JPS6089040A - Matrix electron source - Google Patents

Abstract

PURPOSE:To form a matrix electron source which can emit electrons uniformly by arranging the electron beam control electrode in vicinity of the plural rod- shaped heat cathode and further by providing the device with a grid electrode and an electrode beam takeoff electrode. CONSTITUTION:A plurality of electron beam control electrodes 2 and a plurality of rod-shaped heat cathode 3 which make a right angle to the electron beam control electrodes 2, are arranged in vicinity of each other. Furthermore, a grid electrode 6 having electron beam passing holes 7 which are coaxial with the holes 5 of an electron beam takeoff electrode 4 is arranged between the electron beam control electrode 2 and the electron beam takeoff electrode 4 having the electron beam passing hole 5. Thus formed is a matrix electron source of a plate type display unit. Since the voltage approximately equal to that applied to the cathode 3 is applied to the grid electrode 6 from the power source V4, an electron beam is only emitted from the surface of the cathode 3 which corresponds to the central part of the electron beam passing holes 5, 7. Consequently, a uniform electron beam with good convergence can be obtained without loading the cathode 3 unnecessarily.

Description

DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to an IJ wax source for a display device that displays characters or images using an electron beam.

(Conventional structure and its problems) Multiple electron beams are controlled to collide with a phosphor to create characters,
A flat display device for displaying images, such as Japanese Patent Application Laid-open No. 1983-
No. 7984.5 requires precise control of the electron beam to impinge on the phosphor display panel in a matrix manner. In particular, when displaying high-density images, such as television images, a high-density controlled electron beam is required, and therefore a high-density arrangement of control electrodes is required. When control electrodes are arranged in a high density, mutual influence between the electrodes, that is, a crosstalk phenomenon occurs, making it difficult to obtain high-resolution images.

Figure 1 shows the electrode configuration and wiring diagram of a conventional MA) IJ wax source, in which 1 is an insulating substrate made of glass or the like, on the surface of which a plurality of electron beam control electrodes 2 are arranged. , 3 is a linear hot cathode, 4 is an electron beam extraction electrode, and is provided with a through hole 5 for emitting an electron beam. AI,
A2 + A3 are the signal input terminals of the linear hot cathode 3, Bl
, B2 and B3 are control signal input terminals DI for the electron beam control electrode 2.

D2 and D3 are diodes, R1, R2, and R3 are resistors provided at one end of the linear hot cathode 3, rl, r2°r3 are resistors of the electron beam extraction electrode 2, vl is a bias power supply,
2 is a cathode heating power source, and v3 is a power source for the electron beam extraction electrode 4.

Signal input terminal A I + A 2 * of linear hot cathode 3
When a negative cellus signal is applied to any one of A 3, for example A, an electron beam is emitted from the corresponding linear hot cathode 3, and an electron beam is emitted from the through hole 5 provided in the electron beam extraction electrode 4. However, a negative cutoff voltage is applied to the electron beam control electrode 2 from the bias power supply V1, and no smear beam is generated. Now, when a positive signal voltage is applied to the electron beam control electrode 201 from one of the control signal input terminals B1 to B3, the corresponding through hole 5 provided in the electron beam extraction electrode 4 is applied.
An electron beam is emitted from the At this time, when a positive signal voltage is applied to one of the control electrodes, for example 2-2, the electron beam needs to be emitted only from the through hole at the position corresponding to the control electrode. However, if the control electrodes are densely arranged, electron beams may be emitted from adjacent through holes.
This method has disadvantages such as the inability to obtain high-resolution images due to interactions such as changes in the beam current value depending on the potential state of adjacent control electrodes. In addition, when the linear hot cathode 3 is used, the electron beam also flows to parts other than the through hole 5 of the electron beam extraction electrode 40, which not only places an unnecessary burden on the cathode but also increases the potential difference between both ends of the linear hot cathode 30. There were drawbacks such as an increase in the beam current, an uneven beam current, and an uneven image brightness.

(Objective of the Invention) The present invention is intended to solve the drawback described in item 1, and reduces the potential difference between both ends of the hot cathode by minimizing the electron emission current from the hot cathode. The purpose of this method is to obtain uniform electron emission and a well-focused electron beam.

