JPS6052838A - Exposing device of copying machine - Google Patents

Exposing device of copying machine

Info

Publication number
JPS6052838A
JPS6052838A JP16050083A JP16050083A JPS6052838A JP S6052838 A JPS6052838 A JP S6052838A JP 16050083 A JP16050083 A JP 16050083A JP 16050083 A JP16050083 A JP 16050083A JP S6052838 A JPS6052838 A JP S6052838A
Authority
JP
Japan
Prior art keywords
plate
exposure
light
lens
magnification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16050083A
Other languages
Japanese (ja)
Other versions
JPH0522224B2 (en
Inventor
Katsuhiko Ono
勝彦 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Business Innovation Corp
Original Assignee
Fuji Xerox Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Xerox Co Ltd filed Critical Fuji Xerox Co Ltd
Priority to JP16050083A priority Critical patent/JPS6052838A/en
Publication of JPS6052838A publication Critical patent/JPS6052838A/en
Publication of JPH0522224B2 publication Critical patent/JPH0522224B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00Photographic printing apparatus
    • G03B27/32Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52Details
    • G03B27/522Projection optics
    • G03B27/525Projection optics for slit exposure
    • G03B27/526Projection optics for slit exposure in which the projection optics move

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Or Original Feeding In Electrophotography (AREA)
  • Optical Systems Of Projection Type Copiers (AREA)

Abstract

PURPOSE:To correct uneven exposing by the cosine law and to enable control of exposure with good accuracy by providing a correction plate on an optical path connecting an original and a photosensitive body, providing a detector for quantity of light on the correcting plate and detecting the change in the exposure owing to staining of an optical system. CONSTITUTION:A correcting plate 12 which corrects uneven exposing by the cosine law is installed in the position apart by a distance (l) behind a lens 9 which maintains an imaging relation in the stage of variable power. Said plate moves integrally with the lens 9 during variable power. The plate 12 of which the center is provided on an optical axis 13' shields most the projected luminous flux near the axis 13' and decreases gradually the quantity of the shielded light toward the direction further from the axis 13' and therefore said plate can correct the uneven exposing by the cosine law. If the shape and distance (l) of the plate 12 are preliminarily set in conformity with the magnification at which the max. angle of view is attained at each magnification, the correction for the projected luminous flux incident at all angles within the max. angle of view is possible. A detector 15 for quantity of light is provided in the central part of the plate 12 to detect exactly the change in the exposure owing to the staining and deterioration of the optical system, by which the control of the exposure with high accuracy is made possible.

Description

【発明の詳細な説明】 産業上の利用分野 この発明は露光ム2を改善した複写機の露光装置に関す
る。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application This invention relates to an exposure device for a copying machine with an improved exposure system 2.

従来技術 従来光学系を用いて原稿を感光体へ投影する複写機にお
いては、その画角に応じてCo54 乗mによる露光ム
ラが発生する。また光学系内の汚れや光源、ミラー等の
劣化により経時的に露光量が変化することにより、得ら
れる複写の画像にカブリ等が発生する不具合があった。
2. Description of the Related Art In a copying machine that uses a conventional optical system to project an original onto a photoreceptor, exposure unevenness due to Co54 to the power m occurs depending on the angle of view. In addition, the exposure amount changes over time due to dirt in the optical system and deterioration of the light source, mirror, etc., resulting in problems such as fogging in the resulting copied images.

