JPS6097359A - Projection type exosing device - Google Patents
Projection type exosing deviceInfo
- Publication number
- JPS6097359A JPS6097359A JP58205518A JP20551883A JPS6097359A JP S6097359 A JPS6097359 A JP S6097359A JP 58205518 A JP58205518 A JP 58205518A JP 20551883 A JP20551883 A JP 20551883A JP S6097359 A JPS6097359 A JP S6097359A
- Authority
- JP
- Japan
- Prior art keywords
- reticle
- piezoelectric body
- error
- trapezoidal
- projection type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
Abstract
Description
【発明の詳細な説明】
（発明の技術分野〕
本発明は、投影形露光装置に１３１６゜〔発明の技術的
背景〕
従来、半導体基板やフォトマスク基板上に所定のパター
ンを転写するために投影形露光装置が使用されている。[Detailed Description of the Invention] (Technical Field of the Invention) The present invention relates to a projection type exposure apparatus. A shape exposure device is used.
而して、この装置のレチクル設置台に所定のレチクルを
設置し、光源からの光をコンデンサレンズを介してレチ
クルに透過させ、この光を投影レンズで集光して移動台
上の半導体基板等に照射することによりパターンの形成
を行なっている。A predetermined reticle is installed on the reticle installation table of this device, and the light from the light source is transmitted through the reticle through the condenser lens, and this light is focused by the projection lens to illuminate the semiconductor substrate, etc. on the moving table. The pattern is formed by irradiating the
（背景技術の問題点）
しかしながら、従来の投影形露光装置では、レチクルの
設置位置の調整は平面的にしかできなかった。このため
次のような問題があった。その一つは倍率誤差といわれ
るものである。すなわち、第１図に示す如く、レチクル
面の位置が上下に変位していると結像面での像の歪が発
生し、第１図に示す如く本来の像１よりも小さい像２や
大きい像３ができてしまう。その２は、台形誤差と言わ
れるものである。これはレチクル面が傾いている場合に
発生するものであり、第２図に示す如く、本来の像に比
べて台形状に変形した像４ができる。(Problems with the Background Art) However, in the conventional projection exposure apparatus, the installation position of the reticle can only be adjusted in a two-dimensional manner. This caused the following problems. One of them is called magnification error. That is, as shown in Fig. 1, if the position of the reticle surface is vertically displaced, image distortion occurs on the imaging plane, and as shown in Fig. 1, image 2 is smaller than the original image 1, or image 2 is larger than the original image 1. Image 3 is created. The second is what is called a trapezoidal error. This occurs when the reticle surface is tilted, and as shown in FIG. 2, an image 4 is formed which is deformed into a trapezoidal shape compared to the original image.
このような問題を解消するために、レチクルとレチクル
設置台との間にスペーサーを介在してレチクルの上下方
向の設定位置を調節することが行なわれている。このよ
うな手段によるものでは、調節作業に長時間を要すると
共に、調節はスペーサーの厚さ分しかできないため、前
述の問題を完全には解消できなかった。なお、これらの
誤差は、サブミクロンから数ミクロンオーダーのもので
ある。In order to solve this problem, a spacer is interposed between the reticle and the reticle mounting base to adjust the vertical setting position of the reticle. With such means, the adjustment work takes a long time and the adjustment can only be made by the thickness of the spacer, so the above-mentioned problems cannot be completely solved. Note that these errors are on the order of submicrons to several microns.
本発明は、倍率誤差および台形誤差の発生を阻止して、
所定のパターンを極めて高い形状精度で形成することが
できる投影形露光装置を提供づることをその目的とする
もので゛ある。The present invention prevents the occurrence of magnification errors and trapezoidal errors, and
The object of the present invention is to provide a projection exposure apparatus that can form a predetermined pattern with extremely high shape accuracy.
