JPS6052369A - Masking mechanism for laser marker - Google Patents

Masking mechanism for laser marker

Info

Publication number
JPS6052369A
JPS6052369A JP58161401A JP16140183A JPS6052369A JP S6052369 A JPS6052369 A JP S6052369A JP 58161401 A JP58161401 A JP 58161401A JP 16140183 A JP16140183 A JP 16140183A JP S6052369 A JPS6052369 A JP S6052369A
Authority
JP
Japan
Prior art keywords
mask
window
masks
laser
case
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58161401A
Other languages
Japanese (ja)
Inventor
Masakazu Nakano
正和 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP58161401A priority Critical patent/JPS6052369A/en
Publication of JPS6052369A publication Critical patent/JPS6052369A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54473—Marks applied to semiconductor devices or parts for use after dicing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Dot-Matrix Printers And Others (AREA)
  • Laser Beam Printer (AREA)

Abstract

PURPOSE:To simplify the selection of marks by providing plural mask movers to be driven in the direction of crossing each other in faces in parallel with window in the case in which the window of a given face region through which laser is passed is provided. CONSTITUTION:Mask holder 10, 20 and 30 are provided in the case 41 having a window 40 through which laser is passed. A photo mask 11 having a combination of letter, mark and pattern is provided to the mask holder 10, and is driven by an elevating mechanism 13 and a drive mechanism 12. Even for the mask holders 20 and 30, plural patterns are provided on the masks 21 and 31 in the same mechanism. These patterns are selected and combined by the elevating mechanisms 13, 23 and 33 of the holders 10, 20 and 30 and set on a window 40. The upper and lower mechanisms are wholly moved horizontally along guide holes 15, 25 and 35 in parallel with the window by the knob on the upper end by means of manual mask moving mechanisms 14, 24 and 34. The masks can thus be easily exchanged and selectively combined in large numbers.

Description

【発明の詳細な説明】 本発明はマスクマーキング型のレーザマーカに使用され
るマスク機構に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a mask mechanism used in a mask marking type laser marker.

マスクマーキング型し−ザマーカトハ、レーザ光源から
発射されたレーザビームを大口径の光束に拡げ、この光
束中にレーザビームｔ−ａ断する文字や図形パターンを
有するマスクを設け、このマスクを透過したレーザビー
ムをレンズを用いて縮小結像させてそのマ、スク上のパ
ターンに対応した高エネルギー密度のパターンを形成す
るもので、これによりプラスチックや金５な′どででき
た物体上にマーキングあるいは刻印を行うものである。Mask marking type - The laser beam emitted from a laser light source is expanded into a large-diameter beam of light, and a mask with a character or graphic pattern that cuts the laser beam is provided in this beam, and the laser beam transmitted through this mask is A beam is reduced and focused using a lens to form a high-energy density pattern that corresponds to the pattern on the mask.This allows marking or engraving on objects made of plastic, gold, etc. This is what we do.

従来、この種のレーザマーカにおいては、１）マークに
対応してマスクを一枚ずつ交換したり、２）回転円盤上
に設けられた数種のマスクを選択したり、３）金５薄板
に設けられたマークを複数個組合わせたりするマスク機
構が用いられていた。これらのマスク機構のうち、第１
の装置ではマーク数に応じて多数のマスクを用意する必
要がアシ、第２の装置ではマークの種類が円周上に配置
できる数に限定される上複雑な組合わせが困難であり、
第３の装置ではわずかなマーク変更にもいちいち小さな
、数ミリ程度の文字高さのマークを取換えなければなら
ず取扱いが面倒で熟練を要するというような欠点があっ
た。Conventionally, in this type of laser marker, 1) masks were replaced one by one according to the marks, 2) several types of masks were selected on a rotating disk, and 3) masks were placed on a thin gold plate. A mask mechanism was used that combined multiple marks. Of these mask mechanisms, the first
In the first device, it is necessary to prepare a large number of masks according to the number of marks, and in the second device, the types of marks are limited to the number that can be arranged on the circumference, and complex combinations are difficult.
The third device had the disadvantage that small marks, each with a character height of several millimeters, had to be replaced every time a slight mark change was made, making it cumbersome to handle and requiring skill.

