JPS6059252B2 - Surface treatment method for vinyl chloride resin molded products - Google Patents

Surface treatment method for vinyl chloride resin molded products

Info

Publication number
JPS6059252B2
JPS6059252B2 JP12809480A JP12809480A JPS6059252B2 JP S6059252 B2 JPS6059252 B2 JP S6059252B2 JP 12809480 A JP12809480 A JP 12809480A JP 12809480 A JP12809480 A JP 12809480A JP S6059252 B2 JPS6059252 B2 JP S6059252B2
Authority
JP
Japan
Prior art keywords
torr
vinyl chloride
gas
chloride resin
sheet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12809480A
Other languages
Japanese (ja)
Other versions
JPS5753541A (en
Inventor
潔 今田
進 上野
洋和 野村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP12809480A priority Critical patent/JPS6059252B2/en
Priority to NL8104230A priority patent/NL8104230A/en
Priority to US06/301,536 priority patent/US4395434A/en
Priority to DE19813136574 priority patent/DE3136574A1/en
Priority to GB8127854A priority patent/GB2084159B/en
Publication of JPS5753541A publication Critical patent/JPS5753541A/en
Publication of JPS6059252B2 publication Critical patent/JPS6059252B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 本発明は塩化ビニル系樹脂成形品の表面処理方法に関す
るものてあり、特には塩化ビニル系樹脂成形品の表面特
性を改質することにより成形品に恒久性ある帯電防止性
、耐汚染性を付与することを目的とするものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for surface treatment of vinyl chloride resin molded articles, and in particular, to provide permanent antistatic properties to the molded articles by modifying the surface properties of the vinyl chloride resin molded articles. The purpose of this is to impart properties such as durability and stain resistance.

一般に塩化ビニル系樹脂成形品は著しく帯電し易いため
、ほこり、じんあい等の付着により外観の汚れがもたら
され、また蓄積した静電気による人体への影響(雷撃シ
ョック)、火花放電等の問題点を有している。
In general, vinyl chloride resin molded products are easily charged with electricity, so the appearance becomes dirty due to adhesion of dust, dirt, etc., and problems such as the effects on the human body due to accumulated static electricity (lightning shock) and spark discharge. have.

この帯電(静電気の蓄積)を防止するための方法として
は該成形品の表面に帯電防止剤を塗布するとかあるいは
成形品製造の際に帯電防止剤を練り込むなどの方法が知
られているが、前者の塗布する方法には速効的な効果が
得られるが持久性にJ乏しく、また塗布面がベトツクと
かブロッキングの問題点があり、他方後者の方法には持
久性の点ては前者の方法よりもすぐれているが帯電防止
の効果が不十分で、これを補うために帯電防止剤の添加
量を増加すると成形品表面にベトツキ感が現;れ、ブル
ーミング、ブロッキング等の問題点を生じるほか、耐熱
性が低下し、加工性が悪くなり、成形品表面が着色し汚
れやすくなるという不利がある。
Known methods for preventing this charging (accumulation of static electricity) include applying an antistatic agent to the surface of the molded product or incorporating an antistatic agent into the molded product during manufacture. The former method of application provides a fast-acting effect, but lacks durability and has the problem of a sticky surface and blocking, while the latter method has less durability than the former method. However, the antistatic effect is not sufficient, and when the amount of antistatic agent added to compensate for this, a sticky feeling appears on the surface of the molded product, causing problems such as blooming and blocking. However, there are disadvantages in that heat resistance decreases, processability deteriorates, and the surface of the molded product is easily colored and stained.

他方、塩化ビニル系樹脂成形品については、この表面を
プラズマ処理することにより親水性を向上させ、これに
より帯電を抑制する試みがなされているが、十分な効果
を得ることはできない。
On the other hand, attempts have been made to improve the hydrophilicity of vinyl chloride resin molded articles by plasma-treating their surfaces and thereby suppress charging, but sufficient effects cannot be obtained.

本発明者らはかかる問題点を解決すべく、鋭意研究した
結果、塩化ビニル系樹脂成形品を10トル以下の窒素原
子含有有機化合物の低温プラズマに曝し、ついでこの低
温プラズマ処理面にハロゲン、ハロゲン化水素または有
機ハロゲン化物を接触させれば、成形品はその本来有す
る機械的強さ等を損われることなく表面特性が改質され
、すくれた帯電防止性、耐汚染性等が付与されることを
見い出した。さらに、上記方法で処理すれば塩化ビニル
系樹脂成形品の表面に極薄の改質層が形成され、この層
はポリ塩化ビニルに対して特に強く結合する長所があり
、またこの改質層の形成速度は他のポリマー成形品に比
べて速く、その低温プラズマ処理による効果が顕著に現
われることを確認した。上記窒素原子含有有機化合物は
特に一般式で示される化合物であることが望ましい。
The inventors of the present invention conducted extensive research to solve these problems, and found that they exposed vinyl chloride resin molded products to low-temperature plasma of an organic compound containing nitrogen atoms at 10 torr or less, and then applied halogen or halogen to the low-temperature plasma-treated surface. When a molded product is brought into contact with hydrogen hydride or an organic halide, its surface properties are modified without sacrificing its inherent mechanical strength, giving it excellent antistatic properties and stain resistance. I discovered that. Furthermore, when treated with the above method, an extremely thin modified layer is formed on the surface of the vinyl chloride resin molded product, and this layer has the advantage of bonding particularly strongly to polyvinyl chloride. The formation speed was faster than that of other polymer molded products, and it was confirmed that the effects of low-temperature plasma treatment were noticeable. The nitrogen atom-containing organic compound is preferably a compound represented by the general formula.

