JPS606439Y2 - Mother plate for metal electrodeposition - Google Patents

Mother plate for metal electrodeposition

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Publication number
JPS606439Y2
JPS606439Y2 JP2633782U JP2633782U JPS606439Y2 JP S606439 Y2 JPS606439 Y2 JP S606439Y2 JP 2633782 U JP2633782 U JP 2633782U JP 2633782 U JP2633782 U JP 2633782U JP S606439 Y2 JPS606439 Y2 JP S606439Y2
Authority
JP
Japan
Prior art keywords
electrode
base
protrusion
plate
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2633782U
Other languages
Japanese (ja)
Other versions
JPS58128979U (en
Inventor
武 中川
和幸 高石
正勝 岡林
照明 白石
勝久 大西
Original Assignee
住友金属鉱山株式会社
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Priority to JP2633782U priority Critical patent/JPS606439Y2/en
Publication of JPS58128979U publication Critical patent/JPS58128979U/en
Application granted granted Critical
Publication of JPS606439Y2 publication Critical patent/JPS606439Y2/en
Expired legal-status Critical Current

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Description

【考案の詳細な説明】 本考案は金属を電着するための電着用母板に関し、特に
球状に近い電着金属を得るのに適した電着用母板に関す
る。
[Detailed Description of the Invention] The present invention relates to a mother plate for electrodeposition for electrodepositing metal, and particularly to a mother plate for electrodeposition suitable for obtaining electrodeposited metal having a nearly spherical shape.

ニッケルの電解精製においてニッケルの陰極析出物は通
常厚さ10m程度の平板状に電着されているため、これ
をニッケルメッキ用アノードとして用いる場合一般に小
片状にしてチタンバスケットに充填している。
In electrolytic refining of nickel, nickel cathode deposits are usually electrodeposited in the form of a flat plate with a thickness of about 10 m, so when used as an anode for nickel plating, they are generally formed into small pieces and filled into a titanium basket.

そのために電着したニッケル平板を例えば25rIrI
n角の小片に切断して市販している。
For this purpose, an electrodeposited nickel plate, for example 25rIrI
It is commercially available after being cut into n-square pieces.

しかしメッキ工場ではこの四角状の小片は尖った角があ
るためチタンバスケットに充填する場合や、アノードと
して使用中にバスケットのラスに引掛って棚吊りを起こ
腰バスケット内に空所を形成して充填率がさがり、電流
が均等にメッキ液に伝わらないために電流分布を乱して
、被メッキ物にメツキネ良を発生する事故を生ずる。
However, in plating factories, these square pieces have sharp edges, so when filling titanium baskets, or when using them as anodes, they get caught on the basket's lath and hang on the shelf, creating voids inside the basket. The filling rate decreases, and the current is not evenly transmitted to the plating solution, which disturbs the current distribution and causes accidents such as scratches on the plated object.

そこで近時切断不要で角のない電着物を得るための多く
の提案があり、例えば平板状の母板を絶縁体により規則
的に仕切って小型の電着物を得てこれを剥ぎ取る特公昭
44−1062号公報、特公昭45−1706涛公報に
記載の方法、また電気的に絶縁性のある平板の表面に多
数の円形または楕円形の導電性金属面を露出させて、こ
の部分に円盤状あるいは半球状の電着物を析出させる特
開昭52−15283涛公報、特開昭52−13192
4号公報、及び特開昭55−134185号公報に記載
の方法などもある。
In recent years, there have been many proposals for obtaining electrodeposited materials without cutting edges and without any corners. The method described in Japanese Patent Publication No. 1062 and Japanese Patent Publication No. 45-1706 is also used, in which a large number of circular or elliptical conductive metal surfaces are exposed on the surface of an electrically insulating flat plate, and this portion is shaped like a disk. Alternatively, JP-A-52-15283 and JP-A-52-13192 are used to deposit hemispherical electrodeposit.
There are also methods described in Japanese Patent Application Laid-Open No. 55-134185.

しかしながらこれらの製品も球形には程遠く、バスケッ
ト内に装入した場合の流動性が十分とは云えなかった。
However, these products were far from spherical and did not have sufficient fluidity when placed in a basket.

また一方完全に球状のニッケルを得る方法として電気ニ
ッケルを一旦電気炉等で溶解後、鋳造して製造されたも
のもあるが製造コストが大で極めて特殊な用途以外にに
は使用されていない。
On the other hand, as a method of obtaining completely spherical nickel, electrolytic nickel is melted in an electric furnace or the like and then cast, but this is expensive and is not used for anything other than very special purposes.

