JPS6066347A - Electron beam recorder for disc - Google Patents

Electron beam recorder for disc

Info

Publication number
JPS6066347A
JPS6066347A JP58172194A JP17219483A JPS6066347A JP S6066347 A JPS6066347 A JP S6066347A JP 58172194 A JP58172194 A JP 58172194A JP 17219483 A JP17219483 A JP 17219483A JP S6066347 A JPS6066347 A JP S6066347A
Authority
JP
Japan
Prior art keywords
electron beam
vacuum
small hole
sample room
sample chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58172194A
Other languages
Japanese (ja)
Inventor
Yuji Matsumoto
有史 松本
Toru Tojo
東条 徹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP58172194A priority Critical patent/JPS6066347A/en
Publication of JPS6066347A publication Critical patent/JPS6066347A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B9/00Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor
    • G11B9/10Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using electron beam; Record carriers therefor

Abstract

PURPOSE:To prevent vacuum in an electron optical lens barrel surely from being turned to atmospheric pressure by malfunction by forming a small hole on a smoothing plate between the electron optical lens barrel and a sample room and turning the sample room to atmospheric pressure through the small hole. CONSTITUTION:The smoothing body 3 having the small hole 11 is formed between the electron optical lens barrel 1 held in vacuum by a pump 4 and the sample room 2. The smoothing plate 3 is held by a differential exhaust system consisting of the high pressure air of a pipe A, the low cavuum exhaust of a pipe P1 and the high vacuum exhaust of a pipe P2 and seeled so as to be vacuum. If the whole sample room is moved to the right, the sample room 2 is turned to atmospheric pressure state through the small hole 11 under the condition that the vacuum state of the optical lens parrel 1 is held as it is. Under said condition, a substrate 8 is replaced, the whole sample room is returned to the original position, a vacuum pump 7 is started, and a prescribed pattern is drawn on a substrate 8 by electron beams 6. Consequently, the vaccum state of the lens barrel 1 can be surely prevented from being damaged by malfunction.

Description

【発明の詳細な説明】 〔発明の属する技術分野〕 本発明は、基板、特に円板状の基板上に(′1子ビーム
を用いて情報を描き込む円4π用1;T、子ビーノ・コ
1]録装汀に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical field to which the invention pertains] The present invention relates to a circular 4 1] Concerning recording.

〔従来技術とその問題点〕[Prior art and its problems]

従来、真空中にi6かれたICマスク、ウェハー郷の基
板を電子ビームを用いてn光し卆杓−ヒlIi二1(−
意のパターン情報を描画していくものど1.てr“・子
ビーム描画装置がある。−刀1回転日仮」二に、、l+
tj 衣を載置し、基板全回転させながら’(71子ビ
ーノ、7.r、 liiいて描画を行なう装置■がある
。このよつγ(装置?’fでFi真空中に回転動力を導
入すると同時(・τ、一方向に連続的に直進運動ケさせ
る必要がある。このような動力の導入方法は一般に−T
【かしくマた(1(1′?的にも複べ惟になる傾向にあ
る。さらに、基板を内f駕する試料室は描画中は真空、
基板を交換づ、イ1ときは大気と交互に繰返される。こ
の時、1へ子ビームを制御する電子光学鏡筒は大気にす
ることなしに連続して真空を保持することが望ましい。
Conventionally, an IC mask and a wafer substrate placed in a vacuum were exposed to light using an electron beam.
1. Drawing the desired pattern information. There is a child beam lithography device.-One rotation of the sword
There is a device ■ that performs drawing by placing a coating on the substrate and rotating it completely while rotating the substrate. Then, at the same time (・τ, it is necessary to continuously move linearly in one direction. Such a method of introducing power is generally -T
[However, there is a tendency for double damage to occur.Furthermore, the sample chamber that passes over the substrate is under vacuum during drawing
The substrate is replaced, and times A1 and A1 are repeated alternately with the atmosphere. At this time, it is desirable that the electron optical column for controlling the 1-heson beam be kept in a vacuum state continuously without being exposed to the atmosphere.

ナなツノち一度大気にしてその後真空にし電子銃をカロ
熱。
Once in the atmosphere, I vacuumed it up and heated the electron gun.

電子を引出し安定化させるeこは75為なりの時1¥J
1を有し、生産性が良< reいという欠点がある。壕
だ。
E, which extracts and stabilizes electrons, costs 1 yen when it is 75.
1, and has the disadvantage of good productivity. It's a trench.

