JPS6095821A - Directly heated cathode - Google Patents

Directly heated cathode

Info

Publication number
JPS6095821A
JPS6095821A JP58203454A JP20345483A JPS6095821A JP S6095821 A JPS6095821 A JP S6095821A JP 58203454 A JP58203454 A JP 58203454A JP 20345483 A JP20345483 A JP 20345483A JP S6095821 A JPS6095821 A JP S6095821A
Authority
JP
Japan
Prior art keywords
heater
base metal
base metals
width
tape member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58203454A
Other languages
Japanese (ja)
Inventor
Osamu Tsumura
治 津村
Makoto Sakamoto
酒本　誠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Original Assignee
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Semiconductor Manufacturing Co Ltd, Kansai Nippon Electric Co Ltd filed Critical Renesas Semiconductor Manufacturing Co Ltd
Priority to JP58203454A priority Critical patent/JPS6095821A/en
Publication of JPS6095821A publication Critical patent/JPS6095821A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/15—Cathodes heated directly by an electric current
    • H01J1/16—Cathodes heated directly by an electric current characterised by the shape

Landscapes

  • Solid Thermionic Cathode (AREA)

Abstract

PURPOSE:To contribute to the improvement of quality in mass production, without necessitating the judgement of the front and the reverse of base metals by punching the base metals in order that both side edges of a tape member will remain at both sides of the base metals and locating side edges of the punched base metals at both sides of a heater and fixing to the heater. CONSTITUTION:The width W2 of the tape member 12 is approximately equal to the width of the heater 9 and when base metals are punched from the tape member 12 in larger diameter than the width of the heater 9, a part of the base metals is lacked. Namely, burrs accompanied by the punching are cuased in the portions of the arcs 13a and the burrs are not caused in the linear portions 13b. The base metals, of which the linear portions 13b in the peripheral edges should be perpendicular to the heater 9, are fixed to the heater by welding, and the portions of the arcs 13a which have burrs in the peripheral edges of the base metals 13 should be projected from the sides of the heater 9. Whereby, it is possible not to contact the burrs with the heater 9 in spite of the front and the reverse of the base metals. At that time, it is preferable that a length of the linear portions 13b is approximately equal to the width of the heater 9.

Description

【発明の詳細な説明】 イ、産業上の利用分野 本鞘、朋は直熱、型陰忰に関するものである。[Detailed description of the invention] B. Industrial application field This scabbard is related to direct heat and type yin huan.

・口、従来技術 陰極線管等に用いうれる直熱型陰極の従来例を第１図及
ｑ第２図に示すと、（１）は直熱型の陰極で、有底円筒
形の制御電極（２）内に収納されリテーナ（３）により
固定されている。・Conventional technology Conventional examples of directly heated cathodes that can be used in cathode ray tubes, etc. are shown in Figures 1 and 2. (1) is a directly heated cathode with a bottomed cylindrical control electrode. (2) and is fixed by a retainer (3).

陰極（１）はセラミック等の絶縁基板（インシュレータ
）（４）と、インシュレータ（４）に固定された２本の
リード（５）と、各リード（５）に固定された断面くの
字状の導電性のバネサボ−１−（６，、？と、上面中央
にベースメタル（７）を介してエミッタ物質（８）を被
着したリボン状ヒータ（９）とで構成されている。The cathode (1) consists of an insulating substrate (insulator) (4) made of ceramic or the like, two leads (5) fixed to the insulator (4), and a dogleg-shaped cross section fixed to each lead (5). It consists of a conductive spring sabot 1-(6, ?) and a ribbon-shaped heater (9) having an emitter material (8) deposited on the center of the upper surface via a base metal (7).

