JPS61106767A - Edge surface layer reforming method of cutter or the like - Google Patents

Edge surface layer reforming method of cutter or the like

Info

Publication number
JPS61106767A
JPS61106767A JP22718984A JP22718984A JPS61106767A JP S61106767 A JPS61106767 A JP S61106767A JP 22718984 A JP22718984 A JP 22718984A JP 22718984 A JP22718984 A JP 22718984A JP S61106767 A JPS61106767 A JP S61106767A
Authority
JP
Japan
Prior art keywords
cutter
surface layer
base material
edge
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22718984A
Other languages
Japanese (ja)
Other versions
JPH042666B2 (en
Inventor
Mamoru Sato
守 佐藤
Fuminori Fujimoto
藤本 文範
Minoru Ishida
実 石田
Masaaki Murai
正明 村井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Feather Safety Razor Co Ltd
Original Assignee
Agency of Industrial Science and Technology
Feather Safety Razor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Feather Safety Razor Co Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP22718984A priority Critical patent/JPS61106767A/en
Publication of JPS61106767A publication Critical patent/JPS61106767A/en
Publication of JPH042666B2 publication Critical patent/JPH042666B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48Ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Knives (AREA)
  • Scissors And Nippers (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To generate a thin film having a strong adhering property against an edge base material, to reform an edge surface layer, and to improve a mechanical property by performing a vacuum vapor-deposition processing the an edge of a cutter, and performing an ion implantation processing. CONSTITUTION:In a vacuum, a cutter W made of stainless steel, etc. is placed on a mask 1 and a negative voltage is applied, a vapor-depositing matter of Cr, etc. is evaporated toward said cutter from a vapor deposition source 2, and also anion such as an N ion, etc. is accelerated and irradiated from an ion source 3. By said ion, a thick reformed layer is generated by forming a mixing phase consisting of a base material atom of an edge of the cutter W, a vapor-depositing atom and the ion, and a vapor-deposited thin film whose adhering property is very strong against the edge base material is formed. In this way, an edge surface layer of said cutter W is reformed and the mechanical property can be improved.

Description

【発明の詳細な説明】 発明の目的 (産業上の利用分野) この発明は剃刀、包丁、ナイフ、鋏等の生活用品は勿論
のこと、外科用器具や驕械切削工具等のように、切断を
目的とする各種刃物類において、その刃先表面層を改質
する方法に関するものである。
[Detailed Description of the Invention] Purpose of the Invention (Field of Industrial Application) This invention is applicable not only to daily necessities such as razors, kitchen knives, knives, and scissors, but also to cutting tools such as surgical instruments and mechanical cutting tools. This invention relates to a method for modifying the surface layer of a cutting edge of various types of cutlery.

(従来の技術及び発明が解決しようとする問題点)従来
、この種の刃先表面層改質方法としては、メッキ処理や
スパッタリング処理がある。メッキ処理では、第4図に
示すように、刃先母材B(ステンレス鋼、Feで図示)
に対しメッキ薄膜F(Cr )を単に堆積するだけであ
るため、メッキ薄膜Fが刃先母材Bから剥がれ易かった
。又、スパッタリング処理では、第5図に示すように、
刃先母材B(ステンレス鋼、Feで図示〉にイオン(N
イオン)が深く侵入することがないため、刃先母材Bと
1llllF(Cr)との結合力はメッキ処理に比較し
て改善されるものの、やはり薄膜1:が刃先母材Bから
剥がれるおそれがあった。
(Prior Art and Problems to be Solved by the Invention) Conventionally, methods for modifying this type of blade edge surface layer include plating treatment and sputtering treatment. In the plating process, as shown in Fig. 4, the cutting edge base material B (stainless steel, shown as Fe) is
On the other hand, since the plating thin film F (Cr) was simply deposited, the plating thin film F was easily peeled off from the cutting edge base material B. In addition, in the sputtering process, as shown in FIG.
Ions (N
Although the bonding strength between the base material B of the blade edge and 1llllF (Cr) is improved compared to plating, there is still a risk that the thin film 1: may peel off from the base material B of the blade edge. Ta.

