JPS60262338A - X-ray exposure method - Google Patents
X-ray exposure methodInfo
- Publication number
- JPS60262338A JPS60262338A JP59117124A JP11712484A JPS60262338A JP S60262338 A JPS60262338 A JP S60262338A JP 59117124 A JP59117124 A JP 59117124A JP 11712484 A JP11712484 A JP 11712484A JP S60262338 A JPS60262338 A JP S60262338A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- target
- rotating shaft
- air
- seal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/10—Rotary anodes; Arrangements for rotating anodes; Cooling rotary anodes
- H01J35/101—Arrangements for rotating anodes, e.g. supporting means, means for greasing, means for sealing the axle or means for shielding or protecting the driving
- H01J35/1017—Bearings for rotating anodes
- H01J35/104—Fluid bearings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2235/00—X-ray tubes
- H01J2235/10—Drive means for anode (target) substrate
- H01J2235/1093—Measures for preventing vibration
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Radiography Using Non-Light Waves (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
Abstract
Description
【発明の詳細な説明】
（１，１発明の技術分野
本発明はＸ線露光方法、詳しくは電子衝撃型回転ターゲ
ラ）Ｘ線源にエアベアリング軸受けおよびクリアランス
真空シールを用いてなすＸ線露光方法に関する。DETAILED DESCRIPTION OF THE INVENTION (1.1 Technical Field of the Invention The present invention relates to an X-ray exposure method, specifically, an electron impact rotating target camera) An X-ray exposure method using an air bearing and a clearance vacuum seal as an X-ray source. Regarding.
（２）技術の背景
試料例えばウェハ上にマスクを通してＸ線を照射して露
光する方法が開発されている。それに用いる装置を第２
図の部分的正面図を参照して説明すると、１は真空チャ
ンバ、２ばターゲット、３は電子銃を示す。クーゲット
はアルミニウム（へｌ、波長７人）、パラジウム（Ｉ’
ｄ、波長４．４人）、銅（Ｃｕ、波長１４人）などで作
られ、１０．００Ｏｒｐｍ程度の高速回転をなす。この
クーゲット２に電子銃３からの電子ビーム（ＥＢ） ４
が衝撃し、ターゲットをイオン化してＸ線５を出し、Ｘ
線５はへリリウム（Ｂｅ）窓６を通ってａ式料（図示せ
ず〉に到達する。(2) Background of the technology A method has been developed in which a sample, for example, a wafer, is exposed by irradiating X-rays through a mask. The equipment used for this
Referring to a partial front view of the figure, reference numeral 1 indicates a vacuum chamber, 2 indicates a target, and 3 indicates an electron gun. Couget is aluminum (Hel, wavelength 7 people), palladium (I'
It rotates at a high speed of about 10.00 rpm. An electron beam (EB) from the electron gun 3 is applied to this Kuget 2.
impacts, ionizes the target and emits X-rays 5,
The line 5 passes through a helium (Be) window 6 and reaches a type A charge (not shown).
ＨＤのパワーは１０〜２０に−と大なるものであるが、
そのほとんど（９９，８％）は熱となり、残りの０．２
％程度のみがＸ線に変換される。その結果クーゲットは
高温に加熱されるので、高速回転しつつ水冷される構造
となっている。The power of HD is as high as 10-20, but
Most of it (99.8%) becomes heat, and the remaining 0.2
Only about % is converted into X-rays. As a result, the cougette is heated to a high temperature, so it is designed to be water-cooled while rotating at high speed.
クーデ・２トの高速回転を支え、一方゛チャンバ１内を
真空に保つために、第２図に示される如くオイルシール
７とベアリング軸受８とが用いられる。In order to support the high-speed rotation of the coupe 2 and maintain a vacuum inside the chamber 1, an oil seal 7 and a bearing 8 are used as shown in FIG.
オイルシール７はゴムのＯリングに油を充填した構造で
、オイルのシールによって真空を保ち、他方硬球で作ら
れたヘアリング軸受８はクーゲソトのための機械的支持
を与える。なお、オイルシール７、ヘアリング軸受８は
通常の技術で作成された公知のものである。The oil seal 7 is a rubber O-ring filled with oil, and the oil seal maintains a vacuum, while the hair ring bearing 8 made of hard balls provides mechanical support for the Kugesoto. Note that the oil seal 7 and the hair ring bearing 8 are well-known products made using ordinary techniques.