前記イツ、シュル−ク（４）は平板状の基板部（４Ｐ）
と１．基板部（４ａ）の中央に一体に突３シした円筒状
、の支持部（４ｂ）と、支持部（４ｂ）の直、径方向外
方の、基板部（４ａ）に穿設した挿通孔（４ｃ）と、基
板部（４８）の上面周縁に突設（たスペーサ部（，４ｄ
）とを有、し、挿通孔（４ｃ）にリード（５，）を挿入
して低融点ガラス等の接着材にて固定している。又、バ
ネサポート（６）は一端を基板部（４ａ）上方に突出さ
せ、他端をリード（５）の側面に溶接固定している。ヒ
ータ（９）味支持部（４ｂ）の上端面に直径方向に跨り
、端部がバネサポ−１−（６）に溶接されて張設される
。又、陰極（１）は制御電極（２）の底部（２″）内面
との間隔がスペーサ部（４ｄ）によって規制され、制御
電極（２）の底部（２°）の中心に穿設した電子ビーム
透過孔（１０）とエミッタ物質（８）の間隔、いわゆる
ＧＫ間隔（ｇ）が一定に規制される。The above-mentioned Shulk (4) is a flat board part (4P)
and 1. A cylindrical support part (4b) integrally protruding from the center of the base plate part (4a), and an insertion hole bored in the base base part (4a) directly and radially outward of the support part (4b). (4c) and a spacer portion (,4d) protruding from the upper surface periphery of the substrate portion (48).
), and a lead (5,) is inserted into the insertion hole (4c) and fixed with an adhesive such as low melting point glass. The spring support (6) has one end protruding above the base plate (4a) and the other end fixed to the side surface of the lead (5) by welding. The heater (9) straddles the upper end surface of the taste support part (4b) in the diametrical direction, and the end part is welded to the spring support part 1-(6) and stretched. In addition, the distance between the cathode (1) and the inner surface of the bottom (2'') of the control electrode (2) is regulated by a spacer part (4d), and an electron The distance between the beam transmission hole (10) and the emitter material (8), the so-called GK distance (g), is regulated to be constant.

上記ＧＫ間隔（ｇ）によってカントオフ電圧が変動する
ため、カットオフ電圧特性を一定にするにはＧＫ間隔（
ｇ＞を一定に規制することが要求される。Since the cant-off voltage varies depending on the above GK interval (g), in order to keep the cut-off voltage characteristics constant, the GK interval (g)
g> is required to be regulated to a certain level.

ところで、従来ベースメタル（７）は第３図に示すよう
に１００μ程度の厚さのＮｉをベースにした帯板（１１
）を直径０．８１程度の円形に打ち抜いて製造されるの
であるが、このような製造法によれば、第４図に示すよ
うにベースメタル（７）の全周に打ち抜き方向にパリ　
（７゛）が生しる。ごのベースメタル（７）周囲に生じ
たパリ　（７°）のため上記ＧＫ間隔（ｇ）が一定に規
制されないことがある。By the way, the conventional base metal (7) is a Ni-based strip plate (11) with a thickness of about 100μ, as shown in Fig. 3.
) into a circular shape with a diameter of approximately 0.81 mm. According to this manufacturing method, as shown in Figure 4, there is a paris around the entire circumference of the base metal (7) in the punching direction.
(7゛) is born. Due to the gap (7°) generated around the base metal (7), the above GK spacing (g) may not be regulated to a constant value.

即ち、ベースメタル（７）は周縁部の２点でヒータ（９
）にスポット溶接されてヒータ（９）に固定されるが、
この時、ベースメタル（７）は第５図又は第６図に示す
ようにハリ　（７°）の向きが２通りある。That is, the base metal (7) is connected to the heater (9) at two points on the periphery.
) is spot welded and fixed to the heater (9),
At this time, the base metal (7) has two orientations of the firmness (7°) as shown in Figures 5 and 6.

ここで第５図のようにパリ　（７′）がヒータ（９）と
反対方向にある場合には、ベースメタル（７）はヒータ
（９）に密着するためベースメタル（７）はヒータ（９
）面に平行に溶接され、ＧＫ間隔（ｇ）は一定に規制さ
れる。Here, as shown in Fig. 5, when Paris (7') is in the opposite direction to the heater (9), the base metal (7) is in close contact with the heater (9), so the base metal (7) is
) plane, and the GK spacing (g) is regulated to be constant.

