JPS6055316B2 - Manufacturing method of thermal recording head - Google Patents

Manufacturing method of thermal recording head

Info

Publication number
JPS6055316B2
JPS6055316B2 JP52133754A JP13375477A JPS6055316B2 JP S6055316 B2 JPS6055316 B2 JP S6055316B2 JP 52133754 A JP52133754 A JP 52133754A JP 13375477 A JP13375477 A JP 13375477A JP S6055316 B2 JPS6055316 B2 JP S6055316B2
Authority
JP
Japan
Prior art keywords
insulating layer
heat
resistor
recording head
thermal recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52133754A
Other languages
Japanese (ja)
Other versions
JPS5466850A (en
Inventor
正昭 片桐
邦雄 川口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP52133754A priority Critical patent/JPS6055316B2/en
Publication of JPS5466850A publication Critical patent/JPS5466850A/en
Publication of JPS6055316B2 publication Critical patent/JPS6055316B2/en
Expired legal-status Critical Current

Links

Description

【発明の詳細な説明】 本発明は、ファクシミリ装置等の受信部て使用される感
熱記録ヘッドの製造法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a thermal recording head used in a receiving section of a facsimile machine or the like.

最近電気通信技術によつて文書、図面を伝送するファク
シミリ装置の利用発達はめざましく特に安価なファクシ
ミリ装置としては感熱記録方式のものが注目されてきて
いる。
Recently, the use of facsimile machines for transmitting documents and drawings using telecommunications technology has been rapidly progressing, and thermal recording type facsimile machines are attracting particular attention as inexpensive facsimile machines.

これら感熱記録方式の最重要部は感熱記録ヘッドでこれ
らヘッドの製造方法としては薄膜方式、厚膜方式および
モノシリツク方式などがある。
The most important part of these thermal recording systems is a thermal recording head, and methods for manufacturing these heads include a thin film system, a thick film system, and a monolithic system.

薄膜方式および厚膜方式とも基板はアルミナ磁器、ベリ
リア磁器などで厚さ1.6〜2』一、寸法は130×2
20−mn程度のものが使用されており、モノシリツク
方式では基板はn型シリコンを使用している。またこれ
ら基板上に構成させる発熱体の抵抗体としては前2者の
ものについてはTa。N、SnO。、Pd/Agベース
I・などを蒸着または焼付けしたもの、またモノシリツ
ク方式ではトランジスタ発熱体などを使用し、また前2
者の表面保護層としてはSiC)ガラスなどを用いて高
温で焼付けている。しかるに従来のセラミック基板を用
いているものは、熱の伝導性がよくないため放熱性に劣
ること、寸法が300wn程度と大きく、その平面度の
良いものを得ることがむづかしいこと、高価につくこと
、加工性が劣ること製造が容易でないなどの欠点があり
、またn型シリコン基板は高価となる欠点がある。
In both the thin film method and the thick film method, the substrate is made of alumina porcelain, beryllia porcelain, etc., with a thickness of 1.6 to 2", and the dimensions are 130 x 2.
A material with a thickness of about 20-mn is used, and in the monosilicon method, the substrate is made of n-type silicon. The resistors of the heating elements constructed on these substrates are Ta for the former two. N, SnO. , Pd/Ag base I, etc., are vapor-deposited or baked, and in the monolithic system, a transistor heating element is used, and the previous two
The protective layer on the surface of the device is made of SiC (SiC) glass or the like and baked at high temperature. However, those using conventional ceramic substrates have poor heat dissipation due to poor thermal conductivity, are large in size of about 300wn, and are difficult to obtain with good flatness, and are expensive. However, they have drawbacks such as poor processability and difficulty in manufacturing, and also have the drawback that n-type silicon substrates are expensive.

