JPS606462A - Gravure process printing system - Google Patents

Gravure process printing system

Info

Publication number
JPS606462A
JPS606462A JP11542383A JP11542383A JPS606462A JP S606462 A JPS606462 A JP S606462A JP 11542383 A JP11542383 A JP 11542383A JP 11542383 A JP11542383 A JP 11542383A JP S606462 A JPS606462 A JP S606462A
Authority
JP
Japan
Prior art keywords
etching
aqueous solution
cupric chloride
chloride
hydrochloric acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11542383A
Other languages
Japanese (ja)
Inventor
Tatsuo Shigeta
龍男 重田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHINKU LAB KK
Original Assignee
SHINKU LAB KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHINKU LAB KK filed Critical SHINKU LAB KK
Priority to JP11542383A priority Critical patent/JPS606462A/en
Publication of JPS606462A publication Critical patent/JPS606462A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To obtain screen wires of sizes of 6-12mum without cutting by a method in which a plate after forming a resist is subjected to an etching process using an aqueous solution containing 300g/1,000cc or more of cupric chloride and a specific amount of hydrochloric acid. CONSTITUTION:Using an aqueous solution containing 300g/1,000cc or more of cupric chloride and hydrochloric acid in an amount enough to keep cuprous chloride to be chemically changed by the cupric chloride during the processing period in dissolved state in the liquid, a plate after forming a resist is etched. Since the cupric chloride is chamically changed into insoluble cuprous chloride during the processing period, it is necessary to add hydrochloric acid as an aid in order to keep the cuprous chloride in the dissolved state. The etching process used includes Morton Roller touch method, shower spray method, etc., and the preferred temperature of the etching liquid is 25-35 deg.C.

Description

【発明の詳細な説明】 〈発明の背景〉 技術分野 本発明は、塩化第二銅の水溶液でエツチング加工するグ
ラビア製版法に関する。
DETAILED DESCRIPTION OF THE INVENTION <Background of the Invention> Technical Field The present invention relates to a gravure plate-making method in which etching is performed using an aqueous solution of cupric chloride.

従来技術 塩化物系のエツチング液には°塩化第二鉄の水溶液と、
塩化第二銅の水溶液とがある。
Conventional technology Chloride-based etching solutions include an aqueous solution of ferric chloride,
There is also an aqueous solution of cupric chloride.

しかしながら、塩化第二銅の水溶液は、印刷配線板のエ
ツチング加工に使用されているが、グラビア印刷版のエ
ツチング加工に実用された例は全くない。
However, although an aqueous solution of cupric chloride has been used for etching printed wiring boards, it has never been put to practical use for etching gravure printing plates.

しかるに、塩化第二鉄の水溶液は液の(4生や廃液処理
が難しく、反対に塩化第二銅の水溶液は液の再生や廃液
処理が容易である。そこで1本発明者は塩化第二銅の水
溶液をグラビア印刷版のエンチング加工に実用したいと
考えた。
However, an aqueous solution of ferric chloride is difficult to process as a liquid (4) and waste liquid, whereas an aqueous solution of cupric chloride is easy to regenerate and treat as a waste liquid. We wanted to put this aqueous solution to practical use in the etching process of gravure printing plates.

このため、印刷配線板のエツチング加l°に使用されて
いる濃度範囲のm化第二銅の水溶液を作り、グラビア印
刷版のエツチング加工に実用できるエツチング液として
好ましいかどうかの実験を行った。
For this reason, an aqueous solution of cupric chloride in a concentration range used for etching printed wiring boards was prepared, and an experiment was conducted to determine whether it was suitable as an etching solution that could be used practically for etching gravure printing plates.

この実験は、1,0OOGC: ′!4Iりに塩化第二
銅をそれぞれ100g、150g、200g含み、かつ
塩酸をいずれも40g含む低濃度、中濃度、高濃度の三
種類の水溶液を作り、三通り行った。
This experiment was 1,0OOGC: '! Three types of aqueous solutions containing 100 g, 150 g, and 200 g of cupric chloride, respectively, and 40 g of hydrochloric acid, low concentration, medium concentration, and high concentration, were prepared for 4I, and the test was carried out in three ways.

