JPS6050392A - Heating-cooling device - Google Patents

Heating-cooling device

Info

Publication number
JPS6050392A
JPS6050392A JP15871583A JP15871583A JPS6050392A JP S6050392 A JPS6050392 A JP S6050392A JP 15871583 A JP15871583 A JP 15871583A JP 15871583 A JP15871583 A JP 15871583A JP S6050392 A JPS6050392 A JP S6050392A
Authority
JP
Japan
Prior art keywords
shell
heating
cooling
container
cooling device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15871583A
Other languages
Japanese (ja)
Inventor
Kinya Usuda
臼田 欣也
Nobuji Tsuchiya
土屋 宜司
Fumiaki Shigemitsu
重光 文明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP15871583A priority Critical patent/JPS6050392A/en
Publication of JPS6050392A publication Critical patent/JPS6050392A/en
Pending legal-status Critical Current

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28DHEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D21/00Heat-exchange apparatus not covered by any of the groups F28D1/00 - F28D20/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Furnace Details (AREA)

Abstract

PURPOSE:To enable to heat or cool uniformly the material to be treated in a shell by a method wherein a shell is formed in a shape in which a material to be treated can be arranged separately with certain space so that a heat convection does not generate between the shell and the surface of the arranged material to be treated. CONSTITUTION:A material to be treated (for instance, a blank mask 25) is inserted into a shell 19 after opening a cover 21, and supported with a supporting body 20, subsequently, a high temperature nitrogen gas is fed from a high temperature gas supply part 15, then discharged from a discharging port 17. Thereby, the inside of a vessel 11 is filled with nitrogen gas, accordingly, the shell 19 is heated. In this case, the space between the inner wall surface of the shell 19 and the blank mask 25 is neared by interposing the supporting body 20 having a length of less than 10mm.. Also the shell 19 is formed with a material having a high heat conductivity, accordingly the blank mask 25 is uniformly heated without influence of heat convection.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は加熱・冷却装置に関し、特にレジストパターン
形成でのベーク、冷却工程での使用に適した加熱・冷却
装置に係る。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a heating/cooling device, and particularly to a heating/cooling device suitable for use in baking and cooling steps in resist pattern formation.

[発明の技術的背景とその問題点〕 従来の加熱・冷却装置としては第1図に示す構造のもの
が知られていた。すなわち1図中の1は断熱性の壁部2
を有する恒温槽である。この恒温槽Jの底部側にはガス
導入室3がもうけられており、この導入室3の側壁には
ガスを導−人するための供給管4が取着されている。ま
た。
[Technical background of the invention and its problems] As a conventional heating/cooling device, one having the structure shown in FIG. 1 has been known. In other words, 1 in Figure 1 is the heat insulating wall 2
This is a constant temperature bath. A gas introduction chamber 3 is provided at the bottom of the thermostatic chamber J, and a supply pipe 4 for conducting gas is attached to the side wall of this introduction chamber 3. Also.