エアバルブの操作によって誤って重子y仁字−f市を大
気にしてし貰うとい9小故が発生することもある。
Accidents may occur if air valves are operated incorrectly to make Shigeko Yinji-F city atmospheric.

〔発明の目的〕[Purpose of the invention]

本発明は尤珪、b、:を全体の(Ji造が1j(〕単で
、かつ基板の交換時の誤櫓作によって真空状態にある7
5′子つ“0学鏡筒が大気になることがない円板用1’
iV、子ビームa己録装倍を提供することにある。
In this invention, the entire (Ji structure is 1j()) and is in a vacuum state due to erroneous operation at the time of replacing the board.
5'1' for discs where the optical lens barrel does not become the atmosphere
iV, the objective is to provide a self-recording device for a child beam.

〔発明のノドλ要〕[Key to the invention]

本発明の骨子は、l・、子光学鏡筒と、基板を収めであ
る試料室との間に、1:3、子ビームが通過できる小孔
を設けた平滑板を設けるとともに、重子゛尤学鏡を帛と
平滑板、試料室と平滑板との開音それぞれ空気膜を形成
(−支持するとともに、差動排気により真空をシールす
るようにしたものである。こうすることによって、基板
を描画中は平滑板の小孔を通して電子ビームが照射され
、試別室内を大気にするときは、その小孔を移面さ(J
:差1j+、IJ’!、 l気の外側にもっていくこと
によって大気k ;’t’i人−することができ、小孔
から大気を導入してい2)と11,1−必らず′電子光
学鏡筒は差動排気に」:って7j7.”:に11+(た
力ていることになる。また回転11枢+iυ7:、1F
、17.I+、一方向]3動機格を大気中に設回して(
(q成できる。
The gist of the present invention is to provide a smooth plate with a small hole through which the secondary beam can pass in a 1:3 ratio between the secondary optical column and the sample chamber containing the substrate; An air film is formed (-) between the glass mirror and the smooth plate, and between the sample chamber and the smooth plate, and the vacuum is sealed by differential pumping.By doing this, the substrate is During drawing, an electron beam is irradiated through a small hole in the smooth plate, and when the atmosphere is created in the testing chamber, the small hole is moved to the surface (J
: Difference 1j+, IJ'! , the atmosphere can be removed by bringing it to the outside of the atmosphere, and the atmosphere is introduced through the small hole. "For exhaust": 7j7. ”: 11 +
, 17. I+, one direction] by placing a three-movement device in the atmosphere (
(q can be formed.

〔発明の効果〕〔Effect of the invention〕

本発明によi]、ば、 fi7子光学鏡筒とめ(H′が
の間に設けた差動排気によって支持さitだ平?61F
jの小孔の移動によって試料室を大気にしている−17
 、v) 、誤操作によって電子光学鏡筒金犬気に千る
ことがt!い。才だ、構造が簡単なたd)、操・作7ハ
容易で、生産性全向上できるなど利点が多い。
According to the present invention, it is supported by a differential pump provided between the optical lens barrel stopper (H') and the 61F
The sample chamber is made into an atmosphere by moving the small hole of j-17
,v) ,The electron optical lens barrel may be damaged due to incorrect operation! stomach. It has many advantages, such as its simple structure, easy operation, and the ability to improve productivity.

〔発明の実1布例〕 第1図は本発明の一実帷化1iに係わる円功、出目シ、
子ビーム記録装侃の概略構成図を示才ものである。
[Embodiment 1 of the invention] Fig. 1 shows the circular gong, the roll, and
A schematic diagram of the child beam recording equipment is shown.

