JPS59111222A - Impregnated cathode member - Google Patents

Impregnated cathode member

Info

Publication number
JPS59111222A
JPS59111222A JP57218289A JP21828982A JPS59111222A JP S59111222 A JPS59111222 A JP S59111222A JP 57218289 A JP57218289 A JP 57218289A JP 21828982 A JP21828982 A JP 21828982A JP S59111222 A JPS59111222 A JP S59111222A
Authority
JP
Japan
Prior art keywords
cathode
cup
sleeve
impregnated
recess
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57218289A
Other languages
Japanese (ja)
Inventor
Toru Yakabe
矢壁 徹
Toshiharu Higuchi
敏春 樋口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP57218289A priority Critical patent/JPS59111222A/en
Publication of JPS59111222A publication Critical patent/JPS59111222A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/04Manufacture of electrodes or electrode systems of thermionic cathodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Solid Thermionic Cathode (AREA)

Abstract

PURPOSE:To securely weld and fix a cathode base substance, a cup, and a cathode sleeve, by providing a recess on the peripheral wall of the cathode base substance and irradiating a laser beam on the cup and the cathode sleeve opposing the recess portion. CONSTITUTION:A cathode base substance 21 provided with a ring-shaped recess 21a on its peripheral wall is contained in a cup 22 made of such a metallic material having a high melting point as tantalum or molybdenum. The cup 22 is inserted in the top portion of a cathode sleeve 23 made of a tantalum or molybdenum plate rounded and welded into a cylindrical shape. A laser beam 34 generated by a YAG pulse laser beam machine is irradiated on the portion to be welded 31 opposing the recess portion 21a of the cathode base substance 21. Then, the portion to be welded 31 of the cup 22 and the cathode sleeve 23 is melted into the recess 21a to form a projection 35 there and the cathode base substance 21, the cup 22, and the cathode sleeve 23 are fixed together very strongly.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は含浸型陰極構体の改良に関するものである。[Detailed description of the invention] [Technical field of invention] The present invention relates to improvements in impregnated cathode structures.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

従来の含浸型陰極構体の構造の一例を第1図によシ説明
する。
An example of the structure of a conventional impregnated cathode structure will be explained with reference to FIG.

陰極基体(1)は外径1.5朔y、厚さ0.5 van
程度の円板である。
The cathode substrate (1) has an outer diameter of 1.5 mm and a thickness of 0.5 van.
It is a disk of about.

この陰極基体(1)は粒径3〜10μmのタングステン
粉末を圧縮成形した後、還元性雰囲気で焼結して得られ
た基体金属にBa0 、 At20g、CaOよシなる
電子放射物質を高温の還元性雰囲気で溶融含浸させて得
られ、一般には外径30〜50jBに形成した多孔質タ
ングステンの焼結体を薄板に切削加工し、この薄板に電
子放射物質を含浸させたのち、放電加工やレーザ加工な
どによシ、所望の外径寸法に抜き取ることによシ一枚の
薄板から多数の陰極基体(1)を得るようになっている
This cathode substrate (1) is made by compression molding tungsten powder with a particle size of 3 to 10 μm, and then sintering it in a reducing atmosphere.An electron emitting substance such as Ba0, 20 g of At, or CaO is reduced to the base metal at high temperature. A porous tungsten sintered body obtained by melting and impregnating in a neutral atmosphere, and generally formed to an outer diameter of 30 to 50 jB, is cut into a thin plate. After impregnating this thin plate with an electron emitting substance, it is processed by electric discharge machining or laser processing. A large number of cathode substrates (1) can be obtained from a single thin plate by cutting the cathode substrate to a desired outer diameter by processing or the like.

このようにして作られた陰極基体(1)は肉厚0.02
5晒のタンタル、モリブデン等の高融点金属からなるカ
ップ(2)に装着される。
The cathode substrate (1) made in this way has a wall thickness of 0.02
It is attached to a cup (2) made of a high melting point metal such as tantalum or molybdenum.