@記恒温槽1とガス導入室3とね4同槽1の底壁部2に
開口した吸気孔5を介して連通されている。前記恒温槽
1内の吸気孔5近傍にはヒータ6が配設されている。前
記恒温槽1内の四すみには土壁部2で支持されたフレー
ム7がもうけられている。これらフレーム7には下側か
ら熱風整流板8.第1〜第3の棚板9a〜9cが順次水
平に載置されている。更に、前記土壁部2の中央には真
空装a(図示せず)と連結した排気ダンパ10が開口さ
れている。こうした構造の加熱・冷却装置によシ被処理
物を加熱するには、まず、棚板98〜9c上に被処理物
(図示せず)をのせる。つづいて、ヒータ6を所定温度
に加熱すると共に6図示しない真空装置を作動して恒温
槽J内のガスを排気ダンパ1oを介して排気する。こう
した排気により、ガス導入室3内のガスが吸気孔5を通
って恒温槽1内に導入され、ヒータ6で加熱されると共
に整流板8によ多分散されて棚板9tR〜9o土の被処
理物をした状態で図示しない真空装置を作動する。こう
することによシ、冷却ガスはガス導入室3゜吸気孔6お
よび整流板8を介して恒温槽1内にながれ棚板91I〜
9c上の被処理物が冷却される。
The constant temperature chamber 1 and the gas introduction chamber 3 and 4 are communicated through an intake hole 5 opened in the bottom wall 2 of the chamber 1. A heater 6 is arranged near the intake hole 5 in the thermostatic chamber 1 . A frame 7 supported by earthen walls 2 is provided at each corner of the thermostatic chamber 1. These frames 7 are provided with hot air baffle plates 8 from below. First to third shelf boards 9a to 9c are sequentially placed horizontally. Furthermore, an exhaust damper 10 connected to a vacuum system a (not shown) is opened in the center of the earthen wall portion 2. In order to heat an object to be processed using the heating/cooling device having such a structure, the object to be processed (not shown) is first placed on the shelf boards 98 to 9c. Subsequently, the heater 6 is heated to a predetermined temperature, and a vacuum device (not shown) is activated to exhaust the gas in the thermostatic chamber J via the exhaust damper 1o. Due to this exhaust gas, the gas in the gas introduction chamber 3 is introduced into the thermostatic chamber 1 through the intake hole 5, heated by the heater 6, and dispersed by the rectifier plate 8, so that it covers the soil of the shelf plates 9tR to 9o. A vacuum device (not shown) is operated with the object being treated. By doing this, the cooling gas flows into the thermostatic chamber 1 through the gas introduction chamber 3, the intake hole 6, and the rectifier plate 8, and the shelf plates 91I to 91I.
The object to be processed on 9c is cooled.

しかしながら、旧述した第1(i!!J図示の加熱・冷
却装置VChつては、熱対流によ勺被処理物を冷却する
ため、均一冷却が困難であった。また。
However, in the first heating/cooling device VCh shown in the figure, uniform cooling was difficult because the object to be processed was cooled by thermal convection.

恒温槽内の温度上昇、降下に時間がかかや、こまかい温
度制御がむずかしい。さらに、装置が大型になる欠点が
あった。
It takes time for the temperature inside the thermostat to rise and fall, and precise temperature control is difficult. Furthermore, there is a drawback that the device becomes large.

〔発明、の目的〕[Purpose of the invention]

本発明は均一加熱、均一冷却が可能で、小型な加熱・冷
却装置を提供しようとするものである。
The present invention aims to provide a compact heating/cooling device that is capable of uniform heating and cooling.

〔発明の概要〕[Summary of the invention]

本発明は容器と、この容器内に装填され、被処理物が収
納される熱伝導率の高い壁体からなるシェルと、前記容
器とシェルとの窄間を加熱する加熱手段と、前記容器と
シェルとの窒間を冷却す゛る冷却手段とを具備し、前記
シェルを。
The present invention provides a container, a shell made of a wall with high thermal conductivity that is loaded into the container and stores an object to be processed, a heating means for heating a gap between the container and the shell, and a heating means for heating the gap between the container and the shell. and cooling means for cooling the nitrogen gas between the shell and the shell.

その壁体内面と収納すべき被処理物の表面とが熱対流を
生じない間隔で配置されるような形状としたことを特徴
とするものである。こうした構成にすることによって、
シェル内の被処理物鉱熱対流を招くことなく加熱ないし
冷却がなされるため、既述のごとく均一加熱、均一冷却
をはかることが可能で、小型の加熱・冷却装置を得るこ
とができる。
It is characterized by a shape in which the inner surface of the wall and the surface of the workpiece to be stored are arranged at an interval that does not cause thermal convection. By having this configuration,
Since the material to be treated is heated or cooled without causing mineral heat convection within the shell, uniform heating and cooling can be achieved as described above, and a compact heating/cooling device can be obtained.

〔発明の実施例〕[Embodiments of the invention]

以下1本発明の実施例を図面を参照して説明する。 An embodiment of the present invention will be described below with reference to the drawings.

