JPS6040595Y2 - Melting plating tank - Google Patents

Melting plating tank

Info

Publication number
JPS6040595Y2
JPS6040595Y2 JP8217682U JP8217682U JPS6040595Y2 JP S6040595 Y2 JPS6040595 Y2 JP S6040595Y2 JP 8217682 U JP8217682 U JP 8217682U JP 8217682 U JP8217682 U JP 8217682U JP S6040595 Y2 JPS6040595 Y2 JP S6040595Y2
Authority
JP
Japan
Prior art keywords
plating
bath
plated
tank
hot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8217682U
Other languages
Japanese (ja)
Other versions
JPS58184561U (en
Inventor
章二 志賀
昭利 鈴木
Original Assignee
古河電気工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 古河電気工業株式会社 filed Critical 古河電気工業株式会社
Priority to JP8217682U priority Critical patent/JPS6040595Y2/en
Publication of JPS58184561U publication Critical patent/JPS58184561U/en
Application granted granted Critical
Publication of JPS6040595Y2 publication Critical patent/JPS6040595Y2/en
Expired legal-status Critical Current

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  • Coating With Molten Metal (AREA)

Description

【考案の詳細な説明】 本考案は溶融メッキ槽の改良に関するもので、特に設置
面積の縮少及び熱源費用の節約を可能にし、操作時の保
守管理を容易にしたものである。
[Detailed Description of the Invention] The present invention relates to an improvement of a hot-dip plating tank, and in particular, it makes it possible to reduce the installation area, save on heat source costs, and facilitate maintenance during operation.

一般に鉄鋼に対する亜鉛メッキ又は銅、銅合金に対する
錫メッキ、半田メッキには溶融メッキが広く用いられて
おり、金属線、条、管等に低融点金属を溶融メッキした
材料が工業上広く用いられている。
In general, hot-dip plating is widely used for galvanizing steel, tin plating copper and copper alloys, and solder plating, and materials made by hot-dipping metal wires, strips, pipes, etc. with low melting point metals are widely used in industry. There is.

例えば銅線上に半田を5〜10μの厚さに溶融メッキし
た材料は、電子部品や通信用導体に用いられている。
For example, a material obtained by hot-dipping solder on a copper wire to a thickness of 5 to 10 microns is used for electronic components and communication conductors.

このような溶融メッキにおいて、厚付けするためには浴
温度を低くして、溶融浴の粘度を高くする必要がある。
In such hot-dip plating, in order to increase the thickness, it is necessary to lower the bath temperature and increase the viscosity of the molten bath.

しかるに浴温度を低(すると、被メッキ材との濡れ性が
不十分となり、ピンホールや不メツキ部を生ずる原因と
なる。
However, if the bath temperature is lowered, wettability with the material to be plated will be insufficient, causing pinholes and unplated areas.

濡れ性は被メッキ材とメッキ金属、例えば銅の錫メッキ
において、銅と錫が反応して1種の合金を形成するもの
であり、高温浴の方が指数関数的に進行し易いことは周
知である。
It is well known that wettability occurs when the material to be plated and the plating metal, such as tin plating of copper, react with copper to form a type of alloy, and that wettability progresses exponentially more easily in a high-temperature bath. It is.

