JPS6038251B2 - electroforming cavity - Google Patents

electroforming cavity

Info

Publication number
JPS6038251B2
JPS6038251B2 JP8177876A JP8177876A JPS6038251B2 JP S6038251 B2 JPS6038251 B2 JP S6038251B2 JP 8177876 A JP8177876 A JP 8177876A JP 8177876 A JP8177876 A JP 8177876A JP S6038251 B2 JPS6038251 B2 JP S6038251B2
Authority
JP
Japan
Prior art keywords
layer
plating
nickel plating
cavity
electroless
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8177876A
Other languages
Japanese (ja)
Other versions
JPS537546A (en
Inventor
元伸 高野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seikosha KK
Original Assignee
Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seikosha KK filed Critical Seikosha KK
Priority to JP8177876A priority Critical patent/JPS6038251B2/en
Publication of JPS537546A publication Critical patent/JPS537546A/en
Publication of JPS6038251B2 publication Critical patent/JPS6038251B2/en
Expired legal-status Critical Current

Links

Description

【発明の詳細な説明】 この発明はプラスチック成形に用いられる電銭キヤビテ
イに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a coin cavity used in plastic molding.

従来の露鋳キャビティ用電気メッキ材料としては、ほと
んどがニッケルメッキであり、その他ニッケル合金メッ
キが一部実用化されている程度である。
Conventional electroplating materials for open casting cavities are mostly nickel plating, with some nickel alloy platings being put into practical use.

これらは成形用キヤビテイとしてはその内部表面硬度が
余り高くなく、電気ニッケルメッキでHV280〜35
0、電気ニッケル合金メッキでも実用化されているもの
でせいぜいHV50の茎度である。そのため、成形中に
その内部表面が摩耗したり、傷がつくなどの事故がおこ
りやすいという欠点があった。また電気メッキによる方
法であることから、マスタに対するメッキ付着初期にお
ける突部への電荷集中からつきまわりが悪く、デンドラ
イトの発生もひどく作業上問題が多かった。さらに電気
メッキはその密着性の高いことから、入念なる離型処理
を行なわなければマスタを引抜くことができないという
欠点があった。これら従来技術上の欠点を除去したもの
として本件出願人は先に、内部表面に無電解ニッケルメ
ッキ層を有することを特徴とする電気ニッケルメッキ又
は電気ニッケル合金メッキ電鈴キャビティについて出願
をしている。無電解ニッケルメッキは、リン系の場合H
V450、ホウ素系の場合HV750と電気ニッケルメ
ッキに比べて高く、露鍵キャビティの内面表面材料とし
て適している。しかしこの無電解ニッケルメッキはリン
系あるいはホウ素系のいずれでも、そのメッキ厚は1時
間当り10〜20仏の生成しか得られない。しかも厚み
を増加させるにつれて表面は凹凸が顕著になり内部ひず
みも増大する。したがって霞銭キャピティ内部表面に一
層だけの無電解〆ッキを施した場合厚さが十分でないた
め、高荷重に対してはその硬さが生かされなくなってい
る。本発明はこうした欠点を除くため、キヤビティ内部
表面に無電藤ニッケルメッキ層を形成しその下に電気ニ
ッケルメッキと無電解ニッケルメッキを交互に複数層形
成し、最終層として電気ニッケルメッキ層を形成したも
のである。
The internal surface hardness of these is not very high for molding cavities, and with electrolytic nickel plating, HV280~35
0. Even electrolytic nickel alloy plating that has been put into practical use has a hardness of HV50 at most. Therefore, there is a drawback that accidents such as abrasion or scratching of the internal surface easily occur during molding. Furthermore, since the method is based on electroplating, the charge concentration on the protrusions during the initial stage of plating on the master results in poor coverage and the occurrence of dendrites, which causes many operational problems. Furthermore, due to the high adhesion of electroplating, there was a drawback that the master could not be pulled out without careful mold release treatment. In order to eliminate these drawbacks of the prior art, the present applicant has previously filed an application for an electrolytic nickel plated or electrolytic nickel alloy plated bell cavity characterized by having an electroless nickel plating layer on the inner surface. Electroless nickel plating is H for phosphorus-based plating.
V450 is higher than HV750 and electrolytic nickel plating in the case of boron-based plating, and is suitable as the inner surface material of the exposed key cavity. However, whether this electroless nickel plating is phosphorus-based or boron-based, the plating thickness is only 10 to 20 plating per hour. Furthermore, as the thickness increases, the surface becomes more uneven and the internal strain increases. Therefore, if only one layer of electroless sealing is applied to the inner surface of the capacitor, the thickness will not be sufficient, and its hardness will not be utilized against high loads. In order to eliminate these drawbacks, the present invention forms an electroless nickel plating layer on the inner surface of the cavity, and below that, multiple layers of electrolytic nickel plating and electroless nickel plating are formed alternately, and an electrolytic nickel plating layer is formed as the final layer. It is something.

