JPS6036674A - Activating method for electroless copper plating - Google Patents

Activating method for electroless copper plating

Info

Publication number
JPS6036674A
JPS6036674A JP14464083A JP14464083A JPS6036674A JP S6036674 A JPS6036674 A JP S6036674A JP 14464083 A JP14464083 A JP 14464083A JP 14464083 A JP14464083 A JP 14464083A JP S6036674 A JPS6036674 A JP S6036674A
Authority
JP
Japan
Prior art keywords
palladium
compound
article
electroless copper
copper plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14464083A
Other languages
Japanese (ja)
Inventor
Isao Matsuzaki
松崎 五三男
Haruki Yokono
春樹 横野
Takehiko Ishibashi
石橋 武彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP14464083A priority Critical patent/JPS6036674A/en
Publication of JPS6036674A publication Critical patent/JPS6036674A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • C23C18/40Coating with copper using reducing agents

Abstract

PURPOSE:To improve the characteristics of electroless copper plating by immersing an article to be plated in an aqueous soln. contg. a complex compound prepd. by reacting a bivalent Pd compound or a uni- or bivalent Cu compound with glucose, pulling up the article, and heating it to produce metallic Pd or Cu. CONSTITUTION:An article to be plated is immersed in an aqueous soln. of a complex compound prepd. by reacting a bivalent Pd compound or a uni- or bivalent Cu compound with glucose. The concn. of the complex compound in the aqueous soln. is <=1wt% when the compound is expressed in terms of Pd or Cu. The article is pulled up from the soln., and it is heated to 30-200 deg.C to form metallic Pd or Cu particles on the surface of the article. The article is then subjected to electroless copper plating by a conventional method.

Description

【発明の詳細な説明】 本発明(グ、無電解銅4)つきに附子め活性化法に関す
ゐ。
DETAILED DESCRIPTION OF THE INVENTION The present invention (G, Electroless Copper 4) relates to a method for activating screws.

無゛亀解鋼めっきは、印刷配紡板の分野で5積層板寺の
絶縁基板に回路葡形成丁々ために広く用いらn、ていΦ
0 この場合、絶縁基板の無電解銅めっきが施される而は粘
性化1丁lわち無電解銅めっきのための触媒核が形成δ
nる。この触媒核?中心にして、無’dLWf鋼めっき
液中の鋼イオンが析出し、成長して銅膜と7mり、■鮎
となる。
Non-glare steel plating is widely used in the field of printing and spinning boards to form circuit boards on insulating substrates of 5 laminated boards.
0 In this case, when electroless copper plating is applied to an insulating substrate, it becomes viscous, that is, catalyst nuclei for electroless copper plating are formed δ
nru. This catalytic nucleus? At the center, steel ions in the non-dLWf steel plating solution precipitate and grow to a distance of 7 m with the copper film, forming a sweetfish.

忙U基板ケ清性化テなために、無電解銅めっきのための
触媒と71:る金属パラジウムを絶縁基板表向に形成さ
せている。
In order to improve the cleanliness of a busy U-substrate, metal palladium, which acts as a catalyst for electroless copper plating, is formed on the surface of an insulating substrate.

従来、この金属パラジウムは CJ P d CTo +5nCJn−、−P d + 5n
Cd4の反工6でイqらnており、硅藻士などの担体V
c州付さ!11、触媒rμ用を来丁工うに」−夫さj、
ていな。
Conventionally, this metal palladium is CJ P d CTo +5nCJn-, -P d + 5n
It is equal to the anti-corrosion 6 of Cd4, and carrier V such as silica
C-state attached! 11. I'm going to work on the catalyst rμ.'' - Husband,
Tina.

そのためSn、C8などの不純物ケ多(′詮むうえに。Therefore, there are many impurities such as Sn and C8.