このため溶融メッキにおいても第1図に示すように2個
の溶融メッキ槽1,1′を直列に配置し、前方のメッキ
槽1をメッキ金属の溶融高温浴2、後方のメッキ槽1′
をメッキ金属の溶融低温浴2′とし、被メッキ材aを前
方のメッキ槽1内に設けたガイドロール3と、メッキ槽
1上に設けたガイドロール4により高温浴2中を通過せ
しめ、続いて両ロール3.4間に配置した絞りダイス5
を通してメッキ金属を薄くメッキした後、後方のメッキ
槽1′内に設けたガイドロール3′と、メッキ槽1′上
に設けたガイドロール4′により低温浴2′中を通過せ
しめ、続いて両ロール3’、4’間に配置した絞りダイ
ス5′を通してメッキ金属を厚くメッキしている。
For this reason, even in hot-dip plating, two hot-dip plating tanks 1 and 1' are arranged in series as shown in Fig. 1, and the front plating tank 1 is used as the high-temperature bath 2 for melting the plated metal, and the rear plating tank 1'
is a low-temperature bath 2' for melting plating metal, and the material to be plated is passed through the high-temperature bath 2 by a guide roll 3 provided in the front plating tank 1 and a guide roll 4 provided above the plating tank 1, and then A drawing die 5 placed between both rolls 3 and 4
After thinly plating the plating metal through the plating tank 1', the plated metal is passed through the low temperature bath 2' by a guide roll 3' installed in the rear plating tank 1' and a guide roll 4' installed above the plating tank 1'. The plating metal is thickly plated through a drawing die 5' placed between the rolls 3' and 4'.

このような溶融メッキによれば単槽による溶融メッキに
比較し、高品質の溶融メッキ材料を得ることができる。
According to such hot-dip plating, a high-quality hot-dip plating material can be obtained compared to hot-dip plating using a single tank.

しかしながら単槽の場合と比較し、2倍の設備を必要と
するため、設置面積及び熱源費用が倍となり、操業時の
保守管理にも倍の入力を要し、更に高価なメッキ金属、
例えば半田を多量に用いるばかりか、酸化によるロスも
無視できない欠点があった。
However, compared to a single tank, it requires twice as much equipment, doubles the installation area and heat source costs, requires twice as much input for maintenance during operation, and requires more expensive plated metal and
For example, not only does it require a large amount of solder, but it also suffers from losses due to oxidation, which cannot be ignored.

本考案は前記問題点を解消するため、種々検討の結果、
設置面積及び熱費用を半減し、酸化によるロスも少なく
、操業時の保守管理も容易な溶融メッキ槽を開発したも
ので、槽内にメッキ金属の溶融浴を保持し、該浴中に被
メッキ材を連続して通過させてメッキを行なう溶融メッ
キ槽において、槽内を被メッキ材の通過口を有する隔壁
により、少なくとも被メッキ材の挿入室と引出室に2分
し、挿入室内の浴温度を引出室内の浴温度より高温に保
持することを特徴とするものである。
In order to solve the above-mentioned problems, the present invention was developed after various studies.
We have developed a hot-dip plating tank that reduces the installation area and heat costs by half, has little loss due to oxidation, and is easy to maintain during operation.The tank holds a molten bath of plated metal, and the plated metal is placed in the bath. In a hot-dip plating tank in which plating is performed by passing material continuously, the inside of the tank is divided into at least two parts, an insertion chamber and a withdrawal chamber for the material to be plated, by a partition wall having a passage port for the material to be plated, and the bath temperature in the insertion chamber is The temperature of the bath is maintained at a higher temperature than the bath temperature in the drawer chamber.

これを図面を用いて詳細に説明する。This will be explained in detail using the drawings.

第2図は本考案溶融メッキ槽の一実施例を示すもので、
図においてaは被メッキ材、1は溶融メッキ槽、6は隔
壁を示し、メッキ槽1内に被メッキ材aの通過ロアを有
する隔壁6を取付け、メッキ槽1内を少なくとも左右2
室に分割し、その一方を被メッキ材aの挿入室1a、他
方を被メッキ材aの引出室1bとし、挿入室1aをメッ
キ金属の溶融高温浴2a、引出室1bをメッキ金属の溶
融低温浴2bとする。
Figure 2 shows an embodiment of the hot-dip plating tank of the present invention.
In the figure, a indicates a material to be plated, 1 indicates a hot-dip plating tank, and 6 indicates a partition wall.In the plating tank 1, the partition wall 6 having a lower passage through which the material to be plated a passes is installed.
The chamber is divided into two chambers, one of which is an insertion chamber 1a for plating material a, and the other is a drawer chamber 1b for plated material a. Let's call it hot bath 2b.