本考案は上述の問題点を解消し四角形状あるいは円盤状
、半球状の電着ニッケルと類似の製造コストで、より球
状に近い電気ニッケルを製造することのできる金属電着
用母板を提供するものである。
The present invention solves the above-mentioned problems and provides a metal electrodepositing base plate that can produce electrolytic nickel that is more spherical at a production cost similar to that of square, disk-shaped, or hemispherical electrodeposited nickel. It is.

以下この考案を図面について説明する。第1図、第2図
はこの考案による金属電着用母板の一実施例を示した図
で、1は電気の非伝導性材料でできた平板であって、こ
の両面に多数の截頭円錐状の突起2が同材料で連続させ
て形成されてる。
This idea will be explained below with reference to the drawings. Figures 1 and 2 are diagrams showing an embodiment of a metal electrodeposition base plate according to this invention, in which 1 is a flat plate made of an electrically non-conductive material, and a large number of truncated cones are formed on both sides of the flat plate. The protrusions 2 of the shape are continuously formed of the same material.

3は突起2の截頭面から突出して突起2の円錐を延長せ
しめた状態に形成された導電金属からなる電極である。
Reference numeral 3 designates an electrode made of a conductive metal that protrudes from the truncated surface of the projection 2 and extends the cone of the projection 2.

4は電極3の突起2内への延長部であって円柱状をなし
、平板1中に埋設された導電金属板5にねじで固定され
ている。
Reference numeral 4 denotes an extension of the electrode 3 into the protrusion 2, which has a cylindrical shape and is fixed to a conductive metal plate 5 embedded in the flat plate 1 with screws.

本実施例では非伝導性材料の平板1の両面の同一位置に
突起2が設けられていて、両側の同一位置にある電極3
は延長部4で連続し延長部4の中間のねじ部6で導電金
属板5に設けたねじ孔にねじ止めされている。
In this embodiment, projections 2 are provided at the same position on both sides of a flat plate 1 made of a non-conductive material, and electrodes 3 are provided at the same position on both sides.
is continuous in the extension part 4, and is screwed into a screw hole provided in the conductive metal plate 5 by a threaded part 6 in the middle of the extension part 4.

7は導電金属板5と電気的に接続された平板1の吊手で
平板1の端面より外部に延長し、端部に形成した屈曲部
で電解槽においてクロスバ−に懸吊される。
Reference numeral 7 denotes a hanging arm of the flat plate 1 which is electrically connected to the conductive metal plate 5 and extends outward from the end face of the flat plate 1, and is suspended from a crossbar in the electrolytic cell by a bent portion formed at the end.

非伝導性材料の平板1としては所謂プラスチックが戒型
上部合が良く、電解液に不活性で磨耗に強く、埋込金属
と十分適合しうる膨張係数を持ち、両材料が剥離しない
ようなものであれば何でもよい。
The flat plate 1 of non-conductive material is made of so-called plastic, which has a good fit, is inert to the electrolyte, is resistant to abrasion, has an expansion coefficient that is sufficiently compatible with the embedded metal, and does not allow the two materials to separate. Anything is fine.

このようなプラスチックとしてエポキシ、ポリウレタン
、ポリプロピレン、ポリエチレン、アクリル、ポリエス
テルなどが使用可能である。
Epoxy, polyurethane, polypropylene, polyethylene, acrylic, polyester, etc. can be used as such plastic.

導電金属の材質としてはステンレススチールやチタンが
適当で、これ等を用いると電着した金属を容易に剥離す
ることが可能である。
Stainless steel and titanium are suitable materials for the conductive metal, and when these are used, the electrodeposited metal can be easily peeled off.

平板1の表面に設ける突起2の円錐の頂角が鈍角であま
り大きくなりすぎると一般的に陰極となる電極3が大き
くなり、球状に近い電掃着物が得られ難くなる。
If the apex angle of the cone of the protrusion 2 provided on the surface of the flat plate 1 is an obtuse angle and becomes too large, the electrode 3, which serves as a cathode, will generally become large, making it difficult to obtain a nearly spherical electric sweep deposit.

これに対し突起2の円錐の頂角が鋭角であまり庄になり
すぎると球状に近い電着物は得られるが、大きな析出物
が得られず、且つ剥離かや)困難となって好ましくない
On the other hand, if the apex angle of the cone of the protrusion 2 is too acute and too sharp, an electrodeposit close to a spherical shape can be obtained, but a large precipitate cannot be obtained and peeling becomes difficult, which is not preferable.