州俸r使用丁/l)ため、接盾斉11混入し、アディテ
ィブ印刷配腺板用の接涜沖](触媒入り)付禎看板?]
l−製盾丁ゐ場合、そり、ねじn、が発生し、絶縁性に
難点があり、又、絶縁電線の絶縁層中に混入丁ゐことげ
困難であった。
State salary r used / l), so 11 is mixed in, and the additive printing board is used for additive printing] (contains catalyst) with a sign board? ]
In the case of L-made shields, warping and screws occur, there are problems with insulation, and it is difficult to get the wires mixed into the insulation layer of the insulated wire.

応させた錯化合物ケ加熱し金属パラジウム?生成さ一1
!7ゐこと紮特徴と丁ゐ無電解銅めっきに附子ゐ活性化
法である。
Metallic palladium by heating the complex compound that corresponds to it? Generation 1
! 7. The special features and the activation method for electroless copper plating.

2倫のパラジウム化合物としては、塊化パラジウム(■
)、フッ化バ2ジウム(11)、 −)4化バラジウム
(II) * ヨウ化パラジウム(ロ)、硝酸パラジウ
ム(川、&tHパラジウム(111% 酸化パラジウム
(■)s 411i化バ2ジウム(H)&びこ71らの
混合物が1丈用さn心。
As a palladium compound of 2 Lun, agglomerated palladium (■
), baradium fluoride (11), -) palladium tetrachloride * palladium iodide (b), palladium nitrate (kawa, &tH palladium (111% palladium oxide (■) s 411i baradium (H) ) & Biko 71 etc. are used for 1 length.

ハロケン化物、特VC塩化バラジワム(11)が好まし
い。1画、21曲の銅化合物とし、ては、塊化銅(1)
、堪化銅(■)、饋欽鉛+ (+T)及びこ11.らの
混合物が使用さn、心。
A halokenide, especially VC baladium chloride (11), is preferred. 1 stroke, 21 pieces of copper compound, which is lumped copper (1)
, Tanhua copper (■), Feiqin lead + (+T) and this 11. A mixture of et al.

タルコースとしてirJ、D−グルコース、L−グルコ
ースか使用さnを。
irJ, D-glucose, L-glucose or n is used as talcose.

2 fjhのバラジクム化合物tグルコースと皮比、さ
せて錯化合物ケ侍ゐにンコ、?すえばl」−グルコース
i gに水2g才加λ−1こn−に塊化パラジウム0.
25g會加え20分向50℃に加熱振と9することによ
り#、らn、ゐ、この錯化合物は80℃以上の力[j熱
で金属パラジウムる生成−fる。
2 What is the relationship between fjh's Baladicum compound tglucose and the complex compound? Add 2 g of water to 1 g of glucose and add 0.0 g of agglomerated palladium to 1 g of glucose.
By adding 25 g and heating and shaking at 50° C. for 20 minutes, this complex compound was heated to a temperature of 80° C. or higher [j to form metal palladium with heat].

侍ら)1.た錯化合物では、塩化パラジウム(U)はグ
ルコースの水酸基に配位してお!l1%7Jli丁ゐと
水rg基の結合している炭素原子VC近接する戻累原子
に結合している水系VCより211111のパラジウム
は還元さn、て金塊パラジウム?生成丁ゐ。
Samurai etc.) 1. In the complex compound, palladium chloride (U) is coordinated to the hydroxyl group of glucose! The palladium of 211111 is reduced by the aqueous VC bonded to the carbon atom VC adjacent to the carbon atom to which the l1%7Jli Ding and the water rg group are bonded, and to the gold bullion palladium? Generate.

不発明の錯化合物の使用別ケrila明T心。使用(1
) み)化合物音ゴむ水済嵌中f級めっき物全浸偵し引
き上げ、加熱丁ゐことVCより被めっき物表面に金属パ
ラジウムケ生成させる。
Use of uninvented complex compounds by Kerila Ming Tshin. Use (1
) All the F-grade plated items in the wetted compound were collected and removed, and a metal palladium layer was formed on the surface of the plated items using VC, also known as heating.

