JPS6059929B2 - Surface treatment method for vinyl chloride resin molded products - Google Patents

Surface treatment method for vinyl chloride resin molded products

Info

Publication number
JPS6059929B2
JPS6059929B2 JP12809380A JP12809380A JPS6059929B2 JP S6059929 B2 JPS6059929 B2 JP S6059929B2 JP 12809380 A JP12809380 A JP 12809380A JP 12809380 A JP12809380 A JP 12809380A JP S6059929 B2 JPS6059929 B2 JP S6059929B2
Authority
JP
Japan
Prior art keywords
vinyl chloride
torr
nitrogen atom
containing organic
chloride resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12809380A
Other languages
Japanese (ja)
Other versions
JPS5753540A (en
Inventor
潔 今田
進 上野
洋和 野村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP12809380A priority Critical patent/JPS6059929B2/en
Priority to NL8104230A priority patent/NL8104230A/en
Priority to US06/301,536 priority patent/US4395434A/en
Priority to DE19813136574 priority patent/DE3136574A1/en
Priority to GB8127854A priority patent/GB2084159B/en
Priority to FR8117469A priority patent/FR2491935B1/en
Publication of JPS5753540A publication Critical patent/JPS5753540A/en
Publication of JPS6059929B2 publication Critical patent/JPS6059929B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12Chemical modification
    • C08J7/123Treatment by wave energy or particle radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12Chemical modification
    • C08J7/126Halogenation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29KINDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2027/00Use of polyvinylhalogenides or derivatives thereof as moulding material
    • B29K2027/06PVC, i.e. polyvinylchloride

Description

【発明の詳細な説明】 本発明は塩化ビニル系樹脂成形品の表面処理方法に関す
るものであり、特には塩化ビニル系樹脂成形品の表面特
性を改質することにより成形品に恒久性ある帯電防止性
、耐汚染性を付与することを目的とするものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for surface treatment of vinyl chloride resin molded products, and in particular, it provides permanent antistatic properties to molded products by modifying the surface properties of vinyl chloride resin molded products. The purpose of this is to impart properties such as durability and stain resistance.

一般に塩化ビニル系樹脂成形品は著しく帯電し易いため
、ほこり、じんあい等の付着により外観の汚れがもたら
され、また蓄積した静電気による人体への影響(電撃シ
ョック)、火花放電等の問題点を有している。
In general, vinyl chloride resin molded products are easily charged with electricity, so the appearance becomes dirty due to the adhesion of dust, dirt, etc., and problems such as the effects on the human body due to accumulated static electricity (electric shock) and spark discharge. have.

この帯電(静電気の蓄積)を防止するための方法として
は該成形品の表面に帯電防止剤を塗布するとかあるいは
成形品製造の際に帯電防止剤を練り込むなどの方法が知
られているが、前者の塗布する方法には速効的な効果が
得られるが持久性に乏しく、また塗布面がベトツクとか
ブロッキングの問題点があり、他方後者の方法には持久
性の点では前者の方法よりもすぐれているが帯電防止の
効果が不十分で、これを補うために帯電防止剤の添加量
を増加すると成形品表面にベトツキ感が現れ、ブルーミ
ング、ブロッキング等の問題点を生じるほか、耐熱性が
低下し、加工性が悪くなり、成形品表面が着色し汚れや
すくなるという不利がある。
Known methods for preventing this charging (accumulation of static electricity) include applying an antistatic agent to the surface of the molded product or incorporating an antistatic agent into the molded product during manufacture. The former method of application provides quick-acting effects, but lacks durability and has the problem of sticky and blocking surfaces, while the latter method is more durable than the former. Although the antistatic effect is excellent, the antistatic effect is insufficient, and when the amount of antistatic agent added to compensate for this, a sticky feeling appears on the surface of the molded product, causing problems such as blooming and blocking, as well as poor heat resistance. There are disadvantages in that the processability deteriorates, and the surface of the molded product is easily colored and stained.

他方、塩化ビニル系樹脂成形品については、この表面を
プラズマ処理することにより親水性を向上させ、これに
より帯電を抑制する試みがなされているが、十分な効果
を得ることはできない。
On the other hand, attempts have been made to improve the hydrophilicity of vinyl chloride resin molded articles by plasma-treating their surfaces and thereby suppress charging, but sufficient effects cannot be obtained.

本発明者らはかかる問題点を解決すべく、鋭意研究した
結果、塩化ビニル系樹脂成形品を、ガス分圧10−2〜
10トルの窒素原子含有有機化合物(ただし有機けい素
化合物を除く)とガス分圧10−4〜10トルの無機ガ
スの雰囲気下、電極間に10KHz以上の高周波電力を
印加して低温プラズマ処理するとともに、前記成形品表
面に該窒素原子含有有機化合物の重合膜を設けることに
より、成形品はその本来有する機械的強さを損われるこ
となく表面特性が改質され、すぐれた帯電防止性、耐汚
染性等が付与されることを見い出した。さらに上記方法
で処理すれば塩化ビニル系樹脂成形品の表面に極薄の改
質層が形成され、この層はポリ塩化ビニルに対して強く
結合する長所があり、またこの改質層の形成速度は他の
ポリマー成形品に比べて速く、その低温プラズマ処理に
よる効果が顕著に現われることを確認した。上記窒素原
子含有有機化合物は特に一般式または で示される化合物であることが望ましい。
In order to solve this problem, the inventors of the present invention have conducted extensive research, and as a result, we have developed vinyl chloride resin molded products with gas partial pressures of 10-2 to 10-2.
Low-temperature plasma treatment is performed by applying high-frequency power of 10 KHz or more between electrodes in an atmosphere of 10 torr of nitrogen atom-containing organic compounds (excluding organosilicon compounds) and inorganic gas with a gas partial pressure of 10-4 to 10 torr. In addition, by providing a polymer film of the nitrogen atom-containing organic compound on the surface of the molded product, the surface properties of the molded product are modified without impairing its inherent mechanical strength, resulting in excellent antistatic properties and durability. It has been found that it imparts contaminant properties. Furthermore, when treated with the above method, an extremely thin modified layer is formed on the surface of the vinyl chloride resin molded product, and this layer has the advantage of strongly bonding to polyvinyl chloride, and the formation speed of this modified layer is It was confirmed that the processing speed was faster than that of other polymer molded products, and the effects of low-temperature plasma treatment were noticeable. It is particularly desirable that the nitrogen atom-containing organic compound is a compound represented by the general formula or.

