JPS6075152U - 自動車のグロ−ブボツクス - Google Patents
自動車のグロ−ブボツクスInfo
- Publication number
- JPS6075152U JPS6075152U JP16794083U JP16794083U JPS6075152U JP S6075152 U JPS6075152 U JP S6075152U JP 16794083 U JP16794083 U JP 16794083U JP 16794083 U JP16794083 U JP 16794083U JP S6075152 U JPS6075152 U JP S6075152U
- Authority
- JP
- Japan
- Prior art keywords
- glove box
- box body
- actuator
- view
- car glove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Vehicle Step Arrangements And Article Storage (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16794083U JPS6075152U (ja) | 1983-10-29 | 1983-10-29 | 自動車のグロ−ブボツクス |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16794083U JPS6075152U (ja) | 1983-10-29 | 1983-10-29 | 自動車のグロ−ブボツクス |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6075152U true JPS6075152U (ja) | 1985-05-27 |
JPH0214513Y2 JPH0214513Y2 (enrdf_load_stackoverflow) | 1990-04-19 |
Family
ID=30367288
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16794083U Granted JPS6075152U (ja) | 1983-10-29 | 1983-10-29 | 自動車のグロ−ブボツクス |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6075152U (enrdf_load_stackoverflow) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6620723B1 (en) | 2000-06-27 | 2003-09-16 | Applied Materials, Inc. | Formation of boride barrier layers using chemisorption techniques |
US6551929B1 (en) | 2000-06-28 | 2003-04-22 | Applied Materials, Inc. | Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques |
US7101795B1 (en) | 2000-06-28 | 2006-09-05 | Applied Materials, Inc. | Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer |
US7405158B2 (en) | 2000-06-28 | 2008-07-29 | Applied Materials, Inc. | Methods for depositing tungsten layers employing atomic layer deposition techniques |
US6765178B2 (en) | 2000-12-29 | 2004-07-20 | Applied Materials, Inc. | Chamber for uniform substrate heating |
US6998579B2 (en) | 2000-12-29 | 2006-02-14 | Applied Materials, Inc. | Chamber for uniform substrate heating |
US6951804B2 (en) | 2001-02-02 | 2005-10-04 | Applied Materials, Inc. | Formation of a tantalum-nitride layer |
US6878206B2 (en) | 2001-07-16 | 2005-04-12 | Applied Materials, Inc. | Lid assembly for a processing system to facilitate sequential deposition techniques |
US6734020B2 (en) | 2001-03-07 | 2004-05-11 | Applied Materials, Inc. | Valve control system for atomic layer deposition chamber |
US7211144B2 (en) | 2001-07-13 | 2007-05-01 | Applied Materials, Inc. | Pulsed nucleation deposition of tungsten layers |
US6936906B2 (en) | 2001-09-26 | 2005-08-30 | Applied Materials, Inc. | Integration of barrier layer and seed layer |
US7049226B2 (en) | 2001-09-26 | 2006-05-23 | Applied Materials, Inc. | Integration of ALD tantalum nitride for copper metallization |
US6916398B2 (en) | 2001-10-26 | 2005-07-12 | Applied Materials, Inc. | Gas delivery apparatus and method for atomic layer deposition |
US6911391B2 (en) | 2002-01-26 | 2005-06-28 | Applied Materials, Inc. | Integration of titanium and titanium nitride layers |
US6833161B2 (en) | 2002-02-26 | 2004-12-21 | Applied Materials, Inc. | Cyclical deposition of tungsten nitride for metal oxide gate electrode |
US7439191B2 (en) | 2002-04-05 | 2008-10-21 | Applied Materials, Inc. | Deposition of silicon layers for active matrix liquid crystal display (AMLCD) applications |
US7262133B2 (en) | 2003-01-07 | 2007-08-28 | Applied Materials, Inc. | Enhancement of copper line reliability using thin ALD tan film to cap the copper line |
US20040198069A1 (en) | 2003-04-04 | 2004-10-07 | Applied Materials, Inc. | Method for hafnium nitride deposition |
JP2007523994A (ja) | 2003-06-18 | 2007-08-23 | アプライド マテリアルズ インコーポレイテッド | バリヤ物質の原子層堆積 |
-
1983
- 1983-10-29 JP JP16794083U patent/JPS6075152U/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH0214513Y2 (enrdf_load_stackoverflow) | 1990-04-19 |
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