(2)飴化合物ヶ、ゴム−フェノール系等の・扱堝削中
に分散し、この按盾削tガシス布にエポキシを含浸した
積層機等の表面に塗布し、加熱乾録する段階で金掬パラ
ジウムを生成させゐ0 (6) 特化合物ケ、エポキシ樹脂のアセトン浴液中に
分散場ゼたワニスデカラス布等の恭材に含浸さ一+!:
、通常の方法により積層機k・装造する。プリプレグの
乾燥時、槓鳩叡の加熱加圧時の熱により金属パラジウム
が生成1心〇(4)飴化合物會、ポリエステル側屈の有
機浴朔浴欣申に分散させ、vfL姓法で2イルム紮つく
る。有機酷刑の加熱除去中の加熱により金属パラジウム
か生成する〇 (5)錯化合物γ、ポリイミドのテトラビドロンラン浴
欣中VC分散させ、銅輸に被楕丁な。焼き付は時の熱v
c x g金属パラジウムが生成し触媒性紮M丁杷縁電
祢が侍らfLゐ。
(2) Candy compounds, rubber, phenolic, etc. are dispersed during drilling, applied to the surface of a laminating machine, etc., where the gasis cloth is impregnated with epoxy, and heated and dried. Create palladium (6) Special compound, varnish dispersed in an acetone bath solution of epoxy resin, impregnated into a material such as dekara cloth! :
, a laminating machine is assembled using a conventional method. When the prepreg is dried, metallic palladium is generated by the heat applied by heating and pressurizing the prepreg. Make a harp. 〇 (5) Complex compound γ, which produces metallic palladium by heating during heat removal of organic torture, is dispersed in VC in a tetrahydrone lanthane bath of polyimide, and is oxidized to copper. Burning is the heat of timev
c x g Metallic palladium is produced and the catalytic ligation is completed.

以」二MW、明したよりに、本発明の方法では次の利点
が途−釦らn、/)。
As stated above, the method of the present invention provides the following advantages.

(1)生成する曽椙パラジウムの粒子が細力・いため、
侍ら71.7(無電解めっきの特性が優nΦ、−1(2
)硅凍土寺の担俸葡使用しないで丁むので、浴欣申での
使用がi’lil]b″′r:あジ、均一混合が容易。
(1) Because the particles of Sosu palladium that are generated are thin and hard,
Samurai et al. 71.7 (The characteristics of electroless plating are excellent nΦ, -1 (2
) Because it is ground without using the grapes from Shihodoji Temple, it can be used in bathing ceremonies.

(3) Sn、C4寺の不純物ケ宮兼ないため、狗らn
た無電解めっきの特性が艮い。
(3) Because the impurity of Sn, C4 temple does not serve as a shrine, dog et al.
The characteristics of electroless plating are outstanding.

5− 丁 品売 ネル 往二二 店: 昭11158年 9JJ I G l−1″l!’+i
’l’J’i”k’1f’tlQ1、事1’lの、(、
小 11L相+5tu[肋請願第144640′、−J2、
発明の名称 無端11心うっきにりjずろ活性化法 3、補正をするU 事(!1との関1系 !IS許出願出 願人住所 東京JillJi宿区西新宿二、−口」1番
1号名称(、+45 )ロ立イPJ戊T業株式会?l−
代表昔横山亮次 4.1し臥 ■160 居所 東京都新宿区西新宿二丁目1番1ソノ−日立化成
工業株式会hi−rzi (’i−扇占 東京 346−3111 (大代表)6
、補正の内容 y5川用の通り。
5- Ding Merchant Nell O22 Store: Show 11158 9JJ I G l-1″l!'+i
'l'J'i'k'1f'tlQ1, thing 1'l, (,
Elementary school 11L phase +5 tu [Subpetition No. 144640', -J2,
Name of the invention: Mugen 11 Mind Ukki Niri J Zuro Activation Method 3, Amendment U Matters (! 1 Seki 1 System! IS Permit Application Applicant Address: Tokyo Jill Ji-ku, Nishi-Shinjuku 2, - No. 1) No. 1 name (, +45) Rotachi PJ Oriental Co., Ltd.?l-
Representative: Ryoji Yokoyama 4.1 Shiwa ■ 160 Address: 2-1-1 Nishi-Shinjuku, Shinjuku-ku, Tokyo Hitachi Chemical Co., Ltd. hi-rzi ('i-senshu Tokyo 346-3111 (main representative) 6
, The content of the correction is as per y5 river.