上記一般式においてR1は置換もしくは非置換の一価炭
化水素基、R2,R3,R5およびR6は水素原子また
は置換もしくは非置換の一価炭化水素基をそれぞれ示す
。ただし、本発明においてはけい素原子を有する有機化
合物は含まないものとする。
In the above general formula, R1 represents a substituted or unsubstituted monovalent hydrocarbon group, and R2, R3, R5 and R6 represent a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group, respectively. However, in the present invention, organic compounds having silicon atoms are not included.

以下本発明を詳しく説明する。The present invention will be explained in detail below.

本発明の方法て対象とされる塩化ビニル系樹脂成形品は
、ポリ塩化ビニルおよび塩化ビニルを主.体とする共重
合体から製造されたいずれでもよく、この場合の塩化ビ
ニルと共重合されるコモノマーとしては、ビニルエステ
ル、ビニルエーテル、アクリル酸またはメタクリル酸お
よびそのエステル、マレイン酸またはフマル酸あるいは
その−エステルならびに無水マレイン酸、芳香族ビニル
化合物、ハロゲン化ビニリデン、アクリロニトリルまた
はメタクリロニトリル、さらにはエチレン、プロピレン
などのオレフィンが例示される。
The vinyl chloride resin molded products targeted by the method of the present invention mainly include polyvinyl chloride and vinyl chloride. In this case, the comonomer copolymerized with vinyl chloride may be vinyl ester, vinyl ether, acrylic acid or methacrylic acid and its ester, maleic acid or fumaric acid, or its - Examples include esters, maleic anhydride, aromatic vinyl compounds, vinylidene halides, acrylonitrile or methacrylonitrile, and olefins such as ethylene and propylene.

なお、塩化ビニル系樹脂には必要に応じ各種配合剤、添
加剤が加えられる。たとえば、成形品の柔軟性、硬さを
調節するために使用される可塑剤としては、ジオクチル
フタレート、ジブチルフタレート、ブチルベンジルフタ
レート等のフタル酸エステル、アジピン酸ジオクチル、
セバシン酸ジブチル等の脂肪族二塩基酸エステル、ペン
タエリスリトールエステル、ジエチレングリコールジベ
ンゾエート等のグリコール゛エステル、アセチルリシノ
ール酸メチル等の脂肪酸エステル、トリクレジールホス
フエート、トリフェニルホスフェート等のリン酸エステ
ル、エポキシ化大豆油、エポキシ化アマニ油等のエポキ
シ化油、アセチルトリブチルシトレート、アセチルトリ
オクチルシトレート等のクエン酸エステル、トリアルキ
ルトリメリテート、テトラーn−オクチルピロメリテー
ト、ポリプロピレンアジペート、その他ポリエステル系
等の種々の構造の可塑剤が例示される。
Note that various compounding agents and additives may be added to the vinyl chloride resin as necessary. For example, plasticizers used to adjust the flexibility and hardness of molded products include phthalate esters such as dioctyl phthalate, dibutyl phthalate, butylbenzyl phthalate, dioctyl adipate,
Aliphatic dibasic acid esters such as dibutyl sebacate, glycol esters such as pentaerythritol ester and diethylene glycol dibenzoate, fatty acid esters such as methyl acetyl ricinoleate, phosphate esters such as tricresyl phosphate and triphenyl phosphate, and epoxy Epoxidized oils such as oxidized soybean oil and epoxidized linseed oil, citric acid esters such as acetyl tributyl citrate and acetyl trioctyl citrate, trialkyl trimellitate, tetra n-octyl pyromellitate, polypropylene adipate, and other polyesters. Examples include plasticizers with various structures such as.

また、滑性、安定性等の性質向上のために使用される添
加剤として、ステアリン酸カルシウム、ステアリン酸亜
鉛、ステアリン酸鉛、ステアリン酸バリウム、ステアリ
ン酸カドミウム等のカルボン酸の金属塩、三塩基性硫酸
鉛、二塩基性亜りん酸鉛、ジブチルすずジラウレート、
ジーn−オクチルすずマレート、ジーn−オクチ・ルす
ずメルカプタイトのような有機すず化合物、ブチルステ
アレートのようなエステル系、エチレンビスステアロア
マイドのような脂肪酸アミド、高級脂肪酸およびそのエ
ステル、あるいはポリエチレンワックス等が例示される
In addition, as additives used to improve properties such as lubricity and stability, metal salts of carboxylic acids such as calcium stearate, zinc stearate, lead stearate, barium stearate, and cadmium stearate, tribasic Lead sulfate, dibasic lead phosphite, dibutyltin dilaurate,
Organic tin compounds such as di-n-octyltin malate and di-n-octyltin mercaptite, esters such as butyl stearate, fatty acid amides such as ethylene bisstearamide, higher fatty acids and their esters, or polyethylene Wax etc. are exemplified.