そのほか、この種の技術としては、特公昭54−283
79号公報に示すように、刃先にイオン注入処理のみを
施す方法がある。このイオン注入法は表面層内にわずか
な不純物を導入して新しい特性を持った材料を作る技術
として半導体工業界ではなくてはならない方法であり、
最近では金属材料などの表面処理技術として盛んになり
つつある。一般的に刃先のイオン注入処理では、注入室
に設置した刃物をイオン源からの高エネルギーイオンビ
ームで照射し、そのイオンを刃先の表面層に導入する。
In addition, this type of technology includes
As shown in Japanese Patent No. 79, there is a method in which only ion implantation treatment is performed on the cutting edge. This ion implantation method is an indispensable method in the semiconductor industry as a technology to create materials with new characteristics by introducing a small amount of impurity into the surface layer.
Recently, it has become popular as a surface treatment technology for metal materials. Generally, in ion implantation of a cutting edge, a cutting tool placed in an implantation chamber is irradiated with a high-energy ion beam from an ion source, and the ions are introduced into the surface layer of the cutting edge.

このイオン注入法では、イオンを加速して刃先円Hに衝
突させるため、はとんどのイオンは刃先母材の内部に侵
入し、表面層に合金あるいは化合物を形成し、表面層の
電気的、科学的、光学的及び機械的性質を変えることが
できる。しかし、刃先に照射されたイオンの侵入深さが
高々1μm程度であって薄い表面層だけしか改質が行わ
れないという欠点があった。従つで、イオン注入法だけ
では比較的厚い改質層を形成することができず、刃先表
面層の機械的性質、すなわち耐摩耗性、耐腐蝕性及び硬
度の向上はあまり期待できなかった。
In this ion implantation method, the ions are accelerated and collided with the cutting edge circle H, so most of the ions penetrate inside the cutting edge base material and form an alloy or compound on the surface layer, causing electrical and Scientific, optical and mechanical properties can be changed. However, there was a drawback that the penetration depth of ions irradiated to the cutting edge was about 1 μm at most, and that only a thin surface layer was modified. Therefore, it was not possible to form a relatively thick modified layer using only the ion implantation method, and no significant improvement in the mechanical properties of the cutting edge surface layer, that is, the wear resistance, corrosion resistance, and hardness, could be expected.

発明の構成 (問題点を解決するための手段及び作用)本発明はこの
問題点に鑑み、刃先に真空蒸着処理を施しながらイオン
注入処理を施したものである。この真空蒸着法は真空内
で物質を加熱し、こ4   れを蒸発させ、その蒸発物
を他の物質上に付着させることで膜を作る方法であり、
この真空蒸着法と前記イオン注入法とを組合わせて併用
したものが本発明である。つまり、薄膜形成の初期の段
階では、蒸着原子の一部がイオンとの衝突による反跳で
刃先の表面層に侵入すると同時に、照射イオンも刃先の
表面層に注入される。この照射イオンによって刃先の表
面層に刃先母材原子、照射イオン及び蒸着原子によるミ
キシング状態を作り、刃先母材と蒸1着薄膜間には不連
続な界面が存在しない新しい混合相が形成される。
Structure of the Invention (Means and Effects for Solving Problems) In view of this problem, the present invention performs ion implantation treatment while performing vacuum deposition treatment on the blade edge. This vacuum evaporation method is a method of creating a film by heating a substance in a vacuum, evaporating it, and depositing the evaporated product on another substance.
The present invention is a combination of this vacuum evaporation method and the ion implantation method. That is, at the initial stage of thin film formation, some of the deposited atoms invade the surface layer of the cutting edge due to recoil due to collisions with ions, and at the same time, irradiated ions are also injected into the surface layer of the cutting edge. These irradiated ions create a mixing state in the surface layer of the cutting edge of the cutting edge base material atoms, irradiated ions, and vapor deposited atoms, forming a new mixed phase in which there is no discontinuous interface between the cutting edge base material and the vapor deposited thin film. .