上記一般式においてR1は置換もしくは非置換の一価炭
化水素、R29R39R49R59R69R79R99
RlOおよびRllは水素原子または置換もしくは非置
換の,一価炭化水素、R8は置換もしくは非置換の二価
炭化水素基をそれぞれ示す。また、低温プラズマふん囲
気中には上記窒素原子含有有機化合物と共に窒素、窒素
原子含有有機化合物または希ガスと共存させると好まし
い結果が得られ、さらに10KHz以上の高周波放電に
よつて低温プラズマを発生させること、および窒素原子
含有有機化合物が存在するガスふん囲気中に設置された
電極間に高周波電力を印加して低温プラズマを発生させ
ることにより、よりすぐれたしかも耐久性のある帯電防
止性、耐汚染性を付与することができる。
In the above general formula, R1 is a substituted or unsubstituted monovalent hydrocarbon, R29R39R49R59R69R79R99
RlO and Rll represent a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group, and R8 represents a substituted or unsubstituted divalent hydrocarbon group, respectively. In addition, preferable results can be obtained by coexisting nitrogen, a nitrogen atom-containing organic compound, or a rare gas together with the above-mentioned nitrogen atom-containing organic compound in the low-temperature plasma atmosphere, and further, low-temperature plasma can be generated by high-frequency discharge of 10 KHz or higher. Furthermore, by applying high-frequency power between electrodes installed in a gas atmosphere containing nitrogen-containing organic compounds to generate low-temperature plasma, it is possible to achieve better and more durable antistatic and anti-pollution properties. can be given gender.

なお、アミン系のモノマーを使用し、無電極ノ(外部電
極)方式の高周波放電によりプラズマ重合半透膜を製造
する方法はよく知られるところであるが、かかるプラズ
マ重合に内部電極を使用すると、形成された膜が劣化す
る、あるいは膜が基材より剥離する、膜厚が不均一にな
るといつた短・所があるため、従来内部電極を使用した
高分子を基材としたプラズマ重合処理は検討されていな
かつた。
It should be noted that the method of manufacturing a plasma-polymerized semipermeable membrane using an amine monomer and an electrodeless (external electrode) method of high-frequency discharge is well known, but if an internal electrode is used for such plasma polymerization, the formation Plasma polymerization treatment using conventional polymer-based polymers using internal electrodes has been considered due to disadvantages such as deterioration of the film, peeling of the film from the substrate, and non-uniform film thickness. It had not been done.

一方、無電極方式により高周波基材にプラズマ重合処理
を行つて帯電防止特性を付与するといつた検討もいまだ
なされていない、また無電極方式を使用し、本発明にて
使用しているアミン、アミド系化合物のプラズマ重合処
理を塩化ビニル系樹脂成形品について行うと窒素原子含
有化合物の重合体膜が基材上に形成され通常正に強く帯
電した成形品が得られるだけで帯電防止効果は得られな
い(処理を行わない塩化ビニル系樹脂成形品は通常負に
強く帯電する)。
On the other hand, studies have not yet been conducted on applying plasma polymerization to a high-frequency base material using an electrodeless method to impart antistatic properties. When a vinyl chloride resin molded product is subjected to plasma polymerization treatment, a polymer film of the nitrogen atom-containing compound is formed on the base material, and usually only a strongly positively charged molded product is obtained, but no antistatic effect is obtained. No (untreated vinyl chloride resin molded products are usually strongly negatively charged).

しかるに、本発明のごとく高周波電力による内部放電方
式によれは、きわめて良好な帯電防止性をもつ改質され
た塩化ビニル系樹脂成形品が得られる。
However, by using the internal discharge method using high-frequency power as in the present invention, a modified vinyl chloride resin molded product having extremely good antistatic properties can be obtained.

この理由は明確ではないが、次のように推定することが
できる。すなわち、内部電極方式では無電極方式と異な
り重合膜の生長反応じ比べ膜や基材の劣化、分解反応も
かなり速く、基材の成形品表面を均一に重合膜が被う、
言わばアミン、アミド系化合物間の重合反応が主体とな
つた反応よりも基材表面層に比較的低分子量の窒素原子
含有化合物、あるいは使用するアミン、アミド系化合物
そのものが官能基として導入される、言わばアミン、ア
ミド系化合物と基材との結合反応の方が優先的であり、
結果として正帯電の傾向にある導入された官能基部と負
帯電の傾向にある塩化ビニル重合体部とが相互に帯電を
打消し合うことができる点である。以下本発明を詳細に
説明する。
Although the reason for this is not clear, it can be estimated as follows. In other words, in the internal electrode method, unlike the electrodeless method, the growth reaction of the polymer film, the deterioration and decomposition reactions of the film and the base material are considerably faster, and the polymer film covers the surface of the molded product on the base material evenly.
In other words, rather than a reaction mainly consisting of a polymerization reaction between amine or amide compounds, a comparatively low molecular weight nitrogen atom-containing compound or the amine or amide compound used itself is introduced as a functional group into the surface layer of the base material. In other words, the bonding reaction between the amine or amide compound and the base material is preferential,
As a result, the introduced functional group, which tends to be positively charged, and the vinyl chloride polymer portion, which tends to be negatively charged, can cancel each other out. The present invention will be explained in detail below.