(Structure of the Invention) The present invention arranges a plurality of strip-shaped electron beam control electrodes in one plane, and arranges linear hot cathodes at regular intervals so as to be substantially perpendicular to the electron beam control electrodes. Further, in a matrix electron source in which a plate-shaped electrode having a through hole for taking out the electron beam is disposed opposite to the electron beam control electrode, a through hole coaxial with the through hole provided in the electron beam taking out electrode is provided. A grid-like electrode having a grid-like electrode is disposed between at least one of the electron beam control electrode, the linear hot cathode, and the electron beam extraction electrode, and the potential of the grid-like electrode is set between the electron beam control electrode and the electron beam extraction electrode. It is constructed so that the potential is lower than that of the beam extraction electrode.

(Explanation of Embodiment) Fig. 2 shows an electrode configuration and a wiring diagram of an embodiment of the present invention. The reason is that a grid-like electrode is provided to prevent talk.

Here, 6 is a grid electrode, 7 is an electron beam extraction electrode 4
A through hole coaxial with the through hole 5 provided in , v4 is a power source for the grid electrode 6, and other symbols are the same as those explained in FIG.

This will be explained in detail below. 1 is an insulating substrate made of glass or the like, and an electron beam control electrode 2 is disposed on the surface thereof. The insulating substrate l can also serve as a part of the vacuum envelope. A plurality of electron beam control electrodes 2 are provided substantially in parallel at regular intervals. The arrangement interval and number of electron beam control electrodes 2 are determined by the resolution of characters or images to be displayed and the number of picture elements.

Numeral 3 is a linear hot cathode, and a plurality of them are arranged substantially parallel to each other and arranged to be substantially orthogonal to the electron beam control electrode 2. It is desirable that the distance between the linear hot cathode 3 and the electron beam control electrode 2 be kept constant, and that they be arranged as close as possible. The distance between the electron beam control electrode 2 and the linear hot cathode 30 has a significant relationship with resolution and electron beam (6) control characteristics. It is desirable that the spacing be kept at 1/2 or less of the spacing between the electron beam control electrodes 2; if it is more than 1/2, crosstalk may occur.

Further, there is an advantage that the smaller the interval, the smaller the signal voltage applied to the electron beam control electrode. Reference numeral 4 denotes an electrode for taking out the electron beam, and through holes 5 are provided at positions corresponding to the intersection points of the electron beam control electrode 2 and the linear hot cathode 3. The explanation up to this point is the same as in the case of FIG.

Next, reference numeral 6 denotes a grid electrode for preventing cross-curing, which is a main part of the present invention. The grid electrode 6 is provided with a through hole 7 coaxial with the electron beam extraction electrode 4 . The through hole 7 has a diameter equal to or larger than the through hole 5 provided in the electron beam extraction electrode 4. The through hole does not necessarily have to be circular, and may be a square hole. In this case, the hole diameter means that the hole has the same area as the through hole 5 or even larger than it. Grid electrode 6
It has been confirmed that it has the same function even when placed between the electron beam control electrode 2 and the linear hot cathode 3.

FIG. 2 also shows a basic wiring diagram for driving this electron source.

Each electrode of the electron beam control electrode 2 has a resistor r1. r2゜r3
It is connected to the negative electrode of the bias power supply v1 via... One end of each cathode of the linear hot cathode 3 is connected to a resistor R1, R
2r R3... to the positive electrode of the cathode heating power supply v2 via R3..., the other end is connected to the diode DI, D2 * D3...
... is connected to the negative electrode of the power supply V2. Further, a positive voltage is applied to the electrode 4 from which the electron beam is extracted by a power source v3.

A voltage approximately equal to that of the linear hot cathode 3 is applied to the grid electrode 6 by a power source V4.

Although the linear hot cathode 3 is constantly supplied with power by the power supply v2 and is heated and ready to emit electrons, and the positive voltage is applied to the electron beam extraction electrode 4 by the power supply v3, A resistor r is connected to the electron beam control electrode 2.
bias voltage v1 via l, r2+r3...
Since a negative voltage is applied by the linear hot cathode 3
There is a negative electric field in the vicinity of , and an electron beam is easily emitted. However, if we now apply a negative pulse signal to one of the linear hot cathodes 3 and apply a positive pulse signal to any electron beam control electrode 2, each intersection of both electrodes to which the signal voltage is applied The electron beam is emitted only from the portion of the cathode surface corresponding to .

FIG. 3 is a sectional view of one embodiment showing the electrode structure of the matrix electron source of the present invention.

