JPS6025874B2 - High frequency heating device - Google Patents

High frequency heating device

Info

Publication number
JPS6025874B2
JPS6025874B2 JP55129471A JP12947180A JPS6025874B2 JP S6025874 B2 JPS6025874 B2 JP S6025874B2 JP 55129471 A JP55129471 A JP 55129471A JP 12947180 A JP12947180 A JP 12947180A JP S6025874 B2 JPS6025874 B2 JP S6025874B2
Authority
JP
Japan
Prior art keywords
waveguide
heating chamber
frequency
high frequency
excitation ports
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55129471A
Other languages
Japanese (ja)
Other versions
JPS5755089A (en
Inventor
光雄 望月
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP55129471A priority Critical patent/JPS6025874B2/en
Publication of JPS5755089A publication Critical patent/JPS5755089A/en
Publication of JPS6025874B2 publication Critical patent/JPS6025874B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00Heating by electric, magnetic or electromagnetic fields
    • H05B6/64Heating using microwaves
    • H05B6/70Feed lines
    • H05B6/707Feed lines using waveguides

Description

【発明の詳細な説明】 この発明は導波管を備えた高周波加熱装置に関する。[Detailed description of the invention] The present invention relates to a high frequency heating device equipped with a waveguide.

一般に、高周波加熱装置のいわゆる電子レンジにあって
は、被調理品の多くが中心部で高密度状態となっている
こと、また形状的にも中心部の厚みが大きいことなどの
熱吸収特性を考慮し、加熱室内の略中央部に対する温度
分布を高くするとともに、加熱室内の中央部周辺に対す
る温度分布を一様にすることが必須条件の一つである。
In general, microwave ovens, which are high-frequency heating devices, have heat absorption characteristics such as the fact that most of the food being cooked is in a high-density state in the center, and the thickness of the center is large. Taking this into consideration, one of the essential conditions is to increase the temperature distribution around the center of the heating chamber and to make the temperature distribution around the center of the heating chamber uniform.

この考案は上記のような事情に鑑みてなされたもので、
その目的とするところは、極めて簡単な構成でありなが
ら被加熱物の熱吸収特性に応じた良好な加熱室内温度分
布状態を得ることができ、被加熱物に対する加熱むらの
無い最適な可能とするすぐれた高周波加熱装置を提供す
ることにある。以下、この発明の−実施例について図面
を参照して説明する。
This idea was made in view of the above circumstances,
The purpose is to achieve a good temperature distribution in the heating chamber according to the heat absorption characteristics of the object to be heated, even though it has an extremely simple configuration, and to achieve optimal heating without uneven heating of the object to be heated. The purpose of the present invention is to provide an excellent high-frequency heating device. Embodiments of the present invention will be described below with reference to the drawings.

第1図、第2図および第3図において、1は電子レンジ
の本体で、前面にはドア2が開閉自在に枝支されるとと
もに、操作パネル3が設けられている。
In FIGS. 1, 2, and 3, reference numeral 1 denotes a main body of a microwave oven, on the front of which a door 2 is supported so as to be freely openable and closable, and an operation panel 3 is provided.

そして、ドア2に対応する本体1内には加熱室4が配設
され、この加熱室4内には被調理食品を載層するための
棚板5が設けられている。また、加熱室4内の天井面に
は方形導波管6が固定され、この導波管6の一端は加熱
室4の側壁を貫通して加熱室4外へ導出されている。し
かして、導波管6の一端側外周面には高周波発生装置た
とえばマグネトロン7が設けられており、このマグネト
ロン7のアンテナ7aは導波管6内に導入されている。
そして、さらに、加熱室4の中央部と対応する導波管6
の管壁には、その底壁6aに直交励振口10a,10b
,10c、両側壁6bに直交励振口10d,10e,1
0fが形成されている。
A heating chamber 4 is disposed within the main body 1 corresponding to the door 2, and a shelf board 5 for stacking food to be cooked is provided within the heating chamber 4. Further, a rectangular waveguide 6 is fixed to the ceiling surface within the heating chamber 4, and one end of this waveguide 6 penetrates the side wall of the heating chamber 4 and is led out to the outside of the heating chamber 4. A high frequency generator such as a magnetron 7 is provided on the outer peripheral surface of one end of the waveguide 6, and an antenna 7a of the magnetron 7 is introduced into the waveguide 6.
Furthermore, a waveguide 6 corresponding to the central part of the heating chamber 4
The tube wall has orthogonal excitation ports 10a, 10b on its bottom wall 6a.
, 10c, orthogonal excitation ports 10d, 10e, 1 on both side walls 6b
0f is formed.