平板1の表面に設ける突起2の基部の直径を大きくする
と、平板1の単位面積当りの電極3の個数が減少する他
、突起2の基部から電極3の頂面(点)までの高さも大
きくなり、電着用母板の全厚さも大となって電解槽中の
陰極のピッチが大となるので不利となる。
When the diameter of the base of the protrusion 2 provided on the surface of the flat plate 1 is increased, the number of electrodes 3 per unit area of the flat plate 1 decreases, and the height from the base of the protrusion 2 to the top surface (point) of the electrode 3 also increases. Therefore, the total thickness of the electrodeposition mother plate becomes large, and the pitch of the cathodes in the electrolytic cell becomes large, which is disadvantageous.

これに対して突起2の基部から電極3の頂面(点)まで
の全高があまり低いと円錐全体が小さくなり、加工上繁
雑となり、得られる電着物が小となる。
On the other hand, if the total height from the base of the protrusion 2 to the top surface (point) of the electrode 3 is too low, the entire cone becomes small, making processing complicated and resulting in a small electrodeposited product.

電極3の基部の外径をあまり小さくすると、初期の電流
密度を一定値以下にしたとき、初期の電着量が少なくて
能率が悪く、能率を上げるために電流密度を上げると瘤
状の電着物となって最終製品の形状が悪くなる。
If the outer diameter of the base of the electrode 3 is made too small, when the initial current density is lowered below a certain value, the initial amount of electrodeposition will be small and efficiency will be poor, and if the current density is increased to increase efficiency, lump-like electrodes will appear. When it becomes a kimono, the shape of the final product becomes poor.

従って一般に云えば非伝導性材料の突起2の基部の外径
は20〜4−1電極3の基部の外径は突起2の基部の外
径の175〜1h程度、すなわち4〜20耽、突起2の
基部から電極3の頂面(点)までの全高は10〜20m
m程度が好ましい。
Therefore, generally speaking, the outer diameter of the base of the protrusion 2 made of non-conductive material is about 20 to 4-1. The total height from the base of electrode 2 to the top surface (point) of electrode 3 is 10 to 20 m.
About m is preferable.

電極3の頂部の形状は必ずしも尖っていなくても良く、
尖端が第3図aのように球状化していてもまた、第3図
すのように平板1と平行に若干截頭されていても、また
電極3の露出した部分が第3図Cのように半球状、ある
いは第3図dのように電極3の基部の直径の1n程度の
高さの球面状のものでも良く、いずれも前記寸法範囲に
入るものであればよい。
The shape of the top of the electrode 3 does not necessarily have to be sharp;
Even if the tip is spherical as shown in Fig. 3a, or slightly truncated parallel to the flat plate 1 as shown in Fig. 3, or the exposed part of the electrode 3 is spherical as shown in Fig. 3C. It may be hemispherical, or it may be spherical with a height of about 1n of the diameter of the base of the electrode 3 as shown in FIG.

電極3と一体をなす延長部4と導電金属板5との結合は
ねじ止め、溶接等電気的に接続されていれば何でも良い
The extension portion 4 integral with the electrode 3 and the conductive metal plate 5 may be connected by any method such as screwing, welding, etc. as long as they are electrically connected.

導電金属板5は単なる平板でも格子形平板であっても良
い。
The conductive metal plate 5 may be a simple flat plate or a lattice-shaped flat plate.

平板1の表面に設ける突起2の位置や数は特に規定され
るものではないが、電着物がもつとも効率よく得られる
ように配慮することが好ましく、突起2の数はできるだ
け多く、且つ相互に接近していることが望ましい。
The position and number of protrusions 2 provided on the surface of the flat plate 1 are not particularly specified, but it is preferable to take care to ensure that the electrodeposited material can be obtained as efficiently as possible, and the number of protrusions 2 should be as large as possible and close to each other. It is desirable that you do so.

しかしながら突起2の円錐の傾斜途中に段をつけて基部
の寸法を第5図aに示すように大きくしたり、円錐基部
のみ第5図すに示すように直径を絞ったり、また突起2
の傾斜と電極3側面の傾斜を第5図c、dに示すように
変えてもよく、これらの場合も本考案に包含される。
However, it is possible to increase the size of the base by adding a step in the middle of the slope of the cone of the projection 2, as shown in FIG.
The inclination of the electrode 3 and the inclination of the side surface of the electrode 3 may be changed as shown in FIGS. 5c and 5d, and these cases are also included in the present invention.