（３）従来技術と問題点
上記の装置においてはオイルシールを用いるために、霧
（ミスト）状の油が真空チャンバ内に入り、このオイル
ミストがＦＢのエネルギーを受けて重合しターケラト上
に堆積（ｄｅｓｐｏｓ ｉ ｔ）する。ところで、ＥＢ
の照射によるターゲットからのＸ線の放射において、Ｘ
線はターゲットの表面のきわめて近くで発生ずるので、
ターゲットにオイルミストの重合したものが堆積してい
ると、Ｘ線の発生量が著しく低下する。そこで、例えば
１００時間毎に真空チャンバの真空を破り、ターゲット
の表面を研摩しなければならない。また重合したオイル
ミストはベリリウム窓の上にも堆積し、この窓を通過し
て試料に到達するＸ線量を低下させる。(3) Prior art and problems Since the above-mentioned device uses an oil seal, mist-like oil enters the vacuum chamber, and this oil mist receives energy from the FB and polymerizes, depositing it on the tarkerat. (despos it). By the way, E.B.
In the emission of X-rays from the target by irradiation of
Since the line occurs very close to the surface of the target,
When polymerized oil mist is deposited on the target, the amount of X-rays generated is significantly reduced. Therefore, the vacuum in the vacuum chamber must be broken every 100 hours, for example, and the surface of the target must be polished. The polymerized oil mist also accumulates on the beryllium window, reducing the amount of X-rays that pass through this window and reach the sample.
オイルシールのゴムＯリングも適当な時間間隔をおいて
交換しないと真空チャンバの真空度を維、、・、・ 持
することができない・
硬球を用いるヘアーリング軸受はターゲットの回転軸と
ｔａ械的接触をしているので摩耗し、それも適宜時間間
隔をおいて交換しなければならない。The vacuum level of the vacuum chamber cannot be maintained unless the rubber O-ring of the oil seal is replaced at appropriate time intervals.Hair ring bearings using hard balls are mechanically connected to the target rotation axis. Since they are in contact, they wear out and must be replaced at appropriate intervals.
また、回転軸の機械的振動がヘアリング軸受を介して真
空チャンバの図に見て下方に配置される試料処理室内の
被照射試料に伝えられ、試料の露光において露光精度に
悪影響を与える問題があり、この影響は微細パターンの
露光において特に顕著に現れる。In addition, the mechanical vibration of the rotating shaft is transmitted via the hair ring bearing to the sample to be irradiated in the sample processing chamber located below the vacuum chamber, causing a problem that adversely affects exposure accuracy when exposing the sample. This effect is particularly noticeable when exposing fine patterns.
（４）発明の目的
本発明は上記従来の問題に鑑み、電子衝撃型回転ターゲ
ットＸ線源を用いる露光において、ターゲットの汚染、
シール部材の摩耗による真空度の低下、ターゲット回転
軸の回転による同軸支持部材の摩耗、ターゲットの回転
による振動の被照射試料への伝達、ベリリウム窓の汚染
などの諸問題を解決するＸ線露光方法を提供することを
目的とする。(4) Purpose of the Invention In view of the above-mentioned conventional problems, the present invention provides a method for preventing contamination of the target in exposure using an electron impact type rotating target X-ray source.
An X-ray exposure method that solves various problems such as a decrease in the degree of vacuum due to wear of the sealing member, wear of the coaxial support member due to rotation of the target rotation axis, transmission of vibrations to the irradiated sample due to rotation of the target, and contamination of the beryllium window. The purpose is to provide
（５）発明の構成
そしてこの目的は本発明によれば、回転クーゲットに電
子線を放射し、該クーゲットから発生ずるＸ線によっ゛
Ｃ試料の露光を行う方法において、前記クーゲットの回
転軸をエアヘアリング軸受けによって無接触に支持し、
クリアランス真空シールによりクーゲットの配置された
室の真空を保持することを特徴とするＸ線露光方法を提
供することによって達成される。(5) Structure and object of the invention According to the present invention, in a method for emitting an electron beam to a rotating cugetto and exposing a C sample to X-rays generated from the cugetto, the rotation axis of the cugetto is Supported without contact by air hair ring bearings,
This is achieved by providing an X-ray exposure method characterized in that the vacuum in the chamber in which the cuget is placed is maintained by a clearance vacuum seal.
（６）発明の実施例 以下本発明の実施例を図面によって詳述する。(6) Examples of the invention Embodiments of the present invention will be described in detail below with reference to the drawings.
