JPS60263481A - Manufacture of photovoltaic device - Google Patents

Abstract

PURPOSE:To enable to perform the desired processing on a film adhered on the nonplanar main surface of the substrate according to irradiation of an energy beam by a method wherein the opposed distance of the convergent means of the energybeam and the surface to be processed is detected and the relative distance of the holding surface of the substrate and the convergent means is modified so that the diameter of the energy beam to reach the surface to be processed is almost constantly held. CONSTITUTION:When contactor is used one piece in number, the point of the contactor 9 is made to come into contact slidingly to a substrate 1 being formed the surface thereof into a carved surface in the vicinity of the irradiation point of a laser beam 6 and the contactor 9 detects it for the surface of the substrate 1 to vertically move by the movement of the substrate 1 to the X axis direction and sends the displacement signal to an amplifier 10. The signal, amplified in the amplifier 10, is inputted in a Z axis driving circuit 11 and the substrate 1, displaced in the upper and lower directions by making a Z axis table 13 drive, is made to immediately shift for making roughly constant the relative distance of the surface to be processed and an objective lens 7. For more precisely holding constantly the distance between the objective lens 7 and the substrate 1 are used plural pieces of contactors. By this way, the processing width and the beam intensity become constant, thereby enabling to perform a uniform processing.

Description

Detailed Description of the Invention (a) The present invention is a photovoltaic method in which a film-like photoelectric conversion region adhered to a non-planar main surface that is a combination of curved surfaces or flat surfaces is patterned by irradiation with an energy beam such as a laser beam. The present invention relates to a method of manufacturing a power device.

(b) Conventional technology Photovoltaic devices, so-called solar cells, and photoreceptors of electrophotographic copying machines, in which non-quality silicon-based semiconductor films obtained by plasma decomposition of reactive gases directly convert light energy into 4-dimensional energy. It is being used for drums, etc. In particular, photovoltaic devices have been in the spotlight as the depletion of energy resources has become a problem because they use sunlight, which is depleted in S, as their main energy source.

The sun gives about IKW/G of energy to the earth's surface when the weather is clear, and if a photovoltaic device that converts this energy into magnetic energy is used as a power source at home, it should be installed on the roof of the house or on the roof. The most common method is to

Japanese Unexamined Patent Publication No. 57-68454 or Utility Model Application No. 58-1
A roof tile equipped with a solar cell disclosed in Publication No. 1261,
That is, the shingled photovoltaic device is suitable as such a household power source.

On the other hand, in a photovoltaic device, one factor that influences the light utilization efficiency is the ratio of the photoelectric conversion area that actually contributes to power generation to the light-receiving area of the entire device (i.e., substrate area). . However, since the voltage generated by one photoelectric conversion region is generally less than rIV at no-load open-circuit voltage, in a normal photovoltaic device, multiple photoelectric conversion regions are arranged on a common substrate. are electrically connected in series and therefore necessarily have an exhaustion at adjacent intervals of each photovoltaic conversion region.
``A region where no photoelectric conversion region exists reduces the above area ratio.

Therefore, photolithography technology and laser patterning technology have traditionally been used for patterning film-like photoelectric conversion regions with the aim of increasing light utilization efficiency. The most suitable laser patterning technology is also seen as promising.

However, in the tile-shaped photovoltaic device as described above, the adhesion surface of the tile body on which the film-like photoelectric conversion region is formed has a wavy curved surface, so laser patterning technology is difficult to apply. When attempting to apply this, the distance between the objective lens that converges the laser beam and the surface to be processed inevitably fluctuates, making it impossible to perform the desired processing (pattern formation).

Purpose of the Invention The present invention has been made in view of the above, and its purpose is to irradiate a desired surface with an energy beam to a film deposited on a non-planar main surface that is a combination of curved surfaces or flat surfaces. The purpose is to perform processing.

B) Structure of the Invention The manufacturing method of the present invention involves forming a constituent film of a photoelectric conversion region on a non-planar insulating surface of a substrate, and patterning the constituent film by irradiation with an energy beam. The device is configured to detect the facing distance to the processing surface and change the relative distance between the holding surface of the substrate and the converging means based on the detection output in order to keep the beam diameter of the energy beam reaching the processing surface almost constant. .

(e) Examples direction The manufacturing method of the present invention will be described below for a Japanese tile-shaped photovoltaic device. An example applied to the manufacturing method will be described.