従来の薄膜方式および厚膜方式の発熱抵抗体および導体
回路部(特に電極部)は一般にスクリーン印刷法て製造
しているため寸法精度が得られず、写真方法などによる
方法(エツチドフオイル法)で得られるような寸法精度
が得られないため発熱にバラツキが生ずる欠点がある。
またセラミック基板上に回路パターンの製造に際して、
基板に穴あけができないので両面スルーホールメッキを
有するものが得られないためハイブリッド方式または多
層方式で回路を形成しなければならないこと、抵抗体焼
付けおよび保護膜の形成のためには840′C程度の高
温炉で焼成の必要があり基板製造が容易でないこと、あ
とからの穴あけ加工や折曲げ加工ができないなどの欠点
がある。本発明はこのような点に鑑みてなされたもので
、第1の発明は、鉄、銅、アルミニウム、ステンレス、
合金板などの熱伝導性の良い金属板を芯とし、この表面
に積層、塗装、蒸着などの方法で絶縁層を形成させ、少
なくともその一表面上の一部には耐熱性のすぐれた有機
質絶縁層を設け、その耐熱絶縁層上に一定間隔をあけた
直線状の発熱性抵抗体膜パターンとこの膜を挟み、かつ
膜の両側で導通のとれたプリント回路の電極部とを配置
.せしめた感熱記録ヘッドに関するものである。又、第
2の発明は、鉄、銅、アルミニウム、ステンレス、合金
板などの熱伝導性の良い金属板を芯とし、この表面にセ
ラミックの溶射で絶縁層を形成させ、その削熱絶縁層上
に一定間隔をあけた.直線状の発熱性抵抗体膜パターン
とこの膜を挟み、かつ膜の両側て導通のとれたプリント
回路の電極部とを配置せしめた感熱記録ヘッドに関する
ものてある。この感熱記録ヘッドの電極に電圧を印加し
たと・き電極間の抵抗膜が発熱しこの電極に接する感熱
記録紙を発色せしめて印字できる機能を持つている。
Conventional thin-film and thick-film heating resistors and conductor circuit parts (especially electrode parts) are generally manufactured using the screen printing method, which makes it difficult to obtain dimensional accuracy. Since the dimensional accuracy cannot be obtained, there is a drawback that heat generation varies.
Also, when manufacturing circuit patterns on ceramic substrates,
Since it is not possible to drill holes in the board, it is not possible to obtain a circuit with through-hole plating on both sides, so the circuit must be formed using a hybrid method or a multilayer method. There are disadvantages such as the need for firing in a high-temperature furnace, which makes it difficult to manufacture substrates, and the inability to perform subsequent drilling or bending. The present invention has been made in view of these points, and the first invention is based on iron, copper, aluminum, stainless steel,
The core is a metal plate with good thermal conductivity, such as an alloy plate, and an insulating layer is formed on the surface by lamination, painting, vapor deposition, etc., and at least a part of the surface is coated with an organic insulator with excellent heat resistance. A layer is formed, and on the heat-resistant insulating layer, linear heat-generating resistor film patterns are placed at regular intervals, and printed circuit electrodes with conductivity are placed on both sides of the film, sandwiching this film. The present invention relates to a thermal recording head. In addition, the second invention uses a metal plate with good thermal conductivity such as iron, copper, aluminum, stainless steel, or alloy plate as a core, and forms an insulating layer on the surface by thermal spraying of ceramic, and on the heat-reducing insulating layer. at a certain interval. The present invention relates to a thermal recording head in which a linear heat-generating resistor film pattern and electrode portions of a printed circuit sandwiching the film and having conductivity on both sides of the film are arranged. When voltage is applied to the electrodes of this heat-sensitive recording head, the resistive film between the electrodes generates heat, causing the heat-sensitive recording paper in contact with the electrodes to develop color and print.

金属板は厚さ0.8〜1.4T!0n程度のものが仕上
り厚さ1.6wnのプリント配線板を得るために用いら
れる。スルーホールメッキのある両面プリント配線板を
得る場合はあらかじめ金属板にスルーホールメッキ用の
下穴をあけ、接続のための前処理(粗化、防錆)後この
穴部にエポキシ樹脂を充填して半硬化せさておく。
The metal plate is 0.8-1.4T thick! About 0n is used to obtain a printed wiring board with a finished thickness of 1.6wn. When obtaining a double-sided printed wiring board with through-hole plating, pilot holes for through-hole plating are pre-drilled in the metal plate, and after pretreatment (roughening and rust prevention) for connection, these holes are filled with epoxy resin. Leave it to semi-harden.

ついで第1の発明では耐熱性塗料単独または一般の塗料
との併用で浸漬塗装、粉体塗装、電着塗装などにより絶
縁層を形成させる。耐熱性の塗料としてはポリイミド樹
脂、変性ポリイミド樹脂、その他市販の耐熱性のものが
使用でき一般用の塗料としてはエポキシ樹脂を主体とす
るものが使用できる。
Next, in the first invention, an insulating layer is formed by dip coating, powder coating, electrodeposition coating, etc. using a heat-resistant paint alone or in combination with a general paint. As heat-resistant paints, polyimide resins, modified polyimide resins, and other commercially available heat-resistant paints can be used, and as general-purpose paints, paints based on epoxy resins can be used.

また第2の発明では無機質の絶縁層形成はセラミックの
プラズマ溶射によつて得られる。
In the second invention, the inorganic insulating layer is formed by ceramic plasma spraying.

セラミックとしてはα−アルミナなどがすぐれている。
なお絶縁層形成後には樹脂を充填した穴部の中央部に絶
縁性を保てるようにドリルによる穴あけを行なつておく
(スルーホールメッキ用)。耐熱性絶縁層上への発熱性
抵抗体膜の形成は金属合金箔(ニッケルクロムなど)を
接着させるかイオンメッキ又は化学メッキを行なつて作
るか無機質の絶縁層上には一般の焼付用ペーストなどを
焼付けまたは蒸着などで形成する。抵抗体膜のパターン
形成は写真法によりエッチングにより形成するか、写真
法によりレジストマスクを形成してからメッキを行なう
。このはか蒸着またはダイスタンプ法などによつて抵抗
体膜パターンを形成してもよい。電極部を含むパターン
形成は抵抗体膜パターン部の表面をマスクしてから全面
に常法により銅メッキを行なつて穴部および表面に厚さ
20〜35p程度の銅メッキ層を設ける。
α-alumina is an excellent ceramic material.
After forming the insulating layer, a hole is drilled in the center of the resin-filled hole to maintain insulation (for through-hole plating). A heat-generating resistor film can be formed on a heat-resistant insulating layer by adhering a metal alloy foil (nickel chrome, etc.) or by ion plating or chemical plating, or by using a general baking paste on an inorganic insulating layer. etc., by baking or vapor deposition. The pattern of the resistor film is formed by etching using a photographic method, or plating is performed after forming a resist mask using a photographic method. The resistor film pattern may be formed by this flash vapor deposition or die stamping method. To form a pattern including the electrode portion, the surface of the resistor film pattern portion is masked and then copper plating is performed on the entire surface by a conventional method to provide a copper plating layer with a thickness of about 20 to 35 p on the hole portion and the surface.