第１図に本発明実施例が正面図で示され、図に１？いて
、１１はＸ線発生が行われる真空チャンバ、１２はター
ゲット、１３ば電子銃、１４はＥＢ、１５はＸ線、１６
はＸ線が透過するベリリウム窓、１７は試料処理室、１
８は試料例えばウェハ、１９はマスクを示し、Ｘ線５の
照射によってマスクのパターンを例えばウェハ上に形成
されたレジスト膜に転写する。Ｘ線露光は、微細パター
ン（例えばサブミクロンのオーダーのもの）の露光に不
可欠の方法として開発すした技術である。試料処理室は
例えば１トンの重量の定盤（防振台＞ ２０の上に配置
され、他方定盤は緩衝部１ｆＡ’２１を介して脚２２に
よって支持される。脚２２は床の上に固定された台２３
の上にのっている。上記の構成はすべて従来例と異なら
ない。An embodiment of the present invention is shown in a front view in FIG. 11 is a vacuum chamber in which X-rays are generated, 12 is a target, 13 is an electron gun, 14 is an EB, 15 is an X-ray, 16
is a beryllium window through which X-rays pass, 17 is a sample processing chamber, 1
Reference numeral 8 indicates a sample such as a wafer, and 19 indicates a mask, and the pattern of the mask is transferred to, for example, a resist film formed on the wafer by irradiation with X-rays 5. X-ray exposure is a technology developed as an essential method for exposing fine patterns (for example, those on the order of submicrons). The sample processing chamber is arranged on a surface plate (vibration isolation table>20) weighing, for example, 1 ton, and the surface plate is supported by legs 22 via a buffer part 1fA'21.The legs 22 are placed on the floor. Fixed stand 23
It's on top of the. All of the above configurations are the same as the conventional example.
本発明においては、真空シールにクリアランスシールを
またターゲットの回転ｉｌ！［ｌ］１２ａの支持にエア
ヘアリング軸受を用いるものである。In the present invention, a clearance seal is added to the vacuum seal and the rotation of the target il! [l] An air hair ring bearing is used to support 12a.
エアヘアリング軸受２４は回転軸１２ａに対し空気を吹
き付ける構成のオリフィスから成り、回転軸２ａと接触
することなく空気圧で回転軸を支持する。The air hair ring bearing 24 consists of an orifice configured to blow air against the rotating shaft 12a, and supports the rotating shaft with air pressure without coming into contact with the rotating shaft 2a.
クリアランスシール２５は図示の如く断面り字型構造の
もので、Ｌ字の上側２５ａの端面と回転軸］２ａの表面
との間の間隔は１５〜２０．ｃａｍ程度に設定される。As shown in the figure, the clearance seal 25 has an L-shaped cross section, and the distance between the end face of the upper side 25a of the L-shape and the surface of the rotating shaft 2a is 15 to 20 mm. It is set to about cam.
この程度のクリアランスでは、外気が室２５ｂに入り難
くなるので、室２５ｂを排気管２５ｃを通し例えばロー
タリポンプで第１段の排気をすると、空気が真空チャン
バ１１にもれることが防止され、他方真空チャンバ１１
は排気管２６を通しターボモレキュラーポンプで第２段
の排気をすることによって高真空に保たれ、それによっ
てＥＢのクーゲットへの照射が良好に行われる。With this level of clearance, it becomes difficult for outside air to enter the chamber 25b, so if the chamber 25b is passed through the exhaust pipe 25c and the first stage of exhaust is performed using, for example, a rotary pump, air is prevented from leaking into the vacuum chamber 11, and the other side Vacuum chamber 11
is maintained at a high vacuum by performing second-stage evacuation with a turbo molecular pump through the exhaust pipe 26, thereby ensuring good irradiation of the EB onto the Couget.
上記の如く、シールは油を用いないので、従来例に比べ
てＸ線源のメンテナンスが容易に行われる。そして、回
転軸１２ａの支持はそれと非接触のエアベアリングによ
るものであるので回転軸の振動の試料への伝達が防止さ
れ、またエアベアリングの振れは０，１μｍ程度に制御
可能であることが確認さ詣、た。As mentioned above, since the seal does not use oil, maintenance of the X-ray source is easier than in the prior art. Since the rotating shaft 12a is supported by an air bearing that does not make contact with it, transmission of the vibration of the rotating shaft to the sample is prevented, and it has been confirmed that the air bearing runout can be controlled to about 0.1 μm. Pilgrimage, ta.
（７）発明の効果
以」二詳細に説明した如く本発明によれば、従来約３０
０時間の寿命であったＸ線源が３０００時間を超える寿
命に延ばされ、振動もきわめて小さく、防振台へ直接結
合することができるようになった。(7) Effects of the Invention As explained in detail in 2, according to the present invention, approximately 300
The lifespan of the X-ray source, which had a lifespan of 0 hours, has been extended to over 3000 hours, and the vibration is extremely low, making it possible to connect directly to a vibration isolation table.
なお、上記の例は試料がウェハであったが、本発明の適
用範囲はその場合に限定されるものでない。Note that although the sample in the above example was a wafer, the scope of application of the present invention is not limited to that case.