本発明の方法で対象とされる塩化ビニル系樹脂成形品は
、ポリ塩化ビニルおよび塩化ビニルを主体とする共重合
体から製造されたいずれでもよく、この場合の塩化ビニ
ルと共重合されるコモノマーとしては、ビニルエステル
、ビニルエーテル、アクリル酸またはメタクリル酸およ
びそのエステル、マレイン酸またはフマル酸あるいはそ
のエステルならびに無水マレイン酸、芳香族ビニル化合
物、ハロゲン化ビニリデン、アクリロニトリルまたはメ
タクリロニトリル、さらにはエチレン、プロピレンなど
のオレフィンが例示される。
The vinyl chloride resin molded article targeted by the method of the present invention may be manufactured from polyvinyl chloride or a copolymer mainly composed of vinyl chloride, and in this case, the comonomer to be copolymerized with vinyl chloride is are vinyl esters, vinyl ethers, acrylic acid or methacrylic acid and its esters, maleic acid or fumaric acid or its esters, maleic anhydride, aromatic vinyl compounds, vinylidene halides, acrylonitrile or methacrylonitrile, as well as ethylene, propylene, etc. Examples include olefins.

なお、塩化ビニル系樹脂には必要に応じ各種配合剤、添
加剤が加えられる。たとえば、成形品の柔軟性、硬さを
調節するために使用される可塑剤としては、ジオクチル
フタレート、ジブチルフタレート、ブチルベンジルフタ
レート等のフタル酸エステル、アジピン酸ジオクチル、
セバシン酸ジブチル等の脂肪族二塩基酸エステル、ペン
タエリスリトールエステル、ジエチレングリコールジベ
ンゾエート等のグリコールエステル、アセチルリシノー
ル酸メチル等の脂肪族エステル、トリクレジールホスフ
エート、トリフェニルホスフェート等のりん酸エステル
、エポキシ化大豆油、エポキシ化アマニ油等のエポキシ
化油、アセチルトリブチルシトレート、アセチルトリオ
クチルシトレート等のクエン酸エステル、トリアルキル
トリメリテート、テトラーn−オクチルピロメリテート
、ポリプロピレンアジペート、その他ポリエステル系等
の種々の構造の可塑剤が例示される。
Note that various compounding agents and additives may be added to the vinyl chloride resin as necessary. For example, plasticizers used to adjust the flexibility and hardness of molded products include phthalate esters such as dioctyl phthalate, dibutyl phthalate, butylbenzyl phthalate, dioctyl adipate,
Aliphatic dibasic acid esters such as dibutyl sebacate, pentaerythritol esters, glycol esters such as diethylene glycol dibenzoate, aliphatic esters such as methyl acetyl ricinoleate, phosphate esters such as tricresyl phosphate and triphenyl phosphate, epoxy Epoxidized oils such as oxidized soybean oil and epoxidized linseed oil, citric acid esters such as acetyl tributyl citrate and acetyl trioctyl citrate, trialkyl trimellitate, tetra n-octyl pyromellitate, polypropylene adipate, and other polyesters. Examples include plasticizers with various structures such as.

また、滑性、安定性等の性質向上のために使用される添
加剤として、ステアリン酸カルシウム、ステアリン酸亜
鉛、ステアリン酸鉛、ステアリン酸バリウム、ステアリ
ン酸カドミウム等のカルボン酸の金属塩、三塩基性硫酸
鉛、二塩基性亜りん酸鉛、ジブチルすずジラウレート、
ジーn−オクチルすずマレート、ジーn−オクチルすず
メルカプタイトのような有機すず化合物、ブチルステア
レートのようなエステル系、エチレンビスステアロアマ
イドのような脂肪酸アミド、高級脂肪酸およびそのエス
テル、あるいはポリエチレンワックス等が例示される。
In addition, as additives used to improve properties such as lubricity and stability, metal salts of carboxylic acids such as calcium stearate, zinc stearate, lead stearate, barium stearate, and cadmium stearate, tribasic Lead sulfate, dibasic lead phosphite, dibutyltin dilaurate,
Organic tin compounds such as di-n-octyltin malate and di-n-octyltin mercaptite, esters such as butyl stearate, fatty acid amides such as ethylene bisstearamide, higher fatty acids and their esters, or polyethylene wax, etc. is exemplified.

その他塩化ビニル系樹脂の成形に使用される各種添加剤
たとえば充てん剤、耐熱性向上剤、抗酸化剤、紫外線吸
収剤、帯電防止剤、無滴剤、顔料、染料、架橋助剤等が
例示される。さらには各種の高分子ゴム弾性体が配合さ
れてもよく、この高分子ゴム弾性体としてはエチレンー
酢酸ビニル共重合体、アクリロニトリル−ブタジエン共
重合体、スチレン−アクリロニトリル共重合体、メチル
メタクリレ−トースチレンーブタジエン共重合体、アク
リロニトリル−スチレンーブタジエン共重合体、ウレタ
ンエラストマー、ポリアミド樹脂、エチレンープロピレ
ンージエンターポリマー、エポキシ変性ポリブタジエン
樹脂等が例示される。
Various other additives used in the molding of vinyl chloride resins include fillers, heat resistance improvers, antioxidants, ultraviolet absorbers, antistatic agents, anti-drop agents, pigments, dyes, crosslinking aids, etc. Ru. Furthermore, various polymeric rubber elastic bodies may be blended, such as ethylene-vinyl acetate copolymer, acrylonitrile-butadiene copolymer, styrene-acrylonitrile copolymer, methyl methacrylate copolymer, etc. Examples include styrene-butadiene copolymer, acrylonitrile-styrene-butadiene copolymer, urethane elastomer, polyamide resin, ethylene-propylene-diene terpolymer, and epoxy-modified polybutadiene resin.