明 和1 着 1、発明の名相\ 無電hf鋼めっ@に対するj6住化法 2、知1a氷の朝t/1 1、 2 i+111 (/Jバフジウム化曾9勿又ハ
、11曲Th2111Dの鋼化付vJ足クルコースと反
応、させた鉛化合物ケ加熱し、金病バ2ジウム又vJ軍
檎端電生成a−trることr行個とする勲′市所給めっ
さに対重ゐl重性化法。
Meiwa 1 arrival 1, name of invention \ electric hf steel metal @ j6 Sumikaho 2, knowledge 1a ice morning t/1 1, 2 i + 111 (/J bafudiumification 9 course, 11 songs Th2111D When the lead compound is heated, it reacts with the steel-formed vJ foot curcose, and when heated, the metallurgical base is heated and the vJ gun end electricity is generated. Heavy weighting method.

6、発明のr第1“πulな眺1町 本発明に、勲1旺解納めつきに対する活性化法V(四す
るO 力1%41.jIl+#@川めつさrJl 印加り自[
−載板の号對−C,偵層&寺の絶に重板に回路忙形成丁
ゐ1こめVC広(用いらrている。
6. The invention's r 1st "πul view 1 town" In this invention, the activation method V (4 O force 1% 41.jIl + # @ Kawametsusa rJl application [
- Board number - C, the circuit board is extremely heavy in the detective layer and the temple, and VC Hiro (used).

この場合、絶縁2とへの無電′M銅りつきが釉さtl、
る而に活性化、丁7zvも無電、解胎めっさのための触
媒核が形成される。この触媒俵會中心にして、無電、解
銅めっき欣中の縮・リイオンか析出し。
In this case, the electroless copper adhesion to the insulation 2 is glazed,
When activated, the catalytic nucleus for disintegration is formed. Centering around this catalyst bale meeting, the ions and ions in the electroless copper electrolytic plating are deposited.

成長して銅膜となり5回路と7+:ゐ。It grows to become a copper film with 5 circuits and 7+:ゐ.

絶縁A〜板倉話性化するために、無篭解餉めっきのため
の触媒となる金員パラジウム又は金楓銅紫絶緘基板表面
に形成させている。
Insulation A - In order to make the insulation conductive, gold-plated palladium or gold maple, copper-purple, and gold-metal palladium, which serve as catalysts for the plating without a plating, are formed on the surface of the insulated substrate.

俊米、?すλはこの並用パラジウムは H(4 PdC1s +5n(4*−→Pd −+−5nC1t
の反応で侍らnており、硅凍土などの担体に担持され、
触媒f¥用τ果米子うr1c工夫さ扛ている。
Shunmai? λ is this ordinary palladium H(4 PdC1s +5n(4*-→Pd −+-5nC1t
It is supported on a carrier such as silica frozen soil, and
τKayonoko Ur1c for catalyst f¥ has been devised.

−1のためSn、C17i:との小糾物ン多(宮む9χ
K。
-1 for Sn, C17i:
K.

担14イ藺用するため%接眉卸Jに混入し、アティティ
ブ印刷配稼板用の候盾烟(触媒入り)何種庵)l、シ?
製輩丁ゐJん介、−tハ ねし扛が発生し、動稼件f(
離点かあり、又、絶縁1載の絶縁層中に混入することσ
はI難でめった。
In order to use it for 14 days, it is mixed in with the wholesaler J, and is used as a substitute for the active printing board (contains catalyst).
Manufacturer D.J., -t has occurred and operation problem f(
There is separation point, and there is no possibility of mixing into the insulation layer of insulation 1.
I had a hard time.