また、加熱室4の中央部周辺と対応する導波管6の管墜
には、その底壁6aに平行励振口11a,11b、両側
壁6bに平行励振口11c,11dが形成されている。
この場合、導波管6におけるマグネトロン7から発せら
れる高周波の管内波長を入gとすれば、上記各励振ロー
oa,10b,Ioc,10d,10e,10f,10
a,lib,11c,11dはそれぞれ高周波発生源つ
まりアンテナ7aを基点としてn・^g/2(nは正の
整数)の距離の位置に順次形成されており、良好な整合
状態(位相がずれが無く、しかもSWR=1.5以下)
が確保されている。また、上記直交励振口10a,10
b,10c,10d,10e,10fは管壁電流方向と
略直交する形状のものであり、平行励振口11a,11
b,11c,11dは管壁電流方向と略平行な形状のも
のである。ここで、第4図は導波管6内における高周波
の電界Eおよび磁界日の状態を示すものである。
In addition, parallel excitation ports 11a and 11b are formed in the bottom wall 6a of the tube bottom of the waveguide 6 corresponding to the vicinity of the central portion of the heating chamber 4, and parallel excitation ports 11c and 11d are formed in both side walls 6b.
In this case, if the internal wavelength of the high frequency wave emitted from the magnetron 7 in the waveguide 6 is input g, then each of the above excitation rows oa, 10b, Ioc, 10d, 10e, 10f, 10
a, lib, 11c, and 11d are formed sequentially at a distance of n·^g/2 (n is a positive integer) from the high frequency generation source, that is, the antenna 7a, and are in a good matching state (no phase shift occurs). (and SWR=1.5 or less)
is ensured. In addition, the orthogonal excitation ports 10a, 10
b, 10c, 10d, 10e, and 10f have shapes substantially orthogonal to the tube wall current direction, and parallel excitation ports 11a, 11
b, 11c, and 11d have shapes substantially parallel to the tube wall current direction. Here, FIG. 4 shows the state of the high frequency electric field E and magnetic field within the waveguide 6.

すなわち、アンテナ7aからn・入g/2の距離の位置
が電界Eの強さが最大となる。また、右ねじの方則によ
り、低壁6aおよび両側壁6bにおける管壁電流1は磁
界fiのループから第5図のように流れる。したがって
、マグネトロン6から発せられる高周波は導波賀6によ
って加熱室4の上部に導かれ、その導波管6の各励振口
から加熱室4内へ供給される。
That is, the strength of the electric field E is maximum at a position at a distance of n·in g/2 from the antenna 7a. Further, according to the right-handed screw rule, the tube wall current 1 in the lower wall 6a and both side walls 6b flows from the loop of the magnetic field fi as shown in FIG. Therefore, the high frequency waves emitted from the magnetron 6 are guided to the upper part of the heating chamber 4 by the waveguide 6 and supplied into the heating chamber 4 from each excitation port of the waveguide 6.

この場合、各励振口は高周波の電界Eの強さが最大且つ
一定となる位置にあることにより、高周波のェネルギが
効率良く加熱室4内に供給される。また、この場合、直
交励振口10a,lob,10c,10d,10e,1
0fの形状は管壁電流を大きく切るものであり、このた
め加熱室4の中央部に供給される高周波のェネルギは非
常に大きなものとなる。一方、平行励振口11a,11
b,11c,11dの形状は管壁電流を小さく切るもの
であり、このため加熱室4の中央部周辺に供給される高
周波のェネルギはあまり大きくならない。しかして、1
00ccの水(初期水温20±2℃)を2分間加熱する
実験を行なうと、第6図および第7図に示すように加熱
室4の中央部0における温度は高く、中央部周辺P,Q
,R,Sにおいてはそれぞれ中央部○の温度よりも低い
一様の温度となる。
In this case, each excitation port is located at a position where the strength of the high-frequency electric field E is maximum and constant, so that high-frequency energy is efficiently supplied into the heating chamber 4. In this case, the orthogonal excitation ports 10a, lob, 10c, 10d, 10e, 1
The shape of 0f greatly cuts the tube wall current, and therefore the high frequency energy supplied to the center of the heating chamber 4 becomes very large. On the other hand, parallel excitation ports 11a, 11
The shapes of b, 11c, and 11d cut the tube wall current to a small value, so that the high frequency energy supplied to the vicinity of the center of the heating chamber 4 does not become very large. However, 1
When conducting an experiment in which 00 cc of water (initial water temperature 20±2°C) was heated for 2 minutes, the temperature at the center 0 of the heating chamber 4 was high, and the temperature at the center P, Q around the center was high, as shown in Figures 6 and 7.
, R, and S each have a uniform temperature lower than the temperature of the center part ○.