しかしながら、いずれの場合も30ミクロンの深さのセ
ルを得るのに20分以上かかってしまった。
However, in both cases, it took more than 20 minutes to obtain cells with a depth of 30 microns.

これに対し、現在行っている塩化第二鉄の水溶液による
エツチング加工時間は、同しセルを得るのに3分ないし
4分なので、塩化第二銅の水溶Iαは印刷配線板のエツ
チング加工に使用されている濃度ではとても実用に供し
得ないことが分った。
On the other hand, the current etching process using an aqueous solution of ferric chloride takes 3 to 4 minutes to obtain the same cell, so the aqueous solution Iα of cupric chloride is used for etching printed wiring boards. It was found that the concentration given above was not practical.

他方、シャドウ部の解像度を極めて高くするにはドツト
%を75%〜85%に高める必要があるが、そうすると
土手幅は6ミクロン〜12ミクロンにする必要がある。
On the other hand, in order to make the resolution of the shadow part extremely high, it is necessary to increase the dot percentage to 75% to 85%, which requires the bank width to be 6 to 12 microns.

しかるに、塩化第二鉄の水溶液は、サイドエッチが大き
いため土手幅を6ミクロン〜12ミクロンにする場合の
エツチング時間の管理やその他の条件の設定が大変難し
いものとなっており、管理やその他の条件の設定が悪い
と、スクリン線が切れてしまうことが度々ある。
However, since the aqueous solution of ferric chloride has a large side etch, it is very difficult to manage the etching time and set other conditions when increasing the bank width from 6 to 12 microns. If the conditions are set incorrectly, the screen line may often break.

〈発明の目的〉 本発明は、上述した点に鑑み案出したもので、エツチン
グ時間が現在行っている塩化第二鉄の水溶液とほぼ同等
に短く実用的であり、しかも塩化第二鉄の水溶液に比へ
てエツチング時間管理やその他の条件の設定が容易であ
り、6ミクロン〜12ミクロンと極めて細いスクリン線
を切れることなく良好に得られるグラビア製版法を提供
するものである。
<Object of the Invention> The present invention was devised in view of the above-mentioned points, and is practical because the etching time is almost as short as the aqueous solution of ferric chloride that is currently used. The purpose of the present invention is to provide a gravure plate making method in which etching time management and other conditions can be easily set, and extremely thin screen lines of 6 to 12 microns can be obtained without cutting.

〈発明の構成〉 本発明のグラビア製版法は、1,0000(1:当り3
00g以上の塩化第二銅と、加工中に該塩化第二銅より
化学変化する塩化第一銅を液中に溶解状態に維持する必
要量の塩酸とを含んでいる水溶液で、レジスト形成後の
版材をエツチング加工することを特徴とするものである
<Structure of the invention> The gravure plate making method of the present invention has a production capacity of 1,0000 (1:3 per
An aqueous solution containing 00g or more of cupric chloride and the necessary amount of hydrochloric acid to maintain the cuprous chloride, which is chemically changed from the cupric chloride during processing, in a dissolved state in the solution. This method is characterized by etching the plate material.

1.000CC:当り300g以上の塩化第二銅を含ん
でいる水溶液に限定したのは、以下の実験により決めた
ものである。
The aqueous solution containing 300 g or more of cupric chloride per 1.000 CC was determined based on the following experiment.