挿入室1a内と引出室1b内に隔壁6の通過ロアと相対
してガイドロール3a13bと、引出室1bの上方にガ
イドロール4とを設け、引出室1b側の両ガイドロール
3b、4間に絞りダイス5を配置したものである。
A guide roll 3a13b is provided in the insertion chamber 1a and the drawer chamber 1b facing the passing lower part of the partition wall 6, and a guide roll 4 is provided above the drawer chamber 1b. A drawing die 5 is arranged.

隔壁6はメッキ金属の溶融浴と反応しない耐火材、例え
ば耐火レンガやアスベストからなり、メッキ槽1内を挿
入室1aと引出室1bの2室に分割し、かつ被メッキ材
aの通過ロアが設けられている。
The partition wall 6 is made of a refractory material that does not react with the molten bath of the plating metal, such as refractory brick or asbestos, and divides the inside of the plating tank 1 into two chambers, an insertion chamber 1a and a drawer chamber 1b, and a lower passage through which the material to be plated a passes. It is provided.

挿入室1aと引出室1bにはそれぞれ熱源8a、8bと
して、例えば燃料バーナー又は電熱体を設け、挿入室1
a内のメッキ金属の溶融浴を引出室1b内のメッキ金属
の溶融浴より温度が高い高温浴2aに、引出室1b内を
低温浴2bに保持できるようになっている。
The insertion chamber 1a and the drawer chamber 1b are each provided with, for example, a fuel burner or an electric heating element as heat sources 8a and 8b.
The molten bath of plated metal in the drawer chamber 1b can be kept in a high temperature bath 2a, which is higher in temperature than the molten bath of plated metal in the drawer chamber 1b, and the bath in the drawer chamber 1b can be kept in a low temperature bath 2b.

例えば半田メッキ銅線の場合には高温浴2aを300℃
前後の温度に、低温浴2bを200〜250℃程度の温
度に保持する。
For example, in the case of solder-plated copper wire, the high temperature bath 2a is heated to 300°C.
The low temperature bath 2b is maintained at a temperature of about 200 to 250°C.

被メッキ材aはメッキ槽1の挿入室1aより高温浴2a
中に入り、表面に高温浴2aによる薄メッキが行なわれ
、続いて挿入室1a内に設けたガイドロール3aと引出
室1b内に設けたガイドロール3bにより、隔壁6に形
成した通過ロアを通り、引出室1b内の低温浴2b中に
入り、低温浴2bによる厚メッキが行なわれる。
The material to be plated a is transferred from the insertion chamber 1a of the plating bath 1 to the high temperature bath 2a.
After entering the interior, the surface is thinly plated using a high-temperature bath 2a, and then passed through a passage lower formed in the partition wall 6 by a guide roll 3a provided in the insertion chamber 1a and a guide roll 3b provided in the drawer chamber 1b. , enters the low-temperature bath 2b in the drawer chamber 1b, and thick plating is performed in the low-temperature bath 2b.

これをガイドロール4により絞りダイス5を通して引出
すものである。
This is pulled out through a drawing die 5 using a guide roll 4.

本考案メッキ槽は以上の構成からなり、高温浴及び低温
浴の熱源消費は殆んど高温浴の熱源によるもので、低温
浴の熱源は隔壁、通過口及び周辺への放熱特性を考慮す
ることにより極少化することができる。
The plating bath of the present invention has the above-mentioned configuration, and the heat source consumption of the high temperature bath and low temperature bath is mostly due to the heat source of the high temperature bath, and the heat source of the low temperature bath should take into consideration the heat radiation characteristics to the partition walls, passage ports, and surroundings. This can be minimized.

また温度制御用程度に抑えることも可能である。It is also possible to limit the amount to a level for temperature control.

従って、従来の2槽方式において、第1槽でメッキした
材料を冷却固化させて第2槽に導入することと、2槽に
よる放熱面積を考慮すると本考案メッキ槽では熱源消費
が半減する。
Therefore, in the conventional two-bath system, when the material plated in the first tank is cooled and solidified before being introduced into the second tank, and the heat dissipation area of the two tanks is considered, the heat source consumption is halved in the plating tank of the present invention.

