 Method of filling inside of piping with liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59231529A JPS61115900A (en) 1984-11-01 1984-11-01 Method of filling inside of piping with liquid

Publications (2)

Publication Number Publication Date
JPS61115900A true JPS61115900A (en) 1986-06-03
JPH021760B2 JPH021760B2 (en) 1990-01-12

Family

ID=16924914

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59231529A Granted JPS61115900A (en) 1984-11-01 1984-11-01 Method of filling inside of piping with liquid

Country Status (1)

Country Link
JP (1) JPS61115900A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010023866A (en) * 2008-07-17 2010-02-04 Iwai Kikai Kogyo Co Ltd Liquid sending method for liquid left in pipeline
JP2011067655A (en) * 1998-03-20 2011-04-07 Hemerus Medical Llc Fluid filtration system
JP2011195163A (en) * 2010-03-18 2011-10-06 Hoya Corp Liquid dispenser
JP5582626B1 (en) * 2014-05-22 2014-09-03 岩井機械工業株式会社 Liquid feeding method and liquid feeding apparatus
JP5582625B1 (en) * 2014-05-22 2014-09-03 岩井機械工業株式会社 Liquid feeding method and liquid feeding apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011067655A (en) * 1998-03-20 2011-04-07 Hemerus Medical Llc Fluid filtration system
JP2011067656A (en) * 1998-03-20 2011-04-07 Hemerus Medical Llc Fluid filtration system
JP2011078808A (en) * 1998-03-20 2011-04-21 Hemerus Medical Llc Fluid filtration system
JP2010023866A (en) * 2008-07-17 2010-02-04 Iwai Kikai Kogyo Co Ltd Liquid sending method for liquid left in pipeline
JP2011195163A (en) * 2010-03-18 2011-10-06 Hoya Corp Liquid dispenser
JP5582626B1 (en) * 2014-05-22 2014-09-03 岩井機械工業株式会社 Liquid feeding method and liquid feeding apparatus
JP5582625B1 (en) * 2014-05-22 2014-09-03 岩井機械工業株式会社 Liquid feeding method and liquid feeding apparatus

Also Published As

Publication number Publication date
JPH021760B2 (en) 1990-01-12

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