その他塩化ビニル系樹脂の成形に使用される各種添加剤
たとえば充てん剤、耐熱性向上剤、抗酸化剤、紫外線吸
収剤、帯電防止剤、無滴剤、顔料、染料、架橋助剤等が
例示される。さらには各種の高分子ゴム弾性体が配合さ
れてもよく、この高分子コム弾性体としてはエチレンー
酢酸ビニル共重合体、アクリロニトリル−ブタジエン共
重合体、スチレン−アクリロニトリル共重合体、メチル
メタクリレ−トースチレンーブタジエン共重合体、アク
リロニトリル−スチレンーブタジエン共重合体、ウレタ
ンエラストマー、ポリアミド樹脂、エチレンープロピレ
ンージエンターポリマー、エポキシ変性ポリブタジエン
樹脂等が例示される。
Various other additives used in the molding of vinyl chloride resins include fillers, heat resistance improvers, antioxidants, ultraviolet absorbers, antistatic agents, anti-drop agents, pigments, dyes, crosslinking aids, etc. Ru. Furthermore, various polymeric rubber elastic bodies may be blended, and examples of this polymeric comb elastic body include ethylene-vinyl acetate copolymer, acrylonitrile-butadiene copolymer, styrene-acrylonitrile copolymer, and methyl methacrylate copolymer. Examples include styrene-butadiene copolymer, acrylonitrile-styrene-butadiene copolymer, urethane elastomer, polyamide resin, ethylene-propylene-diene terpolymer, and epoxy-modified polybutadiene resin.

なお、これらは塩化ビニル系樹脂10鍾量部あたり5鍾
量部以下の配合量で使用することが望ましい。塩化ビニ
ル系樹脂成形品を得る方法は、押出成形、射出成形、カ
レンダー成形、インフレーシヨン成形、圧縮成形等従来
塩化ビニル樹脂の成形で採用されている成形手段によれ
ばよく、成形品の種類、形状については特に制限はない
。本発明の方法はこのようにして得られる塩化ビニル系
樹脂成形品の表面を窒素原子含有有機化合物の低温プラ
ズマで処理するのであるが、この処理に使用される窒素
原子含有有機化合物としては、前記した各一般式で示さ
れるものが望ましく、具体的にはメチルアミン、ジメチ
ルアミン、トリメチルアミン、n−プロピルアミン、ジ
ーn−プロピルアミン、トリーn−プロピルアミン、n
−ブチルアミン、n−アミルアミン、n−ヘキシルアミ
ン、ラウリルアミン、エチレンジアミン、トリメチレン
ジアミン、ヘキサメチレンジアミン、エタノールアミン
、ジエタノールアミン、アリルアミン、アニリン、アラ
ニン、N−メチルアニリン、アリルジメチルアミン、2
−アミノエチルエーテル、1−ジメチルアミノー2−ク
ロルエタン、シクロプロピルアミン、シクロヘキシルア
ミン、エチレンイミン、1−メチルエチレンイミン、ホ
ルムアミド、N,N−ジメチルホルムアミド、カプロン
アミド、アミノアセタール、ベンジルアミン、ピペリジ
ン、ピロリジン、モルホリン等のアミン類、イミン類、
アミド類、イミド類、それらの誘導体が例示される。
It is desirable to use these in an amount of 5 parts by weight or less per 10 parts by weight of the vinyl chloride resin. The method for obtaining a vinyl chloride resin molded product may be any conventional molding method used for molding vinyl chloride resin, such as extrusion molding, injection molding, calendar molding, inflation molding, or compression molding, depending on the type of molded product. , there are no particular restrictions on the shape. In the method of the present invention, the surface of the vinyl chloride resin molded article thus obtained is treated with low-temperature plasma of a nitrogen atom-containing organic compound. Preferably, those represented by the following general formulas include methylamine, dimethylamine, trimethylamine, n-propylamine, di-n-propylamine, tri-n-propylamine, and n-propylamine.
-Butylamine, n-amylamine, n-hexylamine, laurylamine, ethylenediamine, trimethylenediamine, hexamethylenediamine, ethanolamine, diethanolamine, allylamine, aniline, alanine, N-methylaniline, allyldimethylamine, 2
-aminoethyl ether, 1-dimethylamino-2-chloroethane, cyclopropylamine, cyclohexylamine, ethyleneimine, 1-methylethyleneimine, formamide, N,N-dimethylformamide, capronamide, aminoacetal, benzylamine, piperidine, Amines such as pyrrolidine and morpholine, imines,
Amides, imides, and derivatives thereof are exemplified.