陰極基体(1)の装着されたカップ(2)はタンタル、
またはモリブデンなどの高融点金属から彦る陰極スリー
ブ(3)の頂部に挿入され溶接点σDで溶接固着される
The cup (2) on which the cathode substrate (1) is attached is made of tantalum;
Alternatively, it is inserted into the top of a cathode sleeve (3) made of a high melting point metal such as molybdenum and fixed by welding at a welding point σD.

陰極支持子(4)は肉厚0.05■幅0.5〜0.7調
のタンタル、またはモリブデンのリボンからなシ、陰極
スリーブ(3)の底部外周に複数個、溶接点α2で一端
部が固定され、他端部はコバールなどからなる陰極支持
ftJ(5)の肩部(51)に溶接点(13)で溶接固
着され、含浸型陰極構体が完成される。
The cathode supporter (4) is made of tantalum or molybdenum ribbon with a wall thickness of 0.05 mm and a width of 0.5 to 0.7 mm.Multiple pieces are attached to the bottom outer periphery of the cathode sleeve (3), with one end at the welding point α2. The other end is welded to the shoulder (51) of the cathode support ftJ (5) made of Kovar or the like at the welding point (13), thereby completing the impregnated cathode structure.

なおりツブ(2)は陰極基体(1)から熱蒸発によって
飛散する電子放射物質が陰極スリーブ(3)内に装着さ
れる図示しないヒータに付着することを防止するために
設けられている。
The guide tube (2) is provided to prevent electron emitting material scattered by thermal evaporation from the cathode base (1) from adhering to a heater (not shown) installed in the cathode sleeve (3).

然るに、このような含浸型陰極構体は次のような理由に
より製造工程中に溶接不良が発生したシ、寿命試験時に
溶接部から陰極基体(1)がはがれるという問題点があ
った。
However, such an impregnated cathode structure has problems in that poor welding occurs during the manufacturing process and the cathode substrate (1) peels off from the weld during a life test for the following reasons.

即ち陰極基体(1)、カップ(2)及び陰極スリーブが
いずれも高融点金属で形成されているため、抵抗溶接で
は容易に溶接ができないし、またレーザ溶接では粒界破
断を招くことがある。
That is, since the cathode base body (1), the cup (2), and the cathode sleeve are all made of high-melting point metal, they cannot be easily welded by resistance welding, and laser welding may cause intergranular fracture.

次にこの理由を述べると、先ず抵抗溶接では溶接電極材
として使用される銅合金材の融点が陰極基体(1)、カ
ップ(2)及び陰極スリーブ(3)材の融点よシ極端に
低いため、溶接時に強力な電流を流すと溶接電極が溶融
するため浴接部を完全に溶接することができないためで
ある。
Next, the reason for this is that in resistance welding, the melting point of the copper alloy material used as the welding electrode material is extremely lower than that of the cathode base (1), cup (2), and cathode sleeve (3) materials. This is because the welding electrode melts when a strong current is passed during welding, making it impossible to completely weld the bath weld.

また基体金属(1)は融点が33704Cのタングステ
ンで形成され、カップ(2)及び陰極スリーブは融点が
2940℃のタンタル、または融点2617℃のモリブ
デンで形成されているため、これらを浴接するには少な
くとも・一方の金属の融点以上に溶接部を加熱する必要
がある。しかし陰極基体(1)には、電子放射物質が含
浸されていて、この電子放射物質は融点が1800℃で
あるため溶接時にこの電子放射物質が溶融して溶接部近
傍に多量に析出し、カップ(2)の側面にまで付着して
しまうことがある。
The base metal (1) is made of tungsten with a melting point of 33704C, and the cup (2) and cathode sleeve are made of tantalum with a melting point of 2940°C or molybdenum with a melting point of 2617°C. It is necessary to heat the weld to a temperature above the melting point of at least one of the metals. However, the cathode substrate (1) is impregnated with an electron-emitting substance, and this electron-emitting substance has a melting point of 1800°C, so during welding, this electron-emitting substance melts and precipitates in a large amount near the welding area, causing the cup to melt. (2) It may even adhere to the sides.