主な構成として装置■は電子光学鏡筒1.試料室2゜平
滑板3とからなる。電子光学鏡筒1は通常ポンプ4で真
空に保たれており、τL子銃5から電子ビーム6を発し
、基板上に照射される。この電子ビムの0N10FF制
伺1 (4?に図示せず)によって基板上に悄鰻が揖き
込寸れる。試料室でも同様にポンプ7によって、′L1
c空に保たれており、基板8全塔載する回転円板97内
;嘉する。回転円板は聡動モータ10によって回tii
+i rΔ1動され、その間は磁性流体シール、あるい
は追動排気方式rr−ど適当な方法によって真空シール
されている。小′、子光学鏡愉1と試料パ2との間にけ
乎ct? t<ブ3があり、適当な位11なに′しμ子
ビームが通禍でき、かつ大気全2!訴人できる小孔11
が設けられている。平滑板3は= I+’4.子光学玲
筒1.試料室2と真?シールができかつ平面+1qlI
受としても作用するiE:ia+l排気システムによっ
て保持されている。すなわち図中への配管で示さノ]、
た部分には高圧孕気が供給され1例えば試料室2では第
2図で示された壽12に適当な流伝の高圧空気が供給さ
れ、平面静圧空気軸受が形成され、平7゛け仮3を試料
室、6子光学鏡筒から非接触で支持する。
The main configuration of the device (2) is an electron optical lens barrel (1). It consists of a sample chamber 2° and a smooth plate 3. The electron optical lens barrel 1 is normally kept in a vacuum by a pump 4, and an electron beam 6 is emitted from a τL sub-gun 5, which is irradiated onto the substrate. The 0N10FF control 1 (not shown in 4) of this electron beam drives the eel into the substrate. Similarly, in the sample chamber, 'L1
Inside the rotating disk 97, which is kept empty and on which the entire substrate 8 is mounted; The rotating disk is rotated by the smart motor 10.
+irΔ1, and the space between them is vacuum-sealed by a suitable method such as a magnetic fluid seal or a follow-up exhaust system. Is there a place between the child optical mirror 1 and the sample 2? There is t<b3, and the μ-n beam can pass through an appropriate amount of 11, and the entire atmosphere is 2! Complainant's hole 11
is provided. The smooth plate 3 is = I+'4. Child optical lens tube 1. Sample chamber 2 and truth? Can seal and flat surface +1qlI
It is maintained by an iE:ia+l exhaust system which also acts as a drain. In other words, the piping shown in the figure],
For example, in the sample chamber 2, an appropriate flow of high-pressure air is supplied to the bearing 12 shown in FIG. 2, forming a planar static pressure air bearing, 3 is supported in a non-contact manner from the sample chamber and the hexagonal optical lens barrel.

真空側に流れ込む孕気fPxで示した配管により真空粗
引きを行ないP2で示した配管で高真空排気を行なう。
Air flowing into the vacuum side is roughly vacuumed through the piping indicated by fPx, and high vacuum evacuation is performed through the piping indicated by P2.

排気用ポンプでは特に図示(2てい1r(βが例えば拡
散ポンプ、クライオポンプなどがあげられる。このよう
な差動排気システムを(、°・“t IJ7 fること
によって平滑板金高48度で支持し、かつ真空シールも
行なうことができる。
In particular, the pump for evacuation is shown in the figure (2 and 1r (β is, for example, a diffusion pump, a cryopump, etc.). However, vacuum sealing can also be performed.

このように構成した装Jet iJ’、次のJ:つ7r
1便作手11′:Aで使用する。回転円板ケ、l皐il
l シ、基板金1(11転さ、壮−電子ビームを基板上
に照射するとともに、試料県全体k ’rt’i’子光
学璋筒に対して第1図の失印の方間に連続移動させる。
Jet iJ' configured in this way, the following J:7r
1st work hand 11': Used in A. Rotating disk, l.
1. Turn the substrate metal 1 (11), irradiate the substrate with an electron beam, and continuously irradiate the entire sample area in the direction of the missing mark in Figure 1 with respect to the optical tube. move it.

試料ネを直゛州移匍Iオー(3−、ア、方法としては特
に図示していないが従来の枝別例えV、1゛モータの回
転をボールネジによって直進、悴辺lに1′える方法な
どがある。この移動量は原板の半1¥で十分である。基
板全面にわたって描画音光5U−ると、ポンプ7を停止
し通常は閉じているバ、lL7’J:′l全開け、平滑
板31動かし、小孔11ケ電子光学涜筒の差動排気シス
テムの外1jllに出す。こうすることによって試料室
は大気とγfす、基板8の5r侯が可能となる。このよ
′)な状態でも各々の差動1シ1気システムは停止さぜ
ない。次に平滑板3をゆっくり(具体的には試料型をあ
る程度排気する時間をかけて)元の位術に戻すと同時に
真空ポンプ7を作動させる。あらかじめ設定された真望
度になったら、パルプ132閉じる。小孔11が正画に
骨子ビームが通過できる位置に戻るとM rfr、回置
円板がrム〔・力し、づ苗り西が+;(始される。
The sample is moved directly to the state (3-, A. The method is not particularly shown, but it is a conventional branch-based example. etc.This amount of movement is sufficient for half the original board.When the drawing sound light is applied to the entire surface of the board by 5U, the pump 7 is stopped and the normally closed bar is fully opened. Move the smooth plate 31 to expose the 11 small holes to the outside of the differential pumping system of the electro-optic tube.By doing this, the sample chamber can be connected to the atmosphere and the substrate 8 can be separated from the substrate 8. Each differential 1-air, 1-air system will not stop even under normal conditions. Next, the smooth plate 3 is slowly returned to its original position (specifically, after taking some time to evacuate the sample mold), and at the same time, the vacuum pump 7 is activated. When the degree of truth set in advance is reached, the pulp 132 is closed. When the small hole 11 returns to the position where the skeleton beam can pass through the normal image, M rfr and the rotational disk are pressed, and the zunae west +; (starts.