溶液1,0OOC:C当り40gの塩酸を含むように維
持しつつ、塩化第二銅を250gから25g毎に段階的
に増した他種類の水溶液を作り、液温を30°Cに保っ
て、TPR上のセル径が25ミクロンの版材と38ミク
ロンの試験片(版材)を選びエンチング加工して、f!
!化第化第二本溶液の濃度と、エツチング時間との関係
を調べたところ、 塩化第二銅を350g含む水溶液では、5分ないし6分
間で良好なエツチングができることが確認され、塩化第
二銅を300g含む水溶液では、8分ないし10分間で
良好なエツチングができることが確認され、塩化第二銅
をそれぞれ250g、275g含む水溶液では、15分
以上でもエツチングが良好に進まないことが確認され、
また、塩化第二銅を375g以上含む水溶液では350
g含む水溶液と比べてエツチング時間を短縮できなかっ
たことが確認され、そして、500g位含むと飽和点と
なることがことが確認され、以上の結果から、塩化第二
銅を300g以上含む水溶液でないと時間的にグラビア
製版法に実用的でないことが確認された。
While maintaining the solution to contain 40 g of hydrochloric acid per 1,0 OOC:C, prepare other types of aqueous solutions in which cupric chloride was increased stepwise from 250 g to 25 g, and the solution temperature was maintained at 30 ° C. A plate material with a cell diameter of 25 microns and a test piece (plate material) on TPR with a cell diameter of 38 microns were selected and etched, and f!
! When we investigated the relationship between the concentration of the second chemical solution and the etching time, it was confirmed that an aqueous solution containing 350 g of cupric chloride can perform good etching in 5 to 6 minutes. It was confirmed that good etching could be achieved in 8 to 10 minutes with an aqueous solution containing 300 g of cupric chloride, and that etching did not proceed well even after 15 minutes with aqueous solutions containing 250 g and 275 g of cupric chloride, respectively.
In addition, for an aqueous solution containing 375 g or more of cupric chloride, 350
It was confirmed that the etching time could not be shortened compared to an aqueous solution containing about 500g of copper chloride, and it was confirmed that the saturation point was reached when the etching content was about 500g.From the above results, it was confirmed that the etching time was not shortened compared to an aqueous solution containing more than 300g of cupric chloride. It was confirmed that the gravure plate making method was not practical in terms of time.

本発明において、エツチング液として、塩化第二銅の水
溶液を選択したのは、現在、印刷配線板のエツチング加
工に実用されている塩化第二銅の水溶液をグラビア製+
1lii法にも実用化して液の再生や廃液処理を容易に
したいと考えたために外ならない。
In the present invention, an aqueous solution of cupric chloride was selected as the etching solution because the aqueous solution of cupric chloride, which is currently used in the etching process of printed wiring boards, was used in gravure
This is because they wanted to put it to practical use in the 1lii method to facilitate liquid regeneration and waste liquid treatment.

塩化第二銅は、加工中に不水溶性の塩化第一銅に1ヒ学
変化するので、塩化第一銅が溶解状態に維持されるよう
助剤として塩酸を含ませておく必要かある。しかし、こ
の塩酸の量は1,00.QC:C当り30名ないし40
gとすることが好ましいが、特に限定するものではない
。溶解状態に維持される必要j11の塩酸とを含んでい
れば良い。
Since cupric chloride is converted into water-insoluble cuprous chloride during processing, it is necessary to include hydrochloric acid as an auxiliary agent to maintain cuprous chloride in a dissolved state. However, the amount of this hydrochloric acid is 1,00. QC: 30 to 40 people per C
Although it is preferable to set it as g, it does not specifically limit. It is sufficient as long as it contains the required amount of hydrochloric acid to be maintained in a dissolved state.

エツチング法は、モルトンローラタッチ式、シャワース
プし・一式、とぶ1八式、バドル式のいずれによっても
良い。エツチング液の温度は25°C〜35°Cとする
のが良い。
The etching method may be a Molton roller touch method, a shower spray set, a Tobu 18 method, or a Badle method. The temperature of the etching solution is preferably 25°C to 35°C.

モルトンローラタッチ式及びエツチングでは版ロールの
回転数を5ORPM〜140 RPMとするごとかでき
、シャワースプレー式及びパドル式では110PP〜6
0PPM とすることができる。
For Molton roller touch type and etching, the plate roll rotation speed can be set to 5 ORPM to 140 RPM, and for shower spray type and paddle type, it can be set to 110 PP to 6.
It can be set to 0PPM.

〈発明の作用及び効果〉 以上説明してきた本発明のグラビア製版法の作用及び効
果は次の通りである。
<Operations and Effects of the Invention> The operations and effects of the gravure plate making method of the present invention explained above are as follows.