なお、これらは塩化ビニル系樹脂10踵量部あたり5鍾
量部以下の配合量で使用することが望ましい。塩化ビニ
ル系樹脂成形品を得る方法は、押出成形、射出成形、カ
レンダー成形、インフレーシヨン成形、圧縮成形等従来
塩化ビニル樹脂の成形で採用されている成形手段はよれ
ばよく、成形品の種類、形状については特に制限はない
。本発明の方法はこのようにして得られる塩化ビニル系
樹脂成形品の表面を窒素原子含有有機化合物の低温プラ
ズマで処理するのであるが、この処理に使用される窒素
原子含有有機化合物としては、前記した各一般式で示さ
れるものが望ましく、具体的にはメチルアミン、ジメチ
ルアミン、トリメチルアミン、エチルアミン、ジエチル
アミン、トリエチルアミン、n−プロピルアミン、ジー
n−プロピルアミン、トリーn−プロピルアミ)ン、n
−ブチルアミン、n−アミルアミン、n−ヘキシルアミ
ン、ラウリルアミン、エチレンジアミン、トリメチレン
ジアミン、ヘキサメチレンジアミン、エタノールアミン
、ジエタノールアミン、アリルアミン、アニリン、アラ
ニン、N−メiチルアニリン、アリルジメチルアミン、
2−アミノエチルエーテル、1−ジメチルアミノー2−
クロルエタン、シクロプロピルアミン、シクロヘキシル
アミン、エチレンイミン、1−メチルエチレンイミン、
ホルムアミド、N,N−ジメチルホルフムアミド、カプ
ロンアミド、アミノアセタール、ベンジルアミン、ピペ
リジン、ピロリジン、モルホリン等のアミン類、イミン
類、アミド類、アミド類、それらの誘導体が例示される
It is desirable to use these in an amount of 5 parts by weight or less per 10 parts by weight of the vinyl chloride resin. The method of obtaining a vinyl chloride resin molded product may be any conventional molding method used for molding vinyl chloride resin, such as extrusion molding, injection molding, calendar molding, inflation molding, or compression molding, and the type of molded product. , there are no particular restrictions on the shape. In the method of the present invention, the surface of the vinyl chloride resin molded article thus obtained is treated with low-temperature plasma of a nitrogen atom-containing organic compound. Preferably, those represented by the following general formulas include methylamine, dimethylamine, trimethylamine, ethylamine, diethylamine, triethylamine, n-propylamine, di-n-propylamine, tri-n-propylamine, n-propylamine, and n-propylamine.
-butylamine, n-amylamine, n-hexylamine, laurylamine, ethylenediamine, trimethylenediamine, hexamethylenediamine, ethanolamine, diethanolamine, allylamine, aniline, alanine, N-methylaniline, allyldimethylamine,
2-aminoethyl ether, 1-dimethylamino-2-
Chlorethane, cyclopropylamine, cyclohexylamine, ethyleneimine, 1-methylethyleneimine,
Examples include amines, imines, amides, amides, and derivatives thereof, such as formamide, N,N-dimethylformamide, capronamide, aminoacetal, benzylamine, piperidine, pyrrolidine, and morpholine.

これらの化合物のうち高沸点(低蒸気圧)のものは加熱
等の操作でガス状として用いればよい。窒素原子含有有
機化合物の低温プラズマを発生させる際の装置内におけ
る窒素原子含有有機化合物の圧力は10−3〜10トル
(好ましくは0.01トル〜5トル)とすることがよく
、これにより目的とする低温プラズマを良好に発生させ
ることができる。
Among these compounds, those having a high boiling point (low vapor pressure) may be used in a gaseous state by heating or other operations. When generating a low-temperature plasma of a nitrogen atom-containing organic compound, the pressure of the nitrogen atom-containing organic compound in the device is often 10-3 to 10 Torr (preferably 0.01 Torr to 5 Torr). A low-temperature plasma can be generated satisfactorily.

したがつて窒素原子含有有機化合物はかかる圧力のガス
体として存在し得る蒸気圧をもつものであればよく、そ
れ故比較的大きな分子量のものも使用することができる
。なお、窒素原子含有有機化合物はその1種または2種
以上を使用する場合のほか、これら窒素原子含有有機化
合物に無機ガスを併用してもよく、この無機ガスとして
はヘリウム、ネオン、アルゴン、窒素、亜酸化窒素、一
酸化窒素、二酸化窒素、酸素、空気、一酸化炭素、二酸
化炭素、水素、シアン化臭素、亜硫酸ガス、硫化水素な
どが例示され、これらのガスは単独または混合して使用
される。
Therefore, the nitrogen atom-containing organic compound need only have a vapor pressure that allows it to exist as a gas at such a pressure, and therefore compounds with relatively large molecular weights can also be used. In addition to using one type or two or more types of nitrogen atom-containing organic compounds, these nitrogen atom-containing organic compounds may be used in combination with an inorganic gas, and examples of this inorganic gas include helium, neon, argon, and nitrogen. , nitrous oxide, nitrogen monoxide, nitrogen dioxide, oxygen, air, carbon monoxide, carbon dioxide, hydrogen, bromine cyanide, sulfur dioxide gas, hydrogen sulfide, etc. These gases may be used alone or in combination. Ru.