このような構成とすることによりキャビティの内部表面
の無電解ニッケルメッキ層は内部層より保強され硬さの
低下を防止できる。
With such a structure, the electroless nickel plating layer on the inner surface of the cavity is stronger than the inner layer, and a decrease in hardness can be prevented.

つぎに実施例について説明する。Next, examples will be described.

軍銭キャピティ製造用マスタの材質としては、黄銅、炭
素鋼、ステンレス、アルミニウム、プラスチック等のも
のが用いられる。
Brass, carbon steel, stainless steel, aluminum, plastic, and the like are used as the material for the master for manufacturing the gun space.

このマスタの一端部には所望の形状、たとえば歯車が形
成される。このマスタに対しまず無電解ニッケルメッキ
を施す。無電解ニッケルメッキとしてリン系の例として
組成: 塩化ニッケル 30夕/〆次亜リン
酸ソーダ 30夕/そ酢酸ソーダ
12夕/そ 界面活性剤 0.2夕/そ で70ooで3時間メッキし、20仏のメッキ厚を得た
A desired shape, for example a gear, is formed at one end of this master. First, electroless nickel plating is applied to this master. Composition as an example of phosphorus-based electroless nickel plating: Nickel chloride 30 minutes/Sodium hypophosphite 30 minutes/Soda acetate
Plating was carried out for 3 hours at 12 m/s surfactant and 0.2 m/s 70 oz to obtain a plating thickness of 20 mm.

これはでき上った露綾キャビティの内部表面(第1層)
となるものである。つぎにこのマスタに対し電気ニッケ
ルメッキとして、組成: スルフアミン酸ニッケル 6
002/ク塩化ニッケル 5夕/そホウ酸
40夕/そ ポリエチレングリコール 10夕/そ で20A/の,6000,1時間で厚さ0.2脚のメッ
キ層(第2層)を形成した。
This is the inner surface (first layer) of the completed dewy cavity.
This is the result. Next, electrolytic nickel plating is applied to this master, composition: nickel sulfamate 6
002/nickel chloride 5/boric acid
A plating layer (second layer) having a thickness of 0.2 mm was formed using polyethylene glycol of 10 mm/sleeve and 6,000 ml of polyethylene glycol for 1 hour.

さらにこの上に、ホウ素系ニッケル無電鍵〆ッキとして
、組成: 硫酸ニッケル 50夕/そ乳酸
20夕/そクエン酸ナトリウム
25タノク ジメチルアミノボラン 2.5夕/そチオジグリコ
−ル酸 1.5タノク アンモニア 7タノ〆 で60〜7000,2時間で15仏の厚さのメッキ層(
第3層)を形成した。
Furthermore, on top of this, as a boron-based nickel electronic key lock, composition: Nickel sulfate 50%/lactic acid
20 evening/sodium citrate
25 Tanok dimethylaminoborane 2.5 treble/Thiothiodiglycolic acid 1.5 Tanok ammonia 7 Tanok 60-7000 in 2 hours, 15 treps thick plating layer (
3rd layer) was formed.

最後に第2層の電気メッキを施した溶液を用い、30A
/dm2,60qoで2餌時間メッキを施し、約3肌厚
のメッキ層(第4層)を形成した。
Finally, using the solution with which the second layer was electroplated, 30A
Plating was performed at 60 qo/dm2 for 2 feeding hours to form a plating layer (fourth layer) with a thickness of about 3 skins.

図示すると「マスタ、Aの外側に第1層1の無電解ニッ
ケルメッキ層が、その外側に第2層2の電気ニッケルメ
ッキ層が、さらにその外側に第3層3の無電鱗ニッケル
メッキ層が形成され、最外側に第4層の電気ニッケルメ
ッキ層が形成されている。
As shown in the figure, "The first layer 1 is an electroless nickel plating layer on the outside of master A, the second layer 2 is an electroless nickel plating layer on the outside, and the third layer 3 is an electroless nickel plating layer on the outside. A fourth electrolytic nickel plating layer is formed on the outermost layer.