・尤・ エツチング加工昨間が10分以内であり、特に
1,0OOCG当り約350g以」二の塩化第二銅を含
む水溶液とすれば5分ないし6分であり、これは、塩化
第二銅の水溶液と比べて時間的作業性を無視できる有用
なものである。
・In particular, if the etching process takes less than 10 minutes, especially if the aqueous solution contains about 350 g or more of cupric chloride per 1,000 OOCG, it will take 5 to 6 minutes. This is a useful solution with negligible time and workability compared to an aqueous solution.

・Q) tji化第化第二本溶液を使用しているので液
の再生や廃液処理が容易である。
・Q) Since the second main solution of TJI Chemical is used, it is easy to regenerate the liquid and treat waste liquid.

且) 塩化第二鉄の水溶液を使用する従来法に比べて、
食刻作用が小さく、加工時間の管理しやすい。すなわち
、塩化第二鉄の水溶液を使用する従来法では食刻作用が
大きいので、加工時間の管理を怠ると、セルが深すぎる
とともにスクリン線が切れてしまうことになるが、本発
明によればそのようなことは生じない。塩化第二鉄の水
溶液を使用する従来法では35ミクロンの深さのセルと
するのに3分ないし4分かかるのに、本発明によれば3
5ミクロンの深さのセルとするのに7分ないし8分かか
り、また25ミクロンの深さのセルとするのに5分ない
し6分かかった。
and) Compared to the conventional method using an aqueous solution of ferric chloride,
The etching effect is small, making it easy to control processing time. In other words, in the conventional method using an aqueous solution of ferric chloride, the etching effect is large, and if the processing time is not controlled, the cells will become too deep and the screen wires will break, but with the present invention, No such thing will occur. In the conventional method using an aqueous solution of ferric chloride, it takes 3 to 4 minutes to form a cell with a depth of 35 microns, but according to the present invention, it takes 3 to 4 minutes to form a cell with a depth of 35 microns.
It took 7 to 8 minutes to create a 5 micron deep cell, and 5 to 6 minutes to create a 25 micron deep cell.

後述する実験の結果によれば、従来法では毎分約7ミク
ロンの速さでエツチングされ、本発明法では毎分約4ミ
クロンの速さでエツチングされ、本発明法の方がエツチ
ングの加工時間の管理が容易であることが確認できた。
According to the results of experiments described below, the conventional method etches at a speed of about 7 microns per minute, and the method of the present invention etches at a speed of about 4 microns per minute. It was confirmed that it is easy to manage.

したがってまた、本発明では10ミクロンないし25ミ
クロンの深さのセルを得ることが時間的に容易となる。
Therefore, the present invention also makes it easier in terms of time to obtain cells with a depth of 10 to 25 microns.

・4) 塩化第二鉄の水溶液を使用する従来法に比べて
、サイドエッチが極めて小さく、したがって、6ミクロ
ンないし12ミクロンの土手幅でも時間管理が容易にし
て得られるのみならず、その他の条件設定においても容
易となる。このため、最シャドウ部のドツト%を75%
〜85%に高めることが容易となり、シャドウ部の解像
度を大きく高められることにつながった。6ミクロンな
いし12ミクロンの土手幅でも良好に得られシャドウ部
の解像度を大きく高められることに゛つながったのは全
く予期できない好ましい結果であった。
・4) Compared to the conventional method using an aqueous solution of ferric chloride, the side etch is extremely small, and therefore not only can bank widths of 6 to 12 microns be obtained with easy time management, but also other conditions It also becomes easier to set up. For this reason, the dot percentage of the most shadow part is set to 75%.
It became easy to increase the resolution to ~85%, which led to a significant increase in the resolution of shadow areas. This was a totally unexpected and favorable result, which led to the fact that good results were obtained even with bank widths of 6 to 12 microns, and the resolution of the shadow area was greatly improved.