これらの化合物のうち高沸点(低蒸気圧)のものは加熱
等の操作でガス状として用いればよい。窒素原子含有有
機化合物の低温プラズマを発生させる際の装置内におけ
る窒素原子含有有機化合物の圧力は10−3〜10トル
(好ましくは0.01トル〜5トル)とすることがよく
、これにより目的とする低温プラズマを良好に発生させ
ることができる。
Among these compounds, those having a high boiling point (low vapor pressure) may be used in a gaseous state by heating or other operations. When generating a low-temperature plasma of a nitrogen atom-containing organic compound, the pressure of the nitrogen atom-containing organic compound in the device is often 10-3 to 10 Torr (preferably 0.01 Torr to 5 Torr). A low-temperature plasma can be generated satisfactorily.

したがつて窒素原子含有有機化合物はかかる圧力のガス
体として存在し得る蒸気圧をもつものであれはよく、そ
れ故比較的大きな分子量のものも使用することがてきる
。なお、窒素原子含有有機化合物はその1種または2種
以上を使用する場合のほか、これら窒素原子含有有機化
合物に無機ガスを併用してもよく、この無機ガスとして
はヘリウム、ネオン、アルゴン、窒素、亜酸化窒素、一
酸化窒素、二酸化窒素、酸素、空気、一酸化炭素、二酸
化炭素、水素、シアン化臭素、亜硫酸ガス、硫化水素な
どが例示され、これらのガスは単独または混合して使用
される。
Therefore, the nitrogen atom-containing organic compound may be one having a vapor pressure that allows it to exist as a gas at such a pressure, and therefore those having a relatively large molecular weight can also be used. In addition to using one type or two or more types of nitrogen atom-containing organic compounds, these nitrogen atom-containing organic compounds may be used in combination with an inorganic gas, and examples of this inorganic gas include helium, neon, argon, and nitrogen. , nitrous oxide, nitrogen monoxide, nitrogen dioxide, oxygen, air, carbon monoxide, carbon dioxide, hydrogen, bromine cyanide, sulfur dioxide gas, hydrogen sulfide, etc. These gases may be used alone or in combination. Ru.

これらのガスのプラズマ発生装置内におけるガス圧力(
分圧)は、窒素原子含有有機化合物の分圧の1110以
下とするかまたは0.5トル以下の分圧とすることが望
ましく、こうすることによより目的とする低温プラズマ
を良好に発生させることができる。低温プラズマを発生
させる条件としては、たとえば電極間に数KHz〜数百
MHzの高周波電力を印加すれぱよく、放電は有極放電
、無電極放電のいずれでも十分な結果が得られる。
The gas pressure of these gases in the plasma generator (
It is desirable that the partial pressure (partial pressure) be 1110 or less of the partial pressure of the nitrogen atom-containing organic compound, or 0.5 torr or less, so that the desired low-temperature plasma can be generated better. be able to. The conditions for generating low-temperature plasma include, for example, applying high frequency power of several KHz to several hundred MHz between the electrodes, and sufficient results can be obtained with either polar discharge or electrodeless discharge.

プラズマ処理時間は印加電圧によつても相違するが、一
般には数秒から数十分とすることで十分である。なお、
プラズマ処理には上記の方法以外にも種々あり、たとえ
は放電周波数帯としては低周波、マイクロ波、直流など
を用いることができ、また、電極も外部電極のほか内部
電極、コイル型など容量結合、誘導結合のいずれでもよ
い。
The plasma processing time varies depending on the applied voltage, but generally a few seconds to several tens of minutes is sufficient. In addition,
There are various methods for plasma treatment other than the above.For example, low frequency, microwave, direct current, etc. can be used as the discharge frequency band, and the electrodes can be capacitively coupled, such as internal electrodes, coil type, etc. in addition to external electrodes. or inductive coupling.