これに対し、第６図のようにパリ　（７°）がヒータ（
９）に対向する場合には、ベースメタル（７）はヒータ
（９）から浮いた状態となる。またベースメタル（７）
をその周縁部の２点、例えば点（Ｘ）（Ｘ）でヒータ（
９）に溶接する場合、パリ（７°）を含む部分が加圧さ
れるが、この時、ベースメタル（７）の中央部がヒータ
（９）から浮いた状態にあれば、パリ（７°）の部分は
加圧されヒータ（９）面に密着するが、他の部分はその
返りが起きて、例えば　第７図に示すように変形する。On the other hand, as shown in Figure 6, Paris (7°) is the heater (
9), the base metal (7) is in a floating state from the heater (9). Also base metal (7)
A heater (
9), the part including the paris (7°) is pressurized, but at this time, if the center part of the base metal (7) is floating above the heater (9), the paris (7°) ) is pressurized and comes into close contact with the surface of the heater (9), but the other parts are bent and deformed as shown in FIG. 7, for example.

このようなベースメタル（７）の変形はＧＫ間隔（ｇ）
を一定に保つことを困難にする。Such deformation of the base metal (7) is caused by the GK spacing (g)
making it difficult to keep constant.

即ち、第１図に示すようにヒータ（９）の端部をバネサ
ポート（６）の一端に溶接するには、例えばヒータ（９
）の−１端を一方のハネサポート（６）の」端に溶接し
た後、このバネサポート′（６）の弾性力に抗してヒー
タ（９）の他端を□他方のバネサポート（６）の一端ま
で引っ張っ：て溶接すると、ヒータ（９）が横方向に位
置すれする可能性があり、そのため第８図に示すように
ベースメタル（７）の中心が電子ビーム透過孔（１０）
からずれる：ことがあった。即ち電子ヒーム透過ｒｔ　
（１０）とベースメタル（７）間の距ｐＨｔｆ（ｇ）が
上記横ずれ位置によって変化し、前記ＧＫ間隔（ｇ）が
一定に規制できなかった。That is, in order to weld the end of the heater (9) to one end of the spring support (6) as shown in FIG.
) is welded to the end of one spring support (6), and then the other end of the heater (9) is welded against the elastic force of this spring support (6). ) If welding is performed by pulling the heater (9) to one end of the
deviate from: something happened. That is, electron beam transmission rt
The distance pHtf (g) between (10) and the base metal (7) varied depending on the lateral shift position, and the GK interval (g) could not be regulated to a constant value.

従ってベースメタル（７）をヒータ（９）に溶接する際
、ベースメタ＞Ｌ／□（７）の表裏を判定し溶接方向を
決めなりれぼならないが、小径であるため量産過程でこ
のような判定は非常に困難であった。Therefore, when welding the base metal (7) to the heater (9), it is necessary to determine the front and back sides of the base metal > L/□ (7) and determine the welding direction, but since the diameter is small, such a determination is necessary during the mass production process. was extremely difficult.

又、第３図の帯板（１１）にマスキングをしエツチング
によりベースメタル（７）を抜けば、パリ　（７゛）は
生じないが、時間□がかかり作業性が悪く、コストも高
くなって実用的ではない。Also, if the strip plate (11) in Fig. 3 is masked and the base metal (7) is removed by etching, the paris (7゛) will not occur, but it will take time, poor workability, and increase costs. Not practical.

更に、パリ　（７°）のあるベースメタル（７）をエツ
チング液の中に浸してパリ　（７゛）を除去することも
可能であるが、ベースメタル（７）は薄く小径であるた
め取扱いが煩雑であった。Furthermore, it is also possible to remove the paris (7°) by immersing the base metal (7) with a paris (7°) in an etching solution, but the base metal (7) is thin and small in diameter, making it difficult to handle. It was complicated.

ハ０発明の目的 本発明の目的は、手用なベースメタルを有する直熱型陰
極の実現にある。OBJECT OF THE INVENTION An object of the present invention is to realize a directly heated cathode having a flexible base metal.