木晃明はcL、l)ような点に島みてなされたもので、
21曲りパラジウム化8’4’a又は11曲、2イ11
↑1の網化1す躾lヶグリコースと反応さセーに晶化合
物を力l]熱(,2金偶パラジウム又は−捩g4鋼電生
成させること乞イ1叡と′jめ抱ξ山、相絢司めっさに
対するr占性化江でめ々0 2仙1のパラジウム化合物としては、塊化パラジウム(
1υ、フッ化パラジウム(11) 、臭化パラジウム(
II) s ヨウ化パラジウム(■)、硝酸パラジウム
(川。
Ki Akiaki was created with an island view of points like cL and l).
21 bends palladized 8'4'a or 11 bends, 2i 11
↑The formation of a crystalline compound by reacting with glycose using heat Agglomerated palladium (
1υ, palladium fluoride (11), palladium bromide (
II) s Palladium iodide (■), palladium nitrate (River.

硫酸パラジウム(II)、 酸化パラジウム(1)、線
化パラジウム(II)及びこ扛らり混合′@が使用され
る○ハロゲン化物、特に塩化パラジウム(川か好筐しい
011曲、21曲の飼り化&1勿としては、塩化銅+1
j(1)。
Palladium(II) sulfate, palladium(1) oxide, linearized palladium(II) and a mixture of Copper chloride +1
j(1).

塩化銅(II)、*酸餉(1)及びこれらの混合物ρ)
使用される。
Copper(II) chloride, *acid chloride (1) and mixtures thereof ρ)
used.

り/l/ ) −、X トしてV、Xs D−グルコー
ス、 L −グルコースが1丈用ざn/8゜ 2価のパラジウム化合物τダルコー、<とh↓「プさせ
て錯化曾物r伶るにに1例えばD−グルコース1gVC
水2gk加え、こ扛に塩化パラジウムa25gケ〃]]
え20分間50℃に加熱損と9することVCより狗られ
る、この錯化付物は80℃以上の加pRSt雀槁パラジ
ウム忙生敗丁心。
/l/ ) -, For example, D-glucose 1g VC
Add 2gk of water and add 25g of palladium chloride A]]
The complexing compound is heated to 50°C for 20 minutes and heated to 9°C, and this complexing compound is added to the pRSt at 80°C or higher.

侍らnた錯化合物でに、塩化バッジ9ム(111げクル
コースの水酸基に配位しており1加熱すると水淑鯖の結
付している炭素原子に近接する炭素原子に結付している
水素rCより2価υバラジ6− ウムt11還元さイ1て金塊パラジウムr生カ又する0
本弁明り銘化8物の使用ヤリを欣明する。秋用曹はPd
、Cuの石でhiI%以下が好ましい。
In the Samurai complex compound, the chloride badge (111) is coordinated to the hydroxyl group of curcose, and when heated, the hydrogen bonded to the carbon atom adjacent to the carbon atom bonded to Mizushusaba. From rC, divalent υ 6-um t11 is reduced.
I would like to express my gratitude for the use of the 8 items in this book. Autumn soda is Pd
, Cu stones preferably have a content of hiI% or less.

(1) 讐Hヒ台9勿を宮む刀(浴欣甲に法のっさ吻r
反τ貢し引さ土け、 71[]熱丁ゐことにょ9扱めっ
さW表向に金員パラジウム又に金桐銅を生成させる。
(1) The sword that enshrines the enemy Hhidai 9 (the proboscis of law on the bathing armor)
When the anti-tau tribute is removed, 71 [] heat treatment is treated as 9, and on the surface it generates metal palladium and metal paulownia copper.

(2) 錯化8mτ、コムーノエノール禾咎りM yM
痢中に分散し、この後瘤刑電カラス布にエポキシ會宮反
した積層板前の次間に塗布し、カ0蘭乾燥する段Vkで
金橋パラジウム又は金橋鋼t#E成させる。
(2) Complexation 8mτ, Comunoenol Hetari M yM
After dispersing in the water, it is applied to the surface of the laminate plate which is coated with epoxy on a glass cloth, and then dried in a step Vk to form Kanahashi Palladium or Kanahashi Steel T#E.