本発明の目的は、このような欠点を除去し、フォトマス
ク上に形成した複数の基本パターンを設けたマスクと組
合わせることによって、組合せや操作の困難や繁雑さを
なくシ、またマスク移動機構を設けることによってマー
クの選択を簡易化したレーザマーカ用マスク機構を提供
することにおる。The purpose of the present invention is to eliminate such drawbacks, to eliminate the difficulty and complexity of combinations and operations by combining a mask with a plurality of basic patterns formed on a photomask, and to provide a mask moving mechanism. An object of the present invention is to provide a mask mechanism for a laser marker that simplifies the selection of marks by providing the following.

本発明のレーザマーカ用マスク機構は、レーザ光を通過
させる所定面領域のウィンドウ全般けたケースと、この
ケース内に前記ウィンドウ面と平行に互に接近させてそ
れぞれ挿入され文字・記号あるいは図形からｒｊろ朴マ
ークをそれぞれ有する複数のマスクと、これらマスクを
前記ウィンドウと平行面内で互に直交する方向にそれぞ
れ駆動する複数のマスク移動手段とを含み構成される。The mask mechanism for a laser marker of the present invention includes a case that has an entire window of a predetermined surface area through which laser light passes, and a case that is inserted into the case in parallel with the window surface and close to each other, and is inserted into the case to remove rj marks from characters, symbols, or figures. The apparatus includes a plurality of masks each having a blank mark, and a plurality of mask moving means for respectively driving these masks in directions orthogonal to each other in a plane parallel to the window.

以下図面により本発明の詳細な説明する。The present invention will be explained in detail below with reference to the drawings.

第１図はレーザマーカに使用されるマークの一例を示す
図である。この例は、基本パターンとして商標″ＡＢＣ
”、型式名称”ＳＬ−“、型式番号“１２３’および等
級”Ｊ′ヲ表わすものとする。今“ＡＢＣ″や“Ｊ”は
４３種あり、’ＳＬ−”がさらに数種あり、１１２３”
が士数種するとすると、マスクとしてはその組合わせが
１００種類程できることになる。したがって、従来の装
置によれｉｆ種々の困難が生ずることは容易に推察でき
る。そのため本発明においてはＡＢＣ”や′Ｊ”を第１
のマスク上で組合わせ、第２のマスク上で’ＳＬ−”を
組合せ、さらに第３のマスク上で“１２３”の組合わせ
をもつマスクを作成し、これらを組合わせることによっ
て多数の組合せを容易に実現することができる。FIG. 1 is a diagram showing an example of a mark used in a laser marker. This example uses the trademark “ABC” as the basic pattern.
", model name "SL-", model number "123', and class "J'".Currently, there are 43 types of "ABC" and "J", and several more types of 'SL-', 1123".
Assuming that there are several types, there are about 100 combinations of masks. Therefore, it can be easily inferred that various difficulties arise with the conventional apparatus. Therefore, in the present invention, ABC" and 'J" are
, on the second mask, 'SL-', and on the third mask, create a mask with the '123' combination, and by combining these, you can create many combinations. This can be easily achieved.

第２図は一般のレーザマーカの構成を説明する斜視図、
１はＮｄ：ＹＡＧレーザからなるレーザ光源、２はレー
ザビーム拡散光学系、３はマスク機構、４はマスク機構
３によシ形成されたパターンを集光し結像するレンズ、
５はマークを形成すべき物体である。Figure 2 is a perspective view illustrating the configuration of a general laser marker;
1 is a laser light source consisting of a Nd:YAG laser; 2 is a laser beam diffusion optical system; 3 is a mask mechanism; 4 is a lens that focuses and images the pattern formed by the mask mechanism 3;
5 is an object on which a mark is to be formed.

第３図は本発明の実施例の部分破砕斜視図であり、第２
図のマスク機構３に相当するものである。FIG. 3 is a partially exploded perspective view of an embodiment of the present invention, and FIG.
This corresponds to the mask mechanism 3 in the figure.