ついで写真法により電極部を含む回路パターンを形成さ
せて両面プリント配線板とする。このあと電極部にはN
i−Auメッキを行ないその他の導体部は半田メッキを
行なうかまたは絶縁塗膜を設けて防錆させる。片面の感
熱記録ヘッドを作る場合は、金属板は穴あけせず(スル
ーホールメッキがないため)上述と同様に処理してから
絶縁層を形成し、特に耐熱性絶縁層上に抵抗体膜パター
ンを設けこれを挟み側面で導通のとれる電極部を有する
回路パターンを形成して片面プリント配線板とする。こ
のあと電極部にはNi−Auメッキ、他のパターン部は
防錆処理をする。多層にするにはこの片面プリント板土
の電極部以外の部分に積層または塗装により絶縁層(一
般用または耐熱用)を形成し更に回路パターンを設け下
の回路と導通をとれるよ・うに金属メッキすれば多層と
なる。以下図面に基いて本発明を具体的に説明する。
Next, a circuit pattern including electrode portions is formed using a photographic method to obtain a double-sided printed wiring board. After this, N
i-Au plating is applied, and other conductor parts are solder plated or provided with an insulating coating to prevent rust. When making a single-sided thermal recording head, the metal plate is processed in the same manner as above without drilling (because there is no through-hole plating), and then an insulating layer is formed.In particular, a resistor film pattern is formed on the heat-resistant insulating layer. A single-sided printed wiring board is formed by sandwiching this and forming a circuit pattern having conductive electrode portions on the side surfaces. After this, the electrode part is plated with Ni-Au, and the other pattern parts are subjected to anti-corrosion treatment. To make it multi-layered, an insulating layer (general or heat-resistant) is formed by laminating or painting on the parts other than the electrodes of this single-sided printed board, and then a circuit pattern is created and metal plated to establish continuity with the circuit below. This will result in multiple layers. The present invention will be specifically explained below based on the drawings.

第1図は、両面回路パターンを有する感熱記録ヘッドを
示すもので、aは平面図、bは電極部(抵抗体膜を挟む
)の断面図、cはスルーホール部の断面図である。1は
穴あけ後接着の前処理(脱脂、粗化)を行なつた厚さ0
.8〜1.2Trrmの鉄板等の金属板、2は耐熱性積
層絶縁層、3は積層絶縁層、4は耐熱積層絶縁層上に一
定の間隔で直線状に配列させたニクロム箔のエッチング
による抵抗体膜パターン(幅60〜150p好ましくは
100P1長さ300〜500p好ましくは400p1
200〜300Ω)、5は4を挟みその側面で導通のと
れていて、一定間隔の導体電極部、6は表面の回路で、
7は反対面の回路、8はスルーホールメッキ部、9はス
ルーホール内塗の絶縁層である。
FIG. 1 shows a thermal recording head having double-sided circuit patterns, in which a is a plan view, b is a cross-sectional view of an electrode portion (with a resistor film sandwiched therebetween), and c is a cross-sectional view of a through-hole portion. 1 is thickness 0 after pre-treatment (degreasing, roughening) for adhesion after drilling.
.. 8 to 1.2 Trrm metal plate such as iron plate, 2 is a heat-resistant laminated insulating layer, 3 is a laminated insulating layer, 4 is a resistance by etching of nichrome foil arranged linearly at regular intervals on the heat-resistant laminated insulating layer Body membrane pattern (width 60-150p, preferably 100p1, length 300-500p, preferably 400p1)
200 to 300 Ω), 5 is a conductor electrode part that is conductive on the side of 4 and is spaced at regular intervals, 6 is a circuit on the surface,
7 is a circuit on the opposite side, 8 is a through-hole plating part, and 9 is an insulating layer coated inside the through-hole.

電極部5の隣接端子間に電圧を印加すると、その間に挟
まれた抵抗体膜4が発熱し、これに接する感熱記録紙を
発色させることが出来る。第2図は、片面パターンの感
熱記録ヘッドを示すもので、aは平面図、bは電極部の
断面図である。
When a voltage is applied between adjacent terminals of the electrode portion 5, the resistor film 4 sandwiched therebetween generates heat, and the heat-sensitive recording paper in contact therewith can develop color. FIG. 2 shows a single-sided pattern thermal recording head, in which a is a plan view and b is a cross-sectional view of the electrode portion.

1は穴あけをせず接着の前処理を行つた鉄板等の金属板
(0.8〜1.2Tr0it厚さ)、10は耐熱性のポ
リイミド樹脂の塗膜(イ).1〜0.2wrIn厚さ)
、11はニッケルクロムを主体とした抵抗体膜パターン
(箔のエッチングにより形成)、12は11を挟み、そ
の側面て導通のとれている導体電極、13は回路パター
ンである。
1 is a metal plate such as an iron plate (0.8 to 1.2 Tr0it thickness) which has been pretreated for adhesion without drilling, and 10 is a heat-resistant polyimide resin coating (A). 1~0.2wrIn thickness)
, 11 is a resistor film pattern mainly made of nickel chromium (formed by etching a foil), 12 is a conductor electrode sandwiching 11 and conductive on its side, and 13 is a circuit pattern.

抵抗体膜パターンはそれぞれ200〜300Ωの抵抗値
を持たせておき、導体電極12はNi−Auメッキを行
ない、回路パターン13は半田メッキを行う。第3図は
、片面プリント板で曲面を有す感熱記録ヘッドを示すも
のである。
The resistor film patterns each have a resistance value of 200 to 300Ω, the conductor electrode 12 is plated with Ni-Au, and the circuit pattern 13 is plated with solder. FIG. 3 shows a thermal recording head having a curved surface and a single-sided printed board.