(実施例) 以下、本発明を第1〜3図に従ってより具体的に詳述す
る。第1図に本発明の方法を実施する装置の概略を示し
、真空内において、マスク1上に設置された刃物W(ス
テンレス鋼、第3図のFe)に向けて、蒸着源2から蒸
着物(Cr ”)が蒸発すると同時に、イオン源3から
イオン(Nイオン)が加速されて照射されるようになっ
ている。なお、刃物Wには負の電圧が印加されている。
(Example) Hereinafter, the present invention will be described in more detail with reference to FIGS. 1 to 3. FIG. 1 schematically shows an apparatus for carrying out the method of the present invention, in which a vapor deposition source 2 is directed toward a cutter W (stainless steel, Fe in FIG. 3) placed on a mask 1 in a vacuum. At the same time that (Cr 2 '') evaporates, ions (N ions) are accelerated and irradiated from the ion source 3. Note that a negative voltage is applied to the blade W.

そして、第2図及び第3図に示すように、イオ □ン6
は運動エネルギーだけで刃先母材原子4の中に侵入する
とともに、刃先母材原子4に付着した蒸@原子5に衝突
してそれに運動エネルギーを与え、この衝突により蒸着
原子5の一部が刃先母材原子4の中に入り込んで、刃先
母材原子4と入射イオン6と蒸着原子5とからなる原子
の混合状態を作って新しい混合相Mが形成される。蒸着
がさらに進行すると、注入イオン6は刃先母材原子4に
まで侵入J−ることはなく、化学的に活性なイオン6が
蒸着原子5と結合して、新しい機能を持った表面材料の
化合物R膜Fが形成される。さらに、蒸着及びイオン注
入を続けることにより、任意の厚さの化合物薄膜Fを作
成できる。この三者混合の混合相Mは刃先母材Bと化合
物薄膜Fとの付着性を増大させる機能を持つ。この付着
力は刃先に負の電圧を印加することでより一層向上する
。化合物薄膜Fは注入イオン6の電流及び蒸着原子5の
蒸着速度を制御することにより、化合物薄膜Fの組成を
任意に変えることができる。
Then, as shown in Figures 2 and 3, the ion 6
enters the blade edge base material atoms 4 with only kinetic energy, and also collides with the vaporized atoms 5 attached to the blade edge base material atoms 4, imparting kinetic energy to them, and due to this collision, some of the vaporized atoms 5 are attached to the blade edge. The ions enter into the base material atoms 4 and create a mixed state of atoms consisting of the cutting edge base material atoms 4, the incident ions 6, and the deposited atoms 5, forming a new mixed phase M. As the deposition progresses further, the implanted ions 6 do not penetrate into the base material atoms 4 of the cutting edge, and the chemically active ions 6 combine with the deposited atoms 5 to form a surface material compound with new functions. An R film F is formed. Furthermore, by continuing vapor deposition and ion implantation, a compound thin film F having an arbitrary thickness can be created. This three-way mixed phase M has the function of increasing the adhesion between the cutting edge base material B and the compound thin film F. This adhesion force is further improved by applying a negative voltage to the cutting edge. The composition of the compound thin film F can be arbitrarily changed by controlling the current of the implanted ions 6 and the deposition rate of the vaporized atoms 5.