本考案による電着用母板を使用して電解を行なうと、電
極3の表面に電着金属が析出をはじめ、析出の増大と共
に突起2の表面に延長して析出が進行し、第4図に断面
を示すように従来製品よりもはるかに球状に近い電着物
が得られるので、適当な時期に母板を引揚げて、電着金
属に軽い衝撃を与えると容易に剥離して製品が得られる
When electrolysis is carried out using the electrodepositing base plate according to the present invention, electrodeposited metal begins to precipitate on the surface of the electrode 3, and as the precipitation increases, the precipitation progresses and extends to the surface of the protrusion 2, as shown in Fig. 4. As shown in the cross section, the electrodeposited material is much more spherical than conventional products, so if you pull up the base plate at an appropriate time and apply a light impact to the electrodeposited metal, it will peel off easily and the product will be obtained. .

初期の電流密度は電極3の表面積に対して2〜15A/
dy<が好ましく、あまり大とすると瘤状電着になり製
品の形状が悪くなる。
The initial current density is 2 to 15 A per surface area of the electrode 3.
It is preferable that dy<; if it is too large, lump-like electrodeposition will occur and the shape of the product will be poor.

本考案によれば電極3の露出面を大とすれば、1個の単
位重量がニッケル、銅であれば200g程度のものも製
造可能である。
According to the present invention, if the exposed surface of the electrode 3 is made large, it is possible to manufacture an electrode of about 200 g if the unit weight of one electrode is nickel or copper.

また本考案の金属電着用母板はニッケルに限らず、銅、
亜鉛、その他の金属にも使用できる。
In addition, the mother plate for metal electrodeposition of this invention is not limited to nickel, but also copper,
Can also be used for zinc and other metals.

以下使用例について述べる。An example of use will be described below.

使用例 1 ステンレス鋼板の表面に厚さ2rranのABS樹脂を
被覆した平板の一方の面には同じ(AS樹脂製の截頭円
錐で基部直径35mm、截頭部までの高さ16圏の突起
をピッチ3577I+71で設け、その頂部に5us3
16製の円錐の基部直径12rran、尖端部は半径3
1rgILに球状化した高さ6Nnの円錐形の電極を露
出させてステンレス鋼板に電気的に接続し、また他の一
方の面には基部直径29rrrm、截頭部までの高さ1
2閣の突起を他の面と同ピツチで設け、その頂部に露出
させた5US31曝円錐のの電極の寸法は上述の他の面
と同じとし、陽極としては、ニッケルマットアノードを
使用し、陰極陽極極間距離は200wnとして、陰極の
電着用母板はカソードボックス内に入れ、電解廃液は浄
液を行ない、カソードボックスへ給液する電解液の組成
条件をNi So4 C7Na H3BO3pH温度8
0125 65 40 10(1) 2.75 50〜
70℃とし、電極の表面積(1,M/個)に対して最初
は電流密度15A/ddで5日間、その後25A/d−
で2日間型着ニッケルを生長させた。
Usage example 1 One side of a stainless steel plate coated with ABS resin with a thickness of 2 rran is a truncated cone made of AS resin with a base diameter of 35 mm and a protrusion of 16 circles in height to the truncated head. Provided with a pitch of 3577I+71, and 5us3 on the top.
The base diameter of the cone made of 16 is 12 rran, and the tip has a radius of 3
A conical electrode with a height of 6Nn spherical at 1rgIL is exposed and electrically connected to the stainless steel plate, and on the other side is a conical electrode with a base diameter of 29rrrm and a height of 1 to the truncated head.
The dimensions of the 5US31 exposed conical electrode exposed at the top are the same as those for the other surfaces, and a nickel matte anode is used as the anode, and a nickel matte anode is used as the cathode. The distance between the anodes is 200wn, the mother plate for cathode electrodeposition is placed in the cathode box, the electrolytic waste liquid is purified, and the composition conditions of the electrolytic solution supplied to the cathode box are Ni So4 C7Na H3BO3 pH temperature 8
0125 65 40 10(1) 2.75 50~
At 70°C, the current density was initially 15 A/dd for 5 days, then 25 A/d- for the surface area of the electrode (1, M/piece).
The mold-deposited nickel was grown for 2 days.

7日後に母板を引揚げて電着物を剥離したところ第4図
に断面を示すような球状に近い重量32.0〜38.7
gの電気ニッケルが得られた。
After 7 days, the mother plate was pulled up and the electrodeposit was peeled off, resulting in a nearly spherical shape with a weight of 32.0 to 38.7 mm, as shown in the cross section in Figure 4.
g of electrolytic nickel was obtained.