14は厚さ1.4wr!nのアルミニウム板であり、端
部に折曲り部がありかつ湾曲した構造を持つている。
14 has a thickness of 1.4wr! It is an aluminum plate with a bent part at the end and a curved structure.

15は変性ポリイミド樹脂の塗装絶縁層、16は抵抗1
00Ωで無電解メッキで形成した抵抗体膜パターン、1
7はアディティブ法で形成した導体電極部(Cuメッキ
→Niメッキ→Auメッキ)、18は取付け穴である。
15 is a painted insulating layer of modified polyimide resin, 16 is a resistor 1
Resistor film pattern formed by electroless plating at 00Ω, 1
7 is a conductor electrode portion formed by an additive method (Cu plating → Ni plating → Au plating), and 18 is a mounting hole.

第4図は、片面上に回路を多層にした場合の感熱記録ヘ
ッドを示すもので、aは電極部の断面図、bは片面上に
回路パターンを形成させた段階の平面図、cはbの、抵
抗体と電極部を除いた回路パターン部分にエポキシ絶縁
塗膜を形成させた段階の平面図、dはcの絶縁層の上に
回路パターンを形成させ、下面のランドと導通をとつて
多層にした段階の平面図である。aに於て1は穴のない
金属板、19は耐熱性の絶縁層(厚さ0.1〜0.2T
1r!n)、20は一般の絶縁層、21は無電解メッキ
により形成した100〜300Ωの抵抗体膜パターン、
22は導体電極部である。bに於て、23は回路パター
ン、24はランドであり、cに示す如く、抵抗体と電極
部を除いた回路パターン部分にエポキシ樹脂塗料による
絶縁塗膜層25を形成し、この絶縁塗膜上にdに示す如
く回路パターン26を設け、ランド24と導通をもつラ
ンド27を設け、2層構造の感熱記録ヘッドとする。第
5図は、耐熱性絶縁層として、プラズマ溶射によるアル
ミナ層を使用した場合の感熱記録ヘッドを示すもので、
A,b,cは製造工程を示す断面図である。
Figure 4 shows a thermal recording head with multiple circuit layers on one side, where a is a cross-sectional view of the electrode section, b is a plan view of the circuit pattern formed on one side, and c is b. Fig. 3 is a plan view of the stage where an epoxy insulating coating film is formed on the circuit pattern part excluding the resistor and electrode part, and d is a plan view after forming the circuit pattern on the insulating layer of c and making conduction with the land on the bottom surface. FIG. 3 is a plan view of a multi-layered stage. In a, 1 is a metal plate without holes, 19 is a heat-resistant insulating layer (thickness 0.1-0.2T)
1r! n), 20 is a general insulating layer, 21 is a 100-300Ω resistor film pattern formed by electroless plating,
22 is a conductor electrode section. In b, 23 is a circuit pattern, 24 is a land, and as shown in c, an insulating coating layer 25 made of epoxy resin paint is formed on the circuit pattern part excluding the resistor and electrode parts, and this insulating coating film A circuit pattern 26 is provided on top as shown in d, and a land 27 that is electrically connected to the land 24 is provided to form a two-layer thermal recording head. Figure 5 shows a thermal recording head in which an alumina layer formed by plasma spraying is used as a heat-resistant insulating layer.
A, b, and c are cross-sectional views showing manufacturing steps.

aに示すように厚さ1.4w$tの鉄板等の金属板1上
に小短形状にプラズマ溶射によりαアルミナを厚さ約2
00pになるように溶射を行ない耐熱性絶縁層28を形
成させ、この上に真空下でイオンメッキをするかまたは
常法でペーストを焼付けて一ノ定間隔で直線状に配列し
た抵抗体膜パターン29を形成させてからbのように一
般のガラスエポキシ系積層絶縁層30を片面はセラミッ
ク28と同一の高さにまた他面は全部に形成させる。
As shown in a, alpha alumina is deposited on a metal plate 1 such as an iron plate with a thickness of 1.4 w$t by plasma spraying in a small rectangular shape to a thickness of about 2 mm.
00p to form a heat-resistant insulating layer 28, and then ion plating is applied under vacuum on this layer or a paste is baked in a conventional manner to form a resistor film pattern arranged linearly at regular intervals. After 29 is formed, a general glass epoxy laminated insulating layer 30 is formed on one side at the same height as the ceramic 28 and on the entire other side as shown in b.

ついでcに示すように絶縁層30の表面に銅メッキ層3
71を形成させ、このあとは写真法により回路を片面上
に形成させ、さらに積層法またはハイブリッド法などに
より回路を多層とし、多層プリント配線板よりなる感熱
記録ヘッドとする。次に本発明の感熱記録ヘッドの製造
法について説明する。
Then, as shown in c, a copper plating layer 3 is formed on the surface of the insulating layer 30.
After that, a circuit is formed on one side by a photographic method, and a multilayer circuit is formed by a lamination method or a hybrid method to obtain a thermal recording head made of a multilayer printed wiring board. Next, a method for manufacturing the thermal recording head of the present invention will be explained.