図中の11は容器でめシ、この容器11の三側面は開口
されている。この容器11の右側面には2つのガス導入
口12B、12bを有するガス導入体13が連結されて
いる。一方のガス導入口J2aにはパルプ14mを介し
て高温ガス供給部J5が連結されている。他方のガス導
入口12bにはパルプ14bを介して低温ガス供給部1
6が連結されている。また、 nil記容器11の左側
面には、排気口17を廟するガス排気体18が゛連結さ
れている。前記排気口17にはパルプ14cが設けられ
ている。更に、前記容器11内にはシェルJ9がその容
器11の前側面から挿置されている。このシェル19は
銅等の熱伝導率の萬い材料の壁体から形成されている。
11 in the figure is a container, and three sides of this container 11 are open. A gas introduction body 13 having two gas introduction ports 12B and 12b is connected to the right side surface of this container 11. A high temperature gas supply section J5 is connected to one gas inlet J2a via a pulp 14m. The other gas inlet 12b is connected to the low temperature gas supply section 1 via the pulp 14b.
6 are connected. Furthermore, a gas exhaust body 18 is connected to the left side surface of the container 11, which includes an exhaust port 17. The exhaust port 17 is provided with pulp 14c. Further, a shell J9 is inserted into the container 11 from the front side of the container 11. This shell 19 is formed from a wall of a material having a high thermal conductivity, such as copper.

また、@記ンエル19の内側面の上壁部および下壁部に
は、それぞれ被処理物を支持すべき支持体2o・・・が
取着されている。なお、これら支持体20・・・は例え
ば10mm以下の長さになっている。また、前記7エル
19はOil側面が開口され、その開口部分は階段状に
くっきよくして容器IJの前側面の開口に密着し1いる
Supports 2o for supporting the object to be processed are attached to the upper and lower walls of the inner surface of the chamber 19, respectively. Note that these supports 20... have a length of, for example, 10 mm or less. Further, the oil side surface of the 7-well 19 is opened, and the opening portion is shaped like a step and closely contacts the opening on the front side surface of the container IJ.

そして前記シェル19の開口部分には蓋2ノが着脱自在
にと多つけられている。この蓋21には取手22が設け
られている。更に前記シェル19の上面には、センサ2
3が取着されておp。
A lid 2 is detachably attached to the opening of the shell 19. This lid 21 is provided with a handle 22. Furthermore, a sensor 2 is provided on the upper surface of the shell 19.
3 is attached to p.

かつそのセンサ23はコントローラ24に接続されてい
る。このコントローラ24は前GC高温供給部ノ5およ
び低温供給部J6に接続されており、それら供給部15
.16の温度制御を行うものである。
And the sensor 23 is connected to the controller 24. This controller 24 is connected to the front GC high temperature supply section 5 and low temperature supply section J6, and these supply sections 15
.. 16 temperature controls.

このような構成によれば、今、蓋21をひらき、被処理
物(たとえばブランクマスク25)をシェル19内に挿
入し、支持体20・・・に支持する。つづいて、パルプ
1411およびJ4cを開けた後、高温ガス供給部16
より高温ガス。
According to such a configuration, the lid 21 is now opened, the object to be processed (for example, the blank mask 25) is inserted into the shell 19, and supported by the supports 20. Next, after opening the pulp 1411 and J4c, the high temperature gas supply section 16
Hotter gas.

例えば蟹禦ガスをパルプ74M、ガス導入口1211お
よびガス導入体J3を通じて容器11内に供給すると共
に排気口17から排気して容器11と7エルJ9の間の
圧力を一定にする。
For example, crabmeat gas is supplied into the container 11 through the pulp 74M, the gas inlet 1211, and the gas inlet J3, and is exhausted from the exhaust port 17 to keep the pressure between the container 11 and the 7L J9 constant.