このような含浸型陰極構体を使用した電子管を動作させ
ると、析出した電子放射物質が異常蒸発源となって電子
銃を構成する電極間のリークなどが発生し、陰極線管と
しての特性の低下をきたすという問題点がある。
When an electron tube using such an impregnated cathode structure is operated, the precipitated electron emitting material becomes a source of abnormal evaporation, causing leaks between the electrodes that make up the electron gun, resulting in deterioration of the characteristics of the cathode ray tube. There is a problem with this.

またレーザ溶接においては、前述した抵抗溶接とは異な
シ、構成材料が高融点金属でも溶接は可能であり、また
電子放射物質の析出も微量である。
Furthermore, in laser welding, unlike the above-mentioned resistance welding, welding is possible even when the constituent material is a high melting point metal, and the precipitation of electron emitting substances is also minimal.

しかしレーザ溶接により陰極基体(1)、カップ(2)
及び陰極スリーブ(3)を溶接した含浸型陰極構体を電
子管に組み込み寿命試験を行なったところ、カットオフ
電圧が大幅に変化してしまう現象□が見られ、この電子
管を分解調査したところ、陰極基体(Itがわずかな力
でカップ(2)及び陰極スリーブから脱落してしまって
いた。
However, due to laser welding, the cathode base (1) and cup (2)
When the impregnated cathode structure with the welded cathode sleeve (3) and cathode sleeve (3) was assembled into an electron tube and a life test was performed, a phenomenon □ in which the cut-off voltage changed significantly was observed.When this electron tube was disassembled and investigated, it was found that the cathode base (It had fallen off from the cup (2) and the cathode sleeve with a slight force.

この理由はレーザ溶接では陰極基体(1)を構成するポ
ーラスタングステンが局部的に加熱されることによシ結
晶成長が発生する。こ・の結晶成長した部分と、熱影響
を受けない部分の粒界がヒートサイクルによシ粒界すべ
りを起こし破断した結果であった。
The reason for this is that in laser welding, the porous tungsten constituting the cathode substrate (1) is locally heated and crystal growth occurs. This was the result of grain boundaries between the part where the crystals grew and the part not affected by heat caused grain boundary sliding and fracture due to the heat cycle.

〔発明の目的〕[Purpose of the invention]

本発明は前述した問題点に鑑みなされたものであシ、陰
極基体、カップ及び陰極スリーブが良好に溶接固着され
て高品位に保持されてなる品位の良好な含浸型陰極構体
を提供することを目的としている。
The present invention has been made in view of the above-mentioned problems, and it is an object of the present invention to provide a high-quality impregnated cathode structure in which a cathode substrate, a cup, and a cathode sleeve are well welded and fixed and maintained in high quality. The purpose is

〔発明の概要〕[Summary of the invention]

即ち、本発明は、電子放射物質が含浸された陰極基体と
、この陰極基体が装着された高融点金属からなるカップ
と、頂部にカップが挿入固着された高融点金属から゛な
る陰極スリーブとを少くとも具備する含浸型陰極構体に
おいて、陰極基体の側壁部の全周または一部に凹部が形
成され、凹部に対応するカップ及び陰極スリーブにレー
ザ光を照射し溶融させて得られるカップ及び陰極スリー
ブの突出部と凹部の固着によシ陰極基体を固定したごと
を特徴とする含浸型陰極構体である。
That is, the present invention comprises a cathode substrate impregnated with an electron-emitting substance, a cup made of a high-melting point metal to which the cathode substrate is mounted, and a cathode sleeve made of a high-melting point metal to which the cup is inserted and fixed. An impregnated cathode assembly comprising at least a cup and a cathode sleeve in which a recess is formed in the entire circumference or a part of the side wall of the cathode substrate, and the cup and cathode sleeve corresponding to the recess are irradiated with a laser beam and melted. This is an impregnated cathode structure characterized by a cathode substrate fixed by fixing the protrusion and the recess.