〔製造法1(第1の発明)〕 あらかじめ穴をあけるかもしくは穴をあけない金属板を
脱脂、粗化等の接着のための前処理を行ない、燐酸鉄、
燐酸亜鉛処理等の化成処理により耐蝕性を付与してから
耐熱性の絶縁塗膜単独または耐熱塗膜と一般塗膜との併
用の塗膜を形成させてから、特に耐熱性塗膜上にメッキ
法によソー定の抵抗値を有する抵抗体パターンを一定間
隔でしかも直線状に配列せしめ、さらにこれを挟み側面
で導通のとれる回路パターンの電極部を形成させるかも
しくは先に一定間隔の電極部を有する導電回路パターン
を耐熱塗膜上に形成させそのあとこの電極間に一定の抵
抗値を有する抵抗体をメッキ方法または塗装後の焼付け
により導通のとれるごとく形成させ片面か多層かまたは
両面プリント配線板を得さらにこれを折曲げるか若しく
は折曲げずに感熱記録ヘッドとする。
[Manufacturing method 1 (first invention)] A metal plate with or without holes is subjected to pretreatment for adhesion such as degreasing and roughening, and iron phosphate,
After imparting corrosion resistance through chemical conversion treatment such as zinc phosphate treatment, forming a heat-resistant insulating coating alone or a combination of a heat-resistant coating and a general coating, and then plating on the heat-resistant coating. By the method, resistor patterns having a constant resistance value are arranged in a straight line at regular intervals, and then the electrodes of a circuit pattern that can be electrically conductive are formed by sandwiching the resistor patterns on the side surfaces, or the electrode parts are first arranged at regular intervals. A conductive circuit pattern is formed on a heat-resistant coating film, and then a resistor having a certain resistance value is formed between the electrodes by plating or baking after painting to ensure continuity, and single-sided, multilayer, or double-sided printed wiring is created. A plate is obtained and then bent or unbent to form a thermal recording head.

第6図は、この製造法の一例を示すもので、A,b,c
は製造工程を示す断面図である。
Figure 6 shows an example of this manufacturing method, with A, b, c
FIG. 2 is a cross-sectional view showing the manufacturing process.

厚さ1.2Tr0rLの鉄板等の金属板1を穴あけをせ
すに表面の脱脂、塩化第二鉄で表面粗化を行ない常法の
燐酸鉄処理で耐蝕性を付与してからポリイミド系液体塗
料32の浸漬法により厚さ150pの皮膜を両表面上に
形成させる。この皮膜を液体ホーニングにより表面粗化
を行なつてから片面上に金属メッキ抵抗体膜を(厚さ5
μ)パネルメッキする。ついで写真法によソー定間隔で
しかも直線状に配列せしめるごとくパターン33を形成
させる(抵抗値200Ωとするようにする)。抵抗体パ
ターン上のレジストを残したま)で次は銅メッキを行な
い(厚さ3?)、抵抗体パターンの側面で導通がとれし
かもその面上にのみパネルメッキをする。ついで回路パ
ターンを形成させて電極部34を.はじめ一般片面回路
を形成させる。
A metal plate 1 such as an iron plate with a thickness of 1.2 Tr0rL is made by drilling holes, degreasing the surface, roughening the surface with ferric chloride, giving it corrosion resistance by a conventional iron phosphate treatment, and then applying a polyimide liquid paint. A film with a thickness of 150p is formed on both surfaces by the dipping method of No. 32. After roughening the surface of this film by liquid honing, a metal-plated resistor film (with a thickness of 5
μ) Panel plating. Then, using a photographic method, patterns 33 are formed so as to be arranged at regular intervals and in a straight line (with a resistance value of 200Ω). Next, copper plating is performed (with the resist on the resistor pattern remaining) (to a thickness of 3?), and the panel plating is performed only on that side to ensure continuity on the side of the resistor pattern. Next, a circuit pattern is formed to form the electrode portion 34. First, a general single-sided circuit is formed.

このとき必要ならば、抵抗を別に回路部にさらに印刷に
より又は焼付けにより設けて多機能プリント板とするこ
とも出来る。かくて得た金属芯プリント配線板に半田レ
ジスト膜をカバーコートしてから発熱電極!部が、感熱
記録紙と接触がよいように180rfnR程度に湾曲さ
せて感熱記録ヘッドとする。この方法によれば、塗膜絶
縁層を塗装により形成されるので製造容易であり、しか
も安価に得られ抵抗体パターンは金属メッキ法で得るの
で従来4のように高熱で焼付ける必要がなく寸法精度の
良い長所があり金属芯の使用と相俟つて全体が安価とな
り熱放散性のすぐれた感熱記録ヘッドが得られる。
At this time, if necessary, a resistor can be provided separately in the circuit section by printing or baking to obtain a multifunctional printed board. After covering the metal core printed wiring board obtained in this way with a solder resist film, heat generating electrodes are installed! The portion is curved to about 180rfnR so as to make good contact with the thermal recording paper to form a thermal recording head. According to this method, the insulating film layer is formed by painting, so it is easy to manufacture and can be obtained at a low cost.The resistor pattern is obtained by metal plating, so there is no need to bake it at high heat as in the conventional method 4. This has the advantage of high precision, and when combined with the use of a metal core, the overall cost is low and a thermal recording head with excellent heat dissipation properties can be obtained.