1 and 2 show a photovoltaic device manufactured by the manufacturing method of the present invention, FIG. 1 is a perspective view, and FIG. 2 is a sectional view taken along line A-A1 in FIG. (1) is a substrate made of a translucent and insulating material such as tempered glass or transparent ceramics molded into a Japanese tile shape and provided with a wavy insulating surface; (211)
21... are a plurality of photoelectric conversion regions arranged at regular intervals on the insulating surface of the substrate (1). The photoelectric conversion regions (2) + 21... are formed of a transparent conductive film (for example, from the substrate (1) side) such as tin oxide, indium tin oxide, etc.
3) (31..., an amorphous silicon-based amorphous semiconductor film (4) (4)... with a semiconductor junction therein, and the semiconductor film f4) (4)... A back electrode film f5) (51...) made of aluminum or the like which is in ohmic contact with the back electrode film f5) (51...) is sequentially laminated to form a film on the order of microns.

Each amorphous semiconductor film +41 (41... is a P-type layer with a thickness of about 50 to 250 A from the light-receiving surface side, for example, to form a PIN junction parallel to the film surface, 4000 to 7000
Summer type (intrinsic) layer of about A and N of about 300 to 600 A
When the mold layers are sequentially deposited and light is incident through the substrate (1) and the transparent conductive film (31 (3)...), free-state electrons and positive electrons are generated mainly in the summer mold layer. Holes are generated, and these electrons and holes are attracted by the PIN junction electric field formed by each of the above layers and are collected by each transparent conductive film (3) (3)... and back electrode film (51451...). , adjacent charge conversion region f21 (transparent conductive film f31 +31.
... and the back electrode film (51 (adjacent space part with 51...)
The electric power electrically added by the superposition in 6H61... is taken out.

3 to 5 show a film-like photoelectric conversion region f21 F21
The transparent conductive film (3), the amorphous semiconductor film (4), and the back electrode film (5) constituting... are exposed to a laser beam (6).
The process of individually dividing each photoelectric conversion region (21 (21...) by irradiation with each film f31. T4) is shown.
, (51 individual laser patterning methods are described in, for example, Japanese Patent Application Laid-open No. 5
As disclosed in Publication No. 7-12568, each film (3)
, +41. It is applied after each +51 deposition step.

What must be kept in mind in such laser patterning is that the insulating surface of the substrate (1) on which the films (3), (4), and (5) are deposited is non-planar; In order to obtain a curved surface, if the laser beam (6) is simply scanned in one direction or the table is moved in one direction, the laser convergence means will cause the objective lens to face the surface to be processed. This is because the distance varies. If the facing distance between the objective lens and the workpiece surface changes, the spot diameter of the beam irradiated onto the workpiece surface will naturally change, and since the beam intensity changes during processing, it is difficult to perform uniform processing. That is difficult.

For example, if the scanning direction of the laser beam (6) is the X-axis and the optical axis of the objective lens (7) is two axes as shown in Figure 3, then only the X-axis /, C(, It becomes necessary to drive two axes simultaneously.

One possible method is to use a program to control the two axes of the processing table (8), the X-axis and the Y-axis, so that they are driven simultaneously. However, the variation in the distance between the objective lens (7) and the surface to be processed during processing is usually 0.
Considering that the variation in the shape of the non-planar insulating surface of the substrate (1) generally exceeds this value, there is a limit to the control using the above program. be.

Therefore, in the present invention, as a detection means for detecting the facing distance between the surface to be processed and the objective lens (91),
By providing a contact that slides on the surface to be machined and using the signal from the contact to drive the workpiece in the Z-axis direction, the distance between the objective lens (g) and the surface to be machined can be kept almost constant and good machining can be achieved. This makes it possible to

@Figure 4 is a principle diagram when one contact is used. The tip of the contactor (9) is in sliding contact with the curved substrate (1) near the irradiation point of the laser beam (6), and
The vertical movement of the substrate surface due to the movement of the substrate in the X-axis direction is detected, and the displacement (detection) signal is sent to the amplifier 1ll). The signal amplified by the amplifier +II is input to the Z-axis drive circuit 0υ, and by driving the two-axis table (13), the vertically displaced substrate (1) is immediately brought into contact with the workpiece surface and the objective lens (7). It is moved to keep the relative distance constant.

Next, how laser patterning is performed according to the present invention will be explained. As shown in FIGS. 1 to 3, each photoelectric conversion region f21 F21... is connected to a laser beam (6
), how to scan the laser beam (6) on the substrate (1) in advance in X and Y directions.
As for the movement of the table (141 (151), after setting the distance between the XY-axis drive device (stored inside the board 12) and the objective lens (7) appropriately, start the XY-axis drive device 0z. As the contactor (1) moves back and forth and left and right, the contactor (9) moves up and down, but the signal from the contactor is immediately input to the Z-axis drive unit (111) via the amplifier OrJ.

Since the two-axis table is moved upward, the distance between the substrate (1) and the objective lens, etc. is always maintained at the initially set value.