かかる不具合のうち、露光ムラに関しては、光源の長手
方向に輝度分布を変化させて幅4乗則による露光ムラを
補正する方法が提唱されているが、この方法では中央部
より周辺部の輝度を上げた光源を製造する必要があるた
めコスト高になると共に、変倍複写機の場合変倍範囲が
大きくなると補正できないなど、補正能力に限界がある
欠点があった。また光源に螢光灯を用いた複写機では、
光路中に設けたスリット板を変倍率に応じて切換えたり
、スリット板を傾斜させて光路上へ出し入れするもの、
もしくは感光体の近傍でスリット板をスリットの長手方
向へ移動させたり、レンズの移動に対してスリット板を
スリットの長手方向と直角な走査方向に移動させるよう
にしたものなどが公知であるが、倒れの場合もスリット
板を移動するのに複雑な駆動装置を必要として高価にな
ると共に、変倍範囲が大きくなると補正できなくなるな
ど補正能力に限界があるなどの欠点が、あった。
Among these problems, regarding exposure unevenness, a method has been proposed in which the brightness distribution is changed in the longitudinal direction of the light source and the exposure unevenness is corrected according to the fourth power of the width. It is necessary to manufacture a light source with a high magnification, which increases costs, and in the case of a variable magnification copying machine, there is a drawback that there is a limit to the correction ability, such as the fact that it cannot be corrected if the variable magnification range becomes large. In addition, in copying machines that use fluorescent lights as light sources,
The slit plate installed in the optical path can be switched depending on the magnification ratio, or the slit plate can be tilted to move it in and out of the optical path.
Alternatively, there are known methods in which the slit plate is moved in the longitudinal direction of the slit near the photoreceptor, or the slit plate is moved in the scanning direction perpendicular to the longitudinal direction of the slit in response to the movement of the lens. In the case of tilting, a complicated drive device is required to move the slit plate, which is expensive, and there are also drawbacks such as a limited correction ability, such as the inability to correct it when the variable magnification range becomes large.

−刀先学系の汚れや劣化による画像のカブリ等に対して
は、光路中の画像に影響を与えない位置に光量検出器を
設けて露光量を検出し、または光量検出時のみ光路の光
軸付近に光量検出器を挿入して露光量を検出し、得られ
た検出信号と基準値を比較して、その差に応じて光源等
を制御することにより、光学系の汚れや劣化に関係なく
最適な露光量が得られるようにした制御装置が提唱され
ているが、光路の周辺域に光量検出器を設けたものでは
検出する光量が少ないため、ノイズ等の影響7受けやす
くなって精度の高い制御が困難であり、また光軸付近に
光量検出器を挿入するものでは、検出器を出し入れする
機構が必猥となるなどコスト高となる欠点があった。
- To prevent image fogging due to dirt or deterioration of the knife edge system, install a light amount detector in a position in the optical path that does not affect the image, or detect the amount of exposure by installing a light amount detector in a position that does not affect the image, or By inserting a light intensity detector near the axis to detect the exposure amount, comparing the obtained detection signal with a reference value, and controlling the light source etc. according to the difference, it is possible to detect dirt and deterioration of the optical system. A control device has been proposed that can obtain the optimum exposure amount without any noise, but since the amount of light detected by a device with a light amount detector installed in the peripheral area of the optical path is small, it is more susceptible to the effects of noise, etc., resulting in poor accuracy. It is difficult to control the amount of light to a high degree, and in the case where a light amount detector is inserted near the optical axis, a mechanism for inserting and removing the detector is required, resulting in high cost.

発明の目的 この発明はかかる欠点を除去する目的でなされたもので
、cos4乗則による露光ムラを補正し、また精度よく
露光量の制御が可能な複写機の露光装置を簡単な構成で
提供しようとするものである。
Purpose of the Invention The present invention has been made to eliminate such drawbacks, and it is an object of the present invention to provide an exposure device for a copying machine with a simple configuration that can correct exposure unevenness due to the cos fourth power law and can control the exposure amount with high precision. That is.