このようT、Cil:’、111!4とすることによっ
て基板描Ii■後誤った」′j☆作を行なっても宣、子
光与鋭筒を大気にさらすことがない。上述した左動排気
システムは。
By setting T, Cil:', 111!4 in this manner, even if an incorrect 'j☆ operation is performed after drawing the board, the cylinder will not be exposed to the atmosphere. The left-handed exhaust system mentioned above.

−q−Φの平面静圧m気り111受であるので平γ11
板、試料室のイ6動は非電に清らかで移動精度が高いな
ど利点が多い。
-q-Φ plane static pressure m is 111, so flat γ11
The A6 motion of the plate and sample chamber has many advantages, such as non-electricity, clean movement, and high movement accuracy.

〔発明の他の実権例〕[Other examples of actual rights to inventions]

なお1本発明は上述した実施例に限足されるものではな
い。′・ツするに差動排気システムを尋人し、電子光学
(3筒と試料室の間に平滑板を設は平面窒気軸受をC,
l成し、平滑板に設けられた小孔と、電子光学鏡筒との
相対位jd f変えることによって試料室を大気にでき
るようにしたものでこの要旨を逸脱しない範囲で種々変
形して実施することができる。
Note that the present invention is not limited to the embodiments described above. ´・First, a differential pumping system was installed, and a smooth plate was installed between the electron optics (three cylinders and the sample chamber), and a planar nitrogen bearing was installed.
The sample chamber can be made into the atmosphere by changing the relative position between the small hole provided in the smooth plate and the electron optical column, and various modifications can be made without departing from the scope of this article. can do.

例えば上述した実施例では描1iji ’!47行ン7
りつためにFA料室を電子光学鏡筒に対して移動さ、l
ト窪が、試料室と平滑板全固定し、それらを一体で動か
(、でも良い。甘た差動排気システムは形状、溝造とも
各種考えられる。回転円板駆動方式もエア・タービンの
ように窒気を吹き出十ことによって回わくさせても良い
し、軸に溝状のスパイラルプルーブを設け1分子ポンプ
措造とすることによっ−C回早・;と同時に排気N能を
持1こせても良い。
For example, in the above-mentioned embodiment, 1iji'! 47 lines 7
The FA chamber was moved relative to the electron optical column in order to
Tokubo fixes the sample chamber and smooth plate completely and moves them as one unit. (It is also possible to move them together.) Various shapes and groove structures can be considered for the delicate differential exhaust system.The rotating disk drive system is also similar to an air turbine. It can be rotated by blowing out nitrogen gas, or by providing a groove-shaped spiral probe on the shaft and making it a single molecule pump, it is possible to increase the speed of rotation and at the same time have the ability to exhaust nitrogen. It's okay.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実加1例ン・示す概略構成図。 第2図は第11ン1のA−4断面がら下刃全押、たイ面
図である。 l・・・・電子光学鏡筒、2・・・試料室、3・・・・
’It滑板、4・・・・ポンプ、5・・笹子統、6・用
雷子ビーノ、7・・・・ポンプ、8・・・・基板、9・
・・・回転円オ反。 10・・・・回転駆動部、11・・・・小孔、12・・
・・溝13・・・・バルブ。
FIG. 1 is a schematic diagram showing one example of the implementation of the present invention. FIG. 2 is a top view of the 11th section A-4 section with the lower blade fully pressed. l...electron optical lens barrel, 2...sample chamber, 3...
'It sliding board, 4...Pump, 5...Sasako line, 6.Raiko Bino, 7...Pump, 8...Board, 9.
...Rotating circle counter. 10...Rotation drive unit, 11...Small hole, 12...
...Groove 13...Valve.