また2槽方式に比較し酸化やノロの発生が半減する。Also, compared to the two-tank system, oxidation and slag generation are reduced by half.

更にメッキにより消費するメッキ金属、例えば半田の補
給を引出室に投入することにより、引出室内の低温浴部
を常に清浄に保つことができるので、品質向上に寄与す
る。
Furthermore, by supplying plating metal, such as solder, consumed by plating into the drawer chamber, the low temperature bath section in the drawer chamber can be kept clean at all times, contributing to quality improvement.

また絞りダイスやガイドロールの使用も半減できるので
、その保守、補修を著しく軽減できる等顕著な効果を奏
するものである。
Furthermore, since the use of drawing dies and guide rolls can be halved, maintenance and repair thereof can be significantly reduced, which is a remarkable effect.

以上、被メッキ材を垂直方向に引き上げる例について説
明したが、これに限るものではなく、水平方向に引き抜
く場合にも全く同様に実施することができるものである
Although an example has been described above in which the material to be plated is pulled up in the vertical direction, the present invention is not limited to this, and can be carried out in exactly the same manner even when pulled out in the horizontal direction.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の溶融メッキ槽の一例を示す側断面図、第
2図は本考案溶融メッキ槽の一施例を示す側断面図であ
る。 a・・・・・・被メッキ材、1,1′・・・・・・溶融
メッキ槽、1a・・・・・・挿入室、1b・・・・・・
引出室、2,2a・・・・・・高温浴、2,2b・・・
・・・低温浴、3,3’、3at 3bt 4t
4’−−−−−−ガイドロール、5. 5’−・・・
・・絞りダイス、6・・・・・・隔壁、7・・・・・・
通過口。
FIG. 1 is a side sectional view showing an example of a conventional hot-dip plating tank, and FIG. 2 is a side sectional view showing an example of the hot-dip plating tank of the present invention. a... Material to be plated, 1, 1'... Hot dip plating tank, 1a... Insertion chamber, 1b...
Drawer room, 2, 2a... High temperature bath, 2, 2b...
...low temperature bath, 3,3', 3at 3bt 4t
4'-----Guide roll, 5. 5'-...
...Drawing die, 6...Partition wall, 7...
Passage gate.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 槽内にメッキ金属の溶融浴を保持し、該浴中に被メッキ
材を連続して通過させてメッキを行なう溶融メッキ槽に
おいて、槽内を被メッキ材の通過口を有する隔壁により
、少なくとも被メッキ材の挿入室と引出室に2分し、挿
入室内の浴温度を引出室内の浴温度より高温に保持する
ことを特徴とする溶融メッキ槽。
In a hot-dip plating tank in which a molten bath of plating metal is held in the tank and a material to be plated is continuously passed through the bath for plating, a partition wall having a passage port for the material to be plated is provided in the tank. A hot-dip plating tank characterized in that it is divided into two parts: an insertion chamber for plating material and a pull-out chamber, and the bath temperature in the insertion chamber is maintained at a higher temperature than the bath temperature in the pull-out chamber.
JP8217682U 1982-06-02 1982-06-02 Melting plating tank Expired JPS6040595Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8217682U JPS6040595Y2 (en) 1982-06-02 1982-06-02 Melting plating tank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8217682U JPS6040595Y2 (en) 1982-06-02 1982-06-02 Melting plating tank

Publications (2)

Publication Number Publication Date
JPS58184561U JPS58184561U (en) 1983-12-08
JPS6040595Y2 true JPS6040595Y2 (en) 1985-12-07

Family

ID=30091251

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8217682U Expired JPS6040595Y2 (en) 1982-06-02 1982-06-02 Melting plating tank

Country Status (1)

Country Link
JP (1) JPS6040595Y2 (en)

Also Published As

Publication number Publication date
JPS58184561U (en) 1983-12-08

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