二４発明の構成 本発明の特徴は、エミッタ物質を被着したベースメタル
を有するヒータを、対向して突設したインシュレータの
支持部上に跨って張設したものにおいて、上記ベースメ
タルはベースメタル素材であるテープ部月の両側縁□か
ベースメタル両側に残るように打抜いて、打抜かれたベ
ースメタル側縁をビータの両側に位置させて固定したこ
とにある。24. Constitution of the Invention The present invention is characterized in that a heater having a base metal coated with an emitter material is stretched across support parts of insulators protruding from each other, wherein the base metal is a base metal. The tape is punched out so that both edges of the tape remain on both sides of the base metal, and the punched side edges of the base metal are positioned and fixed on both sides of the beater.

ホ、実施例 本発明による陰極に用いられるベースメタルの製造方法
を第９図に示す平面図から説明する。図において、（１
２）はＮｉをベースとするテープ部材であるが、その幅
（目）はヒータの巾と略ば同じである。従ってテープ部
材（１２）からヒータのｒｌｌより大径にｔｌち抜くと
、一部が欠ける。即ちテープ部材（１２）の中心線上の
点を中心に上記円を打ち抜いた場合、テープ部材（１２
）に含まれる円弧（１３ａ　）とテープ部材（１２）の
両側の直線部分（１３ｂ　）とを外形線とする略小判状
のベースメタル（１３）が製造される。従って−・−ス
フイタル（１３）の打し抜き箇所は円弧（１３ａ　）の
部分だけであるので、打ち抜きにイ゛Ｉ′・うハリは円
弧（１３ａ　）の部分に生じ、直線部分（Ｊ　、３　ｂ
　）にハリは生しない。E. Example A method for manufacturing a base metal used in a cathode according to the present invention will be explained with reference to the plan view shown in FIG. In the figure, (1
2) is a tape member based on Ni, and its width (width) is approximately the same as the width of the heater. Therefore, when the tape member (12) is cut out to a diameter tl larger than rll of the heater, a part of the tape member (12) is chipped. That is, if the circle is punched out centering on a point on the center line of the tape member (12), the tape member (12)
) A substantially oval-shaped base metal (13) is manufactured whose outline is the circular arc (13a) included in the tape member (12) and the straight portions (13b) on both sides of the tape member (12). Therefore, since the punching point of the spacer (13) is only the circular arc (13a), the burr in the punching occurs in the circular arc (13a), and the straight part (J, 3) b
) does not produce firmness.

このベースメタル（１３）を第１０図に示すようにベー
スメタル（Ｉ３）周縁の直線部分（１３ｂ　）をヒータ
（９）に直交させてヒータ（９）に溶接固定し、ベース
メタル（１３）周縁のパリのある円弧（１３ａ　）部分
をヒータ（９）の側方にはみ出すようにすれば、ベース
メタル（１３）の表裏に拘らず、パリがヒータ（９）に
接触しないようにすることができる。この時、上記直線
部分（１３ｂ　）の長さはヒータ（９）の幅と略ぼ同じ
であることが好ましい。このヒータを第１図及び第２図
に示すヒータに代えて用い直熱型陰極を構成する。This base metal (13) is welded and fixed to the heater (9) with the straight line part (13b) of the periphery of the base metal (I3) perpendicular to the heater (9) as shown in FIG. By making the circular arc (13a) part with the paris protrude to the side of the heater (9), the paris can be prevented from coming into contact with the heater (9) regardless of whether the base metal (13) is on the front or back side. . At this time, it is preferable that the length of the straight line portion (13b) is approximately the same as the width of the heater (9). This heater is used in place of the heater shown in FIGS. 1 and 2 to construct a directly heated cathode.

これにより、従来ベースメタル（１３）の溶接待にパリ
により生じていたベースメタル（１３）の変形、傾きが
ベースメタル（１３）の表裏によらずなくなり、ヒータ
と密着させることができ電子ビーム透過孔（１０）とエ
ミッタ物質（８）の間隔（ｇ）を一定に規制されるよう
に直熱型陰極を量産することが可能となる。As a result, the deformation and tilting of the base metal (13) that conventionally occurred due to Paris during welding of the base metal (13) is eliminated regardless of whether the base metal (13) is on the front or back side, and the heater can be brought into close contact with the electron beam. Directly heated cathodes can be mass-produced so that the distance (g) between the hole (10) and the emitter material (8) is regulated to a constant value.