Claims (3)

【特許請求の範囲】[Claims] (1)電子ビーム全回転中の基板上に照射し、所望のパ
ターンを描画する円板用電子ビーム記録装備において、
基版全叔向し回転する回転デープルを内蔵した試料室と
、電子ビームを発生、集中する電子光学f、、1! f
IrTと、1)」肥試料室と前記f:L子光学鏡筒との
間に配Hされ差動排気を用いて浮上、真空シールし、電
子ビームが通ゴυ可能な小孔を有する円滑板とを具備し
アこことをI!?徴とする円板用電子ビー ム エ己ζ
子売足ff10
(1) In disk electron beam recording equipment that irradiates a substrate with an electron beam during full rotation to draw a desired pattern,
A sample chamber with a built-in rotating daple that rotates in the direction of the entire base plate, and an electron optical system f, which generates and focuses an electron beam, 1! f
IrT and 1) A circle arranged between the sample chamber and the f:L optical column, floated and vacuum-sealed using differential pumping, and has a small hole through which the electron beam can pass. Equipped with a sliding board and a here! ? Electron beam for discs with characteristics
child sale foot ff10
(2)円滑板を4z動させ゛重子光学鏡筒と前記円滑板
との間に設けた差1“す1排気γ;じの外fiilに小
孔を移へ力させることによって試料堅を大気にすること
を特1り(とじた特許請求のfii1!囲2>y、 1
項記載の円板用電子ビーム記録装悄゛。
(2) By moving the smooth plate by 4 degrees and forcing the small hole in the same outside film to move the sample into the atmosphere. (fii1 of the closed patent claim! Box 2>y, 1
Electron beam recording device for disks described in Section 1.
(3)回転テーブルの回転と同時に回転デープルを一方
向に移動すえときは試料室全体t′α子光学鈍筒と相対
的に移動させることを特命とする(Jl’(n’l: 
l、、請求の範囲第1項記載の円板用1′:!子ビーノ
・記ら巧f″i、
(3) When moving the rotary table in one direction at the same time as the rotary table rotates, the special order is to move the entire sample chamber relative to the t'α beam (Jl'(n'l:
l, 1' for discs according to claim 1:! Child Bino・Kira Takumi f″i,
JP58172194A 1983-09-20 1983-09-20 Electron beam recorder for disc Pending JPS6066347A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58172194A JPS6066347A (en) 1983-09-20 1983-09-20 Electron beam recorder for disc

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58172194A JPS6066347A (en) 1983-09-20 1983-09-20 Electron beam recorder for disc

Publications (1)

Publication Number Publication Date
JPS6066347A true JPS6066347A (en) 1985-04-16

Family

ID=15937317

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58172194A Pending JPS6066347A (en) 1983-09-20 1983-09-20 Electron beam recorder for disc

Country Status (1)

Country Link
JP (1) JPS6066347A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62189649A (en) * 1986-02-17 1987-08-19 Hitachi Ltd Electron beam recording and reproducing device
EP1152417A2 (en) * 2000-03-02 2001-11-07 Sony Corporation Electron beam irradiation apparatus, electron beam irradiation method, original disk, stamper, and recording medium
KR100524265B1 (en) * 1999-04-19 2005-10-26 에이에스엠엘 네델란즈 비.브이. Isolation mounts for use with vacuum chambers and their application in lithographic projection apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62189649A (en) * 1986-02-17 1987-08-19 Hitachi Ltd Electron beam recording and reproducing device
KR100524265B1 (en) * 1999-04-19 2005-10-26 에이에스엠엘 네델란즈 비.브이. Isolation mounts for use with vacuum chambers and their application in lithographic projection apparatus
EP1152417A2 (en) * 2000-03-02 2001-11-07 Sony Corporation Electron beam irradiation apparatus, electron beam irradiation method, original disk, stamper, and recording medium
EP1152417A3 (en) * 2000-03-02 2001-11-28 Sony Corporation Electron beam irradiation apparatus, electron beam irradiation method, original disk, stamper, and recording medium
US7034319B2 (en) 2000-03-02 2006-04-25 Sony Corporation Electron beam irradiation apparatus, electron beam irradiation method, original disk, stamper, and recording medium

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