これらのガスのプラズマ発生装置内におけるガス圧力(
分圧)は、窒素原子含有有機化合物の分圧の1110以
下とするかまたは0.5トル以下の分圧とすることが望
ましく、こうすることにより目的とする低温プラズマを
良好に発生させることができる。低温プラズマを発生さ
せる条件としては、たと,えは電極間に数KHz〜数百
MHzの高周波電力を印加すれはよく、放電は有極放電
、無電極放電のいずれでも十分な結果が得られる。
The gas pressure of these gases in the plasma generator (
The partial pressure) is desirably 1110 or less of the partial pressure of the nitrogen atom-containing organic compound, or 0.5 torr or less. By doing so, the desired low-temperature plasma can be generated well. can. The conditions for generating low-temperature plasma include, for example, applying high-frequency power of several KHz to several hundred MHz between the electrodes, and sufficient results can be obtained with either polar or non-electrode discharge.

プラズマ処理時間は印加電圧によつても相違するが、一
般には数秒から数十分とすることで十分である。なお、
プラズマ処理には上記の方法以外にも種々あり、たとえ
は放電周波数帯としては低周波、マイクロ波、直流など
を用いることができ、また電極も外部電極のほか内部電
極、コイル型など容量結合、誘導結合のいずれでもよい
The plasma processing time varies depending on the applied voltage, but generally a few seconds to several tens of minutes is sufficient. In addition,
There are various methods for plasma processing other than the above.For example, low frequency, microwave, direct current, etc. can be used as the discharge frequency band, and the electrodes can be external electrodes, internal electrodes, capacitive coupling such as coil type, Either inductive coupling may be used.

しか5し、どのような方法をとつても放電熱により材料
表面が変質しないようにしなければならない。本発明の
方法は内部電極方式で実施するのか望ましいが、この際
の電極の形状については特に制限はなく、高周波電極(
入力側電極)とアース側ク電極が同一の形状でもあるい
は異つた形状のいずれでもよく、それらは平板状、網状
、コイル状、リング状、棒状等種々可能であり、さらに
は処理装置の金属内壁を高周波電極またはアース側電極
とする方式でもよい。本発明の方法によつて処理された
塩化ビニル系樹脂成形品は、機械的強度等の本来的物性
が何ら損われず、表面が改質されることにより前記した
帯電防止性、耐汚染性にすぐれるほか、耐摩耗性、接着
性、耐熱性、ぬれ性、印刷性等にすぐれているという長
所を有する。
However, no matter what method is used, it is necessary to prevent the surface of the material from deteriorating due to discharge heat. Although it is preferable to carry out the method of the present invention using an internal electrode method, there is no particular restriction on the shape of the electrode in this case;
The input side electrode) and the ground side electrode may have the same shape or different shapes, and they can be in various shapes such as a flat plate, a mesh, a coil, a ring, and a rod. It is also possible to use a method in which the electrode is a high frequency electrode or a ground side electrode. The vinyl chloride resin molded product treated by the method of the present invention does not lose any of its inherent physical properties such as mechanical strength, and has the above-mentioned antistatic properties and stain resistance due to surface modification. In addition, it has other advantages such as excellent abrasion resistance, adhesiveness, heat resistance, wettability, and printability.

つぎに、具体的実施例をあげる。Next, specific examples will be given.

実験慟.1 1 塩化ビニル樹脂10踵量部、可塑剤(DOP)5重
量部、バリウムー亜鉛系安定剤2重量部、エポキシ化大
豆油3重量部からなる配合物を170℃で1紛間ロール
混練し、これを175℃でブレス成形し厚さ0.3T1
nのシートを作成した。
Experiment. 1 1 A blend consisting of 10 parts by weight of vinyl chloride resin, 5 parts by weight of plasticizer (DOP), 2 parts by weight of barium-zinc stabilizer, and 3 parts by weight of epoxidized soybean oil was kneaded with one powder roll at 170°C, This was press molded at 175℃ to a thickness of 0.3T1.
n sheets were created.

このシートをプラズマ発生装置内の内部電極間(高周波
平板電極とアース平板電極との間)に設置し、内部を1
0−4トルまで減圧後エチルアミンガスを導入し、ガス
流通下0.1トルに調整保持した後、内部電極間に13
.56MHz500Wの高周波電力を印加し、低温プラ
ズマを発生させて、シートを3分間低温プラズマ処理し
た(この処理シートを処理シート■とする)。
This sheet is installed between the internal electrodes in the plasma generator (between the high frequency flat plate electrode and the earth flat plate electrode), and the inside is
After reducing the pressure to 0-4 Torr, ethylamine gas was introduced, and after adjusting and maintaining it at 0.1 Torr under gas flow, 13 Torr was applied between the internal electrodes.
.. A high-frequency power of 56 MHz and 500 W was applied to generate low-temperature plasma, and the sheet was subjected to low-temperature plasma treatment for 3 minutes (this treated sheet is referred to as treated sheet (2)).

また上記においてエチルアミンガスの流通圧力を5×1
0−4トルとしたほかは同様にして低温プラズマ処理し
た(この処理シートを処理シートIとする)。このよう
にして処理したシートIおよび■、およびプラズマ処理
を行わなかつたシートについて、タバコ灰吸着距離、表
面固有抵抗および摩擦帯電圧を測定したところ、下記の
結果が得られた。
In addition, in the above, the flow pressure of ethylamine gas was set to 5×1.
A low-temperature plasma treatment was performed in the same manner except that the temperature was changed to 0-4 torr (this treated sheet is referred to as treated sheet I). When the tobacco ash adsorption distance, surface resistivity, and frictional charging voltage were measured for sheets I and (2) treated in this manner and sheets that were not subjected to plasma treatment, the following results were obtained.