〔製造法2(第2の発明)〕 あらかじめ穴あけを行なうかもしくは穴あけをしない厚
さ1.0〜2.Chmのステンレス、鉄、銅、アルミニ
ウム板等の金属板を接着のための前処理を行なつてから
、その表面の一部分にプラズマ溶射によりセラミック(
α−アルミナなど)の薄膜を短形状に形成せしめ(厚さ
100〜200p)、その上に導電ペーストを一定間隔
で直線上に焼付ける。
[Manufacturing method 2 (second invention)] Thickness 1.0-2. After pre-treating Chm's metal plates such as stainless steel, iron, copper, and aluminum plates for bonding, a part of the surface is coated with ceramic (
A thin film of .alpha.-alumina, etc.) is formed into a rectangular shape (thickness 100-200p), and conductive paste is baked on it in a straight line at regular intervals.

(抵抗値100〜300Ω)についで塗装によりセラミ
”ツク薄膜と同じ高さに塗装絶縁層を全面に形成させる
(抵抗体膜部は除く)この表面(絶縁層)を粗化してか
らメッキ前処理を行ない銅メッキを行ない抵抗体膜の側
面で導通のとれる銅メッキを全面に行なう(抵抗体表面
はレジストでメッキされないようにしておく)このあと
常法により、写真法て回路を形成させ片面か多層かまた
は両面プリント配線板(スルーホールメッキを有す)を
得る。このあと折り曲げをするかもしくは行なはないの
で感熱記録ヘッドとする。第7図は、この製造法の一例
を示すもので、A,b,cは製造工程を示す断面図てあ
る。
(Resistance value 100-300Ω) Next, apply a coating to form an insulating layer on the entire surface at the same height as the ceramic thin film (excluding the resistor film part). Roughen this surface (insulating layer) and then pre-plating treatment. After that, conductive copper plating is applied to the entire surface of the resistor film on the side surface of the resistor film (the surface of the resistor film should not be plated with resist). After that, a circuit is formed using the conventional photographic method, and one side is coated with copper plating. A multilayer or double-sided printed wiring board (with through-hole plating) is obtained.The board is then folded or not bent to form a thermal recording head.Figure 7 shows an example of this manufacturing method. , A, b, and c are cross-sectional views showing the manufacturing process.

表面処理したステンレス板(厚さ1.27m)35の表
面の一部分にアルミナのプラズマ溶射36(200p)
を矩形状に行い耐熱性絶縁層36を形成させる。その上
に焼付け用ペーストで抵抗体膜パターン37(100Ω
)を焼付ける。ついてこのプラズマ絶縁層と抵抗体パタ
ーンの厚さの和よりやや低めに絶縁層38を積層により
形成させてから、銅メッキを行い、常法の写真法により
電極部39と回路パターンを形成し、感熱記録ヘッドを
製造する。この方法によれば金属板上に小面積で薄いセ
ラミックの溶射膜を形成してからその上に抵抗体膜をメ
ッキか蒸着かまたはペーストの焼付けにより形成させる
ので安価に得られ、しかも抵抗体膜の形成が高熱でも可
能である。
Alumina plasma spraying 36 (200p) on a part of the surface of a surface-treated stainless steel plate (1.27m thick) 35
A heat-resistant insulating layer 36 is formed by forming a rectangular shape. On top of that, apply baking paste to resistor film pattern 37 (100Ω
). Then, an insulating layer 38 is formed by lamination to a thickness slightly lower than the sum of the thickness of this plasma insulating layer and the resistor pattern, and then copper plating is performed, and an electrode part 39 and a circuit pattern are formed by a conventional photographic method. Manufactures thermal recording heads. According to this method, a thin ceramic sprayed film is formed in a small area on a metal plate, and then a resistor film is formed on it by plating, vapor deposition, or baking of a paste, so it can be obtained at low cost. formation is possible even at high temperatures.

また金属芯があるので熱放散性にすぐれ、感熱記録ヘッ
ドが安価に得られる効果がある。以上説明したように本
発明の感熱記録ヘッドは感熱記録ヘッドとして必要な基
板の熱伝導性および熱放散性を得るため金属板を用いて
いるため、従来のセラミック基板より放熱性がすぐれて
おり、絶縁層の厚さを変えることにより熱伝導性、熱放
散性で所望のものを得ることが出来る。
Furthermore, since it has a metal core, it has excellent heat dissipation properties, and has the effect that a thermal recording head can be obtained at a low cost. As explained above, the thermal recording head of the present invention uses a metal plate to obtain the thermal conductivity and heat dissipation properties of the substrate necessary for a thermal recording head, so it has better heat dissipation than conventional ceramic substrates. By changing the thickness of the insulating layer, desired thermal conductivity and heat dissipation properties can be obtained.