しかし、どのような方法をとつても放電熱により材料表
面が変質しないようにしなければならない。本発明の方
法は上記のようにして塩化ビニル系樹脂成形品を低温プ
ラズマ処理した後、この処理面にハロゲン、ハロゲン化
水素またはハロゲン化物を接触させることにより処理を
完了するのであるが、このハロゲンとしてはフッ素、塩
素、臭l素、ヨウ素などが、ハロゲン化水素としては塩
化水素、臭化水素、ヨウ化水素、フッ化水素などが例示
される。また有機ハロゲン化物としてはフッ化n−プロ
ピル、塩化メチル、臭化メチル、塩化アリル、塩化ビニ
ル、臭化ビニル、塩化イソプロ門ペニル、1,1,2−
トリフツ化エタン、1,1−ジクロロエタン、クロロホ
ルム、四塩化炭素等が例示される。成形品の低温プラズ
マ処理面に、これらハロゲン、ハロゲン化水素または有
機ハロゲン化物を接触させる手段としては、ガス状接触
フまたは液状接触のいずれでもよい。ガス状接触では例
えば臭素、ヨウ素、塩化アリル、クロロホルム、四塩化
炭素等については加熱および/または減圧でガス状とし
た後接触操作を行えばよく、他方液状接触では、例えば
フッ素、フッ化水素、塩素、塩化水素、臭化水素、ヨウ
化水素、塩化メチル、塩化ビニル等については冷却およ
び/または加圧下て液状とした後接触操作を行えばよい
。接触操作および接触完了後の余分な接触物の除去を考
慮するとガス状接触いわゆるドライ接触処理が望ましい
。またこの場合の接触圧力は10トル以上てあることが
処理効率上好ましく、接触時間は圧力、ガス温度、成形
品表面の温度等によつて異なるが、通常は数十秒から数
十分とすることで目的とする改質が行われる。本発明の
方法によつて処理された塩化ビニル系樹脂成形品は、機
械的強度等の本来的物性が何ら損われす、表面が改質さ
れることにより前記した帯電防止性、耐汚染性にすぐれ
るほか、耐摩耗性、接着性、耐熱性、ぬれ性、印刷性等
にすぐれているという長所を有する。
However, whatever method is used, it is necessary to prevent the surface of the material from deteriorating due to discharge heat. In the method of the present invention, after a vinyl chloride resin molded article is subjected to low-temperature plasma treatment as described above, the treatment is completed by bringing the treated surface into contact with halogen, hydrogen halide, or a halide. Examples of hydrogen halides include fluorine, chlorine, bromine, and iodine, and hydrogen halides include hydrogen chloride, hydrogen bromide, hydrogen iodide, and hydrogen fluoride. Examples of organic halides include n-propyl fluoride, methyl chloride, methyl bromide, allyl chloride, vinyl chloride, vinyl bromide, isopropenyl chloride, 1,1,2-
Examples include trifufluorinated ethane, 1,1-dichloroethane, chloroform, and carbon tetrachloride. The means for bringing the halogen, hydrogen halide, or organic halide into contact with the low-temperature plasma-treated surface of the molded article may be either gaseous contact or liquid contact. In gaseous contact, for example, bromine, iodine, allyl chloride, chloroform, carbon tetrachloride, etc. may be made gaseous by heating and/or reduced pressure, and then the contact operation is performed, while in liquid contact, for example, fluorine, hydrogen fluoride, Chlorine, hydrogen chloride, hydrogen bromide, hydrogen iodide, methyl chloride, vinyl chloride, etc. may be liquefied by cooling and/or under pressure and then subjected to a contact operation. In consideration of the contact operation and the removal of excess contact material after the contact is completed, gaseous contact, so-called dry contact treatment is desirable. In this case, it is preferable for the contact pressure to be 10 torr or more in terms of processing efficiency, and the contact time varies depending on the pressure, gas temperature, temperature of the molded product surface, etc., but is usually from several tens of seconds to several tens of minutes. This allows the desired modification to occur. The vinyl chloride resin molded product treated by the method of the present invention does not lose any of its original physical properties such as mechanical strength, but has the above-mentioned antistatic properties and stain resistance due to surface modification. In addition, it has other advantages such as excellent abrasion resistance, adhesion, heat resistance, wettability, and printability.

つぎに具体的実施例をあげる。Next, specific examples will be given.

実験NO.l 塩化ビニル樹脂10喧量部、DOPl鍾量部、ジブチル
すずメルカプタイド1重量部、カルシウムステアレート
0.踵量部、亜鉛ステアレート0.3重量部、エポキシ
化大豆油1重量部からなる配合物を170゜Cてl吟間
ロール混練し、これを175℃てブレス成形し、厚さ0
.5Tf$tのシートを作成した(未処理シート)。
Experiment No. l 10 parts by weight of vinyl chloride resin, 1 part by weight of DOPl, 1 part by weight of dibutyltin mercaptide, 0.0 parts by weight of calcium stearate. A blend of heel weight, 0.3 parts by weight of zinc stearate, and 1 part by weight of epoxidized soybean oil was kneaded with a roll at 170°C, and then press-molded at 175°C to a thickness of 0.
.. A sheet of 5Tf$t was created (unprocessed sheet).

このシートをプラズマ発生装置内にセットし、装置内を
10−6トルまで真空にした後窒素ガスを導入し、ガス
流通下、装置内を0.1トルに調整保持した。つぎに装
置内にエチルアミンガスを導入し窒素ガスと混合し、ガ
ス流通下、装置内を0.3トルに.調整保持し、13.
56MHz1KWの高周波電力を与えて低温プラズマを
発生させシートを3分間処理した(処理シート1)。
This sheet was set in a plasma generator, and after evacuating the inside of the apparatus to 10<-6> Torr, nitrogen gas was introduced and the inside of the apparatus was adjusted and maintained at 0.1 Torr while the gas was flowing. Next, ethylamine gas was introduced into the device, mixed with nitrogen gas, and the temperature inside the device was adjusted to 0.3 Torr under gas flow. Adjust and hold; 13.
High-frequency power of 56 MHz and 1 KW was applied to generate low-temperature plasma, and the sheet was treated for 3 minutes (treated sheet 1).