なお、刃先母材Bとしては前記ステンレス鋼以外に炭素
鋼、合金鋼、セラミックス、強化プラスチック、アルミ
ニウム等を使用してもよい。又、真空蒸着物質としては
前記Or以外にTi 、Go、Fe、Ni、W、V、M
o 、Ta 、Zr 、Hr、Nb 、 Re 、 O
31Cd 、 Atl 、 Pt 、 Si 、 Th
、AI及びMn等の金属、A1.O,、T i O,L
、Ta2O3、Sin、及びWiO,等の酸化物、AI
 N、BN、Ti N、Zr N、1−1f N、Cr
 N、Co N、WN及びsrN、等の窒化物、Ti 
C,Si C,WClZr C,BC及びMOC等の炭
化物、Tie及びW8等のホウ化物を使用してもよい。
In addition to the stainless steel described above, carbon steel, alloy steel, ceramics, reinforced plastic, aluminum, etc. may be used as the base material B for the cutting edge. In addition to the above-mentioned Or, examples of vacuum-deposited substances include Ti, Go, Fe, Ni, W, V, and M.
o, Ta, Zr, Hr, Nb, Re, O
31Cd, Atl, Pt, Si, Th
, metals such as AI and Mn, A1. O,,T i O,L
, Ta2O3, Sin, and WiO, etc., AI
N, BN, Ti N, Zr N, 1-1f N, Cr
Nitrides such as N, Co N, WN and srN, Ti
Carbides such as C, Si C, WClZr C, BC and MOC, borides such as Tie and W8 may also be used.

一方、イオンとしては前記Nイオン以外に刃物を構成す
る原子と化学的結合が起こりしかも表面コーテイング膜
を形成するB、N、C,O等の非金属を含むイオン、例
エバN;  、 N−、NH:  、NH,−、CN−
1B、H,イオン、0:  、 0−  を使用しても
よい。
On the other hand, in addition to the above-mentioned N ions, ions include non-metals such as B, N, C, and O, which form chemical bonds with atoms constituting the cutlery and form a surface coating film, such as ions such as Eva N; and N-. ,NH: ,NH,-,CN-
1B, H, ion, 0:, 0- may be used.

発明の効果 要するに本発明によれば、刃先母材と蒸@薄膜間に混合
相を形成することができるので、この混合相の存在によ
りメッキ処理やスパッタリング処理に比較して刃先母材
に対し付着性の非常に強い膜を生成することができると
ともに、イオン注入処理だけの場合よりも比較的厚い改
質層を形成でき、刃先表面層の機械的性質の向上が可能
となる。
Effects of the Invention In short, according to the present invention, a mixed phase can be formed between the base material of the cutting edge and the steamed thin film, and due to the presence of this mixed phase, the adhesion to the base material of the cutting edge is reduced compared to plating or sputtering treatments. In addition to being able to produce a film with very strong properties, it is also possible to form a relatively thicker modified layer than in the case of ion implantation treatment alone, making it possible to improve the mechanical properties of the cutting edge surface layer.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の方法を実施する装置の概略図、第2図
は本発明の方法による薄膜形成作用を示す概念図、第3
図は同じく刃先表面層断面を示す概念図、第4図はメッ
キ処理による刃先表面層断面を示す概念図、第5図はス
パッタリング処理による刃先表面層断面を示す概念図で
ある。
FIG. 1 is a schematic diagram of an apparatus for implementing the method of the present invention, FIG. 2 is a conceptual diagram showing the thin film forming operation by the method of the present invention, and FIG.
FIG. 4 is a conceptual diagram showing a cross section of the blade edge surface layer after plating treatment, and FIG. 5 is a conceptual diagram showing a cross section of the blade edge surface layer after sputtering treatment.

Claims (1)

【特許請求の範囲】 1、刃先に真空蒸着処理を施しながらイオン注入処理を
施したことを特徴とする刃物類の刃先表面層改質方法。 2、真空蒸着処理時刃先に負の電圧を印加した特許請求
の範囲第1項に記載の刃物類の刃先表面層改質方法。
[Claims] 1. A method for modifying the surface layer of a cutting edge of cutlery, characterized in that the cutting edge is subjected to ion implantation treatment while being subjected to vacuum deposition treatment. 2. The method for modifying the surface layer of a cutting edge of a cutlery according to claim 1, wherein a negative voltage is applied to the cutting edge during the vacuum deposition process.
JP22718984A 1984-10-29 1984-10-29 Edge surface layer reforming method of cutter or the like Granted JPS61106767A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22718984A JPS61106767A (en) 1984-10-29 1984-10-29 Edge surface layer reforming method of cutter or the like