また発熱抵抗体を設けるためにこの抵抗体の発熱部の下
には特に耐熱性の絶縁層をおき、電極に電圧が印加され
たとき抵抗体が一時的に300℃程度に温度上昇をして
も劣化のないようにされており、かつ電極以外の回路パ
ターン部は安価な絶縁層を設けるようにし得るのて絶縁
層の価格は高価とならない。また発熱抵抗体は従来、セ
ラミック基板に800℃程度の高温で焼付けていたが本
発明の第1の発明では有機質の耐熱絶縁材を使用する場
合は170〜200℃程度で耐熱性の有機質絶縁層上に
抵抗体箔を接着するか、またはメッキにより形成し得る
ため高温で焼付ける必要がないため製造が容易である。
基板は前述のとおり金属板芯上に絶縁層を積層塗装など
により形成するため表面は平滑でかつ大きい寸法のもの
も容易に得られるため安価であり、また抵抗体パターン
および電極部を含む回路パターンが写真法(エツチドフ
オイル法)で得られるので寸法精度のよいものが得られ
る。このほか、本発明ではスルーホールメッキのある両
面プリント配線板方式をとれるのて回路を多層にしなく
てもよく、また従来のものでは絶対に不可能な穴あけ加
工や折曲げ加工ができ曲面を持つた感熱記録ヘッドも得
られ感熱記録紙との接触を良好ならしめることが出来る
。なお、第2の発明の金属板上に一部分セラミック溶射
により絶縁層を形成させたものでは、従来のペースト状
の抵抗体膜の焼付が可能であり、しかも安価に得ること
が出来る。このように本発明の感熱記録ヘッドは、安価
な金属板、絶縁材を用いて容易に製造することが出来る
ため、従来のセラミック基板によるものに比べて安価に
製造し得るものである。
In addition, in order to provide a heating resistor, a particularly heat-resistant insulating layer is placed under the heating part of this resistor, so that when a voltage is applied to the electrode, the temperature of the resistor temporarily rises to about 300 degrees Celsius. Since the circuit pattern parts other than the electrodes can be provided with an inexpensive insulating layer, the cost of the insulating layer is not high. Conventionally, the heating resistor was baked on a ceramic substrate at a high temperature of about 800°C, but in the first aspect of the present invention, when an organic heat-resistant insulating material is used, an organic insulating layer that is heat-resistant at about 170 to 200°C is used. Since it can be formed by bonding a resistor foil thereon or by plating, it is easy to manufacture since there is no need to bake it at a high temperature.
As mentioned above, the board is made by forming an insulating layer on a metal plate core by lamination painting, etc., so the surface is smooth and large dimensions can be easily obtained, making it inexpensive. Since it is obtained by a photographic method (etched oil method), products with good dimensional accuracy can be obtained. In addition, the present invention allows for a double-sided printed wiring board system with through-hole plating, which eliminates the need for multi-layer circuits, and allows for drilling and bending processes that are absolutely impossible with conventional products, allowing for curved surfaces. It is also possible to obtain a heat-sensitive recording head that has good contact with the heat-sensitive recording paper. In addition, in the second aspect of the invention, in which an insulating layer is partially formed on a metal plate by ceramic spraying, it is possible to bake a resistor film in the form of a conventional paste, and it can be obtained at a low cost. As described above, the thermal recording head of the present invention can be easily manufactured using inexpensive metal plates and insulating materials, and therefore can be manufactured at a lower cost than those using conventional ceramic substrates.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図〜第4図は、本発明の感熱記録ヘッドの一実施例
を示すもので、第1図aは一部切欠した平面図、B,c
は要部断面図、第2図aは一部切欠した平面図、bは要
部断面図、第3図は斜視図、第4図aは要部断面図、B
,cは平面図、dは一部切欠した平面図、第5図〜第7
図は本発明の感熱記録ヘッドの製造工程を示すもので、
第5図a−c1第6図a−c1第7図a−cは各々断面
図を示す。 符号の説明、1・・・・・・金属板、2・・・・・・耐
熱性積層絶縁層、3・・・・・・積層絶縁層、4・・・
・・・抵抗体膜パターン、5・・・・・・導体電極部、
6・・・・・・表面回路、7・・・・・・反対面回路、
8−・・・・・スルーホールメッキ、9・・・・・・ス
ルーホール内軸絶縁層、10・・・・・・耐熱性塗膜縁
層、11・・・・・・抵抗体膜パターン、12・・・・
・・導体電極部、13・・・・・・回路パターン、14
・・・・・・アルミニウム板、15・・・・・・塗装絶
縁層、16・・・・・・抵抗体膜パターン、17・・・
・・・導体電極部、18・・・・・・取付け穴、19・
・・・・・耐熱性絶縁層、20・・・・・・絶縁層、2
1・・・・・・抵抗体膜パターン、22・・・・・・導
体電極部、23・・・・・・回路パターン、24・・・
・・・ランド、25・・・・・・絶縁層、26・・・・
・・回路パターン、27・・・・・・7ランド、28・
・・・・・耐熱性絶縁層、29・・・・・・抵抗体膜パ
ターン、30・・・・・・絶縁層、31・・・・・・銅
メッキ層、32・・・・・・耐熱性塗膜層、33・・・
・・・抵抗体膜パターン、34・・・・・・導体電極部
、35・・・・・・ステンレス板、36・・・・・・耐
熱性絶縁層、37・・・・・・抵抗体膜フパターン、3
8・・・・・・絶縁層、39・・・・・・電極部。
1 to 4 show an embodiment of the thermal recording head of the present invention, in which FIG. 1a is a partially cutaway plan view, B, c
2A is a partially cutaway plan view, B is a sectional view of the main part, FIG. 3 is a perspective view, FIG. 4A is a sectional view of the main part, B
, c is a plan view, d is a partially cutaway plan view, Figs. 5 to 7
The figure shows the manufacturing process of the thermal recording head of the present invention.
FIGS. 5 a-c, 6 a-c, and 7 a-c show cross-sectional views, respectively. Explanation of symbols: 1...metal plate, 2...heat-resistant laminated insulating layer, 3... laminated insulating layer, 4...
...Resistor film pattern, 5...Conductor electrode part,
6... surface circuit, 7... opposite surface circuit,
8-...Through-hole plating, 9...Through-hole inner shaft insulating layer, 10...Heat-resistant coating film edge layer, 11...Resistor film pattern , 12...
...Conductor electrode part, 13...Circuit pattern, 14
... Aluminum plate, 15 ... Painted insulating layer, 16 ... Resistor film pattern, 17 ...
...Conductor electrode part, 18...Mounting hole, 19.
...Heat-resistant insulating layer, 20...Insulating layer, 2
DESCRIPTION OF SYMBOLS 1...Resistor film pattern, 22...Conductor electrode part, 23...Circuit pattern, 24...
...Land, 25...Insulating layer, 26...
...Circuit pattern, 27...7 land, 28.
...Heat-resistant insulating layer, 29...Resistor film pattern, 30...Insulating layer, 31...Copper plating layer, 32... Heat-resistant coating layer, 33...
... Resistor film pattern, 34 ... Conductor electrode part, 35 ... Stainless steel plate, 36 ... Heat-resistant insulating layer, 37 ... Resistor Membrane pattern, 3
8... Insulating layer, 39... Electrode part.