発明の構成 原稿と感光体を結ぶ光路上に、光軸付近の遮光性が高く
、かつ周辺部へゆ(に従い順次遮光性が低くなる補正板
を設けて0084乗則による露光ムラを補正すると共に
、上記補正板上に光量検出器を設けて、光学系の汚れに
よる露光量の変化を検出するようにしてなる複写機の露
光装置。
Components of the Invention A correction plate is provided on the optical path connecting the original and the photoreceptor, and has a high light-shielding property near the optical axis, and gradually lowers the light-shielding property toward the periphery, thereby correcting exposure unevenness due to the 0084 power law. An exposure device for a copying machine, which includes a light amount detector provided on the correction plate to detect changes in the amount of exposure due to dirt in the optical system.

実施例 以下この発明な変倍複写機に実施した例について図面を
参照して詳述すると1図において1は複写すべき原稿2
を載置するプラテンで、このプラテン1の下方に原稿2
の複写面を照明する光源3及びり7レクタ4が設置され
ている。
EXAMPLE Below, an example implemented in a variable magnification copying machine according to the present invention will be described in detail with reference to the drawings.
The document 2 is placed below this platen 1.
A light source 3 and a rectifier 4 are installed to illuminate the copy surface.

原稿2からの反射光は光路13上に設けられたスリット
5、第1、第2、第3.ミーy−6t7e8を介してレ
ンズ9へ導びかれ、さらにレンズ9を透過した光は第4
ミラーlOにより感光体11側へ反射されて、感光体1
10表面を露光するようになっている。また上記光学系
のうち、第2、第3ミラー7.8及びレンズ9は変倍率
に応じて矢印b−c及びbl−C1方向へ移動し。
The reflected light from the original 2 passes through the slits 5, first, second, third . . . provided on the optical path 13. The light that is guided to the lens 9 via the lens 6t7e8 and further transmitted through the lens 9 is the fourth
It is reflected toward the photoreceptor 11 side by the mirror lO, and the photoreceptor 1
10 surfaces are exposed. Further, in the optical system, the second and third mirrors 7.8 and the lens 9 move in the directions of the arrows b-c and bl-C1 according to the variable magnification.

変倍時の結像関係を保つレンズ9の後方には距mt離れ
た位置に(K134乗則による露光ムラを補正する補正
板12が設置されており、変倍時はレンズ9と一体に移
動する。この補正板12はその中心が光軸13′と一致
するように設けられた例えば円板であって、(X)84
乗則による露光ムラを次のように補正する。
A correction plate 12 that corrects exposure unevenness due to the K134 power law is installed at a distance mt behind the lens 9 that maintains the image formation relationship when changing the magnification, and moves together with the lens 9 when changing the magnification. This correction plate 12 is, for example, a circular plate provided so that its center coincides with the optical axis 13'.
Exposure unevenness due to the power law is corrected as follows.

すなわち光軸13′に垂直な一つの面内での原稿2のス
リット領域における各物点の投影光束の断面は第3図に
示すように断面積の等しい円□となる。補正板12はそ
の中心が光軸13′上にあり、光軸13′付近の投影光
束の遮光が最大で、光軸13′から離れるに従い順次遮
光量が減少することとなり、cos4乗則による露光ム
ラの補正ができるようになる。
That is, the cross section of the projected light beam of each object point in the slit area of the original 2 in one plane perpendicular to the optical axis 13' becomes a circle □ with the same cross-sectional area as shown in FIG. The center of the correction plate 12 is located on the optical axis 13', and the maximum amount of light blocking of the projection light beam near the optical axis 13' occurs, and the amount of light blocking gradually decreases as the distance from the optical axis 13' increases. It becomes possible to correct unevenness.

ところで、変倍複写を行うと、各倍率で最大画角が異な
ってくるが、その中で最大画角となる倍率に合せて補正
板12の形状及び距qtを設定しておけば、最大画角以
内のあらゆる角度で入射する投影光束に対して補正が可
能である。
By the way, when variable-magnification copying is performed, the maximum angle of view differs for each magnification, but if the shape and distance qt of the correction plate 12 are set according to the magnification that provides the maximum angle of view, the maximum angle of view can be adjusted. Correction is possible for projection light beams incident at any angle within this angle.

