JPS6075320A - ガス選択透過性複合膜およびその製造方法 - Google Patents

ガス選択透過性複合膜およびその製造方法

Info

Publication number
JPS6075320A
JPS6075320A JP18320083A JP18320083A JPS6075320A JP S6075320 A JPS6075320 A JP S6075320A JP 18320083 A JP18320083 A JP 18320083A JP 18320083 A JP18320083 A JP 18320083A JP S6075320 A JPS6075320 A JP S6075320A
Authority
JP
Japan
Prior art keywords
plasma
gas
thin film
siloxane compound
composite membrane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18320083A
Other languages
English (en)
Japanese (ja)
Other versions
JPH038808B2 (es
Inventor
Shigeru Asako
茂 浅古
Koichi Okita
晃一 沖田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP18320083A priority Critical patent/JPS6075320A/ja
Publication of JPS6075320A publication Critical patent/JPS6075320A/ja
Publication of JPH038808B2 publication Critical patent/JPH038808B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0081—After-treatment of organic or inorganic membranes
    • B01D67/009—After-treatment of organic or inorganic membranes with wave-energy, particle-radiation or plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/12—Composite membranes; Ultra-thin membranes
    • B01D69/125—In situ manufacturing by polymerisation, polycondensation, cross-linking or chemical reaction
    • B01D69/127—In situ manufacturing by polymerisation, polycondensation, cross-linking or chemical reaction using electrical discharge or plasma-polymerisation

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
JP18320083A 1983-10-03 1983-10-03 ガス選択透過性複合膜およびその製造方法 Granted JPS6075320A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18320083A JPS6075320A (ja) 1983-10-03 1983-10-03 ガス選択透過性複合膜およびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18320083A JPS6075320A (ja) 1983-10-03 1983-10-03 ガス選択透過性複合膜およびその製造方法

Publications (2)

Publication Number Publication Date
JPS6075320A true JPS6075320A (ja) 1985-04-27
JPH038808B2 JPH038808B2 (es) 1991-02-07

Family

ID=16131516

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18320083A Granted JPS6075320A (ja) 1983-10-03 1983-10-03 ガス選択透過性複合膜およびその製造方法

Country Status (1)

Country Link
JP (1) JPS6075320A (es)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61111121A (ja) * 1984-11-02 1986-05-29 Toray Ind Inc 気体分離用複合膜
US4732841A (en) * 1986-03-24 1988-03-22 Fairchild Semiconductor Corporation Tri-level resist process for fine resolution photolithography
WO2023186616A1 (en) * 2022-03-29 2023-10-05 Fujifilm Manufacturing Europe Bv Gas separation membranes
WO2023186615A1 (en) * 2022-03-29 2023-10-05 Fujifilm Manufacturing Europe Bv Gas separation membranes
EP4357008A1 (en) 2022-10-20 2024-04-24 Seiko Epson Corporation Gas separation membrane

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5730528A (en) * 1980-07-30 1982-02-18 Toyota Central Res & Dev Lab Inc Vapor-separating member
JPS5781805A (en) * 1980-11-11 1982-05-22 Sumitomo Electric Ind Ltd Gas selective permeable composite membrane and its production
JPS586207A (ja) * 1981-07-06 1983-01-13 Sumitomo Electric Ind Ltd ガス選択透過性複合膜の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5730528A (en) * 1980-07-30 1982-02-18 Toyota Central Res & Dev Lab Inc Vapor-separating member
JPS5781805A (en) * 1980-11-11 1982-05-22 Sumitomo Electric Ind Ltd Gas selective permeable composite membrane and its production
JPS586207A (ja) * 1981-07-06 1983-01-13 Sumitomo Electric Ind Ltd ガス選択透過性複合膜の製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61111121A (ja) * 1984-11-02 1986-05-29 Toray Ind Inc 気体分離用複合膜
US4732841A (en) * 1986-03-24 1988-03-22 Fairchild Semiconductor Corporation Tri-level resist process for fine resolution photolithography
WO2023186616A1 (en) * 2022-03-29 2023-10-05 Fujifilm Manufacturing Europe Bv Gas separation membranes
WO2023186615A1 (en) * 2022-03-29 2023-10-05 Fujifilm Manufacturing Europe Bv Gas separation membranes
EP4357008A1 (en) 2022-10-20 2024-04-24 Seiko Epson Corporation Gas separation membrane

Also Published As

Publication number Publication date
JPH038808B2 (es) 1991-02-07

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