その後装置内を10−3トルまて減圧した後、塩素ガス
を導入し、内圧100トルとなつたところで導.”入を
やめ、100トル下5分間放置し、シートを塩素ガスと
接触処理させた(処理シート2)。
After that, the pressure inside the apparatus was reduced to 10-3 Torr, and then chlorine gas was introduced, and when the internal pressure reached 100 Torr, it was introduced. The heating was stopped and the sheet was left under 100 Torr for 5 minutes to contact the sheet with chlorine gas (treated sheet 2).

このようにして処理したシート1および2、および処理
を行わなかつたシートについて、タバコ灰吸着距離、表
面固有抵抗および摩擦帯電圧を測・定したところ、下記
の結果が得られた。実験NO.2実験NO.lと同じ成
形シートを使用し、このシートをプラズマ発生装置内に
セットし、装置内を10−6トルまで真空にした後アル
ゴンガスを導入し、流通下、装置内を0.6トルに調整
保持した。
When the tobacco ash adsorption distance, surface resistivity, and frictional charging voltage were measured for sheets 1 and 2 treated in this manner and sheets that were not treated, the following results were obtained. Experiment No. 2 Experiment No. Using the same molded sheet as in I, set this sheet in a plasma generator, evacuate the inside of the device to 10-6 torr, then introduce argon gas and adjust the inside of the device to 0.6 torr while circulating. held.

つぎに装置内にエチルアミンガスを導入し、アルゴンと
混合しつつ装置内を1.2トルに調整保持した。この系
に13.56MHz800Wの高周波電力を与えて低温
プラズマを発生させシートを5分間処理した。その後処
理シートを取り出し、真空装置内に入れ1トルまて減圧
後、塩素ガスを導入し内圧100トルとなつたところて
導入をやめ、100トル下10分間放置しシートを塩素
ガスと接触処理させた。
Next, ethylamine gas was introduced into the apparatus, and while being mixed with argon, the inside of the apparatus was adjusted and maintained at 1.2 torr. A high frequency power of 13.56 MHz and 800 W was applied to this system to generate low temperature plasma, and the sheet was treated for 5 minutes. After that, the treated sheet was taken out, placed in a vacuum device, and the pressure was reduced to 1 Torr, then chlorine gas was introduced, and when the internal pressure reached 100 Torr, the introduction was stopped, and the sheet was left under 100 Torr for 10 minutes to be brought into contact with the chlorine gas. Ta.

この処理シートについて実験NO.lと同様にして物性
を測定したところ、結果は下記のとおりであつた。実験
NO.3 塩化ビニル樹脂10唾量部、鉛ステアレート2.5重量
部、三塩基性硫酸鉛0.5重量部、バリウムステアレー
ト0.5重量部、ポリエチレンワックス0.3重量部か
らなる配合物をロールにて180℃で10分間混練し、
これを185℃でブレス成形して厚さ1順のシートを作
成した。
Regarding this treated sheet, experiment No. The physical properties were measured in the same manner as 1, and the results were as follows. Experiment No. 3. A blend consisting of 10 parts by weight of vinyl chloride resin, 2.5 parts by weight of lead stearate, 0.5 parts by weight of tribasic lead sulfate, 0.5 parts by weight of barium stearate, and 0.3 parts by weight of polyethylene wax. Knead with a roll for 10 minutes at 180°C,
This was press-molded at 185° C. to produce sheets of one thickness.

このシートをプラズマ発生装置内にセットし、装置内を
10−6トルまで真空にした後、炭酸ガスを導入し、ガ
ス流通下、装置内を0.05トルに調整保持した。
This sheet was set in a plasma generator, and after the inside of the apparatus was evacuated to 10<-6> Torr, carbon dioxide gas was introduced and the inside of the apparatus was adjusted and maintained at 0.05 Torr while gas was flowing.

つぎに装置内にアリルアミンガスを導入し、炭酸ガスと
混合しつつ、装置内を1トルに調整保持し、13.56
MHz1KWの高周波電力を与えて低温プラズマを発生
させシートを5分間処理した。その後装置内を10−3
トルまで減圧した後塩化水素ガスを導入し、内圧450
トルとなつたところで導入をやめて1紛間放置し、シー
トを塩化水素ガスと接触処理させた。
Next, allylamine gas was introduced into the device, and while mixing with carbon dioxide gas, the inside of the device was adjusted and maintained at 1 Torr.
High frequency power of MHz 1 KW was applied to generate low temperature plasma and the sheet was treated for 5 minutes. Afterwards, check the inside of the device by 10-3.
After reducing the pressure to 450 torr, hydrogen chloride gas was introduced to
When the temperature reached a certain level, the introduction was stopped and the sheet was left standing for one hour, and the sheet was brought into contact with hydrogen chloride gas.