In this case, problems such as the responsiveness of the contactor (9), the circuit responsiveness of the amplifier OG and the Z-axis drive circuit OD, and the responsiveness of the Z-axis table q3 occur, resulting in a slight delay in following the curved surface. However, by increasing the gain of the amplifier (1) or increasing the torque of the motor of the two-axis table αJ, the delay can be suppressed to about 0.1 to 1 ml. It is possible, and if the distance is varied to this extent, the change in the machining φ beam intensity will not be so large, and sufficiently good patterning will be possible.

In order to keep the distance between the objective lens and the substrate (1) more precise and constant, it is preferable to use a plurality of contacts. An example of this is shown in figure glf15. In this case, the contact (16R
) (16L) are installed to sandwich the laser beam (6), and each is in sliding contact with the substrate (1). Contact (
16R) (16L) are all sent to the signal switching section (1η
One of the signals is output to the amplifier (10). (16R) (16L)
The signal that determines whether to output to
3 are output.

Next, the operation will be explained using FIG.

The XY-axis drive unit t12) moves the
When driving the Y table, but when driving the substrate (1) in the R direction, select one contact (161+) and move the substrate (1).
) in the L direction, sends a signal that selects the other contact (16L) to the signal switching unit (1η. In this case, the irradiation position 08 of the laser beam (6)) and the position of the contact If the interval g is set appropriately, the contact f161 will always detect the position of the substrate (1) at a position ahead of the processing position, so
The response of the contactor 00 is delayed, and the response of the X-axis table (131) is 1 <, □. □, 4.
7) The distance between the machined surface and the surface to be processed is more accurately kept at a constant value.

A laser suitable for such laser processing has a wavelength of 1°06, for example.
μm (D Nd I YAG L/-the, and the Y
The processing threshold power density of each film (31, +41, (5)) by the AGL/- laser is large hole 2X in the above example.
It is also possible to configure it to move up and down by 10'W/, J~8. Furthermore, the measurement of the displacement of the substrate is not limited to the above-mentioned contact method, but a method of detecting it as a change in optically reflected light or a change in capacitance may also be adopted, in which case the detection means is non-contact. becomes.

(f) Effects of the Invention As is clear from the above description, when processing a film deposited on a non-planar insulating surface using an energy beam, the present invention always uses a converging means such as an objective lens and a surface to be processed. By keeping the distance constant and irradiating the workpiece with an energy beam of a predetermined intensity and convergence diameter, desired patterning can be performed.

Fig. 1 is a perspective view of a shingled photovoltaic device, Fig. 2 is an enlarged sectional view taken along line A-1 in Fig. gJ1, and Fig. 3 shows the laser beam irradiation state. FIG. 4 is a schematic perspective view for explanation, FIG. 4 is a diagram showing the principle of the present invention, and FIG. 5 is a diagram showing the principle of another embodiment.

(1)...Substrate, (2)...Photoelectric conversion region, (6)
... Laser beam, (7) ... Objective lens, (9)
...Contactor, (lω...Amplifier, (1υ...2-axis drive circuit, +121...xy-axis drive circuit, (1m +
141 +15)...zxy axis table, 0ω...
Contact, (1η...signal switching circuit.

Applicant: Sanyo Electric Co., Ltd. Agent: Patent attorney Shizuo Sano

Claims (3)

[Claims] (1) A method for manufacturing a photovoltaic device, in which a constituent film of a film-like photoelectric conversion region formed on a non-planar insulating surface of a substrate is patterned by irradiation with an energy beam, the patterning process performing the patterning process. The apparatus includes a detection means for detecting a facing distance between the energy beam convergence means and the surface to be processed, a holding means for holding the substrate, and a relative distance between the holding surface of the holding means and the convergence means. a changing means, and a scanning means for scanning the energy beam, based on the detection output of the detection means, in order to keep the beam diameter of the energy beam scanned by the scanning means and reaching the workpiece surface substantially constant. A method for manufacturing a photovoltaic device, comprising changing a relative distance between a holding surface of the holding means and the converging means. (2) The holding means is a processing table, and the processing table is moved in the X-axis direction to scan the energy beam, and the processing table is moved in the beam axis direction of the energy beam to perform the processing. A light amount (a method for manufacturing a blade device) according to claim 1, characterized in that the relative distance between the table surface and the convergence means is changed. (3) The holding means is a processing table, and by moving the processing table in the X-axis direction, the energy beam is scanned, and by moving the focusing means in the beam axis direction of the energy beam, the processing is performed. The method of manufacturing a photovoltaic device according to claim 1, characterized in that the relative distance between the table surface and the converging means is changed.