第1図は、1インチ当り175本あるスクリン線でかつ
ポジ」二のド・ント%が80%であるレジストを形成し
た版材を塩化第二銅を350g含む水溶液でエツチング
して得たグラビア版を、光学顕微鏡で見た写真である。
Figure 1 shows a gravure plate obtained by etching a plate material with a resist having 175 screen lines per inch and a positive dot percentage of 80% using an aqueous solution containing 350 g of cupric chloride. This is a photograph of the plate viewed with an optical microscope.

土手幅を測定したところ8ミクロンであった。また、こ
の写真から分かるように、塩化第二銅の水溶液によれば
、土手幅が極めて小さいにもかかわらず土手が切れるこ
となく良好にエツチングできることが確認された。
The width of the bank was measured and was 8 microns. Furthermore, as can be seen from this photo, it was confirmed that using an aqueous solution of cupric chloride, the bank could be etched well without being cut, even though the width of the bank was extremely small.

また、第2図は、第1図のグラビア版を断面して光学顕
微鏡で見た写真である。この写真から分かるよう)こ、
塩化第二銅の水溶液によれば、サイドエッチが全くない
しかもハードドツトなセルを得ることができた。したが
って、深度が小さくてもインキの被印刷物への転移が良
好となり、セルを浅くエツチングすることと好ましく合
致する結果となった。
Moreover, FIG. 2 is a cross-sectional photograph of the gravure plate shown in FIG. 1, as seen with an optical microscope. As you can see from this photo)
Using an aqueous solution of cupric chloride, it was possible to obtain a cell with no side etching and a hard dot. Therefore, even if the depth is small, the ink transfer to the printed material is good, and the results are in good agreement with etching the cells shallowly.

本発明者は塩化第二銅の水溶液を採用すると、従来法に
比べて、食刻作用・サイドエッチが小さいことはある程
度予想していたが、第2図の写真の如き理想的なセルが
得られるとは全く予想外であった。
The inventor had expected to some extent that the use of an aqueous solution of cupric chloride would result in less etching and side etching than in the conventional method, but the ideal cell as shown in the photograph in Figure 2 was obtained. It was completely unexpected.

句 塩化第二鉄の水溶液を使用する従来法に比べて、深
度がセル径に応じて好ましく相違することとなる。
Compared to the conventional method using an aqueous solution of ferric chloride, the depth preferably varies depending on the cell diameter.

第3図(a)は、サイドエッチについて従来法と本発明
のグラビア製版法を比べた実験結果を示す図で、従来法
で7分間エツチングし、本発明法では7分間エツチング
した場合であり、第4図(a)は従来法で5分間エツチ
ングし、本発明法では9分間エツチングした場合である
。それぞれ、縦軸にエツチング径を目盛り、横軸にTP
R(感材名)上のセル径を目盛った。
FIG. 3(a) is a diagram showing the experimental results comparing the conventional method and the gravure plate making method of the present invention regarding side etching, where etching was performed for 7 minutes using the conventional method and 7 minutes using the method of the present invention. FIG. 4(a) shows the case where etching was performed for 5 minutes using the conventional method and for 9 minutes using the method of the present invention. The vertical axis shows the etching diameter, and the horizontal axis shows the TP.
The cell diameter on R (name of sensitive material) was calibrated.

また、第3図(b)は、第3図(a)に対応するセルの
深度を測定した図であり、第4図(b)は、第4図(a
)に対応するセルの深度をΔ11定した図であり、縦軸
に深度を目盛り、横軸にTPR(感材名)上のセル径を
目盛った。
Moreover, FIG. 3(b) is a diagram obtained by measuring the depth of the cell corresponding to FIG. 3(a), and FIG. 4(b) is a diagram showing the measured depth of the cell corresponding to FIG.
) is a diagram in which the depth of the cell corresponding to .

これらの図において、線1.3は従来法であり、線2.
4は本発明のグラビア製版法を示す。
In these figures, line 1.3 is the conventional method, line 2.
4 shows the gravure plate making method of the present invention.

第3図(a)及び第4図(a)は、点線で示す45度に
傾刺した直線より上側にエツチング径がくればサイドエ
ッチが生じていることを示し、線1と線2とから本発明
のグラビア製版法の方がサイドエッチが少いことが分る
Figures 3(a) and 4(a) show that side etching has occurred if the etching diameter is above the straight line inclined at 45 degrees, indicated by the dotted line, and from line 1 and line 2. It can be seen that the gravure plate making method of the present invention causes less side etching.