(5)錯化合物τ、エボキシイtl lぽのアセトン浴
漱甲に分散させたワニスイカラス布等の摸材に含浸さぜ
、通電のカ法VCjり槓層恨を製造する。ブリグレグυ
乾燥時、積層板の加熱加圧時の熱により金員パラジウム
又は金掬鋼が生成する。
(5) The complex compound τ is dispersed in an acetone bath containing epoxy resin and impregnated into a material such as varnished watercolor cloth, and a VCj layer is produced by applying an electric current. Brigreg υ
During drying, metal palladium or gold metal is generated by the heat generated when the laminate is heated and pressed.

(4)錯化付吻t、ポリエステル剥脂(/J有機浴酌浴
液申に分散させ、匝IA法でフィルムtつぐ4− る。有イ浅俗炸jの加熱除去中の加熱により金縞パラジ
ウム又げ金PA矩が生成する。
(4) The complexing agent is dispersed in a polyester resin (/J organic bath solution) and then wrapped in a film using the IA method. A striped palladium overlay gold PA rectangle is produced.

(5)錯化合物t1ポリイミドのテトラビドロンラン偵
赦中に分V¥y、させ、鋼線に扱(Mする。説き付は時
の熱により金員パラジウム父は金桐@Aが生成し触媒性
を廟丁絶縁由1線が侍ら扛る。
(5) During the reconnaissance of tetravidron run on the complex compound t1 polyimide, it is heated for a minute V\y and treated with a steel wire (M). It is persuaded that due to the heat of time, Kinmen palladium father is generated by Kanatou@A. The catalytic properties of one line from the temple insulation are exposed by the samurai.

Jヅ土ah、 ’9J L 7Cよりvc、$、発1.
J (ZJ方ari次の4u点か達−1!−らγLる。
Jzutoah, '9J L 7C from vc, $, 1.
J (ZJ way ari next 4u point reach -1!-ra γL.

(1)生成する金桶パラジウム又は金搗矩の枚子が頗j
かいため、得られたバ区Sめっさの軸性が1や′rLる
(1) The produced gold pail palladium or gold square sheet is the key.
Because of the sharpness, the axiality of the obtained B-section S-metal is 1 or 'rL.

(214rJ腺土等の州体忙1史用しないですむので5
浴赦申での1史用か可能であり、均−混酋が容易0 (3) Sn、CJ跨の不純物を宮−」ないため、侍ら
れた無電解めっきの狩1住が良い。
(Since there is no need to use 214rJ gland soil etc. for the state body 1 history,
It is possible to use it for one time in a bath, and it is easy to mix evenly. (3) It is better to use electroless plating as it does not contain impurities across Sn and CJ.

5− AAI’5- AAI'

Claims (1)

【特許請求の範囲】[Claims] 1、 21!uのパラジウム化合物又は、1価% 2価
の銅化合物rグルコースと反応させた錯化合物ケノノ1
1熱し、金属パラジウムT生成させゐこと?特徴とする
無電解銅めっきに附子ゐ活性化ti:。
1, 21! Complex compound Kenono 1 reacted with u palladium compound or monovalent % divalent copper compound r glucose
1 heat to generate metallic palladium T? Features: Electroless copper plating with activated Ti:.
JP14464083A 1983-08-08 1983-08-08 Activating method for electroless copper plating Pending JPS6036674A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14464083A JPS6036674A (en) 1983-08-08 1983-08-08 Activating method for electroless copper plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14464083A JPS6036674A (en) 1983-08-08 1983-08-08 Activating method for electroless copper plating

Publications (1)

Publication Number Publication Date
JPS6036674A true JPS6036674A (en) 1985-02-25

Family

ID=15366759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14464083A Pending JPS6036674A (en) 1983-08-08 1983-08-08 Activating method for electroless copper plating

Country Status (1)

Country Link
JP (1) JPS6036674A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2646583A1 (en) * 1989-05-01 1990-11-02 Enthone Corp METHOD FOR MANUFACTURING PRINTED CIRCUIT BOARDS

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2646583A1 (en) * 1989-05-01 1990-11-02 Enthone Corp METHOD FOR MANUFACTURING PRINTED CIRCUIT BOARDS

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