このようにして処理したシートおよびプラズブ処理を行
わなかつたシートについて実験NO.lと同様にして物
性を測定したところ、結果は下記に示すとおりであつた
Experiment No. 1 was obtained for sheets treated in this manner and sheets not subjected to plasma treatment. The physical properties were measured in the same manner as in 1, and the results were as shown below.

実験NO.4 実験NO3と同じシートを使用し、このシートをプラズ
マ発生装置内にセットし、装置内を10−6トルまて減
圧した後炭酸ガスを導入し、ガス流通下装置内を0.7
トルに調整保持した。
Experiment No. 4 Using the same sheet as in Experiment No. 3, set this sheet in the plasma generator, reduce the pressure inside the device to 10-6 Torr, then introduce carbon dioxide gas, and reduce the pressure inside the device to 0.7 Torr under gas flow.
Adjusted and held to the torque.

つぎに装置内にアリルアミンガスを導入し炭酸ガスと混
合しつつ装置内を1.7トルに調整保持し、13.56
MHz1KWの高周波電力を与えて低温プラズマを発生
させ、シートを5分間処理した。
Next, allylamine gas was introduced into the device, mixed with carbon dioxide gas, and the inside of the device was adjusted and maintained at 1.7 Torr.
High-frequency power of MHz 1 KW was applied to generate low-temperature plasma, and the sheet was treated for 5 minutes.

この処理シートについて実験NO.lと同様にして物性
を測定したところ、結果は下記のとおりてあつた。実験
NO5 実験NO.3と同じ成形シートを使用し、このシートを
プラズマ発生装置内にセットし装置内を10−6トルま
で減圧した後アルゴンガスを導入し装置内を0.05ト
ルに調整保持した。
Regarding this treated sheet, experiment No. The physical properties were measured in the same manner as in 1, and the results were as follows. Experiment No. 5 Experiment No. Using the same molded sheet as in Example 3, this sheet was set in a plasma generator and the pressure inside the apparatus was reduced to 10<-6> Torr, and then argon gas was introduced to adjust and maintain the inside of the apparatus at 0.05 Torr.

つぎにこの装置内にジメチルアミンガスを導入しアルゴ
ンと混合しつつ装置内を0.08トルに調整保持し11
0KHz2KWの高周波電力を与えて低温プラズマを発
生させシートを2分間処理した。その後処理シートを取
り出し、真空装置内に入れ100トルまで減圧後塩素ガ
スを導入し内圧15叶ルとなつたところで導入をやめ5
分間放置し、シートを塩素ガスと接触処理させた。
Next, dimethylamine gas was introduced into this device, and while mixing with argon, the inside of the device was adjusted and maintained at 0.08 Torr.
A high frequency power of 0 KHz and 2 KW was applied to generate low temperature plasma and the sheet was treated for 2 minutes. After that, take out the treated sheet, put it in a vacuum device, reduce the pressure to 100 Torr, introduce chlorine gas, and stop introducing it when the internal pressure reaches 15 Torr.
The sheet was allowed to stand for a minute and was brought into contact with chlorine gas.

この処理シートについて実験NO.lと同様にして物性
を測定したところ、結果は下記のとおりであつた。
Regarding this treated sheet, experiment No. The physical properties were measured in the same manner as 1, and the results were as follows.

実験NO.6 実験NO.3と同じシートを使用し、この成形シートを
プラズマ発生装置内にセットし、装置内を10−6トル
まで減圧した後、窒素ガスを導入し、ガス流通下装置内
を0.3トルに調整保持した。
Experiment No. 6 Experiment No. Using the same sheet as in 3, set this formed sheet in a plasma generator, reduce the pressure inside the device to 10-6 torr, then introduce nitrogen gas and adjust the inside of the device to 0.3 torr under gas flow. held.

つぎに装置内にジメチルホルムアミドガスを導入して窒
素ガスと混合しつつ装置内を0.4トルに調整保持し、
13.56MHz2KWの高周波電力を与えて低温プラ
ズマを発生させシートを3分間処理した。その後処理シ
ートを取り出し、減圧装置内に入れ0.1トルまて減圧
後加温した塩化アリルガスを導入し、内圧を76叶ルと
して1吟間放置し、シl−トを塩化アリルと接触処理さ
せた。この処理シートについて実験NO.lと同様にし
て物性を測定したところ、結果は下記のとおりであつた
Next, dimethylformamide gas is introduced into the device and mixed with nitrogen gas while adjusting and maintaining the inside of the device at 0.4 torr.
High frequency power of 13.56 MHz 2 KW was applied to generate low temperature plasma and the sheet was treated for 3 minutes. After that, the treated sheet was taken out, put into a decompression device, and the pressure was reduced to 0.1 Torr, then heated allyl chloride gas was introduced, the internal pressure was set to 76 degrees, and it was left for 1 minute, and the silt was brought into contact with allyl chloride. I let it happen. Regarding this treated sheet, experiment No. The physical properties were measured in the same manner as 1, and the results were as follows.