〔発明の実施例〕[Embodiments of the invention]

次に本発明の含浸型陰極構体の一実施例を第2図及び第
3図によシ説明する。
Next, an embodiment of the impregnated cathode structure of the present invention will be described with reference to FIGS. 2 and 3.

陰極基体f2力は外径1.5’mg、厚さ05篩程度の
円板であり、側壁部(211)には環状の四部(21a
)が設けられている。
The cathode substrate f2 is a disk with an outer diameter of 1.5'mg and a thickness of about 0.5 mm, and the side wall (211) has four annular parts (21a
) is provided.

この陰極基体12υは粒径3〜10μmのタングステン
粉末を圧縮成形した後、還元性雰囲気で焼結して得られ
た基体金属にBaOXAt20g 、CaOよシなる電
子放射物質を高温の還元雰囲気で溶融含浸させて得られ
る○凹部(2] a)は陰極基体12υを旋盤加工ある
いは高速パルス発振YAGレーザ加工機によるスクライ
ビングによって得られ、幅01〜0.25胴深さ01〜
03胡程度である。
This cathode substrate 12υ is made by compression-molding tungsten powder with a particle size of 3 to 10 μm and then sintering it in a reducing atmosphere.The resulting substrate metal is melt-impregnated with 20g of BaOXAt, CaO, or other electron-emitting substances in a high-temperature reducing atmosphere. The resulting ○ recess (2) a) is obtained by lathing the cathode substrate 12υ or by scribing with a high-speed pulse oscillation YAG laser processing machine, and has a width of 01 to 0.25 and a body depth of 01 to
It is about 03 Hu.

このようにして作られた陰極基体■υは肉厚0.025
咽程度のタンタル、モリブデン等の高融点金属からなる
内径約1.5備高さ0.5 mmのカップ(イ)内に装
着される。
The cathode substrate ■υ made in this way has a wall thickness of 0.025
It is installed in a cup (A) with an inner diameter of approximately 1.5 mm and a height of 0.5 mm, which is made of a high-melting point metal such as tantalum or molybdenum.

この陰極基体Qυの装着されたカップ(イ)はタンタル
またはモリブデンなど25μを厚程度の板を丸め、溶接
した円筒状の陰極スリーブ(ホ)の頂部に挿入される。
The cup (A) on which the cathode substrate Qυ is mounted is inserted into the top of a cylindrical cathode sleeve (E) made by rolling a 25μ thick plate of tantalum or molybdenum and welding it.

次に陰極基体121)、カップ(イ)及び陰極スリーブ
(イ)の接合する方法たついて説明すると第3図に示す
ように先ずカップに)K陰極基体(2のを装着する。次
に陰極スリーブ(イ)の頂部に陰極基体(21)の装着
されたカップ(イ)を挿入する。
Next, we will explain how to join the cathode base 121), the cup (A), and the cathode sleeve (A).As shown in Figure 3, first attach the K cathode base (2) to the cup.Next, the cathode sleeve Insert the cup (A) on which the cathode substrate (21) is attached into the top of (A).

次に陰極基体(21)の凹部(21a)に対応する溶接
部01)にYAGパルスレーザ加工機から発振されたレ
ーザ光■を照射すると、カップ(2)及び陰極スリーブ
(イ)の溶接部0])は溶融し凹部(21a)の中に溶
は出し突出部(至)を形成し、非常に強固に陰極基体Q
])とカップ(イ)及び陰極スリーブ翰が固着される。
Next, when the welded part 01) corresponding to the concave part (21a) of the cathode base body (21) is irradiated with the laser beam (■) oscillated from the YAG pulse laser processing machine, the welded part 01) of the cup (2) and the cathode sleeve (A) is irradiated. ]) melts and forms a protruding part (to) in the recess (21a), and is very firmly attached to the cathode base Q.
]), the cup (A) and the cathode sleeve holder are fixed.