具体的には第4図に示すように最大画角で入射する投影
光束が交差する点りより外側となる位置に補正板12を
設ければよい。
Specifically, as shown in FIG. 4, the correction plate 12 may be provided at a position outside the point where the projection light beams incident at the maximum angle of view intersect.

一方補正板12の中心部には光量検出器15が設けられ
ていて、この光量検出器15により複写開始前第5図に
示すようにプラテン押え16の下面などに設けられた白
色の基準反射面17からの反射光を検出するようになっ
ている。上記光量検出器15により検出された検出値は
制御系により予め設定された基準値と比較されて、光学
系の汚れや劣化による露光量の変化量が算出される。得
られた変化量に応じて光源30入力電圧等が制御され、
これによって光学系の汚れや劣化に関係なく一定した露
光量が得られるよう゛になる。
On the other hand, a light amount detector 15 is provided in the center of the correction plate 12, and the light amount detector 15 detects a white reference reflective surface provided on the lower surface of the platen holder 16, etc., as shown in FIG. The reflected light from 17 is detected. The detection value detected by the light amount detector 15 is compared with a reference value set in advance by a control system, and the amount of change in exposure amount due to dirt or deterioration of the optical system is calculated. The light source 30 input voltage etc. are controlled according to the obtained change amount,
This makes it possible to obtain a constant amount of exposure regardless of dirt or deterioration of the optical system.

なお変倍の際の必要露光量は倍率により変化するので、
倍率に応じた基準値を予め設定し、これら値と、光量検
出器15が各倍率毎に検出した値とを比較すれば、全て
の倍率に対応することができる。
The required exposure amount when changing magnification changes depending on the magnification, so
By setting reference values in advance according to the magnification and comparing these values with the values detected by the light amount detector 15 for each magnification, it is possible to deal with all magnifications.

またコーナレジスト形式の複写機では倍率に応じて光軸
13′の位置が変化するが、基準反射面17を光軸13
′の移動方向に予め長く形成しておくことにより問題は
生じない。さらに上記実施例では補正板12をレンズ9
の後方に設けたが、レンズ9の前方に設置してもよい。
In addition, in a corner resist type copying machine, the position of the optical axis 13' changes depending on the magnification, but the reference reflective surface 17 is
No problem arises by forming it long in advance in the moving direction of '. Furthermore, in the above embodiment, the correction plate 12 is replaced by the lens 9.
Although it is provided behind the lens 9, it may be provided in front of the lens 9.

発明の効果 この発明は以上詳述したように、光軸付近の遮光性が高
く、かつ周辺部にゆくに従い遮光性を低くした補正板1
2を光路13上に設けて帽4乗則による露光ムラを補正
するようにしたもので、変倍複写機に用いた場合でも変
倍率に応シテレンズと一体に移動するので、構成が簡単
で安価に提供できると共に、変倍範囲が大きくなっても
補正できなくなる虞れがない。また補正板12の中央部
に光量検出器15を設けて露光量を検出するようにした
ことから、光学系の汚れや劣化による露光量の変化を、
複雑な機構を使用せずに正確に検出できるようになり、
これによって精度の高い露光量の制御が可能である。
Effects of the Invention As described in detail above, the present invention provides a correction plate 1 which has a high light-shielding property near the optical axis and has a lower light-shielding property toward the periphery.
2 is installed on the optical path 13 to correct exposure unevenness due to the fourth power law. Even when used in a variable magnification copying machine, it moves together with the lens according to the variable magnification, so the structure is simple and inexpensive. In addition, there is no possibility that correction will not be possible even if the zooming range becomes large. In addition, since the light amount detector 15 is provided in the center of the correction plate 12 to detect the amount of exposure, changes in the amount of exposure due to dirt or deterioration of the optical system can be detected.
Accurate detection is now possible without the use of complicated mechanisms,
This makes it possible to control the exposure amount with high precision.