実験NO.7 塩化ビニルー酢酸ビニル共重合体(SC−400G:信
越化学工業製)10唾量部、ジブチルすノずメルカプタ
イド3重量部、エポキシ化大豆油2重量部、カルシウム
ステアレート0.5重量部からなる配合物を180゜C
て1紛間ロール混練し、これを185゜Cでブレス成形
し、厚さ1Tnのシートを作成した。
Experiment No. 7 Consisting of 10 parts by weight of vinyl chloride-vinyl acetate copolymer (SC-400G: Shin-Etsu Chemical Co., Ltd.), 3 parts by weight of dibutyl tin mercaptide, 2 parts by weight of epoxidized soybean oil, and 0.5 parts by weight of calcium stearate. The mixture was heated to 180°C.
The mixture was kneaded with one powder roll and press-molded at 185°C to form a sheet with a thickness of 1Tn.

Claims (1)

【特許請求の範囲】 1 塩化ビニル系樹脂成形品を10トル以下の窒素原子
含有有機化合物(ただし有機けい素化合物を除く)の低
温プラズマに曝し、ついでこの低温プラズマ処理面にハ
ロゲン、ハロゲン化水素または有機ハロゲン化物を接触
させることを特徴とする塩化ビニル系樹脂成形品の表面
処理方法。 2 前記窒素原子含有有機化合物が、一般式▲数式、化
学式、表等があります▼(式中、R^1は置換もしくは
非置換の一価炭化水素基、R^2およびR^3は水素原
子または置換もしくは非置換一価炭化水素基)で示され
る化合物である特許請求の範囲第1項記載の表面処理方
法。 3 前記窒素原子含有有機化合物が一般式▲数式、化学
式、表等があります▼ (式中、R^5およびR^6は水素原子または置換もし
くは非置換の一価炭化水素基)で示される化合物である
特許請求の範囲第1項記載の表面処理方法。 4 前記低温プラズマのガスふん囲気が (イ)ガス分圧10^−^3〜10トルの窒素原子含有
有機化合物と、(ロ)ガス分圧10^−^4〜10トル
の無機ガスとからなることを特徴とする特許請求の範囲
第1項記載の表面処理方法。
[Claims] 1. A vinyl chloride resin molded product is exposed to low-temperature plasma of a nitrogen atom-containing organic compound (excluding organic silicon compounds) at 10 torr or less, and then halogen or hydrogen halide is applied to the low-temperature plasma-treated surface. Alternatively, a method for surface treatment of a vinyl chloride resin molded article, which comprises contacting with an organic halide. 2 The nitrogen atom-containing organic compound has a general formula ▲ mathematical formula, chemical formula, table, etc. ▼ (in the formula, R^1 is a substituted or unsubstituted monovalent hydrocarbon group, R^2 and R^3 are hydrogen atoms or a substituted or unsubstituted monovalent hydrocarbon group). 3 The nitrogen atom-containing organic compound is a compound represented by the general formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (In the formula, R^5 and R^6 are hydrogen atoms or substituted or unsubstituted monovalent hydrocarbon groups) A surface treatment method according to claim 1. 4. The gas atmosphere of the low-temperature plasma is composed of (a) a nitrogen atom-containing organic compound with a gas partial pressure of 10^-^3 to 10 Torr, and (b) an inorganic gas with a gas partial pressure of 10^-^4 to 10 Torr. The surface treatment method according to claim 1, characterized in that:
JP12809480A 1980-09-16 1980-09-16 Surface treatment method for vinyl chloride resin molded products Expired JPS6059252B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP12809480A JPS6059252B2 (en) 1980-09-16 1980-09-16 Surface treatment method for vinyl chloride resin molded products
NL8104230A NL8104230A (en) 1980-09-16 1981-09-14 METHOD FOR CHANGING THE SURFACE PROPERTIES OF ARTICLES FORMED FROM PLASTICS
US06/301,536 US4395434A (en) 1980-09-16 1981-09-14 Method for improving surface properties of shaped articles of synthetic resins
DE19813136574 DE3136574A1 (en) 1980-09-16 1981-09-15 METHOD FOR MODIFYING THE SURFACE PROPERTIES OF PLASTIC MOLDS
GB8127854A GB2084159B (en) 1980-09-16 1981-09-15 A method for improving surface properties of shaped articles of synthetic resins

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12809480A JPS6059252B2 (en) 1980-09-16 1980-09-16 Surface treatment method for vinyl chloride resin molded products

Publications (2)

Publication Number Publication Date
JPS5753541A JPS5753541A (en) 1982-03-30
JPS6059252B2 true JPS6059252B2 (en) 1985-12-24

Family

ID=14976244

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12809480A Expired JPS6059252B2 (en) 1980-09-16 1980-09-16 Surface treatment method for vinyl chloride resin molded products

Country Status (1)

Country Link
JP (1) JPS6059252B2 (en)

Also Published As

Publication number Publication date
JPS5753541A (en) 1982-03-30

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