そしてこの突出部(至)は陰極基体■乃の円周上に2点
以上の複数箇所、等間隔の位置に設けることにより確実
に固着されることになる。
By providing the protrusions (to) at two or more points on the circumference of the cathode substrate at equal intervals, they can be securely fixed.

次に肉厚0.05mm、幅07叫のタンタルあるいはモ
リブデンのリボンからなる陰極支持子(ホ)を陰与スリ
ーブ(イ)の底部外周に複数個、溶接点(イ)で一端部
で固定し、他端部はコバールなどからなる陰極支持筒(
ハ)の肩部(252)に溶接点(至)で固定し含浸型陰
極構体が完成される。
Next, a plurality of cathode supports (E) made of tantalum or molybdenum ribbons with a wall thickness of 0.05 mm and a width of 0.7 mm are fixed to the outer circumference of the bottom of the negative sleeve (A) at one end at the welding point (A). , the other end is a cathode support tube made of Kovar etc.
It is fixed to the shoulder (252) of (c) at the welding point (to) to complete the impregnated cathode structure.

本実施例のように陰極基体■◇の外周に凹部(21a)
を設け、この四部(21a)に対設するカップ(イ)及
び陰極スリーブ翰をレーザ光によシ溶融させることによ
りカップ(イ)及び陰極スリーブ(イ)の突起部を凹部
(21a)に嵌合することによシ、含浸型陰極構体とし
て次のような効果がある。
As in this example, there is a recess (21a) on the outer periphery of the cathode substrate ◇.
The protrusions of the cup (A) and the cathode sleeve (A) are fitted into the recess (21a) by melting the cup (A) and the cathode sleeve holder that are opposite to the four parts (21a) using a laser beam. By combining them, the impregnated cathode structure has the following effects.

即ち第1にレーザ光によシ溶接するので、極めて局部的
にしか加熱されず、陰極基体に含浸された電子放射物質
は極めて微量析出するだけである。
That is, first, since welding is performed using a laser beam, heating is performed only extremely locally, and only a very small amount of the electron emitting material impregnated into the cathode substrate is precipitated.

従がって、動作時に異常蒸発物が発生しないので電極間
リークなどの不都合を生じることなく安定した特性が得
られる。第2に陰極基体に凹部を形成することによシ溶
接面積を太きくとれるので粒界破断に対して有利である
ばかシではなく突出部により、かしめ作用があり、寿命
試験によるヒートサイクルにおいてカットオフ特性が変
化することなく極めて優れた含浸型陰極構体を得ること
が可能となった。
Therefore, no abnormal evaporated matter is generated during operation, and stable characteristics can be obtained without causing inconveniences such as leakage between electrodes. Secondly, by forming a recess in the cathode substrate, the welding area can be made larger, which is advantageous against intergranular fracture.The protrusion has a caulking effect, rather than a bulge, and can be cut during the heat cycle in a life test. It has become possible to obtain an extremely excellent impregnated cathode structure without any change in off-state characteristics.

次に本発明の他の実施例に使用する陰極構体のそれぞれ
異なる例を第4図乃至第7図によシ説明する0 先ず第4図に示す陰極構体(4〃は側壁部(41t)の
周方向に細長い凹部(41a)を部分的に設けた例であ
り、第5図に示す陰極構体t51)は側壁部(5] +
)の周方向に複数個の凹部(51a)を設けた例であり
、第6図に示す陰極構体−は側壁部(611)に環状の
凹部(61a)を2重に設けた例であシ、第7図に示す
陰極構体(7])は側壁部(71□)に縦方向に凹部(
71a)を設けた例であり、いずれも前の実施例と同様
な効果が得られる。
Next, different examples of cathode assemblies used in other embodiments of the present invention will be explained with reference to FIGS. 4 to 7. First, the cathode assembly shown in FIG. This is an example in which an elongated recess (41a) is partially provided in the circumferential direction, and the cathode structure t51) shown in FIG. 5 has a side wall portion (5] +
) is an example in which a plurality of recesses (51a) are provided in the circumferential direction, and the cathode assembly shown in FIG. , the cathode assembly (7]) shown in FIG. 7 has a vertical recess (
71a), and in both cases the same effects as in the previous embodiment can be obtained.