本発明は、レチクル設置台のレチクル支持部に通電作用
によって伸縮する圧電体を設【ノたことにより、倍率誤
差、台形誤差の発生を完全に阻止して所定のパターンを
極めて高い形状精度で容易に形成できる投影形露光装置
である。The present invention completely prevents magnification errors and trapezoidal errors by installing a piezoelectric material in the reticle support part of the reticle installation stand that expands and contracts when energized, making it easy to form a given pattern with extremely high shape accuracy. This is a projection type exposure device that can be formed into
〔発明の実施例〕
以下、本発明の一実施例について図面を参照して説明す
る。[Embodiment of the Invention] Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
第３図は、本発明の一実施例の概略構成を示づ説明図で
ある。図中１０は、半導体基板１１やマスク基板等の被
処理体が設置される移動台である。FIG. 3 is an explanatory diagram showing a schematic configuration of an embodiment of the present invention. In the figure, 10 is a moving table on which objects to be processed such as a semiconductor substrate 11 and a mask substrate are installed.
移動台１０の上方には、これと対向して所定間隔を設け
て投影レンズ１２が設置されている。投影レンズ１２の
上方には、レチクル設置台１３を介してコンデンサレン
ズ１４が設置されている。コンデンサレンズ１４の上方
には、光源１５が設りられている。レチクル設置台１３
のレチクル支持部１６には、圧電体１７が取イ１けられ
ている。圧電体１７には、図示しない電源部から所定の
電場がかけられるようになっている。圧電体１７は、例
えば、水晶、セレン、硫化力ドミュムなどの圧電効果を
示す材該で形成されている。電圧体１７の大きさは１１
節するレチクル１８の上下の移動量に応じて適宜設定す
るのが望ましい。また、圧電体１７の設置箇所は、レチ
クル１８の垂直方向の位置調整を行ってレチクル１８を
所定の水平状態に設置できるように、少くとも３箇所設
けるのが望ましい。A projection lens 12 is installed above the movable table 10, facing it and spaced at a predetermined interval. A condenser lens 14 is installed above the projection lens 12 via a reticle installation stand 13. A light source 15 is provided above the condenser lens 14. Reticle installation stand 13
A piezoelectric body 17 is mounted on the reticle support portion 16 . A predetermined electric field is applied to the piezoelectric body 17 from a power source (not shown). The piezoelectric body 17 is made of a material exhibiting a piezoelectric effect, such as quartz, selenium, or sulfide. The size of the voltage body 17 is 11
It is desirable to set it appropriately according to the amount of vertical movement of the reticle 18 to be moved. Furthermore, it is desirable that the piezoelectric body 17 be installed at at least three locations so that the reticle 18 can be installed in a predetermined horizontal state by adjusting the vertical position of the reticle 18.
このように構成された投影形露光装置２０によれば、第
４図に示す如く、圧電体１７に所定の通電を施すことに
よりこれを自在に伸縮することができる。なお、同図中
１７ａは、電圧体１７の伸びた領域を示す。その結果、
レチクル設置台１３上のレチクル１８を常に所定の水平
度に保つことができる。このため、倍率誤差や台形誤差
の発生を阻止して所定のパターンを被処理体である半導
体基板１１等に高い形状精度で容易に形成することがで
きる。According to the projection exposure apparatus 20 configured in this manner, as shown in FIG. 4, the piezoelectric body 17 can be freely expanded and contracted by applying a predetermined current to the piezoelectric body 17. Note that 17a in the figure indicates an extended region of the voltage body 17. the result,
The reticle 18 on the reticle installation stand 13 can always be kept at a predetermined level. Therefore, a predetermined pattern can be easily formed on the semiconductor substrate 11 or the like, which is the object to be processed, with high shape accuracy while preventing magnification errors and trapezoidal errors from occurring.
以上説明した如く、本発明に係る投影形露光装置によれ
ば、倍率誤差や台形誤差の発生を阻止して所定のパター
ンを半導体基板等に高い形状精度で容易に形成できるも
のである。As described above, according to the projection exposure apparatus according to the present invention, a predetermined pattern can be easily formed on a semiconductor substrate or the like with high shape accuracy while preventing magnification errors and trapezoidal errors from occurring.