こうすることによって、容器IJ内は窒素ガスが満され
、/エル19が加熱されるが、シェルJ9の内壁面とブ
ランクマスク250間はlO龍以下の長さ支持体20・
・・が介在されて近接され、かつ7エル19は熱伝導率
の高い材料で形成されているため、ブランクマスク26
は熱対流を受けることなく、均一に加熱される。なお。
By doing this, the inside of the container IJ is filled with nitrogen gas and the /L 19 is heated, but the length between the inner wall surface of the shell J9 and the blank mask 250 is less than 10 mm.
... are interposed and close to each other, and the 7L 19 is made of a material with high thermal conductivity, so the blank mask 26
is heated uniformly without undergoing heat convection. In addition.

かかる加熱において、シェルJ91iセンサ23によシ
温度が検知され、その検出信号はコントローラ24に出
力され、高温ガス供給部15の温度を制御する。一方、
パルプ14I!をとじ。
During such heating, the shell temperature is detected by the shell J91i sensor 23, and the detection signal is output to the controller 24 to control the temperature of the high temperature gas supply section 15. on the other hand,
Pulp 14I! Close it.

パルプ14bを介して低温ガス供給部16から冷却ガス
例えば窺素ガスを容器11内に供給すると、7エルJ9
が冷却されてその中のブランクマスク25が前述したの
と同様に均一に冷却される。なお、前記シェル19の温
度はセンサ23によシ監視されておシ、これにより低温
ガスの導入速度が決定される。また、その低温ガスの温
度は被処理物に必要とされる冷却速度によシ決定される
When a cooling gas such as silicon gas is supplied into the container 11 from the low temperature gas supply section 16 through the pulp 14b, 7L J9
is cooled, and the blank mask 25 therein is uniformly cooled in the same manner as described above. Note that the temperature of the shell 19 is monitored by a sensor 23, and the introduction rate of the low temperature gas is determined by this. Further, the temperature of the low-temperature gas is determined by the cooling rate required for the object to be processed.

したがって1本発明によればシェル内の被処理物をきわ
めて迅速、かつ均一に加熱、冷却できる小型の加熱・冷
却装置を得ることができる。
Therefore, according to the present invention, it is possible to obtain a small-sized heating/cooling device that can extremely quickly and uniformly heat and cool the object to be processed within the shell.

なお1本発明の加熱・冷却装置は上記実施例に限定され
るものではない。例えば、第4図図示のごとく容器J1
と7エルノ9の間にヒータ2どと、冷却液体が流通する
配管27を夫々蛇行して配置し、加熱・冷却装置を構成
してもよい。
Note that the heating/cooling device of the present invention is not limited to the above embodiment. For example, as shown in FIG.
A heater 2 and a pipe 27 through which a cooling liquid flows may be arranged in a meandering manner between the heater 2 and the 7 erno 9 to constitute a heating/cooling device.

また、上記実施例において、シェル内を減圧状態に保持
してもよい。このような構成によれば、輻射又は赤外線
放射のみによシ被処理物が加熱、或いは冷却されるため
、よシ一層の均一加熱、均一冷却を達成できる。
Further, in the above embodiment, the inside of the shell may be maintained in a reduced pressure state. According to such a configuration, since the object to be processed is heated or cooled only by radiation or infrared radiation, more uniform heating and cooling can be achieved.

〔発明の効果〕〔Effect of the invention〕

以上詳述したごとく1本発明の加熱・冷却装置によれば
次にしめず効果を有する。
As described in detail above, the heating/cooling device of the present invention has the following effects.

fl) 被処理物に直接冷却材、冷却材を接触せずにシ
ェルの温度を制御するため、制御条件が少なくブランク
マスク等に被覆されたレジス) 84のベーク、および
冷却に有効に適用できる。
fl) Since the temperature of the shell is controlled without direct contact of the coolant with the object to be processed, there are few control conditions, and it can be effectively applied to baking and cooling of resist coated with a blank mask or the like.