このように、導波管6の管壁に直交励振口および平行励
振口を形成するだけの極めて簡単な構成により、被調理
食品の熱吸収特性に応じた良好な加熱室内温度分布状態
を得ることができ、被調理食品に対する加熱むらの無い
良好な調理が可能となる。
In this way, with the extremely simple configuration of just forming orthogonal excitation ports and parallel excitation ports on the tube wall of the waveguide 6, it is possible to obtain a favorable temperature distribution state in the heating chamber according to the heat absorption characteristics of the food to be cooked. This enables good cooking of the food to be cooked without uneven heating.

ところで、従来でも加熱むらを無くすために反射板やス
タラフアンを設ける方法があるが、この発明によれば上
記したような極めて簡単な構成であることから反射板や
スタラフアンを設ける場合よりも経済性の面ですぐれて
おり、しかも加熱室4の容積を最大限に活用できるとい
う特徴がある。なお、上記実施例では各励振口をアンテ
ナ7aからn・^g/2の距離の位置に設けるようにし
ているが、導波管6にスタプを設けて良好な整合状態を
確保するようにすれば励振口の位置を変えることも可能
である。
By the way, in the past there is a method of providing a reflector or a starvation fan to eliminate heating unevenness, but the present invention has an extremely simple structure as described above, so it is more economical than the case of providing a reflector or a starvation fan. In addition, it is characterized by being able to make maximum use of the volume of the heating chamber 4. In the above embodiment, each excitation port is provided at a distance of n·^g/2 from the antenna 7a, but it is also possible to provide a stud in the waveguide 6 to ensure a good matching state. For example, it is also possible to change the position of the excitation port.

ただし、この場合にはコストの上昇は勿論、強電界であ
るためにスタプにスパークが生じてしまうなどの2次的
な問題があることを予め考慮しておくべきである。その
他、この発明は上記実施例に限定されるものではなく、
たとえば励猿口の数は必要に応じて適宜加減してもよく
、また、各励振口に被調理食品からの蒸気やかすが入ら
ないように加熱室4内に仕切板を設けることも可能であ
り、要旨を変えない範囲で種々変形実施可能なものであ
る。
However, in this case, it should be taken into consideration in advance that not only does the cost increase, but also there are secondary problems such as the generation of sparks on the stamp due to the strong electric field. In addition, this invention is not limited to the above embodiments,
For example, the number of excitation ports may be adjusted as necessary, and it is also possible to provide a partition plate in the heating chamber 4 to prevent steam or residue from the food to be cooked from entering each excitation port. , various modifications can be made without changing the gist.

以上述べたようにこの発明によれば、加熱室の中央部と
対応する導波管の管壁に管壁電流方向と略直交する形状
の直交励振口を設けることとともに、加熱室の中央部周
辺と対応する導波管の管壁に管墜電流方向と略平行な形
状の平行励振口を設けるようにしたので、被加熱物の熱
吸収特性に応じた良好な加熱室内温度分布状態を得るこ
とができ、被加熱物に対する加熱むらの無い最適な加熱
を可能とするすぐれた高周波加熱装置を提供できる。
As described above, according to the present invention, an orthogonal excitation port having a shape substantially orthogonal to the tube wall current direction is provided in the tube wall of the waveguide corresponding to the central portion of the heating chamber, and Since a parallel excitation port having a shape substantially parallel to the direction of the tube falling current is provided on the wall of the waveguide corresponding to the waveguide, it is possible to obtain a good temperature distribution state in the heating chamber according to the heat absorption characteristics of the object to be heated. This makes it possible to provide an excellent high-frequency heating device that can optimally heat the object without uneven heating.