The electron beam control electrodes 2 have a pitch of 1 mm and a width of 0.5 mm, and are provided on the surface of an insulating glass substrate 1, and a negative cutoff voltage of -20V is applied at cutoff. The linear hot cathode 3 is stretched approximately parallel to the glass substrate surface with a distance of 0.3 m from the electron beam control electrode 2 and the grid electrode 6, and a voltage of Ov is constantly applied to it, and a voltage of -5V is applied when driving. A Luss voltage of ~-10V is applied. A voltage approximately equal to the voltage during cathode drive is applied to the grid electrode 6, and +50 to 100 V is applied to the electron beam extraction electrode 4.
voltage is applied. Take out the electron beam 9) When a positive voltage is applied to the electrode 4, the grid electrode 60 through hole 7
A positive electric field (partially shown) penetrates into the cathode and reaches the vicinity of the cathode. However, when a negative signal voltage is applied to any one of the plurality of cathodes and a positive signal voltage is applied to any control electrode, an electron beam is emitted from the cathode surface at each intersection point and penetrates. An electron beam is obtained passing through holes 5 and 7.

In this way, by applying a signal voltage to any linear hot cathode 3 and any electron beam control electrode 2, two
It is possible to take out the electron beam while controlling it dimensionally. The through holes 7 and 5 provided in the grid electrode 6 and the electron beam extraction electrode 4 are desirably made slightly larger than the through hole 5 in order to facilitate penetration of the electric field. In the example, the through holes 5 and 7 have diameters of 05φ and 0.
．． 8 tanφ was used.

In the case of such a combination, the electron beam passing through the through hole 5 is emitted from the surface of the linear hot cathode 3 corresponding to the central part of the through hole 5, and a beam with extremely good focusing property is obtained. It has the following characteristics. Historically, the effect of inserting the grid electrode 6 is that the electron beam emitted from the linear hot cathode is emitted only from the surface of the linear hot cathode corresponding to the center of the through hole, so that excess electron current is generated. Because of this, the current flowing through the linear hot cathode is small, and therefore the potential difference between both ends of the linear hot cathode 3 that occurs during driving is also small, making it possible to increase the uniform electron beam over the entire length of the cathode. This is especially necessary when using a long cathode.

In addition, the grid electrode 6 is rearranged between the electron beam control electrode 2 and the linear hot cathode 3, and the grid electrode 6 is placed at the same voltage as the linear hot cathode 3, or at a slightly higher voltage, for example, with respect to the linear hot cathode 3. Teichi 5V
When a positive voltage, for example +IOV, is applied to the electron beam control electrode 2, the linear hot cathode 30 in the center of the through hole 7 is The surface is positive, and electron beams are emitted only from this part. Therefore, as in the case of the previous embodiment, the same effect can be obtained without generating an extra electron flow.

(Effects of the Invention) As explained above, the present invention provides the grid electrode 6 between the linear hot cathode and the electron beam extraction electrode, between the linear hot cathode and the electron beam control electrode, or between both electrodes. This electrode configuration has the advantage that a uniform and well-focused electron beam can be extracted over the entire length of the linear hot cathode without imposing unnecessary load on the cathode.

[Brief explanation of drawings]

FIG. 1 is a diagram showing the electrode configuration and wiring diagram of a conventional matrix electron source, FIG. 2 is a diagram showing the electrode configuration and wiring diagram of an embodiment of the present invention, and FIG. 3 is a diagram showing the electrode configuration and wiring diagram of a matrix electron source of the present invention. FIG. 2 is a cross-sectional view of one embodiment showing an electrode configuration. DESCRIPTION OF SYMBOLS 1... Insulating substrate, 2... Electron beam control electrode, 3...
... Linear hot cathode, 4 ... Electron beam extraction electrode, 5
゜7...Through hole, 6...Grid electrode.

Claims (2)

[Claims] (1) A plurality of electron beam control electrodes arranged on the surface of an insulating substrate, a plurality of linear hot cathodes arranged almost orthogonally to the electron beam control electrodes, and a plurality of linear hot cathodes disposed on the surface of the insulating substrate; In an IJ wax source, an electron beam extraction electrode and an electron beam extraction electrode each having a through hole at a position corresponding to each intersection point where the hot cathodes intersect are arranged substantially parallel to each other.
A grid electrode having a through hole coaxial with the through hole of the electron beam extraction electrode is inserted between at least one of the electron beam control electrode, the linear hot cathode, and the electron beam extraction electrode. matrix electron source. (2) The IJ wax source according to claim (1), wherein the diameter of the through-hole in the grid electrode is larger than the diameter of the through-hole in the electron beam extraction electrode.