このマスク機構は、レーザ光の通るウィンドウ４０を設
けたケース４１内に、第１〜第３のマスクホルダ１０　
、２０　、３０９設けたものである。このｇｉのマスク
ホルダ１０は、第１のマスク１ｉｔ−設けたモータドラ
イブ機構１２で駆動される昇降ｔｉＲ構１３をマスク移
動機構として有するものであり、このマスクホルダ１０
には、ガラス基板に金の蒸着薄膜をフォトエツチングし
て形成した＠ＡＢＣ”、′Ｊ＃などの組合わせを有する
フォトマスク１１が設けられている。この昇降機構１３
は送りネジをもつシャフトからなり、ドライブ機構１２
により駆動される。また、第２のマスクホルダ２０およ
び第３のマスクホルダ３０も同様の機構を有し、それぞ
れ“ＳＬ−”の組合わせ’１２３”に対応する複数個の
パターンが各マスク２１．３１上に設けられている。こ
れら複数個のパターンはそれぞれのマスクホルダ１０，
２０．３０の各昇降　機構１３，２３．３３により選択
されて組合されて、ウィンドウ４θ上に設定される。こ
の実施例では、１０個程度のノくターンが一個のマスク
上に設置され、手動のマスク移動機構１４，２４．３４
によりさらに１０個程度が選択できる構成となっている
。この手動マスク移動機構１４，２４．３４は、フォト
マスク１１．２１゜３１および昇降機構１２，２２．３
２からなる上下機構全体を上端のつまみをもってウィン
ド面と平行なガイド穴１５．’２５．３５ＩＣ沿って水
平方向に移動させるものでアシ、モータドライブとする
ととも出来る。This mask mechanism includes first to third mask holders 10 in a case 41 provided with a window 40 through which laser light passes.
, 20, 309 were provided. This gi mask holder 10 has an elevating tiR mechanism 13 as a mask moving mechanism, which is driven by a motor drive mechanism 12 provided with a first mask 1it.
A photomask 11 having combinations of @ABC", 'J#, etc. formed by photoetching a thin film of gold vapor deposited on a glass substrate is provided in the lift mechanism 13.
consists of a shaft with a feed screw, and the drive mechanism 12
Driven by Further, the second mask holder 20 and the third mask holder 30 have a similar mechanism, and a plurality of patterns corresponding to the combination '123' of "SL-" are provided on each mask 21.31. These multiple patterns are arranged on each mask holder 10,
20.30 are selected and combined by the lifting mechanisms 13, 23.33, and set on the window 4θ. In this embodiment, about 10 nokuturns are installed on one mask, and manual mask moving mechanisms 14, 24, 34
Accordingly, about 10 more items can be selected. This manual mask moving mechanism 14, 24.34 includes a photomask 11.21°31 and an elevating mechanism 12, 22.3.
Holding the knob at the upper end, insert the entire vertical mechanism consisting of 15.2 into the guide hole parallel to the window surface. '25.35It moves horizontally along the IC, and can be done with a reed or motor drive.

本実施例によれば、マスク１１とマスク２１のパターン
形成された面は近接でき、マスク３１もマスク材となる
ガラス板の厚さ分が加わる程度で近接でき、マスクパタ
ーンを互に接近させて設置できるので、結像されたマー
ク像の大きさには殆んど影響を与えない。According to this embodiment, the patterned surfaces of the masks 11 and 21 can be brought close to each other, and the mask 31 can also be brought close to each other by adding the thickness of the glass plate serving as the mask material, so that the mask patterns can be brought close to each other. Since it can be installed easily, it has almost no effect on the size of the formed mark image.

本実施例においては、モータードライブ機構がマスクの
片方の面に設置されており、マスク数の拡張も可能な構
成となっている。また、マスク交換もモータドライブ機
構！構であるため迅速に行えるので熟練を要さず簡便に
行える。なお、この実施例では一部手動によル駆動して
いるがこれにもモータドライブ機構を付加して自動処理
を行うことも可能である。In this embodiment, the motor drive mechanism is installed on one side of the mask, making it possible to expand the number of masks. Also, the motor drive mechanism allows you to change the mask! Since it is a simple structure, it can be performed quickly and can be easily performed without requiring any skill. In this embodiment, some parts are driven manually, but it is also possible to add a motor drive mechanism to perform automatic processing.

また、マスクとしてはガラス基板上の金ハ蒸着膜の他ガ
ラス表面を工、チングして散乱させたマスクや、ステン
シルと呼ばれる金５薄膜に穴をあけたマスクや、セラミ
ックに穴ｔｈけたものなど種々のマスクを用いることが
できる。In addition, masks include a gold oxide deposited film on a glass substrate, a mask made by etching and scattering the glass surface, a mask with holes made in a thin gold film called a stencil, and a mask made with holes made in ceramic. Various masks can be used.