*1:試料表面を木綿布にて10]摩擦後、タバ コ
灰に近づけ、タバコ灰が付着しはじめ実験NO.2塩化
ビニル樹脂10鍾量部、ジメチルすずメルカプタイド3
重量部、エポキシ化大豆油1重量部、およびエチレンビ
スステアリルアミド0.5重J量部からなる配合物を1
75℃で1紛間ロール混錬し、これを180℃でブレス
成形して厚さ0.2Tfr!Ftのシートを作成した。
*1: After rubbing the sample surface with a cotton cloth 10], bring it close to cigarette ash and the cigarette ash begins to adhere to it.Experiment No. 10 parts of vinyl dichloride resin, 3 parts of dimethyltin mercaptide
1 part by weight, 1 part by weight of epoxidized soybean oil, and 0.5 parts by weight of ethylene bisstearylamide.
The powder was kneaded with one roll at 75℃ and then press-formed at 180℃ to a thickness of 0.2Tfr! A sheet of Ft was created.

このシートを実験陥.1と同じ装置、電極を使用し、シ
ートを電極間に設置した後、装置内を10−4,トルま
で減圧し、ついでジメチルホルムアミドガスを導入し、
当該ガスの0.5トル下13.56MHz1KWの高周
波電力を印加して低温プラズマを発生させ電極間の成形
シートを3分間処理した。
Experimented with this sheet. Using the same equipment and electrodes as in 1, after installing the sheet between the electrodes, the pressure inside the equipment was reduced to 10-4 Torr, and then dimethylformamide gas was introduced.
A high-frequency power of 13.56 MHz and 1 KW was applied to the gas under 0.5 torr to generate low-temperature plasma, and the formed sheet between the electrodes was treated for 3 minutes.

このようにして処理シートおよびプラズマ処理;を行わ
なかつたシートについて、実験褐.1と同様にして物性
を測定したところ、結果は下記のとおりであつた。
In this way, the treated sheets and the sheets that were not subjected to plasma treatment were tested for brown color in the experiment. The physical properties were measured in the same manner as in 1, and the results were as follows.

実験NO3 実験NO,2と同じ成形シートを使用し、このシートを
プラズマ発生装置内の内部電極間(高周波棒状電極とア
ース平板電極との間)に設置した。
Experiment No. 3 The same molded sheet as in Experiment No. 2 was used, and this sheet was installed between the internal electrodes (between the high-frequency rod-shaped electrode and the earth plate electrode) in the plasma generator.

つぎに装置内を0.05トルまで減圧した後、トリメチ
ルアミンガスを導入し、当該ガス0.5トル下110K
Hz800Wの高周波電力を印加して低温プラズマを発
生させ、シートを5分間処理した。この処理シートにつ
いて実験NO.lと同様にして物性を測定したところ、
結果は下記のとおりであつた。
Next, after reducing the pressure inside the device to 0.05 torr, trimethylamine gas was introduced, and the gas was heated to 110K under 0.5 torr.
A high frequency power of 800 W of Hz was applied to generate low temperature plasma, and the sheet was treated for 5 minutes. Regarding this treated sheet, experiment No. When the physical properties were measured in the same manner as l,
The results were as follows.

実験褐4 実験NO.3において、電力として1101(Hz8O
OWの代りに、5KHz2KWの高周波電力を使用した
以外は同様にして低温プラズマ処理を行つた。
Experiment Brown 4 Experiment No. 3, the power is 1101 (Hz8O
Low-temperature plasma treatment was performed in the same manner except that high-frequency power of 5 KHz 2 KW was used instead of OW.

この処理シートについて実験陽.1と同様にして物性を
測定したところ、結果は下記のとおりであつた。
Experiment with this treatment sheet. The physical properties were measured in the same manner as in 1, and the results were as follows.

実験褐5 実験褐.2と同じ成形シートを使用し、このシートを実
験褐.3と同じプラズマ発生装置で低温プラズマ処理し
た。
Experimental brown 5 Experimental brown. The same molded sheet as in 2 was used, and this sheet was used in the experimental brown color. Low-temperature plasma treatment was performed using the same plasma generator as in 3.

その際あらかじめ装置内を窒素ガスで置換し、さらに窒
素残圧0.2トルまで減圧後メチルアミンガスを導入し
、当該ガス1トル下13.56MHz1KWの高周波電
力を印加して低温プラズマを発生させ、内部電極間の成
形シートを3分間処理した。この処理シートについて実
験?.1と同様にして物性を測定したところ、結果は下
記のとおりであつた。
At that time, the inside of the apparatus was replaced with nitrogen gas in advance, and after further reducing the nitrogen residual pressure to 0.2 torr, methylamine gas was introduced, and a high-frequency power of 13.56 MHz 1 KW was applied under 1 torr of the gas to generate low-temperature plasma. , the formed sheet between the internal electrodes was treated for 3 minutes. Experimenting with this treatment sheet? .. The physical properties were measured in the same manner as in 1, and the results were as follows.

