JPS6090833U - Semiconductor material draining and drying equipment - Google Patents
Semiconductor material draining and drying equipmentInfo
- Publication number
- JPS6090833U JPS6090833U JP18264083U JP18264083U JPS6090833U JP S6090833 U JPS6090833 U JP S6090833U JP 18264083 U JP18264083 U JP 18264083U JP 18264083 U JP18264083 U JP 18264083U JP S6090833 U JPS6090833 U JP S6090833U
- Authority
- JP
- Japan
- Prior art keywords
- rotor
- guide members
- utility
- model registration
- drain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Drying Of Solid Materials (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は本考案の一例による水切乾燥装置を部分的に切
欠いた斜視図、第2図はその概略断面図、第3図はその
内部を示す平面図、第4図は第2図の線A−Aから見た
平面図、第5図は一つの社内部材の斜視図、第6図は他
の実施例を示すロータの部分的な斜視図、そして第7図
は他の実施例を示す第4図に類似の平面図である。
図中、1・・田−タ、2・・・ケーシング、2a・・・
周壁、5・・・支持部、6・・・吸気口、7・・・排気
口、11 ゛・・・案内部材、11′・・・案内板
の縁。Fig. 1 is a partially cutaway perspective view of a drain dryer according to an example of the present invention, Fig. 2 is a schematic sectional view thereof, Fig. 3 is a plan view showing the inside thereof, and Fig. 4 is a line taken along the line of Fig. 2. A plan view taken from A-A, FIG. 5 is a perspective view of one internal member, FIG. 6 is a partial perspective view of the rotor showing another embodiment, and FIG. 7 is another embodiment. FIG. 4 is a plan view similar to FIG. 4; In the figure, 1...data, 2...casing, 2a...
Peripheral wall, 5...Support part, 6...Intake port, 7...Exhaust port, 11゛...Guide member, 11'...Edge of guide plate.
Claims (4)
収めたキャリヤが設置される一または二つの支持部を備
え且つケーシング内に設置されるロータを含み、前記ロ
ータ上方の吸気口から導入され且つ前記ロータを通過し
て前記ケーシング周壁に在る排気口を通して排出される
気体によって前記ロータ上に設置された半導体材料が乾
燥されろ水切乾燥装置において、前記ロータは導入され
た気体を案内するため前記ロータの外側の区域に配置さ
れた少なくとも3つの案内部材を備え、各前記案内部材
はそれぞれ凸側を内側にしたほぼ垂直なわん曲面に含み
、前記支持部は前記案内部材の間に設けられたこ左を特
徴とする水切乾燥装置。(1) comprising a rotor installed in a casing and having one or two supports on which carriers containing semiconductor materials such as silicon wafers to be drained and dried are placed; the rotor is introduced from an air inlet above the rotor; The semiconductor material placed on the rotor is dried by the gas passed through the rotor and discharged through the exhaust port in the casing peripheral wall. at least three guide members disposed in the outer region of the rotor, each guide member comprising a substantially vertical curved surface with its convex side inward, and the support portion being disposed between the guide members. The drain dryer featured on the left.
装置にお−いて、前記ロータ上には4つの前記案内部材
が備えられている水切乾燥装置。(2) Utility Model Registration Scope of Claim 1. The drain dryer according to claim 1, wherein the four guide members are provided on the rotor.
装置において、各前記案内部材はわん曲板からなり、そ
の両側の縁は前記ロータの外周より若干外側に突出して
いる水切乾燥装置。(3) Utility Model Registration Scope of Claims In the drain drying device according to claim 1, each of the guide members is made of a curved plate, and the edges on both sides of the guide member are slightly protruded outward from the outer periphery of the rotor. .
装置において、各前記案内部材は下方に向って末広状に
傾斜している水切乾燥装置。(4) Utility Model Registration Scope of Claim 1. The drain drying device according to claim 1, wherein each of the guide members is inclined downward in a widening shape.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18264083U JPS6090833U (en) | 1983-11-25 | 1983-11-25 | Semiconductor material draining and drying equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18264083U JPS6090833U (en) | 1983-11-25 | 1983-11-25 | Semiconductor material draining and drying equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6090833U true JPS6090833U (en) | 1985-06-21 |
JPH0514508Y2 JPH0514508Y2 (en) | 1993-04-19 |
Family
ID=30395477
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18264083U Granted JPS6090833U (en) | 1983-11-25 | 1983-11-25 | Semiconductor material draining and drying equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6090833U (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5295167A (en) * | 1976-02-06 | 1977-08-10 | Hitachi Ltd | Wafer dryer |
JPS5324299A (en) * | 1976-08-18 | 1978-03-06 | Nec Corp | Fm-cw radar |
JPS5528549A (en) * | 1978-08-19 | 1980-02-29 | Sony Corp | Servo circuit |
-
1983
- 1983-11-25 JP JP18264083U patent/JPS6090833U/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5295167A (en) * | 1976-02-06 | 1977-08-10 | Hitachi Ltd | Wafer dryer |
JPS5324299A (en) * | 1976-08-18 | 1978-03-06 | Nec Corp | Fm-cw radar |
JPS5528549A (en) * | 1978-08-19 | 1980-02-29 | Sony Corp | Servo circuit |
Also Published As
Publication number | Publication date |
---|---|
JPH0514508Y2 (en) | 1993-04-19 |
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