【図面の簡単な説明】[Brief explanation of the drawing]

図面はこの発明の一実施例を示すもので、第1図は外観
斜視図、第2図は内部を概略的に示す構成図、第3図は
第2図におけるA−A′線断面を図示矢印方向に見た構
成図、第4図は導波管内の高周波の鷺磁界分布を示す図
、第5図は導波管の管壁電流の流れを示す図、第6図お
よび第7図は加熱室内の温度分布状態を実験により調べ
た結果を示す図である。 4・・・・・・加熱室、6・・・・・・導波管、7・・
・・・・高周波発生装置(マグネトロン)、7a・・・
・・・高周波発生源(マグネトロンのアンテナ)、10
a,1ob,10c,10d,10e,10f…・・・
直交励振口、11a,11b,11c,11d…・・・
平行励振口、1・・・・・・管壁電流。 才,図 オ2囚 〆3蟹 オム図 オ5図 才6図 オ7図
The drawings show one embodiment of the present invention; FIG. 1 is an external perspective view, FIG. 2 is a schematic diagram showing the inside, and FIG. 3 is a cross-sectional view taken along the line A-A' in FIG. 2. The configuration diagram as seen in the direction of the arrow, Figure 4 is a diagram showing the distribution of the high frequency heron magnetic field in the waveguide, Figure 5 is a diagram showing the flow of the wall current in the waveguide, Figures 6 and 7 are It is a figure which shows the result of investigating the temperature distribution state in a heating chamber by experiment. 4... Heating chamber, 6... Waveguide, 7...
...High frequency generator (magnetron), 7a...
...High frequency source (magnetron antenna), 10
a, 1ob, 10c, 10d, 10e, 10f...
Orthogonal excitation ports, 11a, 11b, 11c, 11d...
Parallel excitation port, 1...Tube wall current. Figure O 2 Prisoner 3 Crab Om Figure 5 Figure 6 Figure 7

Claims (1)

【特許請求の範囲】 1 高周波発生装置から発せられる高周波を加熱室上部
へ導く導波管を備えた高周波加熱装置において、前記加
熱室の中央部と対応する前記導波管の底壁および側壁に
それぞれ管壁電極方向と略直行する形状の直行励振口を
設けるとともに、前記加熱室の中央部周辺と対応する前
記導波管の底壁および側壁にそれぞれ管壁電流方向と略
平行な形状の平行励振口を設け、これら励振口から前記
加熱室内に高周波を供給するようにしたことを特徴とす
る高周波発生装置。 2 前記導波管における前記各励振口の位置はそれぞれ
高周波源を起点としてn・λg/2(nは整数、λgは
前記導波管における高周波の管内波長)の距離にあるこ
とを特徴とする特許請求の範囲第1項記載の高周波加熱
装置。
[Scope of Claims] 1. In a high-frequency heating device equipped with a waveguide that guides high-frequency waves emitted from a high-frequency generator to an upper part of a heating chamber, a bottom wall and a side wall of the waveguide corresponding to the center portion of the heating chamber Orthogonal excitation ports each having a shape substantially perpendicular to the tube wall electrode direction are provided, and parallel excitation ports each having a shape substantially parallel to the tube wall current direction are provided on the bottom wall and side wall of the waveguide corresponding to the central portion of the heating chamber. A high-frequency generator characterized in that excitation ports are provided and high-frequency waves are supplied into the heating chamber from these excitation ports. 2. The position of each of the excitation ports in the waveguide is located at a distance of n·λg/2 (n is an integer, and λg is the internal wavelength of the high frequency wave in the waveguide) from the high frequency source as the starting point. A high frequency heating device according to claim 1.
JP55129471A 1980-09-18 1980-09-18 High frequency heating device Expired JPS6025874B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55129471A JPS6025874B2 (en) 1980-09-18 1980-09-18 High frequency heating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55129471A JPS6025874B2 (en) 1980-09-18 1980-09-18 High frequency heating device

Publications (2)

Publication Number Publication Date
JPS5755089A JPS5755089A (en) 1982-04-01
JPS6025874B2 true JPS6025874B2 (en) 1985-06-20

Family

ID=15010305

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55129471A Expired JPS6025874B2 (en) 1980-09-18 1980-09-18 High frequency heating device

Country Status (1)

Country Link
JP (1) JPS6025874B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59189588A (en) * 1983-04-12 1984-10-27 株式会社日立ホームテック High frequency heater
JPS59189589A (en) * 1983-04-12 1984-10-27 株式会社日立ホームテック High frequency heater
JPS59194387A (en) * 1983-04-19 1984-11-05 株式会社日立ホームテック High frequency heater
JP6016135B2 (en) 2012-03-09 2016-10-26 パナソニックIpマネジメント株式会社 Microwave heating device
EP2852251A4 (en) * 2012-05-15 2015-06-03 Panasonic Ip Man Co Ltd Microwave heating device

Also Published As

Publication number Publication date
JPS5755089A (en) 1982-04-01

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