第１図は本発明実施例の正面断面図、第２図は従来のＸ
線露光装置の一部の正面断面図である。
１１−真空チャンバ、１２− ターゲット、１２ａ−ｍ
−回転軸、１３−電子銃、
１ｉ １４−電子線、１５”−Ｘ線、
１６−ベリリウム窓、１７−試料処理室、１８−試料、
１９−マスク、
２０一定盤、２１−［！南部材、
２２−・脚、２３一台、２４− エアヘアリング、２５
− クリアランスシール、２６−排気管第１図
第２図Fig. 1 is a front sectional view of the embodiment of the present invention, and Fig. 2 is a conventional X
FIG. 2 is a front cross-sectional view of a part of the line exposure apparatus. 11-vacuum chamber, 12-target, 12a-m
- rotation axis, 13 - electron gun, 1i 14 - electron beam, 15" - X-ray, 16 - beryllium window, 17 - sample processing chamber, 18 - sample,
19-Mask, 20 Fixed Edition, 21-[! Nanbu lumber, 22-legs, 23 one unit, 24-air hair ring, 25
- Clearance seal, 26-Exhaust pipe Fig. 1 Fig. 2
Claims (1)
ら発生ずるＸ線によって試料の露光を行う方法において
、前記ターゲットの回転軸をエアベアリング軸受けによ
って無接触に支持し、クリアランス真空シールによりタ
ーゲットの配置された室の真空を保持することを特徴と
するＸ線露光方法。In a method in which an electron beam is emitted to a rotating target 1-, and a sample is exposed to X-rays generated from the target, the rotating axis of the target is supported without contact by an air bearing, and a clearance vacuum seal is used to support the rotating shaft of the target without contact. An X-ray exposure method characterized by maintaining a vacuum in a chamber in which a target is placed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59117124A JPS60262338A (en) | 1984-06-07 | 1984-06-07 | X-ray exposure method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59117124A JPS60262338A (en) | 1984-06-07 | 1984-06-07 | X-ray exposure method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60262338A true JPS60262338A (en) | 1985-12-25 |
| JPH0561744B2 JPH0561744B2 (en) | 1993-09-07 |
Family
ID=14704024
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59117124A Granted JPS60262338A (en) | 1984-06-07 | 1984-06-07 | X-ray exposure method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60262338A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999053823A3 (en) * | 1998-04-22 | 2000-08-24 | Smithsonian Astrophysical Obse | X-ray diagnostic system |
| WO2014140099A2 (en) * | 2013-03-15 | 2014-09-18 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, rotary target, and rotary vacuum seal |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54134589A (en) * | 1978-03-31 | 1979-10-19 | Siemens Ag | High power xxray tube having rotary anode |
-
1984
- 1984-06-07 JP JP59117124A patent/JPS60262338A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54134589A (en) * | 1978-03-31 | 1979-10-19 | Siemens Ag | High power xxray tube having rotary anode |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999053823A3 (en) * | 1998-04-22 | 2000-08-24 | Smithsonian Astrophysical Obse | X-ray diagnostic system |
| WO2014140099A2 (en) * | 2013-03-15 | 2014-09-18 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, rotary target, and rotary vacuum seal |
| WO2014140099A3 (en) * | 2013-03-15 | 2014-10-30 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, rotary target, and rotary vacuum seal |
| GB2517671A (en) * | 2013-03-15 | 2015-03-04 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, rotary target and rotary vacuum seal |
| EP3118883A1 (en) * | 2013-03-15 | 2017-01-18 | Nikon Metrology NV | Rotary vacuum seal and target assembly |
| JP2017041447A (en) * | 2013-03-15 | 2017-02-23 | ニコン・メトロロジー・エヌヴェ | Rotary vacuum seal for rotating shaft, and target assembly for x-ray source |
| CN106887373A (en) * | 2013-03-15 | 2017-06-23 | 尼康计量公众有限公司 | X-ray source, high-voltage generator, electron beam gun, rotation target assembly, rotary target and rotating vacuum seals part |
| US9941090B2 (en) | 2013-03-15 | 2018-04-10 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, and rotary vacuum seal |
| US9947501B2 (en) | 2013-03-15 | 2018-04-17 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, rotary target, and rotary vacuum seal |
| US9966217B2 (en) | 2013-03-15 | 2018-05-08 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, rotary target, and rotary vacuum seal |
| US10008357B2 (en) | 2013-03-15 | 2018-06-26 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, rotary target, and rotary vacuum seal |
| US10020157B2 (en) | 2013-03-15 | 2018-07-10 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, rotary target, and rotary vacuum seal |
| US10096446B2 (en) | 2013-03-15 | 2018-10-09 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, rotary target, and rotary vacuum seal |
| US10102997B2 (en) | 2013-03-15 | 2018-10-16 | Nikon Metrology Nv | X-ray source, high-voltage generator, electron beam gun, rotary target assembly, rotary target, and rotary vacuum seal |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0561744B2 (en) | 1993-09-07 |
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| JPH04136944A (en) | X-ray exposing device | |
| JPH0130293B2 (en) |