また、1!3と線4とから本発明のグラビア製版法の方
がセル径が55ミクロン以下で良好であることが分る。
Further, from 1!3 and line 4, it can be seen that the gravure plate making method of the present invention is better when the cell diameter is 55 microns or less.

・穀 本発明のグラビア製版法は、土手幅が6ミクロン
ないし12ミクロンでも良好に得られるので、グラビア
印刷が食品包装印刷業界で70%内外使用されている現
状において健康やインキ乾燥の省エネルギーに極めて効
果的である。
・Grain The gravure plate making method of the present invention can be obtained satisfactorily even when the bank width is 6 to 12 microns, so it is extremely effective for health and energy saving for ink drying in the current situation where gravure printing is used in 70% of the food packaging printing industry. Effective.

すなわち、従来法で印刷した包装にインキに残留してい
る有機溶剤をガスクロマトグラフィーで測定したところ
、3 m gあったのに対し、本発明のグラビア製版法
で同じ材質の包装の同じ印刷画像を印刷して乾燥を全く
同一条件で行った後、インキに残留している有機溶剤を
ガスクロマトグラフィーで測定したところ、0.5mg
あった。
That is, when the amount of organic solvent remaining in the ink on a package printed using the conventional method was measured using gas chromatography, it was found to be 3 mg, whereas when the same printed image on a package made of the same material was printed using the gravure platemaking method of the present invention, it was found to be 3 mg. After printing and drying under the same conditions, the amount of organic solvent remaining in the ink was measured using gas chromatography, and it was found to be 0.5 mg.
there were.

これは、本発明のグラビア製版法が従来法に比べてセル
深度を従来法よりもはるかに浅くできるからであり、本
発明のグラビア製版法で印刷した包装そのものが健康上
好ましい結果となるだけでなく、乾燥によって空気中に
排出されるインキに含まれていた有機溶剤を原因とする
窒素酸化物の低減にも繋がり健康上好ましく、さらに、
もしも従来法で印刷した包装にインキに残留している有
機溶剤を本発明のグラビア製版法における量にまで低減
させることを考えると、乾燥エネルギーは残留有機溶剤
の2乗倍に比例するので、極めて省エネルギーとなる。
This is because the gravure plate-making method of the present invention can make the cell depth much shallower than the conventional method, and the packaging itself printed by the gravure plate-making method of the present invention has favorable health results. This is good for health as it reduces nitrogen oxides caused by organic solvents contained in the ink that is discharged into the air during drying.
If we were to reduce the amount of organic solvent remaining in the ink on packaging printed using the conventional method to the amount used in the gravure printing method of the present invention, the drying energy would be proportional to the square of the residual organic solvent, so it would be extremely It saves energy.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、1インチ当り175本あるスクリン線でかつ
ポジ上のドツト%が80%であるレジストを形成した版
材を本発明のグラビア製版法で加工処理して得たグラビ
ア版を、光学顕微鏡で見た写真である。 第2図は、第1図のグラビア版を断面して光学顕微鏡で
見た写真である。 第3図(a)は、サイドエッチについて従来法と本発明
のグラビア製版法を比べた実験結果を示す図で、従来法
で7分間エツチングし、未発Qll法では7分間エツチ
ングした場合であり、第4図(a)は従来法で5分間エ
ツチングし1本発明法では9分間エツチングした場合で
あり、第3図(b )は、第3図(a)に対応するセル
の深度を測定した図であり、第4図(b)は、第4図(
a)に対応するセルの深度を測定した図である。 特許出願人 株式会社シンク・ラボラド9−代理人弁理
士 大 沼 浩 司 −手 糸光ネ山 j」冊書 昭和58年6月28日 II/3和58年6月27ト」に提出した特許罪3 補
止をする表 =1%件との関係 特許出願人 住所 千葉県相市十余二字梅林810−1名称 株式会
社シンク・ラホラトリー 代表取締役 重 1)龍 男 4 代理人 郵便番号 107 T E L (03)
582−000!3自発 6 補止により増加する発明の数 なし7 補正の対象 願占に添伺した図面 8 補正の内容 第11ffi及び第2図(いずれも写真)の添伺を忘れ
たので補充する。
Figure 1 shows a gravure plate obtained by processing a plate material with a resist having 175 screen lines per inch and a positive dot percentage of 80% using the gravure plate making method of the present invention. This is a photo taken with a microscope. FIG. 2 is a cross-sectional photograph of the gravure plate shown in FIG. 1, taken with an optical microscope. FIG. 3(a) is a diagram showing the results of an experiment comparing the conventional method and the gravure plate making method of the present invention regarding side etching. , Fig. 4(a) shows the case of etching for 5 minutes using the conventional method and 9 minutes of etching using the method of the present invention, and Fig. 3(b) shows the measurement of the depth of the cell corresponding to Fig. 3(a). FIG. 4(b) is a diagram of FIG.
It is a figure which measured the depth of the cell corresponding to a). Patent applicant Think Laborad Co., Ltd. 9 - Agent Hiroshi Onuma Patent attorney Hiroshi Onuma - Patent filed on June 28, 1980 II/3 June 27, 1981 Crime 3: Relationship with supplementary table = 1% Patent applicant address: 810-1 Umebayashi, Juyoji, Ai-shi, Chiba Prefecture Name: Think Lahoratory Co., Ltd. CEO Shige 1) Ryuo 4 Agent Postal code: 107 T E L (03)
582-000!3 Spontaneous 6 Number of inventions increased by addition None 7 Drawing 8 attached to the application subject to amendment 8 Details of the amendment I forgot to attach Figure 11ffi and Figure 2 (both photos), so I added it. do.