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22718984A JPS61106767A (en) 1984-10-29 1984-10-29 Edge surface layer reforming method of cutter or the like

Publications (2)

Publication Number Publication Date
JPS61106767A true JPS61106767A (en) 1986-05-24
JPH042666B2 JPH042666B2 (en) 1992-01-20

Family

ID=16856882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22718984A Granted JPS61106767A (en) 1984-10-29 1984-10-29 Edge surface layer reforming method of cutter or the like

Country Status (1)

Country Link
JP (1) JPS61106767A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61110769A (en) * 1984-11-05 1986-05-29 Tai Gold Kk Edged tool for cooking
JPS63250453A (en) * 1987-04-06 1988-10-18 Toray Ind Inc Ceramic edged tool
JPH01105331A (en) * 1987-04-15 1989-04-21 Sanyo Electric Co Ltd Production of magnetic recording medium
JPH0241195A (en) * 1988-08-02 1990-02-09 Asahi Daiyamondo Kogyo Kk Cutting blade with durability
US5053245A (en) * 1989-10-26 1991-10-01 Sanyo Electric Co., Ltd. Method of improving the quality of an edge surface of a cutting device
JPH04198479A (en) * 1990-11-28 1992-07-17 Sanyo Electric Co Ltd Apparatus and method for producing cutlery
EP0581303A2 (en) * 1992-07-31 1994-02-02 Matsushita Electric Industrial Co., Ltd. Magnetic head having a chromium nitride protective film for use in a magnetic recording and/or reproducing apparatus and a method of manufacturing the same
JP2012533344A (en) * 2009-07-17 2012-12-27 ザ ジレット カンパニー Razor atomic layer deposition coating

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5924094B2 (en) 2012-04-18 2016-05-25 新明和工業株式会社 CUTTER, MANUFACTURING METHOD THEREOF, AND PLASMA DEVICE FOR MANUFACTURING THE SAME

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5358439A (en) * 1976-11-08 1978-05-26 Dan Kagaku Kk Deposition method in atmosphere gas
JPS5920465A (en) * 1982-07-24 1984-02-02 Adamando Kogyo Kk Sintered hard alloy tool and its production

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5358439A (en) * 1976-11-08 1978-05-26 Dan Kagaku Kk Deposition method in atmosphere gas
JPS5920465A (en) * 1982-07-24 1984-02-02 Adamando Kogyo Kk Sintered hard alloy tool and its production

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61110769A (en) * 1984-11-05 1986-05-29 Tai Gold Kk Edged tool for cooking
JPS63250453A (en) * 1987-04-06 1988-10-18 Toray Ind Inc Ceramic edged tool
JPH01105331A (en) * 1987-04-15 1989-04-21 Sanyo Electric Co Ltd Production of magnetic recording medium
JPH0241195A (en) * 1988-08-02 1990-02-09 Asahi Daiyamondo Kogyo Kk Cutting blade with durability
US5053245A (en) * 1989-10-26 1991-10-01 Sanyo Electric Co., Ltd. Method of improving the quality of an edge surface of a cutting device
JPH04198479A (en) * 1990-11-28 1992-07-17 Sanyo Electric Co Ltd Apparatus and method for producing cutlery
EP0581303A2 (en) * 1992-07-31 1994-02-02 Matsushita Electric Industrial Co., Ltd. Magnetic head having a chromium nitride protective film for use in a magnetic recording and/or reproducing apparatus and a method of manufacturing the same
EP0581303A3 (en) * 1992-07-31 1994-06-29 Matsushita Electric Ind Co Ltd Magnetic head having a chromium nitride protective film for use in a magnetic recording and/or reproducing apparatus and a method of manufacturing the same
JP2012533344A (en) * 2009-07-17 2012-12-27 ザ ジレット カンパニー Razor atomic layer deposition coating

Also Published As

Publication number Publication date
JPH042666B2 (en) 1992-01-20

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