実験慟.6 実験NO.2と同じ成形シートを使用し、このシートを
外部電極型低温プラズマ発生装置(電極はコ゛イルによ
る誘導形式のものを使用)内にセットした後、10−4
トルまで減圧し、ついでジメチルホルムアミドガスを導
入し、ガス圧5×10−1トル下13.56MHz70
0Wの高周波電力を印加して低温プラズマを発生させ、
装置内のシートを1紛間処理し門た。
Experiment. 6 Experiment No. Using the same molded sheet as in 2, set this sheet in an external electrode type low temperature plasma generator (the electrode is of the induction type using a coil), and then 10-4.
The pressure was reduced to Torr, then dimethylformamide gas was introduced, and the frequency was reduced to 13.56MHz70 under a gas pressure of 5 x 10-1 Torr.
Generate low-temperature plasma by applying 0W high-frequency power,
One sheet in the device was processed and closed.

この処理シートについて実騒べ0.1と同様にして物性
を測定したところ、結果は下記のとおりであつた。
The physical properties of this treated sheet were measured in the same manner as in 0.1, and the results were as follows.

実験褐7 塩化ビニルー酢酸ビニル共重合体(SC一400G)1
0呼量部、ジブチルすずメルカプタイド2.5重量部、
ジブチルすずマレート0.5重量部、カルシウムステア
レート0.鍾量部、ポリエチレンワックス0.1重量部
からなる配合物を175℃で10分間ロール混練し、こ
れを180℃でブレス成形し厚さ0.57mのシートを
作成した。
Experimental brown 7 Vinyl chloride-vinyl acetate copolymer (SC-400G) 1
0 parts by weight, 2.5 parts by weight of dibutyltin mercaptide,
0.5 parts by weight of dibutyltin malate, 0.5 parts by weight of calcium stearate. A blend consisting of a weight part and 0.1 part by weight of polyethylene wax was roll-kneaded at 175°C for 10 minutes, and then press-molded at 180°C to form a sheet with a thickness of 0.57 m.

このシートを実験坐.1と同じ装置、電極を使用し、電
極間に設置した後、装置内を残圧0.1トルまで減圧し
た後アリルアミンガスを導入し、当該ガス1トル下に1
3.5い旬ZIKWの高周波電力を印加し低温プラズマ
を発生させ、シートを5分間処理した。
Use this sheet as an experiment. Using the same equipment and electrodes as in 1, and installing it between the electrodes, reduce the pressure inside the equipment to a residual pressure of 0.1 torr, then introduce allylamine gas, and reduce the pressure to 1 torr of gas.
A low-temperature plasma was generated by applying high-frequency power of 3.5 degrees ZIKW, and the sheet was treated for 5 minutes.

このようにして低温プラズマ処理したシートおよび低温
プラズマ処理しなかつたシートについて、実験NO.l
と同様にして物性を測定したところ、結果は下記のとお
りである。
Regarding the sheets treated with low-temperature plasma in this way and the sheets not treated with low-temperature plasma, Experiment No. l
The physical properties were measured in the same manner as above, and the results are as follows.

実験NO.8 実験NO.7と同じ成形シートを実験NO.7と同じ装
,置で低温プラズマ処理したが、大気リーク圧7×10
−1トル下においてアリルアミンガス分圧1トル分を通
気しながら、全圧を約1.7トルとし、13.56MH
z1KWの高周波電力を印加し、低温プラズマを発生さ
せ、電極間の設置したシートを5分こ間処理した。
Experiment No. 8 Experiment No. The same molded sheet as in 7 was used in Experiment No. Low-temperature plasma treatment was performed using the same equipment as in 7, but the atmospheric leak pressure was 7×10
- Under 1 torr, the total pressure was set to about 1.7 torr while passing 1 torr of allylamine gas partial pressure, and the total pressure was 13.56 MH.
A high frequency power of 1 KW was applied to generate low temperature plasma, and the sheet placed between the electrodes was treated for 5 minutes.

このようにして処理したシートについて実験慟.1と同
様にして物性を測定した。
Experiments were carried out on sheets treated in this way. Physical properties were measured in the same manner as in 1.

実験NO.9 実験慟.7と同じ成形シートを実験褐.7と同じ装置で
低温プラズマ処理したが、処理に先立つて装置内を1X
10−4トルまで減圧し、ついで二酸化炭素ガスを通気
しながら内圧を1刈0−2トルに調整した。
Experiment No. 9 Experiments. The same molded sheet as in 7 was used as an experimental brown. Low-temperature plasma treatment was performed using the same equipment as in 7, but the inside of the equipment was heated to 1X before treatment.
The pressure was reduced to 10-4 torr, and then the internal pressure was adjusted to 0-2 torr per cut while passing carbon dioxide gas through.

その後n−ブチルアミンガス分圧2×10−1トル分を
通気しながら全圧を約2.1×10−1トルとし、13
.56MHz700Wの高周波電力を電極に印加し、低
温プラズマを発生させ、電極内に設置したシートを3分
間処理した。このようにして処理したシートについて実
験NO.lと同様にして物性を測定した。
Thereafter, the total pressure was brought to about 2.1 x 10-1 Torr while passing n-butylamine gas at a partial pressure of 2 x 10-1 Torr.
.. High-frequency power of 56 MHz and 700 W was applied to the electrode to generate low-temperature plasma, and the sheet placed inside the electrode was treated for 3 minutes. Experiment No. 1 was obtained for the sheet treated in this way. The physical properties were measured in the same manner as in 1.

参考実験例 市販の低圧ポリエチレンフィルムに対し、実験NO.7
と同じ装置を使用して低温プラズマ処理したが、処理に
先立つて装置内を1刈0−4トルまで減圧し、ついで窒
素ガスを通気しながら内圧を1×10−2トルに調整し
た。
Reference Experiment Example Experiment NO. 7
Low-temperature plasma treatment was carried out using the same apparatus as above, but prior to treatment, the pressure inside the apparatus was reduced to 0-4 torr, and then the internal pressure was adjusted to 1 x 10-2 torr while nitrogen gas was vented.