Claims (1)

【特許請求の範囲】 1 a 金属板を前処理する第1工程、 b この金属板を芯とし、その両面に粉体塗装を行なつ
て硬化させて絶縁層を形成させるか、少なくとも一表面
に耐熱性の絶縁層を形成させて基板を得る第2工程、c
耐熱性の絶縁層上にメッキ下地形成のための塗装後、
メッキにより一定間隔をあけた直線状の発熱抵抗体膜を
形成させる第3工程、d これら抵抗体膜を挟みかつ抵
抗体膜の両側で導通のとれた電極部とこれらを接続、給
電するプリント回路とを基板上に形成させる第4工程よ
り成る感熱記録ヘッドの製造法。 2 a 金属板の上に小さな四辺形状にプラズマ溶射を
行い耐熱性絶縁層を形成させる第1工程、b これらの
プラブマ溶射部以外の金属板上に粉体塗装を行なつて絶
縁層を形成させて基板を得る第2工程、c この基板上
にイオンメッキ蒸着又はペーストの焼付により一定間隔
で直線状に配列した抵抗体膜パターンを形成させる第3
工程、d これら抵抗体膜を挟みかつ、抵抗体膜の両側
で導通のとれた電極部とこれを接続、給電するプリント
回路とを基板上に形成させる第4工程より成る感熱記録
ヘッドの製造法。
[Scope of Claims] 1 a. A first step of pre-treating a metal plate, b. Using this metal plate as a core, powder coating is applied to both surfaces and hardened to form an insulating layer, or at least one surface is coated with powder. A second step of forming a heat-resistant insulating layer to obtain a substrate, c
After painting to form a plating base on the heat-resistant insulating layer,
The third step is to form linear heat-generating resistor films spaced at regular intervals by plating, d) sandwiching these resistor films and connecting them with electrodes that are electrically conductive on both sides of the resistor film and a printed circuit for supplying power. A method for manufacturing a thermal recording head comprising a fourth step of forming on a substrate. 2 a. The first step is to form a heat-resistant insulating layer by plasma spraying in a small quadrilateral shape on the metal plate, b. To form an insulating layer by powder coating on the metal plate other than these plasma sprayed areas. a second step of obtaining a substrate; c. a third step of forming resistor film patterns linearly arranged at regular intervals on this substrate by ion plating vapor deposition or paste baking;
Step d: A method for manufacturing a thermal recording head comprising a fourth step of forming on a substrate, sandwiching these resistor films, conductive electrode parts on both sides of the resistor film, and a printed circuit for connecting and supplying power. .
JP52133754A 1977-11-08 1977-11-08 Manufacturing method of thermal recording head Expired JPS6055316B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52133754A JPS6055316B2 (en) 1977-11-08 1977-11-08 Manufacturing method of thermal recording head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52133754A JPS6055316B2 (en) 1977-11-08 1977-11-08 Manufacturing method of thermal recording head

Publications (2)

Publication Number Publication Date
JPS5466850A JPS5466850A (en) 1979-05-29
JPS6055316B2 true JPS6055316B2 (en) 1985-12-04

Family

ID=15112149

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52133754A Expired JPS6055316B2 (en) 1977-11-08 1977-11-08 Manufacturing method of thermal recording head

Country Status (1)

Country Link
JP (1) JPS6055316B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6046266A (en) * 1983-08-25 1985-03-13 Sharp Corp Thermal head
JPS6046265A (en) * 1983-08-25 1985-03-13 Sharp Corp Manufacture of thermal head
JPS61244566A (en) * 1985-04-23 1986-10-30 Rohm Co Ltd Thermal head

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS48100144A (en) * 1972-03-31 1973-12-18
JPS5083757A (en) * 1973-11-21 1975-07-07
JPS5030731B2 (en) * 1972-02-07 1975-10-03
JPS5158958A (en) * 1974-11-20 1976-05-22 Hitachi Ltd
JPS5228988A (en) * 1975-08-29 1977-03-04 Kureha Chem Ind Co Ltd Method for preparing microbial cells

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49117740U (en) * 1973-02-08 1974-10-08
JPS5351171Y2 (en) * 1973-07-14 1978-12-07

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5030731B2 (en) * 1972-02-07 1975-10-03
JPS48100144A (en) * 1972-03-31 1973-12-18
JPS5083757A (en) * 1973-11-21 1975-07-07
JPS5158958A (en) * 1974-11-20 1976-05-22 Hitachi Ltd
JPS5228988A (en) * 1975-08-29 1977-03-04 Kureha Chem Ind Co Ltd Method for preparing microbial cells

Also Published As

Publication number Publication date
JPS5466850A (en) 1979-05-29

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