第1層1から第4層4によりキャピティBが形成され、
これをマスタAから離型してキャビティを得ることがで
きる。他の実施例として、マスタに対し、まず無電鱗ニ
ッケルメッキとして、組成: 塩化ニッケル
10夕/そエチレンジアミン 30夕/メ
カセイソーダ 20夕/そ ホウ水素酸ソーダ 0.5夕/そで5000、
2時間処理し、厚さ20yの第1層のホウ素−ニッケル
無電解〆ッキを形成した。
A cavity B is formed by the first layer 1 to the fourth layer 4,
This can be released from the master A to obtain a cavity. As another example, the master is first electroless nickel plated with composition: nickel chloride.
10 evenings/soethylenediamine 30 evenings/mekasei soda 20 evenings/sodium borohydride 0.5 evenings/sleeve 5000,
The treatment was carried out for 2 hours to form a first layer of boron-nickel electroless coating having a thickness of 20y.

次に第2層としてワット格による光沢電気ニッケルメッ
キを1時間行い5仏の厚さを得た。さらに第3層として
、組成: 硫酸ニッケル 30夕/そ次頭
リン酸ソーダ 10夕/そクエン酸カリウム
80夕/そ 硫酸アンモニウム 50夕/そ で90qo〜95qCで2時間処理し約15仏のりンー
ニツケル無電解〆ッキ層を形成した。
Next, as a second layer, bright electrolytic nickel plating was performed for one hour to obtain a thickness of 5 mm. Furthermore, as a third layer, the composition is: Nickel sulfate 30 minutes / Sodium phosphate 10 days / Potassium citrate
It was treated with ammonium sulfate for 2 hours at 90 to 95 qC for 2 hours to form a phosphorous nickel electroless glazing layer of about 15 mm.

最後にスルフアミン酸ニッケル俗で電気ニッケルメッキ
を施し5側の厚さの第4層を形成しキャビティを得た。
このキャビティを、無電解〆ッキ層を単層で用いたキヤ
ビティと比べたところ、硬度で20%の向上がみられ耐
久性が著しく増した。上記二っの実施例ではいずれの場
合も4層を形成しているが、層厚等のかねあいで適宜の
層数とすることができる。
Finally, electrolytic nickel plating was performed using nickel sulfamate to form a fourth layer with a thickness of 5 to form a cavity.
When this cavity was compared with a cavity using a single electroless glazing layer, it was found that the hardness was improved by 20% and the durability was significantly increased. In the above two embodiments, four layers are formed in each case, but the number of layers can be set as appropriate depending on the layer thickness and the like.

なお無電解〆ッキ層と電気メッキ層の密着度は当然高い
程良いので各層間の作業は短時間に行い、その間被メッ
キ物の表面は水漏れさせたまま行なった方が良い結果を
示した。
Naturally, the higher the degree of adhesion between the electroless coating layer and the electroplating layer, the better, so it is better to work between each layer in a short period of time, while leaving water leaking from the surface of the object to be plated. Ta.

【図面の簡単な説明】[Brief explanation of drawings]

図面はこの発明の一実施例の断面説明図である。 The drawing is an explanatory cross-sectional view of one embodiment of the present invention.

Claims (1)

【特許請求の範囲】[Claims] 1 凹部表面に無電解ニツケルメツキ層を形成し、さら
に電気ニツケルメツキ層と無電解ニツケルメツキ層を交
互に複数層形成し、最終層として電気ニツケルメツキ層
を形成した電鋳キヤビテイ。
1. An electroformed cavity in which an electroless nickel plating layer is formed on the surface of the recess, and a plurality of electric nickel plating layers and electroless nickel plating layers are alternately formed, and an electric nickel plating layer is formed as the final layer.
JP8177876A 1976-07-09 1976-07-09 electroforming cavity Expired JPS6038251B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8177876A JPS6038251B2 (en) 1976-07-09 1976-07-09 electroforming cavity

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8177876A JPS6038251B2 (en) 1976-07-09 1976-07-09 electroforming cavity

Publications (2)

Publication Number Publication Date
JPS537546A JPS537546A (en) 1978-01-24
JPS6038251B2 true JPS6038251B2 (en) 1985-08-30

Family

ID=13755927

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8177876A Expired JPS6038251B2 (en) 1976-07-09 1976-07-09 electroforming cavity

Country Status (1)

Country Link
JP (1) JPS6038251B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE220976T1 (en) * 1999-03-17 2002-08-15 Sony Dadc Austria Ag NICKEL PLATING OF A MOLDING TOOL USING A PULSATING CURRENT
US7497781B2 (en) * 2004-11-16 2009-03-03 Seicon, Ltd. Variable stiffness flexible joint

Also Published As

Publication number Publication date
JPS537546A (en) 1978-01-24

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