(ロ) 被処理物の加熱、冷却を均一に行なうことがで
きる。
(b) The object to be processed can be heated and cooled uniformly.

f9 被処理物の加熱、冷却の温度履歴を任惹に制御で
き、被処理物の性質が加熱時の温度履歴に影響される場
合、その性質を高m度に制御できる。
f9 The temperature history of heating and cooling of the object to be processed can be controlled at will, and when the properties of the object to be processed are influenced by the temperature history during heating, the properties can be controlled to a high degree.

に) 構造的に最少限の大きさで済む。2) Structurally, the size can be kept to a minimum.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、従来の加熱・冷却装置を示す断面図、第2図
は本発明の一実施例を示す加熱・冷却装置の平面図、第
3図社第2図のX−X線に沿う断面図、第4図は1本発
明の他の実り例を示す加熱・冷却装置の横断面図である
。 1ノ・・・容器、15・・・高温ガス供給部、16・・
・低温ガス供給部、ノア・・・排気口、19・・・シェ
ル。 20・・・支持体、21・・・蓋、23・・・センサS
24・・・コントローラ、25・・・被処理物、26・
・・ヒータ、27・・・配管。
Fig. 1 is a sectional view showing a conventional heating/cooling device, Fig. 2 is a plan view of a heating/cooling device showing an embodiment of the present invention, and Fig. 3 is a cross-sectional view showing a conventional heating/cooling device. 4 is a cross-sectional view of a heating/cooling device showing another embodiment of the present invention. 1. Container, 15. High temperature gas supply section, 16.
・Low temperature gas supply section, Noah...Exhaust port, 19...Shell. 20... Support body, 21... Lid, 23... Sensor S
24... Controller, 25... Processed object, 26.
...Heater, 27...Piping.

Claims (1)

【特許請求の範囲】 α)容器と、この容器に装填され、被処理物が収納され
る熱伝導率の高い壁体からなる7エルと、前記容器とシ
ェルとの空間を加熱する加熱手段と、前記容器と7エル
との苗量を冷却する冷却手段とを具備し、前記シェルを
。 その壁体内面と収納すべき被処理物の表面とが熱対流を
生じない間隔で配置されるような形状としたことを特徴
とする加熱・冷却装置。 (2)7エル内が―圧状態に保持されていることを特徴
とする特許請求の範囲&’、!を項記載の加熱・冷却装
置。 範囲第1項記載の加熱・冷却装置。 (4シェルを、その壁体内面と収納すべき被処理物の表
面との距離がlomi+以下で配置されるような形状と
したことを特徴とする特許請求の範囲第1項記載の加熱
・冷却装置。
[Scope of Claims] α) A container, a 7-well made of a wall with high thermal conductivity that is loaded into the container and stores the object to be processed, and a heating means for heating the space between the container and the shell. , comprising a cooling means for cooling the container and the seedling quantity of 7 L, and the shell. A heating/cooling device characterized in that the inner surface of the wall and the surface of the processed object to be stored are arranged at an interval that does not cause thermal convection. (2) Claims characterized in that the inside of the 7L is maintained at a -pressure state &',! Heating and cooling equipment as described in section. Heating/cooling device according to scope 1. (Heating and cooling according to claim 1, characterized in that the four shells are arranged in such a shape that the distance between the inner surface of the wall and the surface of the processed object to be stored is lomi+ or less) Device.
JP15871583A 1983-08-30 1983-08-30 Heating-cooling device Pending JPS6050392A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15871583A JPS6050392A (en) 1983-08-30 1983-08-30 Heating-cooling device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15871583A JPS6050392A (en) 1983-08-30 1983-08-30 Heating-cooling device

Publications (1)

Publication Number Publication Date
JPS6050392A true JPS6050392A (en) 1985-03-20

Family

ID=15677765

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15871583A Pending JPS6050392A (en) 1983-08-30 1983-08-30 Heating-cooling device

Country Status (1)

Country Link
JP (1) JPS6050392A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008157578A (en) * 2006-12-26 2008-07-10 Kobe Steel Ltd Heat storage system and heat storage device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008157578A (en) * 2006-12-26 2008-07-10 Kobe Steel Ltd Heat storage system and heat storage device

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