第１図は、従来の投影形露光装置で投影した際に倍率誤
差が発生している状態を示す説明図、第２図は、同装置
にて投影した際に台形誤差が発生している状態を示す説
明図、第３図は、本発明の一実施例の概略構成を示す説
明図、第４図は、圧電体の伸びた状態を示す説明図であ
る。
１０・・・移動台、１１・・・半導体基板、１２・・・
投影レンズ、１３・・・レチクル設置台、１４・・・コ
ンデンサレンズ、１５・・・光源、１６・・・レチクル
、１７・・・圧電体、２０・・・投影形露光装置。
出願人代理人 弁理士 鈴江武彦
第１図
第３図
第２図
ム
第４ｒｙＪ
８Figure 1 is an explanatory diagram showing a state where a magnification error occurs when projecting with a conventional projection exposure device, and Figure 2 shows a state where a trapezoidal error occurs when projecting with the same device. FIG. 3 is an explanatory diagram showing a schematic configuration of an embodiment of the present invention, and FIG. 4 is an explanatory diagram showing a piezoelectric body in an extended state. 10...Moving table, 11...Semiconductor substrate, 12...
Projection lens, 13... Reticle installation stand, 14... Condenser lens, 15... Light source, 16... Reticle, 17... Piezoelectric body, 20... Projection type exposure device. Applicant's representative Patent attorney Takehiko Suzue Figure 1 Figure 3 Figure 2 Figure 4ryJ 8
Claims (1)
置された光源と、該光源と前記移動台間に設置された投
影レンズと、該投影レンズと前記光源間に設置されたコ
ンデンサレンズと、該コンデンサレンズと前記投影レン
ズ間に設置されたレチクル設置台と、該レチクル設置台
のレチクル支持部に取付【Ｊられた圧電体とを具備する
ことを特徴ジる投影形露光装置。[Scope of Claims] A moving table on which an object to be processed is installed, a light source installed opposite to the moving table, a projection lens installed between the light source and the moving table, and a projection lens and the It is characterized by comprising a condenser lens installed between the light sources, a reticle installation stand installed between the condenser lens and the projection lens, and a piezoelectric body attached to the reticle support part of the reticle installation stand. Projection type exposure equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58205518A JPS6097359A (en) | 1983-11-01 | 1983-11-01 | Projection type exosing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58205518A JPS6097359A (en) | 1983-11-01 | 1983-11-01 | Projection type exosing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6097359A true JPS6097359A (en) | 1985-05-31 |
Family
ID=16508198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58205518A Pending JPS6097359A (en) | 1983-11-01 | 1983-11-01 | Projection type exosing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6097359A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62139330A (en) * | 1985-12-13 | 1987-06-23 | Toshiba Mach Co Ltd | Fixation of material to be processed and device thereof |
| JPH0638541U (en) * | 1992-11-06 | 1994-05-24 | 勝男 榎本 | Sonic sinker |
| JPH0661076U (en) * | 1993-02-12 | 1994-08-30 | 勝男 榎本 | Brass football head |
| JPH0982606A (en) * | 1995-09-13 | 1997-03-28 | Nikon Corp | Reticle holder |
-
1983
- 1983-11-01 JP JP58205518A patent/JPS6097359A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62139330A (en) * | 1985-12-13 | 1987-06-23 | Toshiba Mach Co Ltd | Fixation of material to be processed and device thereof |
| JPH0638541U (en) * | 1992-11-06 | 1994-05-24 | 勝男 榎本 | Sonic sinker |
| JPH0661076U (en) * | 1993-02-12 | 1994-08-30 | 勝男 榎本 | Brass football head |
| JPH0982606A (en) * | 1995-09-13 | 1997-03-28 | Nikon Corp | Reticle holder |
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