なお前述した実施例ではカップ(2)と陰極スリーブ(
3)の両方を同時に供えたものについて述べたが、あら
かじめ陰極基体の低面にRe −Mo等のろう材をろう
付して陰極基体(1)の目つぶしをし蒸発を防止してあ
れば、陰極基体(1)と陰極スリーブ(3)のみの場合
でも同様の効果がえられる。又、前述した実施例は陰極
スリーブを陰極支持子を介して陰極支持筒に支持した例
について述べたが、これに限定されるものではなく、や
や長めの陰極スリーブのみを使用した含浸型陰極構体で
も同様であることは説明する迄もない。
In addition, in the above-mentioned embodiment, the cup (2) and the cathode sleeve (
We have described the case in which both of 3) are provided at the same time, but if a brazing material such as Re-Mo is brazed to the lower surface of the cathode substrate in advance to close the eyes of the cathode substrate (1) and prevent evaporation, Similar effects can be obtained even when only the cathode substrate (1) and cathode sleeve (3) are used. In addition, although the above-mentioned embodiment described an example in which the cathode sleeve was supported on the cathode support cylinder via the cathode supporter, the present invention is not limited to this, and an impregnated cathode assembly using only a slightly longer cathode sleeve may be used. But there is no need to explain that they are the same.

〔発明の効果〕〔Effect of the invention〕

上述のように本発明によれば陰極基体、カップ及び陰極
スリーブを確実に固定することが可能であり、また異常
蒸発物や電極間リークなど不都合もなく、更にカットオ
フ特性の変化のない含浸型陰極構体を得ることができる
ので、その工業的価値は極めて大である。
As described above, according to the present invention, it is possible to securely fix the cathode substrate, the cup, and the cathode sleeve, and there is no inconvenience such as abnormal evaporated matter or leakage between electrodes, and furthermore, it is an impregnated type that does not change the cutoff characteristics. Since a cathode structure can be obtained, its industrial value is extremely large.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の含浸型陰極構体の一例を示す一部切欠斜
視図、第2図及び第3図は本発明の含浸型陰極構体の一
実施例を示す図であり、第2図は一部切欠斜視図、第3
図は陰極基体、カップ及び陰陰スリーブのレーザ光によ
る同定方法を示す要部説明用断面図、第4図乃至第7図
は本発明の含浸型陰極構体の他の実施例に使用するそれ
ぞれ異なる四部を有する陰極基体を示す斜視図である。 1、21.41.51.61.71・・・陰極基体2.
22・・・カップ   3,23・・・陰極スリーブ4
.24・・・陰極支持子 5,25・・・陰極支持筒I
I、 12.13.32.33−・・溶接点21 a 
+ 41a + 51a + 61a t 71 a・
・・凹部31・・・溶接部     34−・・レーザ
光35・・・突出部 代理人 弁理士 井 上 −男 第  4  図 第  6  図 l 第  5  図 第  7  図 γl 103−
FIG. 1 is a partially cutaway perspective view showing an example of a conventional impregnated cathode structure, and FIGS. 2 and 3 are views showing an embodiment of the impregnated cathode structure of the present invention. Partial cutaway perspective view, 3rd
The figure is an explanatory cross-sectional view of the main parts showing a method of identifying the cathode substrate, the cup, and the cathode sleeve using laser light. FIG. 1, 21.41.51.61.71... cathode substrate 2.
22... Cup 3, 23... Cathode sleeve 4
.. 24... Cathode supporter 5, 25... Cathode support cylinder I
I, 12.13.32.33--Welding point 21 a
+ 41a + 51a + 61a t 71 a・
...Concave portion 31...Welding portion 34-...Laser beam 35...Protrusion portion Agent Patent attorney Inoue-Male No. 4, No. 6, No. 1, No. 5, No. 7, No. γl 103-