へ１発明のすＪ果 本発明によれば、ベースメタルを打抜き製造した際に形
成されるハリによるヒータとの密着性のばらつきを無（
すことができ、ベースメタルの変形、傾きがなくなる。According to the present invention, variations in adhesion to the heater due to the firmness formed when punching the base metal can be eliminated (
This eliminates deformation and tilting of the base metal.

従って従来のようなべ２スメタルの表裏の判定がなくて
も電子ビｈＭ＆　孔とベースメタル上のエミッタ物質と
の間隔を一定に規制することが容易となり、量産時の品
質向上に寄与する。Therefore, it becomes easy to regulate the distance between the electron bihM&hole and the emitter material on the base metal to a constant level without having to judge whether the base metal is front or back as in the past, contributing to quality improvement during mass production.

【図面の簡単な説明】[Brief explanation of drawings]

第１図及び第２図は従来の直熱型陰極の一例を示ず側断
面図及びＡ−Ａ線断面図、第３図はベースメタルの材料
となるＮｉの帯板の平面図、第４図は打抜きにより製造
されたベースメタルの側面図、第５図及び第６図はベー
スメタルとヒータの関係を示す側断面図、第７図はベー
スメタルを溶接固定したヒータの側断面図、第８図は制
御電極とベースメタルの位置関係を示ず側断面図、第９
図は本発明に係るベースメタルの月料となるテープ部材
の平面図、第１０図は本発明による陰極に用いられ□る
ベースメタルを固定し、たヒータの平面図である。 （４）・・インシュレータ、（４ｂ）・・支持部、（８
）・・エミッタ物質、（９）・・リボン状ヒータ、（１
２）・・テープ部材、（１３）・（９） ・略小判状ベースメタル。 励ＩＩ　ｌＩＩ？、ｆｆ 紛り　１・ｌ 喝）５図　部６１；：］1 and 2 show an example of a conventional directly heated cathode, and are a side sectional view and a sectional view taken along the line A-A. The figure is a side view of the base metal manufactured by punching, Figures 5 and 6 are side sectional views showing the relationship between the base metal and the heater, Figure 7 is a side sectional view of the heater with the base metal fixed by welding, Figure 8 is a side sectional view without showing the positional relationship between the control electrode and the base metal.
The figure is a plan view of a tape member serving as a base metal charge according to the present invention, and FIG. 10 is a plan view of a heater to which the base metal used for the cathode according to the present invention is fixed. (4)...Insulator, (4b)...Support part, (8
)...Emitter material, (9)...Ribbon heater, (1
2)...Tape members, (13), (9) - Approximately oval base metal. Encouragement II lII? , ff 1・l exclamation) Figure 5 Part 61;:]

Claims (1)

【特許請求の範囲】[Claims] （Ｉ）、エミッタ物質を被着したベースメタルを有する
ヒータを、対向して突設したインシュレータの支持部上
に跨って張設したものにおい゛Ｃ１上糾、１ベースメタ
ルはベースメタル素材で：あるテープ部材の両側縁がベ
ースメタル両側に残るよう、に打抜いて、打抜かれたベ
ースメタル両側縁をヒータの両側に位置、させて固定し
たことを特徴とする直熱型陰極。(I) A heater having a base metal coated with an emitter material is stretched across the support portion of an insulator protruding from the opposite side. A directly heated cathode characterized in that a certain tape member is punched out so that both side edges remain on both sides of a base metal, and the punched out base metal side edges are positioned and fixed on both sides of a heater.
JP58203454A 1983-10-28 1983-10-28 Directly heated cathode Pending JPS6095821A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58203454A JPS6095821A (en) 1983-10-28 1983-10-28 Directly heated cathode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58203454A JPS6095821A (en) 1983-10-28 1983-10-28 Directly heated cathode

Publications (1)

Publication Number Publication Date
JPS6095821A true JPS6095821A (en) 1985-05-29

Family

ID=16474383

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58203454A Pending JPS6095821A (en) 1983-10-28 1983-10-28 Directly heated cathode

Country Status (1)

Country Link
JP (1) JPS6095821A (en)

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