Claims (1)

【特許請求の範囲】[Claims] 1.000C:C当り300g以上の塩化第二銅と、加
工中に該塩化第二銅より化学変化する塩化第一銅を液中
に溶解状、IBに維持する必要量の塩酸とを含んでいる
水溶液で、レジスト形成後の版材をエツチング加工する
ことを特徴とするグラビア製版法。
1.000C: Contains 300g or more of cupric chloride per C and the necessary amount of hydrochloric acid to maintain the cuprous chloride, which chemically changes from the cupric chloride during processing, in a dissolved state and at IB in the liquid. A gravure plate making method characterized by etching the plate material after resist formation using an aqueous solution.
JP11542383A 1983-06-27 1983-06-27 Gravure process printing system Pending JPS606462A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11542383A JPS606462A (en) 1983-06-27 1983-06-27 Gravure process printing system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11542383A JPS606462A (en) 1983-06-27 1983-06-27 Gravure process printing system

Publications (1)

Publication Number Publication Date
JPS606462A true JPS606462A (en) 1985-01-14

Family

ID=14662198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11542383A Pending JPS606462A (en) 1983-06-27 1983-06-27 Gravure process printing system

Country Status (1)

Country Link
JP (1) JPS606462A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6093335A (en) * 1996-08-28 2000-07-25 International Business Machines Corporation Method of surface finishes for eliminating surface irregularities and defects
US6547974B1 (en) * 1995-06-27 2003-04-15 International Business Machines Corporation Method of producing fine-line circuit boards using chemical polishing

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49138A (en) * 1972-04-20 1974-01-05
JPS53103942A (en) * 1977-02-22 1978-09-09 Matsushita Electric Ind Co Ltd Method and apparatus for etching of copper and copper alloy

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49138A (en) * 1972-04-20 1974-01-05
JPS53103942A (en) * 1977-02-22 1978-09-09 Matsushita Electric Ind Co Ltd Method and apparatus for etching of copper and copper alloy

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6547974B1 (en) * 1995-06-27 2003-04-15 International Business Machines Corporation Method of producing fine-line circuit boards using chemical polishing
US6093335A (en) * 1996-08-28 2000-07-25 International Business Machines Corporation Method of surface finishes for eliminating surface irregularities and defects

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