Claims (2)

【特許請求の範囲】[Claims] (1)電子放射物質が含浸された陰極基体と、前記陰極
基体が装着された高融点金属からなるカップと頂部に前
記カップが挿入固着された高融点金属からなる陰極スリ
ーブとを少くとも具備する含浸型陰極構体において、前
記陰極基体の側壁部の全周まだは一部に凹部が形成され
、前記四部に対応する前記カップ及び陰極スリーブにレ
ーザ光を照射し溶融させて得られる前記カップ及び陰極
スリーブの突出部と前記凹部の固着により前記陰極基体
を固定したことを特徴とする含浸型陰極構体。
(1) It comprises at least a cathode substrate impregnated with an electron emitting substance, a cup made of a high melting point metal to which the cathode substrate is attached, and a cathode sleeve made of a high melting point metal to the top of which the cup is inserted and fixed. In the impregnated cathode structure, a concave portion is formed on the entire circumference or a part of the side wall portion of the cathode substrate, and the cup and cathode are obtained by irradiating and melting the cup and cathode sleeve corresponding to the four portions with a laser beam. An impregnated cathode structure, characterized in that the cathode substrate is fixed by fixing the protrusion of the sleeve to the recess.
(2)突出部が複数箇所に形成されていることを特徴と
する特許請求の範囲第1項記載の含浸型陰極構体。
(2) The impregnated cathode assembly according to claim 1, wherein the protruding portions are formed at a plurality of locations.
JP57218289A 1982-12-15 1982-12-15 Impregnated cathode member Pending JPS59111222A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57218289A JPS59111222A (en) 1982-12-15 1982-12-15 Impregnated cathode member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57218289A JPS59111222A (en) 1982-12-15 1982-12-15 Impregnated cathode member

Publications (1)

Publication Number Publication Date
JPS59111222A true JPS59111222A (en) 1984-06-27

Family

ID=16717498

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57218289A Pending JPS59111222A (en) 1982-12-15 1982-12-15 Impregnated cathode member

Country Status (1)

Country Link
JP (1) JPS59111222A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61202852U (en) * 1985-06-11 1986-12-19
JPS63119130A (en) * 1986-07-28 1988-05-23 New Japan Radio Co Ltd Impregnated type cathode with conductive support and its manufacture
JPH04220928A (en) * 1990-03-13 1992-08-11 Samsung Electron Devices Co Ltd Impregnation type cathode structure and manufacture thereof
JPH04249023A (en) * 1991-02-05 1992-09-04 Tokyo Tungsten Co Ltd Indirectly heated cathode for cathode-ray tube
JP2004514239A (en) * 1999-12-22 2004-05-13 トムソン ライセンシング ソシエテ アノニム How to assemble a cathode for a cathode ray tube

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61202852U (en) * 1985-06-11 1986-12-19
JPS63119130A (en) * 1986-07-28 1988-05-23 New Japan Radio Co Ltd Impregnated type cathode with conductive support and its manufacture
JPH04220928A (en) * 1990-03-13 1992-08-11 Samsung Electron Devices Co Ltd Impregnation type cathode structure and manufacture thereof
JPH04249023A (en) * 1991-02-05 1992-09-04 Tokyo Tungsten Co Ltd Indirectly heated cathode for cathode-ray tube
JP2004514239A (en) * 1999-12-22 2004-05-13 トムソン ライセンシング ソシエテ アノニム How to assemble a cathode for a cathode ray tube

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