Claims (1)

【特許請求の範囲】 1 塩化ビニル系樹脂成形品を、ガス分圧10^−^2
〜10トルの窒素原子含有有機化合物(ただし有機けい
素化合物を除く)とガス分圧10^−^4〜10トルの
無機ガスの雰囲気下、電極間に10KHz以上の高周波
電力を印加して低温プラズマ処理するとともに、前記成
形品表面に該窒素原子含有有機化合物の重合膜を設ける
ことを特徴とする塩化ビニル系樹脂成形品の表面処理方
法。 2 前記窒素原子含有有機化合物が、一般式▲数式、化
学式、表等があります▼(式中、R^1は置換もしくは
非置換の一価炭化水素基、R^2およびR^3は水素原
子または置換もしくは非置換の一価炭化水素基)で示さ
れる化合物である特許請求の範囲第1項記載の表面処理
方法。 3 前記窒素原子含有有機化合物が、一般式▲数式、化
学式、表等があります▼(式中、R^1、R^5および
R^6は水素原子または置換もしくは非置換の一価炭化
水素基)で示される化合物である特許請求の範囲第1項
記載の表面処理方法。 4 前記窒素原子含有有機化合物が、一般式▲数式、化
学式、表等があります▼(式中、R^8は置換もしくは
非置換の二価炭化水素基、R^7、R^9、R^1^0
およびR^1^1は水素原子または置換もしくは非置換
の一価炭化水素基)で示される化合物である特許請求の
範囲第1項記載の表面処理方法。
[Claims] 1. A vinyl chloride resin molded product is heated to a gas partial pressure of 10^-^2
In an atmosphere of a nitrogen atom-containing organic compound (excluding organosilicon compounds) of ~10 torr and an inorganic gas with a gas partial pressure of 10^-^4 to 10 torr, high-frequency power of 10 KHz or higher is applied between the electrodes to reduce the temperature. A method for surface treatment of a vinyl chloride resin molded article, which comprises subjecting the molded article to plasma treatment and providing a polymer film of the nitrogen atom-containing organic compound on the surface of the molded article. 2 The nitrogen atom-containing organic compound has a general formula ▲ mathematical formula, chemical formula, table, etc. ▼ (in the formula, R^1 is a substituted or unsubstituted monovalent hydrocarbon group, R^2 and R^3 are hydrogen atoms or a substituted or unsubstituted monovalent hydrocarbon group). 3 The nitrogen atom-containing organic compound has a general formula ▲ mathematical formula, chemical formula, table, etc. ▼ (wherein R^1, R^5 and R^6 are hydrogen atoms or substituted or unsubstituted monovalent hydrocarbon groups ) The surface treatment method according to claim 1, wherein the surface treatment method is a compound represented by: 4 The nitrogen atom-containing organic compound has a general formula ▲ mathematical formula, chemical formula, table, etc. ▼ (in the formula, R^8 is a substituted or unsubstituted divalent hydrocarbon group, R^7, R^9, R^ 1^0
2. The surface treatment method according to claim 1, wherein R^1^1 is a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group.
JP12809380A 1980-09-16 1980-09-16 Surface treatment method for vinyl chloride resin molded products Expired JPS6059929B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP12809380A JPS6059929B2 (en) 1980-09-16 1980-09-16 Surface treatment method for vinyl chloride resin molded products
NL8104230A NL8104230A (en) 1980-09-16 1981-09-14 METHOD FOR CHANGING THE SURFACE PROPERTIES OF ARTICLES FORMED FROM PLASTICS
US06/301,536 US4395434A (en) 1980-09-16 1981-09-14 Method for improving surface properties of shaped articles of synthetic resins
DE19813136574 DE3136574A1 (en) 1980-09-16 1981-09-15 METHOD FOR MODIFYING THE SURFACE PROPERTIES OF PLASTIC MOLDS
GB8127854A GB2084159B (en) 1980-09-16 1981-09-15 A method for improving surface properties of shaped articles of synthetic resins
FR8117469A FR2491935B1 (en) 1980-09-16 1981-09-16 PROCESS FOR REDUCING THE QUANTITY OF STATIC ELECTRICITY ON THE SURFACE OF ARTICLES MADE OF SYNTHETIC PVC RESIN, USING LOW TEMPERATURE PLASMA

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12809380A JPS6059929B2 (en) 1980-09-16 1980-09-16 Surface treatment method for vinyl chloride resin molded products

Publications (2)

Publication Number Publication Date
JPS5753540A JPS5753540A (en) 1982-03-30
JPS6059929B2 true JPS6059929B2 (en) 1985-12-27

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP12809380A Expired JPS6059929B2 (en) 1980-09-16 1980-09-16 Surface treatment method for vinyl chloride resin molded products

Country Status (2)

Country Link
JP (1) JPS6059929B2 (en)
FR (1) FR2491935B1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58224746A (en) * 1982-06-23 1983-12-27 三菱化成ポリテック株式会社 Transparent packing bag having excellent antistatic property

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3761299A (en) * 1970-10-13 1973-09-25 Eastman Kodak Co Treating polymeric surfaces
GB2025430B (en) * 1978-06-26 1982-09-22 Agency Ind Science Techn Method for reducing electrostatic charging on shaped articles of polyvinyl chloride resins
JPS5518460A (en) * 1978-07-27 1980-02-08 Agency Of Ind Science & Technol Production of molding of flexible vinyl chloride resin

Also Published As

Publication number Publication date
FR2491935B1 (en) 1986-07-04
JPS5753540A (en) 1982-03-30
FR2491935A1 (en) 1982-04-16

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