【図面の簡単な説明】[Brief explanation of the drawing]

図面はこの発明の一実施例を示し、第1図は全体の構成
図、第2図はレンズ及び補正板の斜視図、第3図、第4
図及び第5図は作用説明図である。 2は原稿、9はレンズ、11は感光体、12は補正板、
13′は光軸、15は光量検出器。 出願人 富士ゼロックス株式会社 代理人 弁理士 米 原 正 章 弁理士 浜 本 忠 第1図 第2図 5 第3図 第4図 第5図
The drawings show one embodiment of the present invention, and FIG. 1 is an overall configuration diagram, FIG. 2 is a perspective view of a lens and a correction plate, and FIGS. 3 and 4.
The figure and FIG. 5 are action explanatory diagrams. 2 is a document, 9 is a lens, 11 is a photoreceptor, 12 is a correction plate,
13' is an optical axis, and 15 is a light amount detector. Applicant Fuji Xerox Co., Ltd. Agent Patent Attorney Masaaki Yonehara Patent Attorney Tadashi Hamamoto Figure 1 Figure 2 5 Figure 3 Figure 4 Figure 5

Claims (1)

【特許請求の範囲】[Claims] 複写すべぎ原稿2の複写面からの反射光を光学系を用い
て感光体11へ導びくものにおいて、上記光学系を構成
するレンズ9の前方または後方に、光軸13′付近の遮
光性が高く、かつ周辺側へ順次遮光性が低くなる補正板
12を、上記レンズ9と相対関係を変化さ、せずに移動
自在に設けると共に、上記補正板12上に光量検出器1
5を設けてなる複写機の露光装置。
In a device that guides the reflected light from the copying surface of the original 2 to be copied to the photoreceptor 11 using an optical system, there is a light shielding feature near the optical axis 13' in front or behind the lens 9 constituting the optical system. A correction plate 12 which is high and whose light shielding properties gradually decrease toward the periphery is provided so as to be movable without changing the relative relationship with the lens 9, and a light amount detector 1 is mounted on the correction plate 12.
5. An exposure device for a copying machine.
JP16050083A 1983-09-02 1983-09-02 Exposing device of copying machine Granted JPS6052838A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16050083A JPS6052838A (en) 1983-09-02 1983-09-02 Exposing device of copying machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16050083A JPS6052838A (en) 1983-09-02 1983-09-02 Exposing device of copying machine

Publications (2)

Publication Number Publication Date
JPS6052838A true JPS6052838A (en) 1985-03-26
JPH0522224B2 JPH0522224B2 (en) 1993-03-26

Family

ID=15716276

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16050083A Granted JPS6052838A (en) 1983-09-02 1983-09-02 Exposing device of copying machine

Country Status (1)

Country Link
JP (1) JPS6052838A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02210340A (en) * 1989-02-09 1990-08-21 Asahi Optical Co Ltd Light quantity correcting device
WO1994007170A1 (en) * 1992-09-19 1994-03-31 Leica Mikroskopie Und Systeme Gmbh Bright-field transparency illumination device for microscopes

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5042856A (en) * 1973-05-23 1975-04-18
JPS56104355A (en) * 1980-01-07 1981-08-20 Xerox Corp Exposure apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5042856A (en) * 1973-05-23 1975-04-18
JPS56104355A (en) * 1980-01-07 1981-08-20 Xerox Corp Exposure apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02210340A (en) * 1989-02-09 1990-08-21 Asahi Optical Co Ltd Light quantity correcting device
WO1994007170A1 (en) * 1992-09-19 1994-03-31 Leica Mikroskopie Und Systeme Gmbh Bright-field transparency illumination device for microscopes
EP0613569A1 (en) * 1992-09-19 1994-09-07 Leica Mikroskopie & Syst Bright-field transparency illumination device for microscopes.

Also Published As

Publication number Publication date
JPH0522224B2 (en) 1993-03-26

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