使用例 2 使用例1と同じ金属電着用母板を用い、また使用例1と
同じ電解液組成と条件で、電流密度を電極の表面積(1
,7C7+!/個)に対して最初3A/d?71″で2
日間、その後?A/ddで1日間、9A/drIlで1
日間、28A/ d y4で1日間、50A/ d d
で2日間、20A/ d dで1日間の計8日間電着ニ
ッケルを生長させたところ、球状に近い40.0〜48
.4 gの電気ニッケルが得られた。
Usage Example 2 Using the same metal electrodeposition base plate as Usage Example 1, and using the same electrolyte composition and conditions as Usage Example 1, the current density was calculated by changing the electrode surface area (1
,7C7+! /piece) at first 3A/d? 2 in 71″
Days, then? A/dd for 1 day, 9A/drIl for 1 day
1 day at 28A/d d y4, 50A/d d
When the electrodeposited nickel was grown for 8 days, 2 days at 20A/dd and 1 day at 20A/dd, it grew to a nearly spherical shape of 40.0 to 48cm.
.. 4 g of electrolytic nickel was obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案による金属電着用母板の一実施例の一部
斜視図、第2図は第1図の縦断面図、第3図a、 by
C,dは電極の4つの実施例を示した側面図、第4図
は本考案による金属電着用母板への金属の電着状態を示
す断面図で、第5図a。 b、C,dは突起及び電極形状の他の4つの実施例を示
した側面図である。 1・・・・・・電気非伝導性材料からなる平板、2・・
・・・・1の突起、3・・・・・・電極、4・・・・・
・3の延長部、5・・・・・・導電金属板、6・・・・
・・ねじ部、7・・・・・・吊手。
Fig. 1 is a partial perspective view of an embodiment of the metal electrodepositing base plate according to the present invention, Fig. 2 is a longitudinal sectional view of Fig. 1, and Fig. 3 a, by.
C and d are side views showing four embodiments of the electrode, FIG. 4 is a cross-sectional view showing the state of metal electrodeposition on the metal electrodepositing base plate according to the present invention, and FIG. 5a is a side view showing four embodiments of the electrode. b, c, and d are side views showing other four examples of protrusion and electrode shapes. 1... Flat plate made of electrically non-conductive material, 2...
...Protrusion 1, 3...Electrode, 4...
・Extension part of 3, 5... conductive metal plate, 6...
...Threaded part, 7... Hanging hand.

Claims (1)

【実用新案登録請求の範囲】 (↓)電気非伝導性材料の平版の片面あるいは両面に多
数の截頭円錐状の突起を同材料で連続して形成し、該突
起の截頭頂部に突起と連続して基部外径4〜2oRの円
錐あるいは半球状の電極を形成し、該電極を前記平板中
に埋設した導電金属板に突起内を通して結合してなる金
属電着用母板。 (2)突起の円錐基部の外径が20〜4orfr!n、
電極の基部の外径が突起の基部の外径の175〜1/2
である実用新案登録請求の範囲(1)項記載の金属電着
用母板。 (3)突起の基部から電極の頂面(点)までの全高が1
0〜20wnである実用新案登録請求の範囲(1)項ま
たは(2)項に記載の金属電着用母板。
[Claims for Utility Model Registration] (↓) A large number of truncated cone-shaped protrusions are continuously formed on one or both sides of a flat plate made of electrically non-conductive material, and a protrusion is formed on the truncated top of the protrusion. A base plate for metal electrodeposition, in which a conical or hemispherical electrode with a base outer diameter of 4 to 2oR is continuously formed, and the electrode is bonded to a conductive metal plate embedded in the flat plate through a protrusion. (2) The outer diameter of the conical base of the protrusion is 20 to 4 orfr! n,
The outer diameter of the base of the electrode is 175 to 1/2 of the outer diameter of the base of the protrusion.
A metal electrodeposition base plate according to claim (1) of the utility model registration. (3) The total height from the base of the protrusion to the top surface (point) of the electrode is 1
The metal electrodeposition base plate according to claim (1) or (2) of the utility model registration claim, which has a molecular weight of 0 to 20 wn.
JP2633782U 1982-02-24 1982-02-24 Mother plate for metal electrodeposition Expired JPS606439Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2633782U JPS606439Y2 (en) 1982-02-24 1982-02-24 Mother plate for metal electrodeposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2633782U JPS606439Y2 (en) 1982-02-24 1982-02-24 Mother plate for metal electrodeposition

Publications (2)

Publication Number Publication Date
JPS58128979U JPS58128979U (en) 1983-09-01
JPS606439Y2 true JPS606439Y2 (en) 1985-03-01

Family

ID=30038297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2633782U Expired JPS606439Y2 (en) 1982-02-24 1982-02-24 Mother plate for metal electrodeposition

Country Status (1)

Country Link
JP (1) JPS606439Y2 (en)

Also Published As

Publication number Publication date
JPS58128979U (en) 1983-09-01

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