以上、詳細に説明したように、本発明によれば、レーザ
マーカ用のマスク機構としてマスク交換が容品で、かつ
多数の組合せを選択でき、しかもガラスマスクを用いて
文字や図形の高品質のマーキングが可能となる。As described in detail above, according to the present invention, the mask mechanism for laser markers allows easy mask replacement, allows for a large number of combinations to be selected, and allows for high-quality marking of characters and figures using a glass mask. becomes possible.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本発明に使用されるマークの一例を示す図、第
２図は一般のレーザマーカの構成を示す斜視図、第３図
は本発明の実施例の部分破砕斜視図である。図において
、１・・・・・・レーザ光源、２・・・・・・拡散光学
系、３・・・・・・レーザマーカ用マスク機構、４・・
・・・・集光レンズ、５・・・・・・マーク物体、１０
，２０゜３０・・・・・・マスクホルダ、１１，２１，
３１・・・・・・マスク、１２．２２．３２・・・・・
・モータドライブ機構、１３，２３゜３３・・・・・・
昇降ｔＲ構、１４，２４．３４・・・・・・マスク移動
ｍＷ、’　１５，２５．３５・・・・・・ガイド穴、４
０・・・・・・ウィンドウ、４１・・・・・・ケース、
である。 代理人　弁理士　内　原　晋 萬　／　図 ＡＢＣＳＬ−１２′３　Ｊ ｚ　３　図 ４FIG. 1 is a diagram showing an example of a mark used in the present invention, FIG. 2 is a perspective view showing the configuration of a general laser marker, and FIG. 3 is a partially exploded perspective view of an embodiment of the present invention. In the figure, 1... Laser light source, 2... Diffusion optical system, 3... Laser marker mask mechanism, 4...
... Condensing lens, 5 ... Mark object, 10
, 20° 30...Mask holder, 11, 21,
31...Mask, 12.22.32...
・Motor drive mechanism, 13, 23° 33...
Lifting/lowering tR structure, 14, 24.34...Mask movement mW,' 15,25.35...Guide hole, 4
0...Window, 41...Case,
It is. Agent Patent Attorney Shinman Uchihara / Figure ABCSL-12'3 J z 3 Figure 4

Claims (1)

【特許請求の範囲】[Claims] レーザ光を通過させる所定面領域のウィンドウを設けた
ケースと、このケース内に前記ウィンドウ面と平行に互
に接近させてそれぞれ挿入され文字・記号あるいは図形
からｒｊるｐマークをそれぞれ有する複数のマスクと、
これらマスクを前記ウィンドウと平行面内で互に直交す
る方向にそれぞれ駆動する複数のマスク移動手段とを含
むレーザマーカ用マスク機構。A case provided with a window of a predetermined surface area through which laser light passes, and a plurality of masks each having a P mark inserted in the case parallel to the window surface and close to each other and extending from a character, symbol, or figure. and,
A mask mechanism for a laser marker including a plurality of mask moving means for respectively driving these masks in directions orthogonal to each other in a plane parallel to the window.
JP58161401A 1983-09-02 1983-09-02 Masking mechanism for laser marker Pending JPS6052369A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58161401A JPS6052369A (en) 1983-09-02 1983-09-02 Masking mechanism for laser marker

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58161401A JPS6052369A (en) 1983-09-02 1983-09-02 Masking mechanism for laser marker

Publications (1)

Publication Number Publication Date
JPS6052369A true JPS6052369A (en) 1985-03-25

Family

ID=15734387

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58161401A Pending JPS6052369A (en) 1983-09-02 1983-09-02 Masking mechanism for laser marker

Country Status (1)

Country Link
JP (1) JPS6052369A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6227341U (en) * 1985-07-31 1987-02-19
GB2601330A (en) * 2020-11-26 2022-06-01 Tenscon Ltd A load-indicating device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6227341U (en) * 1985-07-31 1987-02-19
GB2601330A (en) * 2020-11-26 2022-06-01 Tenscon Ltd A load-indicating device
GB2601330B (en) * 2020-11-26 2023-05-03 Tenscon Ltd A load-indicating device

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